Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
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02/25/2003 | US6523215 Polishing pad and system |
02/25/2003 | CA2248386C Liquid dispensing apparatus and method |
02/20/2003 | WO2003015148A1 Slurry composition for use in chemical mechanical polishing of metal wiring |
02/20/2003 | WO2003015147A1 Wafer holding ring for chemical and mechanical polisher |
02/20/2003 | WO2003013788A1 Platen assembly having a topographically altered platen surface |
02/20/2003 | WO2003013689A1 No drip valve |
02/20/2003 | WO2002100594A8 Improved method and apparatus for bi-directionally polishing a workpiece |
02/20/2003 | US20030036343 Machining strain removal apparatus |
02/20/2003 | US20030036340 Method for polishing angular substrates |
02/20/2003 | US20030036338 Ductile grinding processing for the diamond or diamond film |
02/20/2003 | US20030035940 Via thermoplastic foam polymers; for semiconductor wafer or integrated circuits; smoothness |
02/20/2003 | US20030035730 Method and a pump apparatus for the generation of an adjustable, substantially constant volume flow of a fluid and a use of this method |
02/20/2003 | US20030034131 Chemical mechanical polishing pad having wave shaped grooves |
02/20/2003 | US20030034110 Method and device for producing an adhesive-bonded connection between a semiconductor wafer and a carrier plate |
02/19/2003 | EP1284370A1 Method for delivering variable amounts of flow, and dosing pump using this method |
02/19/2003 | EP1284369A1 Method for delivering variable amounts of flow, and dosing pumping using this method |
02/19/2003 | EP1009588B1 Polishing pad and method for making polishing pad with elongated microcolumns |
02/19/2003 | CN1398213A Abrasive cloth and grinding method thereof |
02/18/2003 | USRE37997 Polishing pad with controlled abrasion rate |
02/18/2003 | US6521536 Planarization process |
02/18/2003 | US6521535 Insitu oxidation for polishing non-oxide ceramics |
02/18/2003 | US6521079 Linear CMP tool design with closed loop slurry distribution |
02/18/2003 | US6520847 Polishing pad having a grooved pattern for use in chemical mechanical polishing |
02/18/2003 | US6520843 High planarity chemical mechanical planarization |
02/18/2003 | US6520841 Apparatus and methods for chemical mechanical polishing with an incrementally advanceable polishing sheet |
02/18/2003 | US6520840 CMP slurry for planarizing metals |
02/18/2003 | US6520839 Load and unload station for semiconductor wafers |
02/18/2003 | US6520835 Polishing system, polishing method, polishing pad, and method of forming polishing pad |
02/18/2003 | US6520834 Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
02/18/2003 | US6520833 Oscillating fixed abrasive CMP system and methods for implementing the same |
02/13/2003 | WO2003012846A1 Chemical mechanical polishing pad with micro-holes |
02/13/2003 | WO2003012000A2 Abrasive particles, and methods of making and using the same |
02/13/2003 | WO2003011999A2 Abrasive particles, abrasive articles, and methods of making and using the same |
02/13/2003 | WO2003011786A1 Glass-ceramics |
02/13/2003 | WO2003011785A2 Abrasive particles and methods of making and using the same |
02/13/2003 | WO2003011784A2 Ceramic materials, abrasive particles, abrasive articles, and methods of making and using the same |
02/13/2003 | WO2003011783A2 Method of making amorphous materials and ceramics |
02/13/2003 | WO2003011782A2 Alumina-zirconia, and methods of making and using the same |
02/13/2003 | WO2003011523A1 Multiport polishing fluid delivery system |
02/13/2003 | WO2003011522A1 Method for fabricating polishing pad using laser beam and mask |
02/13/2003 | WO2003011520A1 Method for fabricating chemical mechanical polishing pad using laser |
02/13/2003 | WO2003011518A1 Cmp system and method for efficiently processing semiconductor wafers |
02/13/2003 | WO2003011479A1 Selective electroless deposition and interconnects made therefrom |
02/13/2003 | WO2002044293A3 Method and composition for the removal of residual materials during substrate planarization |
02/13/2003 | WO2002024413A3 Polishing by cmp for optimized planarization |
02/13/2003 | US20030032567 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
02/13/2003 | US20030032382 Grinding wheel |
02/13/2003 | US20030032380 Polishing media stabilizer |
02/13/2003 | US20030032379 Platen assembly having a topographically altered platen surface |
02/13/2003 | US20030032378 Polishing surface constituting member and polishing apparatus using the polishing surface constituting member |
