Patents
Sitemap › H05 - Electric techniques not otherwise provided for › H05H - Plasma technique; Production of accelerated electrically- charged particles or of neutrons; Production or acceleration of neutral molecular or atomic beams › H05H 1 - Generating plasma; Handling plasma
Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
12/2000
12/21/2000DE19927540A1 Abgasreinigungssystem Emission Control System
12/21/2000DE19912981C1 Supply of a wide range of plasmas e.g. for use in biological processes by supplying a barrier discharge using sequentially adjustable phases
12/20/2000EP1061782A2 Plasma arc torch head
12/20/2000EP1061781A2 Method for providing the electric arc starting point in the electrode of a plasma cutting torch, and electrode thus provided
12/20/2000EP0737256B1 Microwave plasma reactor
12/20/2000CN1277546A Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator
12/19/2000US6163009 Process for operating a plasma arc torch
12/19/2000US6163008 Plasma arc torch
12/19/2000US6163007 Microwave plasma generating apparatus with improved heat protection of sealing O-rings
12/19/2000US6163006 Permanent magnet ECR plasma source with magnetic field optimization
12/19/2000US6162709 Use of an asymmetric waveform to control ion bombardment during substrate processing
12/19/2000US6162323 Plasma processing apparatus
12/19/2000US6161501 Device for plasma generation
12/14/2000WO2000075973A1 Plasma processing device, window member for the plasma processing device and electrode plate for the plasma processing device
12/14/2000WO2000075955A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production
12/14/2000WO2000075393A2 Carbon plasma pulsed source
12/14/2000DE19958016A1 Plasma generator for plasma coating or machining of large surfaces has all cathodes coupled to voltage source via central current feed line
12/14/2000CA2375677A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production
12/13/2000EP1059018A1 Apparatus for the investigation of surface chemistry
12/13/2000EP1058944A1 Cooling system with antifreeze for cooling magnetron for process chamber of processing system
12/13/2000EP0935633A4 Acrylate coating methods
12/12/2000US6160238 Tunable molten oxide pool assisted plasma-melter vitrification systems
12/12/2000US6159867 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
12/12/2000US6159432 Housing having interior and exterior surfaces, first and second selectively movable electrodes positioned predetermined distance from each other, plasma discharge generator, gas stream introducer, collector for reaction product effluent
12/12/2000US6159388 Plasma etching method and plasma etching system for carrying out the same
12/12/2000US6159297 Semiconductor process chamber and processing method
12/12/2000US6158384 Plasma reactor with multiple small internal inductive antennas
12/12/2000US6158209 Device for concentrating ion beams for hydromagnetic propulsion means and hydromagnetic propulsion means equipped with same
12/07/2000WO2000073247A1 Thermal device and method for production of carbon monoxide and hydrogen by thermal dissociation of hydrocarbon gases
12/07/2000DE19925790A1 High rate processing of material surfaces especially in optical applications, microelectronics or in microsystems comprises using a plasma beam source
12/06/2000EP1058489A2 Method and apparatus for generating a plasma
12/06/2000EP1057789A2 Material and geometry design to enhance the operation of a plasma arc centrifugal treatment system pouring nozzle
12/06/2000EP1057207A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods
12/06/2000EP1057206A1 Low pressure inductively coupled high density plasma reactor
12/06/2000EP1057205A1 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
12/06/2000CN1275938A Apparatus and method for utilizing a plasma density gradient to produce a flow of particles
12/06/2000CN1275937A Apparatus and method for adjusting density distribution of a plasma
12/05/2000US6156995 Water-injection nozzle assembly with insulated front end
12/05/2000US6156994 Arc-plasma method for welding metals
12/05/2000US6156162 Power supply for dielectric barrier discharge plasma
12/05/2000US6156152 Plasma processing apparatus
12/05/2000US6156103 Discharge gas purification system
12/05/2000US6155199 Parallel-antenna transformer-coupled plasma generation system
11/2000
11/30/2000WO2000071866A1 Dielectric barrier gas reactors with non-axial flow
11/30/2000WO2000071340A1 Method and apparatus for coating a floor tile
11/30/2000WO2000070928A2 Method for obtaining and accelerating plasma and plasma accelerator using a closed-circuit electron drift
11/30/2000WO2000041512A3 System and method for determining combustion temperature using infrared emissions
11/30/2000DE19923018A1 Plasma treatment apparatus, for strip materials or linked individual flat substrates, comprises a screened rectangular passage with a wound internal conductor enclosing a moving workpiece
