| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 02/01/2001 | DE19933842A1 Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas Apparatus and method for etching a substrate by means of an inductively coupled plasma |
| 02/01/2001 | DE19933841A1 Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas Apparatus and method for etching a substrate by means of an inductively coupled plasma |
| 02/01/2001 | DE19933762A1 Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen Pulsed magnetic opening of electron cyclotron resonance Jonen sources for generating short, strong current pulses of highly charged ions or electrons |
| 02/01/2001 | DE19932630A1 Plasma sputterer assembly to sputter an injected sample in a gas feed has a carrier with a holder fitted to the generator wall to give easy access to the component parts for cleaning and exchange |
| 01/31/2001 | EP1073091A2 Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus |
| 01/31/2001 | EP1072894A2 Capacitive probe for in situ measurement of wafer DC bias voltage |
| 01/31/2001 | EP1072175A1 Method for treating the surface of a material or an object and implementing device |
| 01/31/2001 | CN1282384A Magnetron sputtering source |
| 01/30/2001 | US6181069 High frequency discharging method and apparatus, and high frequency processing apparatus |
| 01/30/2001 | US6181068 Plasma generating apparatus |
| 01/30/2001 | US6180911 Material and geometry design to enhance the operation of a plasma arc |
| 01/30/2001 | US6179955 Dry etching apparatus for manufacturing semiconductor devices |
| 01/30/2001 | US6178920 Plasma reactor with internal inductive antenna capable of generating helicon wave |
| 01/30/2001 | US6178919 Perforated plasma confinement ring in plasma reactors |
| 01/28/2001 | CA2303981A1 Plasma spraying apparatus |
| 01/25/2001 | WO2001006544A2 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
| 01/25/2001 | WO2001006540A1 Device and method for etching a substrate using an inductively coupled plasma |
| 01/25/2001 | WO2001006539A1 Device and method for etching a substrate by means of an inductively coupled plasma |
| 01/25/2001 | WO2001006533A2 Pulsed magnetic opening of electron resonance ion sources for the generation of short, high-current pulses of highly charged ions or electrons |
| 01/25/2001 | WO2001006402A1 Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma |
| 01/25/2001 | WO2001006268A1 Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator |
| 01/25/2001 | WO2000058995A3 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 01/24/2001 | EP1071113A2 Plasma reactors for processing semiconductor wafers |
| 01/24/2001 | EP1070442A1 Plasma apparatus for ion energy control |
| 01/24/2001 | EP1070154A1 Method and apparatus for deposition of biaxially textured coatings |
| 01/23/2001 | US6177647 Electrode for plasma arc torch and method of fabrication |
| 01/23/2001 | US6177148 For coating substrates; homogeneity of coated layer |
| 01/23/2001 | US6177147 Process and apparatus for treating a substrate |
| 01/23/2001 | US6177145 Semiconductor processing method of making electrical contact to a node |
| 01/23/2001 | CA2029507C Plasma torch |
| 01/18/2001 | WO2001005198A1 Anode electrode for plasmatron structure |
| 01/18/2001 | WO2001005020A1 Radio frequency power source for generating an inductively coupled plasma |
| 01/18/2001 | WO2001004927A2 Methodologies to reduce process sensitivity to the chamber wall condition |
| 01/18/2001 | DE19925493C1 Linear ausgedehnte Anordnung zur großflächigen Mikrowellenbehandlung und zur großflächigen Plasmaerzeugung Linear extended array for large-scale microwave treatment and for large-scale plasma generation |
| 01/17/2001 | EP1069083A1 Process and apparatus for depositing silica glass on a planar substrate using a plasma torch |
| 01/17/2001 | EP1068778A1 Plasma torch with a microwave transmitter |
| 01/17/2001 | EP1068633A1 Method and device for specifically manipulating and depositing particles |
| 01/17/2001 | EP1068632A1 Contamination controlling method and plasma processing chamber |
| 01/17/2001 | EP1068631A1 Use of variable impedance having rotating core to control coil sputter distribution |
| 01/17/2001 | EP1068032A1 Container with material coating having barrier effect and method and apparatus for making same |
| 01/17/2001 | CN1280705A Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process |
| 01/16/2001 | US6175183 Device for producing plasma |
| 01/16/2001 | US6175095 Resonant impedance-matching slow-wave ring structure microwave applicator for plasmas |
| 01/16/2001 | US6174450 Methods and apparatus for controlling ion energy and plasma density in a plasma processing system |
| 01/16/2001 | US6173674 Plasma reactor with a deposition shield |
| 01/11/2001 | WO2001003256A1 Gas laser |
| 01/11/2001 | WO2001003159A1 Gas distribution apparatus for semiconductor processing |
| 01/11/2001 | WO2001003158A1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 01/11/2001 | WO2000052973A3 Plasma reactor having a helicon wave high density plasma source |
| 01/11/2001 | DE19928053A1 Arrangement for generating low temperature plasma with corona discharge supported by magnetic field uses pulsed voltages with frequency below 100 kHz between electrodes, cathodes |
