Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
12/2001
12/27/2001WO2001099478A1 X-ray micro-target source
12/27/2001WO2001099143A1 Plasma focus light source with tandem ellipsoidal mirror units
12/27/2001WO2001098553A1 Pulsed highly ionized magnetron sputtering
12/27/2001WO2001098013A1 High temperature tooling
12/27/2001US20010055552 Plasma generator, impedance matching unit, radio frequency generator; for gases used in semiconductor manufacturing process
12/27/2001US20010055190 Electrostatic chuck
12/27/2001US20010054484 Plasma processor, cluster tool, and method of controlling plasma
12/27/2001US20010054483 Thermal control apparatus for inductively coupled rf plasma reactor having an overhead solenoidal antenna
12/27/2001US20010054383 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
12/27/2001CA2413293A1 High temperature tooling
12/26/2001CN1076723C Method and device for production of fluorocarbon compounds
12/25/2001US6333634 Method for measuring radio-frequency current
12/25/2001US6333481 Process and unit for plasma-arc working with a gas mixture based on hydrogen, nitrogen and/or argon
12/25/2001US6333272 Gas distribution apparatus for semiconductor processing
12/25/2001US6333269 Plasma treatment system and method
12/25/2001US6333079 Feeding material gas for film formation into reactor inside of which is kept evacuated; decomposing gas into plasma by using power having high frequency to form deposited film on substrate provided inside reactor
12/25/2001US6332961 Device and method for detecting and preventing arcing in RF plasma systems
12/25/2001US6332947 Plasma processing apparatus and plasma processing method using the same
12/20/2001WO2001096028A1 Methods and apparatus for spray forming, atomization and heat transfer
12/20/2001WO2000019481A3 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate
12/20/2001US20010053422 Diamond film depositing apparatus and method thereof
12/20/2001US20010052458 High frequency sputtering device
12/20/2001US20010052456 Self Ionized Plasma Sputtering
12/20/2001US20010052390 Method and apparatus for solid bonding, a conductor bonding method, a packaging method, and a bonding agent and a method for manufacturing a bonding agent
12/20/2001US20010052322 Plasma process device
12/20/2001US20010052321 Single-substrate-processing apparatus for semiconductor
12/20/2001US20010052319 Plasma processing apparatus and plasma processing method
12/20/2001EP1145273A3 Low contamination high density plasma etch chambers and methods for making the same
12/20/2001DE10052889A1 Plasmabearbeitungseinrichtung und Plasmabearbeitungsverfahren für Substrate Plasma processing apparatus and plasma processing method for substrates
12/19/2001CN1327612A Semiconductor processing equipment having tiled ceramic liner
12/19/2001CN1327142A Plasma electric refrigerator
12/19/2001CN1326810A Normal pressure microwave discharging reactor and appliation in removing nitrogen-oxygen compound thereof
12/19/2001CN1076518C Plasma treating device
12/18/2001CA2047571C Inductively coupled plasma spectroscopy
12/13/2001WO2001095362A1 Plasma focus light source with active and buffer gas control
12/13/2001WO2001095352A2 Apparatus and method for accelerating electrons in a plasma reactor
12/13/2001WO2001094004A1 Over-unity production of clean new energies by recycling contaminated liquid waste
12/13/2001US20010051232 Plasma processing method
12/13/2001US20010050144 Plasma processing apparatus
12/13/2001US20010050059 Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate
12/13/2001US20010050058 Plasma process apparatus
12/12/2001EP1162646A2 Plasma treatment apparatus and method
12/12/2001EP1161855A1 An ion accelerator
12/12/2001EP1161309A1 A method for a repetitive ion beam processing with a by carbon containing ion beam
12/12/2001EP1161278A1 Pulsed plasma radiation device for significant spectral bands
12/11/2001US6329757 High frequency transistor oscillator system
12/11/2001US6329627 Electrode for plasma arc torch and method of making the same
12/11/2001US6329024 Method for depositing a coating comprising pulsed plasma polymerization of a macrocycle
12/11/2001US6328805 Equipment for processing a container using a low-pressure plasma having an improved vacuum circuit