11/30/2000DE19920387A1 Releasing energy using controlled nuclear fusion involves use of plasma chamber having plasma which operates with specific energy
11/29/2000EP1055249A1 Plasma assisted processing chamber with separate control of species density
11/29/2000CN1058912C Plasma arc spray gun
11/28/2000US6153897 Heterojunction compound semiconductor device and method of manufacturing the same
11/28/2000US6153852 Use of a chemically reactive plasma for thermal-chemical processes
11/22/2000EP1054411A2 Device with high thermal resistance
11/22/2000EP1053660A1 Device for producing a free cold plasma jet
11/22/2000EP1053563A1 Methods for reducing mask erosion during plasma etching
11/21/2000US6150764 Tandem hall field plasma accelerator
11/21/2000US6150762 Method of manufacturing cathode for plasma etching apparatus using chemical surface treatment with potassium hydroxide (KOH), and cathode manufactured thereby
11/21/2000US6150628 Toroidal low-field reactive gas source
11/21/2000US6149985 High-efficiency plasma treatment of imaging supports
11/21/2000US6149760 Plasma processing apparatus
11/21/2000US6148765 Electrode for plasma processes and method for manufacture and use thereof
11/21/2000US6148762 Plasma processing apparatus
11/21/2000CA2308893A1 Component for high thermal stress
11/16/2000WO2000069230A1 Microwave plasma burner
11/15/2000EP1012863A4 Glow plasma discharge device
11/14/2000US6147452 AC glow plasma discharge device having an electrode covered with apertured dielectric
11/14/2000US6147318 Assembly of electrode body and electrode carrier for a plasma torch
11/14/2000US6146724 A laminate comprising a silicon oxide barrier layer, forming a container, such that the barrier layer is on the interior of the container; gas impermeability, resists impact, and resists abrasion
11/14/2000US6146599 Dielectric barrier discharge system and method for decomposing hazardous compounds in fluids
11/14/2000US6146508 Sputtering method and apparatus with small diameter RF coil
11/14/2000US6146492 Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning method
11/14/2000US6145469 Plasma processing apparatus and processing method
11/09/2000WO2000067535A1 Nuclear fusion machine for releasing energy with fewer neutrons and with average fusion reactant energies greater than 30 kev
11/09/2000WO2000067306A1 Method for anisotropic plasma etching of semiconductors
11/09/2000DE19929776A1 Production of a device for manufacturing semiconductors comprises forming a protective layer on a substrate, joining to a further substrate and alternately forming a film with high molecular weight and etching
11/09/2000DE19919832A1 Verfahren zum anisotropen Plasmaätzen von Halbleitern A method for anisotropic plasma etching of semiconductors
11/08/2000EP1050200A1 Torch for cutting processes
11/08/2000EP1050064A2 Implantation of radioactive ?32 p atoms
11/08/2000CN2405398Y Positive and high voltage dc streamer discharging plasma source arrangement
11/08/2000CN1272953A Dual face shower head magnetron, plasma generating apparatus and method for coating substrate
11/07/2000US6143129 Inductive plasma reactor
11/07/2000US6143084 Apparatus and method for generating plasma
11/07/2000US6142096 Electronic device manufacturing apparatus and method for manufacturing electronic device
11/07/2000CA2047147C Atmospheric pressure plasma surface treatment process
11/02/2000WO2000065887A1 Method and apparatuses for plasma treatment
11/02/2000WO2000065631A2 Apparatus and method for exposing a substrate to plasma radicals
11/02/2000WO2000064618A2 Method and apparatus for initiating, directing and constricting electrical discharge arcs
11/02/2000WO2000043102A3 Process and reactor for plasma assisted gas processing
11/02/2000WO1999067808A9 High sputter, etch resistant window for plasma processing chambers
11/02/2000DE19918790A1 High frequency electrical transmission, for use with high frequency generator, e.g. 13.56 MHz, includes a waveguide in the transfer path such that the high frequency is transferred in the form of helical waves
10/2000
10/31/2000US6140773 Automated control of linear constricted plasma source array
10/31/2000US6140752 Energy storage device having a plurality of single charged particles and a charge neutralizer
10/31/2000US6140657 Sterilization by low energy electron beam
10/31/2000US6139694 Method and apparatus utilizing ethanol in non-thermal plasma treatment of effluent gas
10/31/2000US6139678 Plasma processing methods and apparatus
10/26/2000WO2000064224A1 Cartridge for a plasma torch and plasma torch fitted therewith
10/26/2000WO2000063960A1 Process for etching a silicon layer in a plasma processing chamber to form deep openings
10/26/2000WO2000063955A1 Plasma processing apparatus
10/26/2000WO2000063943A1 Large area atmospheric-pressure plasma jet
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