| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
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| 06/08/2010 | US7731566 Substrate polishing metrology using interference signals |
| 06/03/2010 | WO2010061828A1 Mask blank substrate |
| 06/03/2010 | US20100136886 Polishing apparatus and substrate processing apparatus |
| 06/03/2010 | US20100136884 Substrate polishing apparatus and method of polishing substrate using the same |
| 06/03/2010 | US20100136372 Glass substrate for magnetic disk and method for producing the same |
| 06/02/2010 | EP2191936A2 Retaining ring with convex bottom surface |
| 06/02/2010 | EP1512168B1 Subpad having robust, sealed edges |
| 06/02/2010 | DE10314212B4 Verfahren zur Herstellung eines Maskenrohlings, Verfahren zur Herstellung einer Transfermaske A method of producing a mask blank, method of manufacturing a transfer mask |
| 06/02/2010 | CN201493751U Improved grinding upper disc |
| 06/02/2010 | CN1914004B Multi-step pad conditioning method for chemical planarization |
| 06/02/2010 | CN1796482B Composition for selectively polishing silicon nitride layer and polishing method employing it |
| 06/02/2010 | CN101716745A Device and method for polishing sapphire substrate material by ultrasound assisted chemical machinery |
| 06/02/2010 | CN101716744A Board surface leveling method of loop-free blind hole high-density interconnection printing circuit board |
| 06/02/2010 | CN101148031B Polishing pad and method of producing the same |
| 06/01/2010 | US7727630 nickel powder batches include particles having a small particle size, narrow size distribution and a spherical morphology, encapulated by a metal oxide selected from ZrO2, SiO2, b2O3, TiO2, Cu2O, CuO, Bi2o3, V2O5 and Al2O3 |
| 06/01/2010 | US7727053 Double-side polishing method for wafer |
| 06/01/2010 | US7727049 Friction sensor for polishing system |
| 05/27/2010 | US20100130111 Double side polishing method and apparatus |
| 05/27/2010 | US20100130105 Substrate supporting unit, and apparatus and method for polishing substrate using the same |
| 05/27/2010 | US20100130103 Polishing apparatus and program thereof |
| 05/27/2010 | DE102008058638A1 Verfahren zum Betreiben einer Doppelseitenschleifmaschine sowie Doppelseitenschleifmaschine Method for operating a double side grinding and double side grinding |
| 05/26/2010 | EP2189240A1 Method for operating a double sided grinding machine and double sided grinding machine |
| 05/26/2010 | EP1694464B1 Retaining ring with shaped surface |
| 05/26/2010 | EP1305139B1 Fluid dispensing fixed abrasive polishing pad |
| 05/26/2010 | CN201483382U Grinding pad and grinding device |
| 05/26/2010 | CN201483369U Polishing liquid transmitting device |
| 05/26/2010 | CN201483366U Controller of numerical-control precise grinding and polishing machine |
| 05/26/2010 | CN201483359U Chemical mechanical grinding equipment |
| 05/26/2010 | CN201483358U Mechanical arm used for polishing pad adjusting device |
| 05/26/2010 | CN201483357U Mirror surface grinding disk |
| 05/26/2010 | CN201483356U Main shaft structure grinder wheelhead |
| 05/26/2010 | CN201483355U Ring grinder |
| 05/26/2010 | CN201483354U Grinding pan of vertical grinding machine |
| 05/26/2010 | CN1890055B Chemical mechanical polishing method for reducing slurry reflux |
| 05/26/2010 | CN1781668B Apparatus for forming a striation reduced chemical mechanical polishing pad |
| 05/26/2010 | CN101712136A Automatic valve flashboard lapping machine |
| 05/26/2010 | CN101346804B Polishing composition, polishing method, and method for forming copper wiring for semiconductor integrated circuit |
| 05/26/2010 | CN101263583B Polishing compound, polishing device, and semiconductor integrated circuit device |
| 05/26/2010 | CN101253022B Polishing pad |
| 05/26/2010 | CN101037585B Polishing fluid and polishing method |
| 05/25/2010 | US7725208 Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing |
| 05/25/2010 | US7722692 fluorination; high removal rate, less generation of scratches, high-precision polished surface with small surface roughness, and safe, simple and low-cost production; optical lens, hard disk, display panel, filter for cutting off specific frequency, or photomask |
| 05/25/2010 | US7722439 Semiconductor device manufacturing apparatus and method |
| 05/25/2010 | US7722436 Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model |
| 05/25/2010 | US7722434 Apparatus for measurement of parameters in process equipment |
| 05/20/2010 | WO2010019264A3 Chemical mechanical polisher having movable slurry dispensers and method |
| 05/20/2010 | US20100124817 Method of fabricating self-aligned contact pad using chemical mechanical polishing process |
| 05/19/2010 | CN201471296U Polishing pad dresser |
| 05/19/2010 | CN201471289U Hole sealing surface grinding tool |
