Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
09/2000
09/05/2000US6114650 Electrode for plasma arc torch and method of making same
09/05/2000US6114649 Anode electrode for plasmatron structure
09/05/2000US6114182 Measuring electron shading damage in semiconductor fabrication
09/05/2000US6113731 Magnetically-enhanced plasma chamber with non-uniform magnetic field
09/05/2000US6112697 RF powered plasma enhanced chemical vapor deposition reactor and methods
09/05/2000US6112696 Downstream plasma using oxygen gas mixture
09/05/2000CA2073236C Process and apparatus for the ignition of cvd plasmas
08/2000
08/31/2000WO2000051405A1 Dielectric barrier discharge system and method for decomposing hazardous compounds in fluids
08/31/2000WO2000019506A9 Method of plasma etching dielectric materials
08/30/2000EP1030788A1 Plasma processing methods and apparatus
08/30/2000EP1030745A1 All-surface biasable and/or temperature-controlled electrostatically-shielded rf plasma source
08/30/2000EP0586579B1 Microwave plasma processing device
08/30/2000CN2394403Y Device for generating streams of plasma and negative oxygen ions in air
08/30/2000CN1265222A Method and appts. for ionized sputtering of materials
08/29/2000US6110395 Method and structure for controlling plasma uniformity
08/29/2000US6109208 Plasma generating apparatus with multiple microwave introducing means
08/24/2000WO2000049278A1 Reactor for plasma assisted gas processing
08/23/2000EP1029702A2 Surface treatment method, production method for ink jet recording medium, and ink jet recording medium
08/23/2000EP1029099A2 Apparatus and method for adjusting density distribution of a plasma
08/23/2000EP1028662A1 Method of plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator
08/23/2000CN2393303Y Hot-spraying super-sonic electric-arc plasma spraying gun
08/23/2000CN1263952A Device for forming vacuum coating
08/22/2000US6106663 Semiconductor process chamber electrode
08/22/2000US6105518 Durable plasma treatment apparatus and method
08/17/2000WO2000048226A1 High-density plasma source for ionized metal deposition
08/16/2000EP1027475A1 Large area microwave plasma apparatus with adaptable applicator
08/16/2000EP1027281A1 A plasma ozone generator
08/16/2000EP0628212B1 Dc power supply for a plasma processing system
08/15/2000US6104487 Plasma etching with fast endpoint detector
08/15/2000US6103070 Insulative, inter-turn shield positioned at a channel defining coil windings; confining generated plasma
08/15/2000US6101972 Plasma processing system and method
08/15/2000US6101970 Plasma processing apparatus
08/15/2000CA2029505C Plasma torch
08/10/2000WO2000047023A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source
08/10/2000WO2000046811A1 Electric power generator
08/10/2000WO2000046417A1 Non-magnetic stainless steel for use at very low temperature and resistant to neutrons and use
08/10/2000WO2000000998A3 Electrode for plasma processes and method for manufacture and use thereof
08/09/2000EP1026723A2 Vacuum coating forming device
08/09/2000EP1025276A1 Device and method for detecting and preventing arcing in rf plasma systems
08/08/2000US6099915 Plasma powder build up welding with alternating current and direct current using copper-nickel alloys as welding material
08/08/2000US6099747 Grounding counter electrode and connecting substrate electrode to high frequence power source; introducing gas to form layer on wafer; chamber etching of apparatus; disconnecting from grounding and power; introducing fluorocarbon gas
08/08/2000US6099687 Etching system
08/08/2000US6098568 Mixed frequency CVD apparatus
08/03/2000WO2000045623A1 Atmospheric steady-state glow-discharge plasma
08/03/2000DE19902146A1 Plasma generation method for generating impervious/dense plasmas in vacuum processes, includes applying direct current between hollow cathode, its ring anode where discharge current follows constantly to set up impervious/dense plasma
08/02/2000EP1023819A2 System for plasma ignition by fast voltage rise
08/02/2000EP1023771A1 Electrical impedance matching system and method
