Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
04/2000
04/27/2000DE19846123A1 Fusion reactor comprises magnetic bottle and particle accelerator which fires ions into plasma at the poles, to produce material wave front
04/26/2000EP0995345A1 Vorrichtung zur anregung
04/26/2000EP0995344A1 Plasma processing apparatus
04/26/2000EP0995343A2 Compact microwave downstream plasma system
04/26/2000EP0995342A1 Method for improved cleaning of substrate processing systems
04/26/2000EP0995219A1 Plasma processing apparatus
04/26/2000CN1051903C Method and apparatus for ignition of CVD plasmas
04/25/2000US6054913 Current flow switching device for combined function magnetic field production
04/25/2000US6054670 Method and apparatus for a contact start plasma cutting process
04/25/2000US6054669 Plasma marking torch and method of operating same
04/25/2000US6054191 Decarbonization of a titanium nitride/silicon interface with an plasma gas activated to react with the carbon present from the organotitanium compound used in the vapor disposition of the nitride layer; transforming to a lower electrical
04/25/2000US6054063 Method for plasma treatment and apparatus for plasma treatment
04/25/2000US6054016 Magnetically enhanced microwave plasma generating apparatus
04/25/2000US6054013 Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density
04/25/2000US6053123 Plasma-assisted metallic film deposition
04/22/2000CA2286852A1 Combined process and automatic installation for plasma-jet marking and cutting or welding, in particular of metals
04/20/2000WO2000022646A1 Water-cooled coil for a plasma chamber
04/20/2000DE19848022A1 Plasma generator has conductor fed through vacuum chamber in insulating tube of greater diameter, with tube ends sealed with respect to chamber walls, and conductor ends connected to AC field source
04/20/2000DE19841771C1 Plasma stabilisation unit for vacuum or gas discharge switch
04/19/2000EP0994637A2 Device for plasma treatment of bar or wire shaped material
04/19/2000CN1251199A Method and machine for producing energy
04/18/2000US6051841 Plasma focus high energy photon source
04/18/2000US6051321 Low dielectric constant materials and method
04/18/2000US6051285 Support member is sufficiently cooled so as to suppress thermal deformation and abnormal discharge, thus enabling to preferably carry out the film formation.
04/18/2000US6051151 Apparatus and method of producing a negative ion plasma
04/18/2000US6051100 High conductance plasma containment structure
04/18/2000US6050215 Plasma stream generator with a closed configuration arc
04/18/2000CA2135204C Plasma furnace and a method of operating the same
04/12/2000EP0992059A1 Toroidal low-field reactive gas source
04/12/2000EP0991590A1 Method and device for producing fullerenes
04/11/2000US6048435 Plasma etch reactor and method for emerging films
04/06/2000WO2000019784A1 Slotted waveguide structure for generating plasma discharges
04/06/2000WO2000019506A1 Method of plasma etching dielectric materials
04/06/2000WO2000019505A1 Method and apparatus for improving accuracy of plasma etching process
04/06/2000WO2000019501A1 Method and apparatus for plasma processing
04/06/2000WO2000019483A1 Vacuum treatment chamber and method for treating surfaces
04/06/2000WO2000019481A2 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate
04/06/2000WO1999065281A3 Arc plasma generator
04/06/2000DE19842074A1 Anode für Plasmaauftragsbrenner Anode plasma deposition burner
04/06/2000CA2347417A1 Slotted waveguide structure for generating plasma discharges
04/05/2000EP0990251A2 Central coil design for ionized metal plasma deposition
04/04/2000US6046546 Stabilizer for switch-mode powered RF plasma
04/04/2000US6046533 Discharge cell for ozone generator
04/04/2000US6045667 Process and system for the treatment of substrates using ions from a low-voltage arc discharge
04/04/2000US6045618 Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
03/2000
03/30/2000WO2000018198A1 Substrate electrode plasma generator and substance/material processing method
03/30/2000WO2000017907A1 Apparatus and method for endpoint detection in non-ionizing gaseous reactor environments
03/30/2000WO2000017906A2 Rf plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
03/29/2000EP0989595A2 Device for processing a surface of a substrate
03/29/2000EP0988491A1 High capacity gas storage and dispensing system
03/29/2000EP0988406A1 Method for making a non-sticking diamond like nanocomposite
03/28/2000US6043608 Plasma processing apparatus