12/11/2001US6328760 Pulsed plasma radiation device for emitting light in biologically significant spectral bands
12/06/2001WO2001093322A1 Plasma processing device and processing method
12/06/2001WO2001093315A2 Methods and apparatus for plasma processing
12/06/2001WO2001092784A1 Apparatus for processing waste
12/06/2001WO2001091896A1 Object processing apparatus and plasma facility comprising the same
12/06/2001WO2001091889A1 Compact plasma reactor
12/06/2001WO1999062099A9 Gas distributor for a semiconductor process chamber
12/06/2001US20010049196 Apparatus for improving etch uniformity and methods therefor
12/06/2001US20010048981 High speed plasma vapor deposition; exhaustion ventilation gas
12/06/2001US20010047849 Apparatus and method for fabricating semiconductor device
12/06/2001US20010047760 Apparatus and method for multi-zone high-density inductively-coupled plasma generation
12/06/2001DE19963904C2 Plasmabrenner und Verfahren zur Erzeugung eines Plasmastrahls Plasma torch and method for generating a plasma beam
12/04/2001US6326584 Methods and apparatus for RF power delivery
12/04/2001US6326583 Gas control system for a plasma arc torch
12/04/2001US6326581 Torch for cutting processes
12/04/2001US6325018 Flat antenna having openings provided with conductive materials accommodated therein and plasma processing apparatus using the flat antenna
11/2001
11/29/2001WO2001091523A2 Extreme ultraviolet source based on colliding neutral beams
11/29/2001WO2001041964A3 Plasma arc torch
11/29/2001US20010046273 Compound plasma configuration, and method and apparatus for generating a compound plasma configuration
11/29/2001US20010045415 Process for operating a plasma arc torch
11/29/2001DE10026160A1 X-ray detector in computer tomography system, has wire elements which are spaced apart to receive scintillators between them
11/28/2001EP1158568A2 Plasma assisted semiconductor substrate processing chamber
11/28/2001EP1158565A2 Toroidal plasma source for plasma processing
11/28/2001EP1157598A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source
11/28/2001EP1157597A1 Method of generating euv radiation, method of manufacturing a device by means of said radiation, euv radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
11/28/2001EP1157595A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
11/28/2001EP1156866A1 Plasma-assisted processing of gaseous media
11/28/2001CN1324207A High-pressure microwave plasma exciter
11/27/2001US6324256 Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
11/27/2001US6323595 High frequency discharging method and apparatus, and high frequency processing apparatus
11/27/2001US6323134 Plasma processing methods and apparatus
11/27/2001US6322856 Power injection for plasma thermal spraying
11/27/2001US6322757 Low power compact plasma fuel converter
11/27/2001US6322679 Planar magnetron with moving magnet assembly
11/27/2001US6322662 Plasma treatment system
11/27/2001US6322661 Method and apparatus for controlling the volume of a plasma
11/27/2001US6321681 Method and apparatus to produce large inductive plasma for plasma processing
11/22/2001WO2001088438A1 Device for destroying hazardous substances (variants)
11/22/2001WO2001088220A1 System for precision control of the position of an atmospheric plasma jet
11/22/2001WO2001032297A3 Modular chemical treatment system
11/22/2001US20010043661 Method and system for reducing plasma loss in a magnetic mirror fusion reactor
11/22/2001US20010042511 Reduction of plasma edge effect on plasma enhanced CVD processes
11/22/2001DE10122598A1 Method for ionizing working gas for surface treatment of semi-products, involves applying pulsating basic voltage between anode and cathode for forming pulsed electrical field
11/21/2001EP1156516A1 Method and apparatus for plasma processing
11/21/2001EP1155600A1 Method for the excitation of a plasma and a use of the method
11/21/2001EP1155599A1 Atmospheric steady-state glow-discharge plasma
11/21/2001EP1155164A1 In situ chemical generator and method
11/21/2001EP1155160A1 Non-magnetic stainless steel for use at very low temperature and resistant to neutrons and use
11/21/2001EP1062679B1 Plasma etching installation
11/21/2001CN1323444A Semiconductor process chamber electrode and method for making the same
11/20/2001US6320321 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly