Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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04/27/2000 | DE19846123A1 Fusion reactor comprises magnetic bottle and particle accelerator which fires ions into plasma at the poles, to produce material wave front |
04/26/2000 | EP0995345A1 Vorrichtung zur anregung |
04/26/2000 | EP0995344A1 Plasma processing apparatus |
04/26/2000 | EP0995343A2 Compact microwave downstream plasma system |
04/26/2000 | EP0995342A1 Method for improved cleaning of substrate processing systems |
04/26/2000 | EP0995219A1 Plasma processing apparatus |
04/26/2000 | CN1051903C Method and apparatus for ignition of CVD plasmas |
04/25/2000 | US6054913 Current flow switching device for combined function magnetic field production |
04/25/2000 | US6054670 Method and apparatus for a contact start plasma cutting process |
04/25/2000 | US6054669 Plasma marking torch and method of operating same |
04/25/2000 | US6054191 Decarbonization of a titanium nitride/silicon interface with an plasma gas activated to react with the carbon present from the organotitanium compound used in the vapor disposition of the nitride layer; transforming to a lower electrical |
04/25/2000 | US6054063 Method for plasma treatment and apparatus for plasma treatment |
04/25/2000 | US6054016 Magnetically enhanced microwave plasma generating apparatus |
04/25/2000 | US6054013 Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density |
04/25/2000 | US6053123 Plasma-assisted metallic film deposition |
04/22/2000 | CA2286852A1 Combined process and automatic installation for plasma-jet marking and cutting or welding, in particular of metals |
04/20/2000 | WO2000022646A1 Water-cooled coil for a plasma chamber |
04/20/2000 | DE19848022A1 Plasma generator has conductor fed through vacuum chamber in insulating tube of greater diameter, with tube ends sealed with respect to chamber walls, and conductor ends connected to AC field source |
04/20/2000 | DE19841771C1 Plasma stabilisation unit for vacuum or gas discharge switch |
04/19/2000 | EP0994637A2 Device for plasma treatment of bar or wire shaped material |
04/19/2000 | CN1251199A Method and machine for producing energy |
04/18/2000 | US6051841 Plasma focus high energy photon source |
04/18/2000 | US6051321 Low dielectric constant materials and method |
04/18/2000 | US6051285 Support member is sufficiently cooled so as to suppress thermal deformation and abnormal discharge, thus enabling to preferably carry out the film formation. |
04/18/2000 | US6051151 Apparatus and method of producing a negative ion plasma |
04/18/2000 | US6051100 High conductance plasma containment structure |
04/18/2000 | US6050215 Plasma stream generator with a closed configuration arc |
04/18/2000 | CA2135204C Plasma furnace and a method of operating the same |
04/12/2000 | EP0992059A1 Toroidal low-field reactive gas source |
04/12/2000 | EP0991590A1 Method and device for producing fullerenes |
04/11/2000 | US6048435 Plasma etch reactor and method for emerging films |
04/06/2000 | WO2000019784A1 Slotted waveguide structure for generating plasma discharges |
04/06/2000 | WO2000019506A1 Method of plasma etching dielectric materials |
04/06/2000 | WO2000019505A1 Method and apparatus for improving accuracy of plasma etching process |
04/06/2000 | WO2000019501A1 Method and apparatus for plasma processing |
04/06/2000 | WO2000019483A1 Vacuum treatment chamber and method for treating surfaces |
04/06/2000 | WO2000019481A2 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
04/06/2000 | WO1999065281A3 Arc plasma generator |
04/06/2000 | DE19842074A1 Anode für Plasmaauftragsbrenner Anode plasma deposition burner |
04/06/2000 | CA2347417A1 Slotted waveguide structure for generating plasma discharges |
04/05/2000 | EP0990251A2 Central coil design for ionized metal plasma deposition |
04/04/2000 | US6046546 Stabilizer for switch-mode powered RF plasma |
04/04/2000 | US6046533 Discharge cell for ozone generator |
04/04/2000 | US6045667 Process and system for the treatment of substrates using ions from a low-voltage arc discharge |
04/04/2000 | US6045618 Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment |
03/30/2000 | WO2000018198A1 Substrate electrode plasma generator and substance/material processing method |
03/30/2000 | WO2000017907A1 Apparatus and method for endpoint detection in non-ionizing gaseous reactor environments |
03/30/2000 | WO2000017906A2 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls |
03/29/2000 | EP0989595A2 Device for processing a surface of a substrate |
03/29/2000 | EP0988491A1 High capacity gas storage and dispensing system |
03/29/2000 | EP0988406A1 Method for making a non-sticking diamond like nanocomposite |