03/28/2000US6043607 Apparatus for exciting a plasma in a semiconductor wafer processing system using a complex RF waveform
03/28/2000US6043451 Plasma spraying of nickel-titanium compound
03/28/2000US6042686 Power segmented electrode
03/28/2000US6041734 Use of an asymmetric waveform to control ion bombardment during substrate processing
03/28/2000US6041733 Plasma processing apparatus protected from discharges in association with secondary potentials
03/28/2000CA2017015C Process for the treatment of liquid materials
03/23/2000WO2000016367A1 Ac glow plasma discharge device having an electrode covered with apertured dielectric
03/23/2000DE19944071A1 Modified microwave plasma-CVD, e.g. of diamond layers on large surfaces such as window panes, involves using one or more separate electron sources for plasma stabilization by electron emission
03/23/2000DE19841617A1 Apparatus for thermally coating the inner walls of e.g. car cylinder bores has a hollow wire electric arc inner burner having a burner head with two wires extending from the feeding mechanism
03/23/2000CA2344402A1 Ac glow plasma discharge device having an electrode covered with apertured dielectric
03/22/2000EP0987930A2 Anode for a transferred-arc plasma torch
03/22/2000EP0986939A1 Plasma processing device for surfaces
03/21/2000US6040566 Device to control the aiming and focusing of laser systems on a target
03/21/2000US6040548 Apparatus for generating and deflecting a plasma jet
03/21/2000US6040547 Gas discharge device
03/21/2000US6039836 Focus rings
03/21/2000US6039834 Apparatus and methods for upgraded substrate processing system with microwave plasma source
03/15/2000EP0985742A2 Plasma jet chemical vapor deposition system having a plurality of distribution heads
03/15/2000EP0985331A1 Inductive plasma torch with reagent injector
03/15/2000EP0865716B1 A high-frequency plasma process wherein the plasma is excited by an inductive structure in which the phase and anti-phase portions of the capacitive currents between the inductive structure and the plasma are balanced
03/14/2000US6037560 Enhanced tunable plasma-melter vitrification systems
03/14/2000US6036878 Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna
03/09/2000WO2000013219A1 Apparatus for plasma processing
03/09/2000WO2000013202A1 Method and device for surface processing with plasma at atmospheric pressure
03/09/2000WO2000012446A1 Plasma-resistant member and plasma treatment apparatus using the same
03/09/2000WO2000012253A1 Dual mode plasma arc torch for use with a plasma arc treatment system and method of use thereof
03/08/2000EP0984481A2 Ion source device
03/08/2000EP0983608A2 Aluminum deposition shield
03/08/2000EP0983605A1 Plasma processing apparatus
03/07/2000US6033586 Apparatus and method for surface treatment
03/02/2000WO2000010756A1 Method and transferred arc plasma system for production of fine and ultrafine powders
03/01/2000EP0982976A1 Closed electron drift plasma thruster adapted to high thermal loads
03/01/2000EP0981936A1 Plasma focus high energy photon source
03/01/2000CN2367052Y Plasma type reactor for preparing super fine powder
02/2000
02/29/2000US6031334 Method and apparatus for selectively distributing power in a thruster system
02/29/2000US6031198 Plasma processing method and apparatus
02/29/2000US6030902 Apparatus and method for improving uniformity in batch processing of semiconductor wafers
02/29/2000US6030667 Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma
02/29/2000US6030486 Magnetically confined plasma reactor for processing a semiconductor wafer
02/29/2000US6029602 Apparatus and method for efficient and compact remote microwave plasma generation
02/24/2000WO2000010019A1 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
02/24/2000DE19900179C1 Installation for etching substrates by high-density plasmas comprises a phase delay line causing the supply voltages at both ends of the inductively coupled plasma coil to be in counter-phase with one another
02/24/2000DE19853121C1 Treatment of substrates made of insulating materials in high-frequency plasmas involves production of a thin electrically conductive surface layer and using this layer as a high-frequency discharge electrode
02/24/2000CA2340718A1 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
02/23/2000CN1245474A Method and device for producing hydrogen by plasma reformer
02/22/2000US6028662 Adjustment of particle beam landing angle
02/22/2000US6028395 Vacuum plasma processor having coil with added conducting segments to its peripheral part
02/22/2000US6027663 Method and apparatus for low energy electron enhanced etching of substrates