08/02/2000CN1261835A Electrode of green compact for discharge surface treatment, method of producing the same, method and apparatus for discharge surface treatment and green compact for discharge surface treatment
08/01/2000US6097157 System for ion energy control during plasma processing
08/01/2000US6096993 Safety device for a plasma torch
08/01/2000US6096992 Low current water injection nozzle and associated method
08/01/2000US6096176 Applying bias voltage to wafer while helicon wave plasma of high density generated between target and wafer by antenna
07/2000
07/29/2000CA2289432A1 Low current water injection nozzle and associated method
07/27/2000WO2000044207A1 Method for the excitation of a plasma and a use of the method
07/27/2000WO2000043566A1 Plasma processing system and method
07/27/2000WO2000043102A2 Process and reactor for plasma assisted gas processing
07/27/2000WO2000000992A9 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber
07/27/2000WO1999030006A3 Method and apparatus for characterizing a combustion flame
07/26/2000EP1022933A2 Plasma generator
07/25/2000US6093905 Process for operating a plasma arc torch
07/25/2000US6093903 Plasma burner device with adjustable anode and fixed cathode
07/25/2000US6093332 Flowing etchant source gas into plasma processing chamber, gas including fluorocarbon and nonreactive gases, providing radio frequency power wave form to electrode associated with plasma processing chamber, forming plasma, depositing polymer
07/25/2000US6093293 Magnetron sputtering source
07/20/2000WO2000042827A1 An ion accelerator
07/20/2000WO2000041512A2 System and method for determining combustion temperature using infrared emissions
07/19/2000EP1021073A1 An ion accelerator
07/19/2000EP1019945A1 Method and device for surface-treating substrates
07/19/2000EP1019944A1 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
07/19/2000EP1019943A1 Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process
07/19/2000CN1260406A Plasma treatment apparatus
07/19/2000CN1054652C Apparatus for rapid plasma treatments and method
07/18/2000US6090303 Process for etching oxides in an electromagnetically coupled planar plasma apparatus
07/18/2000US6089186 Vacuum coating forming device
07/13/2000WO2000041445A1 Plasma vacuum pump
07/13/2000WO2000041212A1 Gas injection system for plasma processing
07/13/2000WO2000041211A1 Method and apparatus for etch rate stabilization
07/13/2000WO2000041210A1 Plasma etching installation
07/13/2000WO2000040776A1 In situ chemical generator and method
07/13/2000WO2000040771A1 Large area plasma source
07/13/2000WO2000017906A3 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
07/12/2000EP1018388A2 Welding method and apparatus therefor
07/12/2000EP1018135A2 Vacuum plasma processor having coil with added conducting segments to its peripheral part
07/12/2000EP1017477A1 Treatment of gaseous emissions
07/12/2000EP1017325A1 Medical apparatus for generating an ionised gas plasma flame
07/11/2000US6088096 End-point detector for plasma etcher
07/11/2000US6087616 Method for the plasmic arc-welding of metals
07/11/2000US6086962 Method for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source
07/11/2000US6085688 Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor
07/11/2000CA2186437C Single cathode plasma gun with powder feed along central axis of exit barrel
07/06/2000WO2000039837A1 Perforated plasma confinement ring in plasma reactors
07/05/2000EP1016489A1 Arc-plasma method for welding metals
07/05/2000EP1016333A1 Thermal spray coating applicator element and apparatus for using same
07/05/2000EP1016122A1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
07/05/2000EP1016116A2 Apparatus for improving etch uniformity and methods therefor
07/05/2000EP1015161A1 Plasma gun and methods for the use thereof
07/05/2000EP0861575B1 Four-nozzle plasma generator for forming an activated jet
07/05/2000CN1259105A Method and device for producing Fullerenes
07/04/2000US6084356 Plasma processing apparatus with a dielectric body in the waveguide
07/04/2000US6084201 Method of forming an oxide ceramic electrode in a transferred plasma arc reactor
07/04/2000US6084200 Plasma torch having a pivotable electrode