H05H 1 - Generating plasma; Handling plasma

Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
11/2001
11/20/2001	US6320320 Method and apparatus for producing uniform process rates
11/20/2001	US6320156 Plasma processing device, plasma torch and method for replacing components of same
11/20/2001	US6319372 Permanent magnet linear microwave plasma source
11/20/2001	US6319355 Plasma processor with coil responsive to variable amplitude rf envelope
11/15/2001	WO2001087021A2 Plasma processing method and apparatus
11/15/2001	WO2001086687A1 Apparatus for evaluating plasma polymerized polymer layer using uv spectrometer
11/15/2001	WO2000079568A3 Plasma reactor with multiple small internal inductive antennas
11/15/2001	US20010041449 Method and apparatus for plasma etching
11/15/2001	US20010041441 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds
11/15/2001	US20010041227 Powder injection for plasma thermal spraying
11/15/2001	US20010039919 Chemical vapor deposition and powder formation using thermal spray
11/15/2001	CA2409747A1 Plasma processing method and apparatus
11/14/2001	EP1154678A1 Transfer-type plasma heating anode
11/14/2001	EP1154459A2 Plasma source
11/14/2001	EP1154040A2 Reduction of plasma edge effect on plasma enhanced CVD processes
11/14/2001	EP1153425A1 Method for plasma etching with pulsed substrate electrode power
11/14/2001	EP1153407A1 Electrostatic fluid accelerator
11/14/2001	EP1153207A1 Reactor for plasma assisted gas processing
11/14/2001	EP0896732B1 Sputtering installation with two longitudinally placed magnetrons
11/14/2001	EP0871795A4 A scalable helicon wave plasma processing device with a non-cylindrical source chamber
11/14/2001	EP0793855B1 Plasma processor for large workpieces
11/14/2001	EP0776523B1 FUEL PELLETS FOR THERMONUCLEAR REACTIONS and process for making such pellets
11/14/2001	EP0667034B1 Magnetic field cathode
11/14/2001	CN1322007A Plasma processing device
11/13/2001	US6315859 Apparatus and method for improving uniformity in batch processing of semiconductor wafers
11/08/2001	WO2001084611A1 Apparatus for treating the surface with neutral particle beams
11/08/2001	WO2001084591A2 Pulsed rf power delivery for plasma processing
11/08/2001	US20010038894 Gas barrier film
11/08/2001	US20010038813 Treating flue gas in electrical gas discharge, passing treated gas over storage material (stores nitrogen oxides in form of nitrates), releasing, then treating storage material with reducing regenerative gas stream forming ammonia
11/08/2001	US20010038680 X-ray phase-contrast medical micro-imaging methods
11/08/2001	US20010038087 In gas, liquid, solid, forms as combustible fuel; detectable by peaks in mass spectrophotometry
11/08/2001	US20010037996 Method and apparatus for a contact start plasma cutting process
11/08/2001	DE10119766A1 Radio frequency plasma reactor has distribution chamber with wall opposite metal plate with gas inlet openings distributed along wall and connected to at least one gas feed line to reactor
11/07/2001	EP1152646A1 Method and apparatus for plasma treatment
11/07/2001	EP1151465A1 High-density plasma source for ionized metal deposition
11/07/2001	EP0857224A4 Durable plasma treatment apparatus and method
11/07/2001	EP0811172B1 Electron beam stop analyzer
11/07/2001	CN1321326A Device and method for generating local plasma by micro-structure electrode discharges with microwaves
11/07/2001	CN1320840A Shield nozzle for control of gas spray in super ultraviolet light source
11/07/2001	CN1074582C Apparatus for coating substrates in vacuum
11/06/2001	US6313583 Plasma processing apparatus and method
11/06/2001	US6313430 Plasma processing apparatus and plasma processing method
11/06/2001	US6313429 Dual mode plasma arc torch for use with plasma arc treatment system and method of use thereof
11/06/2001	US6312556 Beat frequency modulation for plasma generation
11/06/2001	US6312555 Thin film electrostatic shield for inductive plasma processing
11/06/2001	US6312554 Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber
11/06/2001	US6311638 Plasma processing method and apparatus
11/01/2001	WO2001082329A2 Highly efficient compact capacitance coupled plasma reactor/generator and method
11/01/2001	WO2001082328A2 Magnetic barrier for plasma in chamber exhaust
11/01/2001	US20010036465 With P2O5
11/01/2001	US20010035130 Plasma processing apparatus
10/2001
10/31/2001	EP1150331A2 Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate
10/31/2001	EP1150330A2 Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system
10/31/2001	EP1150169A2 Gas jet nozzle for extreme ultraviolet light source
10/31/2001	EP1149622A1 Process for removal of nitrogen oxides from an oxygen ontaining flue gas stream
10/31/2001	EP1149403A1 Perforated plasma confinement ring in plasma reactors
10/31/2001	EP1149231A2 Process and reactor for plasma assisted gas processing
10/31/2001	EP1082726A4 Method and apparatus for compressing a bose-einstein condensate of atoms
10/31/2001	EP0878020B1 Electromagnetic high-frequency or microwave apparatus
10/31/2001	DE10017445A1 Arc generator, used for spectral analysis of metals, comprises arc stream which is regulated via quick semiconductor elements, and moving electrode for contacting with sample to ignite arc
10/31/2001	CN1319683A Apparatus for treatment plasma
10/30/2001	US6310577 Plasma processing system with a new inductive antenna and hybrid coupling of electronagnetic power
10/30/2001	US6309978 Beat frequency modulation for plasma generation
10/30/2001	US6309610 Non-thermal plasma apparatus utilizing dielectrically-coated electrodes for treating effluent gas
10/30/2001	US6308654 Inductively coupled parallel-plate plasma reactor with a conical dome
10/30/2001	CA2227233C Plasma treatment apparatus for large area substrates
10/25/2001	WO2001080607A1 Method and plasma torch for treating a surface in a cavity and related filling-closure installation
10/25/2001	WO2001080297A1 Plasma processing apparatus
10/25/2001	WO2001080290A2 A method of operating a dual chamber reactor with neutral density decoupled from ion density
10/25/2001	WO2001080281A2 Stand alone plasma vacuum pump
10/25/2001	WO2001031683A8 Plasma doping system comprising a hollow cathode
10/25/2001	US20010033207 Reconfigurable electromagnetic waveguide
10/25/2001	US20010032707 Dry etching system for patterning target layer at high reproducibility and method of dry etching used therein
10/25/2001	US20010032591 Magnetic barrier for plasma in chamber exhaust
10/25/2001	US20010032590 Magnetic barrier for plasma in chamber exhaust
10/24/2001	EP1148770A2 Plasma generator for HF surgery
10/24/2001	EP1147692A1 Wear part for arc welding torch produced in alloyed copper
10/24/2001	EP1147691A1 Plasma vacuum pump
10/24/2001	EP1147544A2 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
10/24/2001	EP1147242A1 Large area plasma source
10/24/2001	EP0829089B1 Energy storage device
10/24/2001	CN1319247A Low contaminatino, high density plasma etch chamber and method for making the same
10/24/2001	CN1318862A Large workpiece plasma processor
10/24/2001	CN1318511A Nanometer carbon pipe material and its preparation
10/23/2001	US6306770 Method and apparatus for plasma etching
10/23/2001	US6306244 Apparatus for reducing polymer deposition on substrate support
10/23/2001	US6305390 Stabilization; inert gas flow; varying pressure
10/23/2001	US6305316 Integrated power oscillator RF source of plasma immersion ion implantation system
10/23/2001	US6305315 ECR plasma apparatus
10/18/2001	WO2001078471A1 Twin plasma torch apparatus
10/18/2001	WO2001078470A1 Plasma torch comprising electrodes separated by an air gap and igniter incorporating same
10/18/2001	WO2001078191A1 A reconfigurable plasma antenna
10/18/2001	WO2001078188A1 Reconfigurable plasma electromagnetic waveguide
10/18/2001	WO2001077604A1 Plasma torch incorporating a reactive priming fuse and igniter tube integrating such a torch
10/18/2001	US20010031557 Electrode for plasma processes and method for manufacture and use thereof
10/18/2001	US20010031310 Plasma treatment apparatus
10/18/2001	US20010031234 Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions
10/18/2001	US20010030541 Corona discharge apparatus
10/18/2001	US20010030025 Plasma treatment method and apparatus
10/18/2001	US20010030024 Plasma-enhanced processing apparatus

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