| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
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| 05/05/2010 | CN1550288B Abrasive pad, method and metal mold for manufacturing the same, and semiconductor wafer polishing method |
| 05/04/2010 | US7709382 Electroprocessing profile control |
| 05/04/2010 | US7708900 Chemical mechanical polishing slurry compositions, methods of preparing the same and methods of using the same |
| 05/04/2010 | US7708854 Work carrier and method of processing a workpiece |
| 05/04/2010 | US7708788 Cerium oxide abrasive and method of polishing substrates |
| 05/04/2010 | US7708622 Apparatuses and methods for conditioning polishing pads used in polishing micro-device workpieces |
| 05/04/2010 | US7708618 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device |
| 04/29/2010 | WO2010047520A1 Polisher, pressure plate of the polisher and method of polishing |
| 04/29/2010 | WO2010047314A1 Composition for polishing silicon nitride and method for controlling selectivity using same |
| 04/29/2010 | WO2010005543A3 Method of polishing nickel-phosphorous |
| 04/29/2010 | US20100104806 Method for polishing both sides of a semiconductor wafer |
| 04/29/2010 | DE102009038942A1 Vorrichtung zur beidseitigen Bearbeitung von flachen Werkstücken sowie Verfahren zur gleichzeitigen beidseitigen Material abtragenden Bearbeitung mehrerer Halbleiterscheiben Apparatus for two-sided machining flat workpieces and method for simultaneous two-sided material removing machining plurality of semiconductor wafers |
| 04/28/2010 | EP1447841B1 Method of machining semiconductor wafer-use polishing pad and semiconductor wafer-use polishing pad |
| 04/28/2010 | CN1791491B 基片抛光设备 Substrate polishing equipment |
| 04/27/2010 | US7704122 Customized polish pads for chemical mechanical planarization |
| 04/27/2010 | US7703193 Methods and apparatus for controlling the lapping of a slider based on an amplitude of a readback signal produced from an externally applied magnetic field |
| 04/22/2010 | US20100099340 Textured platen |
| 04/22/2010 | US20100099337 Device For The Double-Sided Processing Of Flat Workpieces and Method For The Simultaneous Double-Sided Material Removal Processing Of A Plurality Of Semiconductor Wafers |
| 04/22/2010 | US20100099333 Method and apparatus for determining shear force between the wafer head and polishing pad in chemical mechanical polishing |
| 04/22/2010 | US20100099259 Polishing composition and method for manufacturing semiconductor integrated circuit device |
| 04/22/2010 | DE102009041386A1 Verfahren und Vorrichtung zum Läppen von Oberflächen Method and apparatus for lapping surfaces |
| 04/22/2010 | DE102008049972A1 Verfahren zum Messen der Dicke von in einer Bearbeitungsmaschine bearbeiteten scheibenförmigen Werkstücken A method for measuring the thickness of machined in a machine tool disc-shaped workpieces |
| 04/21/2010 | EP2177315A1 Chemical mechanical polishing pad having sealed window |
| 04/21/2010 | EP2177313A1 A Chemical Mechanical Polishing Pad Having Integral Identification Feature |
| 04/21/2010 | EP2177312A1 A chemical mechanical polishing pad having window with integral identification feature |
| 04/21/2010 | EP1667816B1 Polishing pad with recessed window |
| 04/21/2010 | CN201439182U 化学机械研磨装置 The chemical mechanical polishing apparatus |
| 04/21/2010 | CN101695826A Grinder for charging roller of full-automatic printer |
| 04/21/2010 | CN101327577B Fixed abrasive polishing pad with self-finishing function and even wear |
| 04/20/2010 | US7699901 Alumina-film-polishing composition and chemical mechanical polishing method using the same |
| 04/20/2010 | US7699684 CMP porous pad with component-filled pores |
| 04/15/2010 | US20100093585 Post-cmp treating liquid and manufacturing method of semiconductor device using the same |
| 04/15/2010 | US20100092366 Water-based polishing slurry for polishing silicon carbide single crystal substrate, and polishing method for the same |
| 04/15/2010 | US20100090314 Final polishing method for silicon single crystal wafer and silicon single crystal wafer |
| 04/15/2010 | US20100090159 Semiconductor polishing composition |
| 04/14/2010 | CN201437215U 研磨机 Grinder |
| 04/14/2010 | CN101693354A Substrate polishing apparatus |
| 04/13/2010 | US7698012 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing |
| 04/13/2010 | US7696273 Method for improving mechanical properties of polymer particles and its applications |
| 04/13/2010 | US7695637 Slurry composition for chemical mechanical polishing and precursor composition thereof |
| 04/13/2010 | US7695347 Method and pad for polishing wafer |
| 04/13/2010 | US7695345 Polishing compound for semiconductor integrated circuit device, polishing method and method for producing semiconductor integrated circuit device |
| 04/08/2010 | WO2010038725A1 Urethane resin composition for polishing pad, polyurethane polishing pad, and method for producing polyurethane polishing pad |
| 04/08/2010 | WO2010038724A1 Two liquid-type urethane resin composition for polishing pad, polyurethane polishing pad obtained using the same, and method for producing polyurethane polishing pad |
| 04/08/2010 | WO2010038706A1 Polishing liquid and polishing method |
| 04/08/2010 | WO2010038646A1 Apparatus for polishing spherical body, method for polishing spherical body and method for manufacturing spherical member |
| 04/08/2010 | WO2010038617A1 Polishing slurry, process for producing same, method of polishing, and process for producing glass substrate for magnetic disk |
| 04/08/2010 | WO2010038503A1 Cerium oxide and process for producing the same |
| 04/08/2010 | WO2010038407A1 Silicon carbide single crystal substrate |
| 04/08/2010 | WO2010037527A1 Apparatus and method for processing a stent |
| 04/08/2010 | WO2010037469A1 Method for measuring the thickness of disc-shaped work pieces machined in a machine tool |
| 04/08/2010 | WO2010037452A1 Method for measuring the thickness of a discoidal workpiece |
| 04/08/2010 | US20100087128 Polishing pad, and method for manufacturing polishing pad |
| 04/08/2010 | US20100086864 Method of polishing glass substrate |
| 04/08/2010 | US20100084373 Method for manufacturing perpendicular magnetic recording medium |
| 04/07/2010 | CN201436147U Wafer grinding and cutting protection structure |
| 04/06/2010 | US7691279 Method of producing a glass substrate for a mask blank and method of producing a mask blank |
| 04/01/2010 | WO2010035404A1 Chemical mechanical polishing apparatus, chemical mechanical polishing method, and control program |
| 04/01/2010 | WO2009158507A3 Chemical mechanical planarization pad conditioner and method of forming |
| 04/01/2010 | DE10195941B4 Halbleiter-Bearbeitungsverfahren zum Entfernen leitfähigen Materials Semiconductor processing method of removing conductive material |
| 03/31/2010 | EP2169710A1 Metal film polishing liquid and polishing method |
| 03/31/2010 | EP2168721A1 Apparatus and method for processing a stent |
| 03/31/2010 | EP2167278A1 Scratch removal device and method |
| 03/31/2010 | CN101689494A Polishing liquid for metal film and polishing method |
| 03/31/2010 | CN101689493A Polishing composition and method for manufacturing semiconductor integrated circuit device |
| 03/31/2010 | CN101687307A Stacked polishing pad for high temperature applications |
| 03/31/2010 | CN101683723A Dead halt alarm method for CMP equipment and apparatus therefor |
| 03/30/2010 | US7687393 Polishing composition and rinse composition |
| 03/30/2010 | US7686673 Working shape prediction method, working requirement determination method, working method, working system, method of manufacturing semiconductor device, computer program, and computer program storage medium |
| 03/25/2010 | WO2010032715A1 Polishing pad |
| 03/25/2010 | WO2010008824A3 Closed-loop control for effective pad conditioning |
| 03/25/2010 | WO2009155137A3 Improved grinder/polisher |
| 03/25/2010 | WO2009152008A3 Cmp pad identification and layer ratio modeling |
| 03/25/2010 | US20100076588 Polishing apparatus and polishing method |
| 03/25/2010 | US20100075577 Method of polishing glass substrate |
| 03/25/2010 | US20100075576 Polishing state monitoring apparatus and polishing apparatus and method |
| 03/25/2010 | US20100075501 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method |
| 03/25/2010 | US20100075500 Metal polishing slurry and chemical mechanical polishing method |
| 03/25/2010 | US20100072418 Polishing slurry |
| 03/25/2010 | DE102008044646A1 Verfahren zur Herstellung einer Halbleiterscheibe A process for producing a semiconductor wafer |
| 03/25/2010 | DE102007035266B4 Verfahren zum Polieren eines Substrates aus Silicium oder einer Legierung aus Silicium und Germanium A method for polishing a substrate of silicon or an alloy of silicon and germanium |
| 03/24/2010 | CN201427275Y Weight for reduction of semiconductor wafer wear |
| 03/24/2010 | CN101681825A Metal film polishing pad and method for polishing metal film using the same |
| 03/24/2010 | CN101678529A Methods and apparatus for polishing a semiconductor wafer |
| 03/24/2010 | CN101678528A Process for producing glass substrate for magnetic disk |
| 03/24/2010 | CN101678527A Cushion for polishing pad and polishing pad using the cushion |
| 03/24/2010 | CN101677055A Wafer grinding process |
| 03/24/2010 | CN101676235A Heat-resistant roll, production method thereof, and method of producing sheet glass using heat-resistant roll |
| 03/24/2010 | CN100595892C 研磨组合物 Polishing composition |
| 03/24/2010 | CN100595035C Method of surface treatment, crystal substrate, and semiconductor device |
| 03/23/2010 | US7682976 Methods of forming a phase-change material layer pattern, methods of manufacturing a phase-change memory device and related slurry compositions |
| 03/23/2010 | US7682225 Polishing apparatus and substrate processing apparatus |
| 03/23/2010 | US7682221 Integrated endpoint detection system with optical and eddy current monitoring |
| 03/18/2010 | US20100068974 Abrasive particles having a unique morphology |
| 03/17/2010 | EP2164095A1 Cerium oxide abrasive and method of polishing substrates |
| 03/17/2010 | CN101675138A Cmp compositions containing a soluble peroxometalate complex and methods of use thereof |
| 03/17/2010 | CN101674919A Polishing tool and polishing device |
| 03/17/2010 | CN101673668A Method for polishing gallium nitride crystals |
| 03/17/2010 | CN101670547A Polishing apparatus and method for separating a substrate from a substrate holding part |
| 03/16/2010 | US7678245 Method and apparatus for electrochemical mechanical processing |