| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
|---|
| 10/19/2010 | US7815489 Method for the simultaneous double-side grinding of a plurality of semiconductor wafers |
| 10/13/2010 | CN201604071U 金相磨抛机 Metallographic grinding and polishing machine |
| 10/13/2010 | CN101857773A Plastic soft composition for polishing and for surafec protective material application |
| 10/13/2010 | CN101856805A Method for producing large-size synthetic quartz glass substrate |
| 10/13/2010 | CN101856804A Full-automatic grinding device of semiconductor chip with four main shafts |
| 10/13/2010 | CN101128285B Polishing device and polishing method |
| 10/12/2010 | US7811972 Method of polishing tape-shaped substrate and substrate for oxide superconductor |
| 10/07/2010 | WO2010113678A1 Working fluid for brittle material and working fluid for hard material |
| 10/07/2010 | WO2010112225A1 Method for the material-removing machining of very thin work pieces in a double side grinding machine |
| 10/07/2010 | US20100255756 Polishing apparatus and polishing method |
| 10/07/2010 | US20100251624 Plastic soft composition for polishing and for surface protective material application |
| 10/07/2010 | DE102009015878A1 Verfahren zum materialabtragenden Bearbeiten von flachen Werkstücken A method for material-processing of flat pieces |
| 10/06/2010 | EP2237311A1 Polishing composition and polishing method using the same |
| 10/06/2010 | EP2236574A1 Polishing composition |
| 10/06/2010 | EP2236247A1 Plastic soft composition for polishing and for surafec protective material application |
| 10/06/2010 | EP2236245A2 Equipment and method for cleaning polishing cloth |
| 10/06/2010 | CN201596968U 柱塞球头研磨机 Plunger ball mill |
| 10/06/2010 | CN101855309A Polishing composition comprising a N-substituted imidazole and a method for polishing a copper film |
| 10/06/2010 | CN101853671A Method of manufacturing a substrate for a magnetic disk |
| 10/06/2010 | CN101853670A Subastrate for a magnetic disk and method of manufacturing the same |
| 10/06/2010 | CN101850539A Lower unit for glass polishing system and polishing method utilizing the same |
| 10/06/2010 | CN101850538A Support jig of wafer and method for grinding, transferring and cutting wafer |
| 10/05/2010 | US7807252 Chemical mechanical polishing pad having secondary polishing medium capacity control grooves |
| 10/05/2010 | US7807038 with a polishing pad having thin cellular polymeric layer overlying a metal or alloy conductive substrate; improved electrical and thermal capabilities and control; porosity |
| 09/30/2010 | WO2010110834A1 Abrasive tool for use as a chemical mechanical planarization pad conditioner |
| 09/30/2010 | WO2010110463A1 POLISHING METHOD, POLISHING APPARATUS AND GaN WAFER |
| 09/30/2010 | US20100248595 Abrasive tool for use as a chemical mechanical planarization pad conditioner |
| 09/30/2010 | US20100247978 Method of manufacturing a substrate for a magnetic disk |
| 09/30/2010 | US20100247977 Subastrate for a magnetic disk and method of manufacturing the same |
| 09/30/2010 | US20100243950 Polishing agent for synthetic quartz glass substrate |
| 09/30/2010 | US20100242374 Polishing Composition and Polishing Method |
| 09/29/2010 | CN1970232B Method of manufacturing chemical mechanical polishing pad and polishing pad |
| 09/29/2010 | CN101849052A Fabric, composite sheet, polishing cloth, and wiping product |
| 09/29/2010 | CN101848791A Method and device for mechanically processing diamond |
| 09/29/2010 | CN101844330A Polishing pad trimmer |
| 09/29/2010 | CN101844328A Equipment and method for cleaning polishing cloth |
| 09/29/2010 | CN101450449B CMP technique condition adjustment control method |
| 09/29/2010 | CN101346806B Metal polishing liquid and method for polishing film to be polished |
| 09/29/2010 | CN101337336B Method for grinding semiconductor chip |
| 09/23/2010 | WO2010082992A3 Polishing pad and system with window support |
| 09/23/2010 | US20100240283 Method of Chemical Mechanical Polishing |
| 09/23/2010 | US20100240281 Substrate polishing metrology using interference signals |
| 09/23/2010 | US20100236288 Glass powders, methods for producing glass powders and devices fabricated from same |
| 09/22/2010 | CN201586922U Grinding block |
| 09/22/2010 | CN1849264B Cerium salt, process for producing the same, cerium oxide, and cerium-based abrasive material |
| 09/22/2010 | CN1670116B Polishing composition and polishing method |
| 09/22/2010 | CN1535796B Ion bombardment electric grinding indicator for reducing noise in course of grinding process |
| 09/22/2010 | CN101842192A System and method for producing damping polyurethane cmp pads |
| 09/22/2010 | CN101837565A Method for manufacturing disc-shaped substrate |
| 09/22/2010 | CN101837564A Valve grinding machine |
| 09/21/2010 | US7799688 Polishing fluid and method of polishing |