| 01/11/2001 | DE19927063A1 Calibratable measurement system for determining electrical properties of high frequency stimulated gas discharges has single calibration before measurement to adapt probes to system |
| 01/10/2001 | EP1067829A2 Plasma nozzle |
| 01/10/2001 | EP1067433A1 High-efficiency plasma treatment of paper |
| 01/10/2001 | EP1067432A1 High-efficiency plasma treatment of polyolefins |
| 01/10/2001 | EP1067431A1 High-efficiency plasma treatment of imaging supports |
| 01/09/2001 | US6172324 Plasma focus radiation source |
| 01/09/2001 | US6172322 Annealing an amorphous film using microwave energy |
| 01/09/2001 | US6170431 Plasma reactor with a deposition shield |
| 01/05/2001 | CA2313258A1 Process and equipment for forming flat layers of vitreous silica by using an inductively coupled plasma torch |
| 01/04/2001 | WO2001001737A1 Divertor filtering element for a tokamak nuclear fusion reactor; divertor employing the filtering element; and tokamak nuclear fusion reactor employing the divertor |
| 01/04/2001 | WO2001001445A1 Techniques for improving etch rate uniformity |
| 01/04/2001 | WO2001001443A1 Plasma processor with coil responsive to variable amplitude rf envelope |
| 01/04/2001 | WO2001001442A1 A plasma reaction chamber component having improved temperature uniformity |
| 01/04/2001 | WO2000057675A3 Waveguide apparatus for an electromagnetic heating device |
| 01/04/2001 | DE19930755A1 Hochfrequenz angeregte Gaslaser mit Plasmaeinschluß durch magnetische Multipolfelder RF excited gas laser with plasma confinement by magnetic multipole |
| 01/04/2001 | DE19927806A1 Vorrichtung und Verfahren zum Hochratenätzen eines Substrates mit einer Plasmaätzanlage und Vorrichtung und Verfahren zum Zünden eines Plasmas und Hochregeln oder Pulsen der Plasmaleistung Apparatus and method for Hochratenätzen a substrate with a plasma etching system and apparatus and method for igniting a plasma and high rules or pulsing the plasma power |
| 01/04/2001 | CA2370090A1 Divertor filtering element for a tokamak nuclear fusion reactor; divertor employing the filtering element; and tokamak nuclear fusion reactor employing the divertor |
| 01/03/2001 | EP1065914A1 Plasma spray device |
| 01/03/2001 | EP1065502A1 Method for carrying out the electrical breakdown of a gaseous dielectric in a highly non-uniform field |
| 01/03/2001 | EP1065295A1 Plasma cleaning method for processing chambers |
| 01/03/2001 | EP1064672A1 Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor |
| 01/03/2001 | EP1064671A1 An apparatus and method for generating plasma |
| 01/03/2001 | EP1064670A1 Sputtering apparatus with a coil having overlapping ends |
| 01/03/2001 | EP0828618A4 Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure |
| 01/03/2001 | CN2413467Y Plasma generator for spraaying technology |
| 01/03/2001 | CN1278750A All-surface biosable and/or temperatures-controlled electrostatically-shielded rf plasma source |
| 01/02/2001 | US6169520 Plasma antenna with currents generated by opposed photon beams |
| 01/02/2001 | US6169370 Method and device for producing plasma with electrodes having openings twice the diameter of the isolator opening |
| 01/02/2001 | US6169265 Electrode for plasma generator the generator comprising same and process for treatment of solidifying liquid metal |
| 01/02/2001 | US6169264 Nozzle/nozzle carrier assembly for a plasma torch |
| 01/02/2001 | US6168690 Methods and apparatus for physical vapor deposition |
| 01/02/2001 | US6167835 Two chamber plasma processing apparatus |
| 12/28/2000 | WO2000079844A1 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
| 12/28/2000 | WO2000079843A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 12/28/2000 | WO2000079579A2 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards |
| 12/28/2000 | WO2000079578A1 Improvements relating to plasma etching |
| 12/28/2000 | WO2000079568A2 Plasma reactor with multiple small internal inductive antennas |
| 12/28/2000 | WO2000079564A2 Plasma reactor with internal inductive antenna capable of generating helicon wave |
| 12/28/2000 | DE19928876A1 Vorrichtung zur lokalen Erzeugung eines Plasmas in einer Behandlungskammer durch Mikrowellenanregung Device for local generation of a plasma in a treatment chamber by microwave excitation |
| 12/28/2000 | CA2376015A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 12/27/2000 | EP1063871A1 Divertorfiltering element for a tokamak nuclear fusion reactor, divertor employing the filtering element and tokamak nuclear fusion reactor employing the divertor |
| 12/27/2000 | EP1063678A2 Device for microwave powered plasma generation in a cavity |
| 12/27/2000 | EP1062679A1 Plasma etching installation |
| 12/26/2000 | US6166898 Plasma chamber wafer clamping ring with erosion resistive tips |
| 12/26/2000 | US6165376 Work surface treatment method and work surface treatment apparatus |
| 12/26/2000 | US6165313 Downstream plasma reactor system with an improved plasma tube sealing configuration |
| 12/26/2000 | US6165311 Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
| 12/26/2000 | US6164241 Multiple coil antenna for inductively-coupled plasma generation systems |
| 12/21/2000 | WO2000077792A1 An effective dry etching process of actinide oxides and their mixed oxides in cf4/o2/n2 plasma |
| 12/21/2000 | WO2000077452A1 Emission control system |