03/28/2000 | US6043608 Plasma processing apparatus |
03/28/2000 | US6043607 Apparatus for exciting a plasma in a semiconductor wafer processing system using a complex RF waveform |
03/28/2000 | US6043451 Plasma spraying of nickel-titanium compound |
03/28/2000 | US6042686 Power segmented electrode |
03/28/2000 | US6041734 Use of an asymmetric waveform to control ion bombardment during substrate processing |
03/28/2000 | US6041733 Plasma processing apparatus protected from discharges in association with secondary potentials |
03/28/2000 | CA2017015C Process for the treatment of liquid materials |
03/23/2000 | WO2000016367A1 Ac glow plasma discharge device having an electrode covered with apertured dielectric |
03/23/2000 | DE19944071A1 Modified microwave plasma-CVD, e.g. of diamond layers on large surfaces such as window panes, involves using one or more separate electron sources for plasma stabilization by electron emission |
03/23/2000 | DE19841617A1 Apparatus for thermally coating the inner walls of e.g. car cylinder bores has a hollow wire electric arc inner burner having a burner head with two wires extending from the feeding mechanism |
03/23/2000 | CA2344402A1 Ac glow plasma discharge device having an electrode covered with apertured dielectric |
03/22/2000 | EP0987930A2 Anode for a transferred-arc plasma torch |
03/22/2000 | EP0986939A1 Plasma processing device for surfaces |
03/21/2000 | US6040566 Device to control the aiming and focusing of laser systems on a target |
03/21/2000 | US6040548 Apparatus for generating and deflecting a plasma jet |
03/21/2000 | US6040547 Gas discharge device |
03/21/2000 | US6039836 Focus rings |
03/21/2000 | US6039834 Apparatus and methods for upgraded substrate processing system with microwave plasma source |
03/15/2000 | EP0985742A2 Plasma jet chemical vapor deposition system having a plurality of distribution heads |
03/15/2000 | EP0985331A1 Inductive plasma torch with reagent injector |
03/15/2000 | EP0865716B1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced |
03/14/2000 | US6037560 Enhanced tunable plasma-melter vitrification systems |
03/14/2000 | US6036878 Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna |
03/09/2000 | WO2000013219A1 Apparatus for plasma processing |
03/09/2000 | WO2000013202A1 Method and device for surface processing with plasma at atmospheric pressure |
03/09/2000 | WO2000012446A1 Plasma-resistant member and plasma treatment apparatus using the same |
03/09/2000 | WO2000012253A1 Dual mode plasma arc torch for use with a plasma arc treatment system and method of use thereof |
03/08/2000 | EP0984481A2 Ion source device |
03/08/2000 | EP0983608A2 Aluminum deposition shield |
03/08/2000 | EP0983605A1 Plasma processing apparatus |
03/07/2000 | US6033586 Apparatus and method for surface treatment |
03/02/2000 | WO2000010756A1 Method and transferred arc plasma system for production of fine and ultrafine powders |
03/01/2000 | EP0982976A1 Closed electron drift plasma thruster adapted to high thermal loads |
03/01/2000 | EP0981936A1 Plasma focus high energy photon source |
03/01/2000 | CN2367052Y Plasma type reactor for preparing super fine powder |
02/29/2000 | US6031334 Method and apparatus for selectively distributing power in a thruster system |
02/29/2000 | US6031198 Plasma processing method and apparatus |
02/29/2000 | US6030902 Apparatus and method for improving uniformity in batch processing of semiconductor wafers |
02/29/2000 | US6030667 Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma |
02/29/2000 | US6030486 Magnetically confined plasma reactor for processing a semiconductor wafer |
02/29/2000 | US6029602 Apparatus and method for efficient and compact remote microwave plasma generation |
02/24/2000 | WO2000010019A1 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing |
02/24/2000 | DE19900179C1 Installation for etching substrates by high-density plasmas comprises a phase delay line causing the supply voltages at both ends of the inductively coupled plasma coil to be in counter-phase with one another |
02/24/2000 | DE19853121C1 Treatment of substrates made of insulating materials in high-frequency plasmas involves production of a thin electrically conductive surface layer and using this layer as a high-frequency discharge electrode |
02/24/2000 | CA2340718A1 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing |
02/23/2000 | CN1245474A Method and device for producing hydrogen by plasma reformer |
02/22/2000 | US6028662 Adjustment of particle beam landing angle |
02/22/2000 | US6028395 Vacuum plasma processor having coil with added conducting segments to its peripheral part |
02/22/2000 | US6027663 Method and apparatus for low energy electron enhanced etching of substrates |