| 09/21/2010 | US7799686 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 09/21/2010 | US7798309 Stabilizing substrate carriers during overhead transport |
| 09/16/2010 | WO2010104085A1 Semiconductor polishing agent, method for producing the same, and polishing method |
| 09/16/2010 | WO2007011158A9 Polishing pad containing interpenetrating liquified vinyl monomer network with polyurethane matrix therein |
| 09/16/2010 | US20100233945 Polishing head, polishing apparatus and method for demounting workpiece |
| 09/16/2010 | US20100233937 Method for predicting worked shape, method for determining working conditions, working method, working system, semiconductor device manufacturing method, computer program and computer program storage medium |
| 09/16/2010 | US20100231088 Wafer, wafer polishing apparatus, wafer polishing method, method of fabricating piezoelectric vibrator, piezoelectric vibrator, oscillator, electronic apparatus and radiowave timepiece |
| 09/16/2010 | US20100230841 Aerosol method and apparatus, particulate products, and electronic devices made therefrom |
| 09/15/2010 | EP2227353A1 Damping polyurethane cmp pads with microfillers |
| 09/15/2010 | EP2227352A2 Improved multiple-phase surfaces, and method therefor |
| 09/15/2010 | CN201579694U CD local grinding machine |
| 09/15/2010 | CN201579693U CD surface grinding device |
| 09/15/2010 | CN101834270A Production method of langasite crystal element |
| 09/15/2010 | CN101829948A Method for the simultaneous grinding of a plurality of semiconductor wafers |
| 09/15/2010 | CN101829947A Feeding mechanism for numerical control double surface lapping machine |
| 09/14/2010 | US7795866 Method and device for forecasting polishing end point |
| 09/10/2010 | WO2010101925A2 System for magnetorheological finishing of a substrate |
| 09/09/2010 | US20100227537 Glass Polishing System |
| 09/09/2010 | US20100227536 Glass Polishing System |
| 09/09/2010 | US20100227535 System and Method for Polishing Glass |
| 09/09/2010 | US20100227534 Lower Unit for Glass Polishing System and Glass Polishing Method Using the Same |
| 09/09/2010 | US20100227532 Method of surface treatment of group iii nitride crystal film, group iii nitride crystal substrate, group iii nitride crystal substrate with epitaxial layer, and semiconductor device |
| 09/09/2010 | US20100224256 Slurry system for semiconductor fabrication |
| 09/08/2010 | EP2225070A1 Nanotopography control and optimization using feedback from warp data |
| 09/08/2010 | EP1722925B1 Insulated pad conditioner and method of using same |
| 09/08/2010 | CN201573111U Silicon wafer fixing device for chemical-mechanical polishing device |
| 09/08/2010 | CN201573110U Polishing table device |
| 09/08/2010 | CN201573109U Safety device for transfer device for chemical mechanical polishing |
| 09/08/2010 | CN1972780B Polishing apparatus and polishing method |
| 09/08/2010 | CN1951634B Method of adhering polishing pads and jig for adhering the same |
| 09/08/2010 | CN101827686A Method of polishing glass substrate and process for producing glass substrate |
| 09/08/2010 | CN101827685A Polishing head and polishing apparatus |
| 09/08/2010 | CN101827684A Polishing head, polishing apparatus and work removing method |
| 09/08/2010 | CN101823234A Planarization slurry feed system and planarization slurry mixture feed method of chemical mechanical planarization station |
| 09/08/2010 | CN101823233A System and method for polishing glass |
| 09/08/2010 | CN101823232A 玻璃抛光系统 Glass polishing system |
| 09/08/2010 | CN101823231A Multi-axial section and axial surface grinder and method thereof |
| 09/08/2010 | CN101823230A Triaxial non-spherical processing clamp with adjustable inclination angle |
| 09/08/2010 | CN101823229A Nonequilibrium humidity control for jet milling |
| 09/08/2010 | CN101823223A 玻璃抛光系统 Glass polishing system |
| 09/08/2010 | CN101410956B Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method |
| 09/08/2010 | CN101258106B Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry |
| 09/07/2010 | US7790788 Method for producing chemical mechanical polishing pad |
| 09/07/2010 | US7790046 Method of texturing |
| 09/07/2010 | US7790015 determining removal of material from a wafer during polishing; biasing via electrodes; electro-chemical mechanical polishing; for semiconductor wafers/integrated circuits |
| 09/02/2010 | WO2010098278A1 Composition for metal film polishing |
| 09/02/2010 | WO2010097903A1 Glass substrate polishing method, package manufacturing method, piezoelectric oscillator, oscillator, electronic device, and radio-controlled watch |
| 09/02/2010 | WO2010097902A1 Glass substrate polishing method, package manufacturing method, piezoelectric oscillator, oscillator, electronic device, and radio-controlled watch |
| 09/02/2010 | US20100221987 Double Side Polishing Machine |