| 05/19/2010 | CN201471288U Abrasive wheel grinding machine |
| 05/19/2010 | CN201471287U Mirror face grinding machine |
| 05/19/2010 | CN201471286U Numerical control precision grinding polishing machine |
| 05/19/2010 | CN201471285U Grinding device for conducting roller |
| 05/19/2010 | CN101708592A Base disc used for suspension polishing |
| 05/19/2010 | CN101708591A Side axial optical fiber grinder |
| 05/19/2010 | CN101352834B Grinding pad collating unit and grinding pad collating method |
| 05/19/2010 | CN101232968B Self-contained conditioning abrasive article, method and polishing system |
| 05/19/2010 | CN101184582B Polishing pad and its manufacture method, a polishing device and polishing method |
| 05/19/2010 | CN101180158B Polishing pad |
| 05/18/2010 | US7720562 Polishing method and polishing apparatus |
| 05/18/2010 | US7718535 Slurry compositions and CMP methods using the same |
| 05/18/2010 | US7718534 Planarization of a heteroepitaxial layer |
| 05/18/2010 | US7718102 forming high density open-cell microstructures in a fast and efficient manner; formed by mixing polyurethanes, surfactants, foaming and curing agents, then pouring into molds; specific gravity |
| 05/18/2010 | US7717769 Manufacture of lapping board |
| 05/18/2010 | US7717768 Wafer polishing apparatus and method for polishing wafers |
| 05/14/2010 | WO2010053804A2 Endpoint control of multiple-wafer chemical mechanical polishing |
| 05/14/2010 | WO2010053206A1 Polishing agent composition and method for polishing magnetic disc substrate |
| 05/14/2010 | WO2010053096A1 Polishing liquid composition for magnetic disk substrate |
| 05/14/2010 | WO2010052990A1 Abrasive, polishing method, method for manufacturing semiconductor integrated circuit device |
| 05/14/2010 | WO2010052983A1 Abrasive composition and method for manufacturing semiconductor integrated circuit device |
| 05/14/2010 | WO2010052945A1 Aspherical silica sol, process for producing the same, and composition for polishing |
| 05/13/2010 | US20100120343 Cushion for polishing pad and polishing pad using the cushion |
| 05/13/2010 | US20100120336 Polishing method and polishing apparatus |
| 05/13/2010 | US20100120249 Process for producing polyurethane foam |
| 05/13/2010 | US20100116685 Methods and apparatuses for electrochemical-mechanical polishing |
| 05/12/2010 | EP2184770A1 Polishing apparatus |
| 05/12/2010 | EP2184131A1 Method for lapping, grinding, honing and polishing seal surfaces on inner diameter of semi-blind cavity in valve body |
| 05/12/2010 | EP2183333A2 Compositions and methods for chemical-mechanical polishing of phase change materials |
| 05/12/2010 | CN201455802U Special jig for abrading gauge block |
| 05/12/2010 | CN201455801U Rotary swinging device of high-precision small spherical grinder |
| 05/12/2010 | CN201455800U High-efficiency grinding device for dual autorotation V-shaped grooves of high-precision ball |
| 05/12/2010 | CN1954967B Lapping pad and its manufacturing method |
| 05/12/2010 | CN1792553B Finishing Apparatus of polishing pat and finishing method |
| 05/12/2010 | CN1670114B Grinding abrasive grains, abrasive, abrasive solution, abrasive solution preparation method, grinding method, and semiconductor device fabrication method |
| 05/12/2010 | CN1653594B Apparatus, system and method to reduce wafer warpage |
| 05/12/2010 | CN101704218A Silicon slice positioning and loading device of chemical mechanical polishing equipment |
| 05/12/2010 | CN101704174A Light scraping method of main bearing black golden tile of ball mill |
| 05/11/2010 | US7714572 Method of detecting characteristics of films using eddy current |
| 05/11/2010 | US7712204 Manufacturing method of a thin-film magnetic head |
| 05/06/2010 | WO2010008824A4 Closed-loop control for effective pad conditioning |
| 05/06/2010 | US20100112914 Retaining ring with tapered inner surface |
| 05/06/2010 | US20100112911 Method and device for the injection of cmp slurry |
| 05/06/2010 | US20100112901 Substrate polishing apparatus and substrate polishing method |
| 05/06/2010 | DE10139086B4 Verfahren zum Trennen eines plattenartigen Werkstückes, welches durch Adsorption an einem elastischen Adsorptionskissen gehalten wird A method of separating a plate-like workpiece which is held by adsorption on a sorbent elastic |
| 05/05/2010 | EP2180977A1 Retaining ring with shaped profile |
| 05/05/2010 | EP1138071B1 A method and system for polishing semiconductor wafers |
| 05/05/2010 | CN201446490U Ceramic ferrule outer-circle polishing machine for optical fiber connectors |
| 05/05/2010 | CN1782013B Polishing composition for a semiconductor substrate |
| 05/05/2010 | CN1781971B Polishing composition |
| 05/05/2010 | CN1646650B Free radical-forming activator attached to solid and used to enhance CMP formulations |