02/13/2003 | US20030032377 Measuring apparatus |
02/13/2003 | US20030032374 Apparatus and method for transferring a torque from a rotating hub frame to a one-piece hub shaft |
02/13/2003 | US20030032373 Fabrication of semiconductor interconnect structures |
02/13/2003 | US20030032372 Substrate polishing apparatus |
02/13/2003 | US20030032371 Chemical mechanical polishing compositions and methods relating thereto |
02/13/2003 | US20030031890 Angular substrates |
02/13/2003 | US20030031876 Thermal management with filled polymeric polishing pads and applications therefor |
02/13/2003 | US20030029939 No drip valve |
02/13/2003 | US20030029841 Method and apparatus for polishing metal and dielectric substrates |
02/13/2003 | US20030029840 Polishing systems, methods of polishing substrates, and methods of cleaning polishing slurry from substrate surfaces |
02/13/2003 | CA2455952A1 Abrasive particles and methods of making and using the same |
02/13/2003 | CA2454646A1 Ceramic materials, abrasive particles, abrasive articles, and methods of making and using the same |
02/13/2003 | CA2454079A1 Glass-ceramics |
02/13/2003 | CA2454076A1 Method of making amorphous materials and ceramics |
02/12/2003 | EP1283551A2 Angular substrates |
02/12/2003 | EP1283250A1 Polishing composition and polishing method employing it |
02/12/2003 | EP1283090A2 Method for polishing angular substrates |
02/12/2003 | EP1283089A2 Wafer holding plate for wafer grinding apparatus and method for manufacturing the same |
02/12/2003 | EP1282482A2 Multilayer retaining ring for chemical mechanical polishing |
02/12/2003 | CN1396632A Method for cutting material on two-sided of semiconductor piece |
02/11/2003 | US6518188 Apparatus and methods for chemical-mechanical polishing of semiconductor wafers |
02/11/2003 | US6518172 Method for applying uniform pressurized film across wafer |
02/11/2003 | US6517668 Method and apparatus for endpointing a chemical-mechanical planarization process |
02/11/2003 | US6517667 Apparatus for polishing a semiconductor wafer |
02/11/2003 | US6517591 Apparatus and method for treating a cathode material provided on a thin-film substrate |
02/11/2003 | US6517426 Composite polishing pad for chemical-mechanical polishing |
02/11/2003 | US6517425 Fixed abrasive polishing pad |
02/11/2003 | US6517424 Chromium and amorphous diamond or chromium nitride, bonding strength |
02/11/2003 | US6517422 Polishing apparatus and method thereof |
02/11/2003 | US6517421 Polishing head of a chemical and mechanical polishing apparatus for polishing a wafer |
02/11/2003 | US6517420 Wafer surface machining apparatus |
02/11/2003 | US6517419 Shaping polishing pad for small head chemical mechanical planarization |
02/11/2003 | US6517418 Method of transporting a semiconductor wafer in a wafer polishing system |
02/11/2003 | US6517417 Polishing pad with a transparent portion |
02/11/2003 | US6517416 Chemical mechanical polisher including a pad conditioner and a method of manufacturing an integrated circuit using the chemical mechanical polisher |
02/11/2003 | US6517415 Carrier head with a substrate detection mechanism for a chemical mechanical polishing system |
02/11/2003 | US6517414 Method and apparatus for controlling a pad conditioning process of a chemical-mechanical polishing apparatus |
02/11/2003 | US6517413 Method for a copper CMP endpoint detection system |
02/06/2003 | WO2003010807A1 Method of manufacturing semiconductor integrated circuit device |
02/06/2003 | WO2003009966A1 Ultrasonic conditioning device cleaner for chemical mechanical polishing systems |
02/06/2003 | US20030027506 Apparatus for distributing a fluid through a polishing pad |
02/06/2003 | US20030027505 Multiport polishing fluid delivery system |
02/06/2003 | US20030027504 Chemical mechanical polish pad conditioning device |
02/06/2003 | US20030027500 Polishing pads for chemical mechanical planarization |
02/06/2003 | US20030027499 Composition and method for polishing rigid disks |
02/06/2003 | US20030027498 Retaining ring with active edge-profile control by piezoelectric actuator/sensors |
02/06/2003 | US20030027424 Feedforward and feedback control for conditioning of chemical mechanical polishing pad |
02/06/2003 | US20030025200 Process of manufacturing semiconductor device and slurry used therefor |
02/06/2003 | US20030024582 Valve for a slurry outlet opening of a chemical mechanical polishing device and chemical mechanical polishing device having a valve |
02/05/2003 | EP1281477A1 Polishing pads |