| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 10/18/2001 | US20010029894 Reacting fibrous materials with chemical digesting solution in presence of organosilicon compounds selected from specified organopolysiloxane compounds or organosilane compounds to produce pulp |
| 10/18/2001 | DE10017343A1 Space vehicle propulsion drive device has plasma ignition device supplying focus region of focusing device with material for generation of shock waves within plasma medium |
| 10/18/2001 | CA2405237A1 Reconfigurable plasma electromagnetic waveguide |
| 10/18/2001 | CA2405231A1 A reconfigurable plasma antenna |
| 10/17/2001 | EP1146618A2 Corona discharge apparatus |
| 10/17/2001 | EP1145759A1 Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
| 10/17/2001 | EP1145277A1 Gas injection system for plasma processing |
| 10/17/2001 | EP1145276A1 Method and apparatus for etch rate stabilization |
| 10/17/2001 | EP1145273A2 Low contamination high density plasma etch chambers and methods for making the same |
| 10/17/2001 | EP1144717A1 Enhanced plasma mode, method, and system for plasma immersion ion implantation |
| 10/17/2001 | CN2455040Y Intelligent splatter ion pump power-supply controller |
| 10/17/2001 | CN1317924A 微波等离子体源 Microwave plasma source |
| 10/16/2001 | US6304630 Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| 10/16/2001 | US6304036 System and method for initiating plasma production |
| 10/16/2001 | US6303511 Wafer flattening process |
| 10/16/2001 | US6303007 For creating a plasma discharge includes a hollow, substantially cylindrical-shaped waveguide, and a coaxial refractive materials |
| 10/16/2001 | US6302057 Apparatus and method for electrically isolating an electrode in a PECVD process chamber |
| 10/16/2001 | US6302056 Device for coating substrates with a material vapor in negative pressure or vacuum |
| 10/11/2001 | WO2001076328A2 Plasma arc torch and method for longer life of plasma arc torch consumable parts |
| 10/11/2001 | WO2001076326A1 Optical monitoring and control system and method for plasma reactors |
| 10/11/2001 | WO2001075958A2 Method for improving uniformity and reducing etch rate variation of etching polysilicon |
| 10/11/2001 | WO2001075932A2 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 10/11/2001 | WO2001037311A3 Method and apparatus for controlling the volume of a plasma |
| 10/11/2001 | US20010029112 Apparatus and method for use in manufacturing a semiconductor device |
| 10/11/2001 | DE10015244A1 Procedure for pulse-shaped energy supply in magnetron discharges has after application of voltage, firing of magnetron discharge determined and then separation of voltage source from electrodes of magnetron arrangement |
| 10/10/2001 | EP1143496A1 Plasma etching method |
| 10/10/2001 | EP1141996A1 Hollow cathode array for plasma generation |
| 10/09/2001 | US6300720 Plasma gun and methods for the use thereof |
| 10/09/2001 | US6300225 Plasma processing method |
| 10/09/2001 | US6299948 Introducing treatment gas comprising one or more components into a treatment reactor, the treatment reactor comprising two exciting electrodes; applying voltage to electrodes to cause discharge in a region of the treatment gas |
| 10/09/2001 | US6298806 Device for exciting a gas by a surface wave plasma |
| 10/04/2001 | WO2001074123A1 Apparatus for detecting plasma anomalous discharge and method of detecting the same |
| 10/04/2001 | WO2001073814A2 Method and apparatus for controlling power delivered to a multiple segment electrode |
| 10/04/2001 | WO2001072462A1 Welding head, nozzle and method for powder plasma arc welding (ppaw) |
| 10/04/2001 | WO2001022465A8 Plasma source of linear ion beam |
| 10/04/2001 | US20010027026 Gas distribution apparatus for semiconductor processing |
| 10/04/2001 | US20010026575 Plasma processing system |
| 10/04/2001 | US20010025833 Plasma arc torch and method for cutting a workpiece |
| 10/04/2001 | EP1139701A1 Plasma torch with electrode/nozzle contact starting |
| 10/04/2001 | EP1138055A1 Semiconductor processing equipment having tiled ceramic liner |
| 10/04/2001 | DE10014034A1 Plasma-Beschleuniger-Anordnung Plasma accelerator configuration |
| 10/04/2001 | DE10014033A1 Plasma accelerator device has inner and outer magnetic devices separated by plasma chamber each exhibiting similar polarity reversals in longitudinal direction |
| 10/04/2001 | DE10008486A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 10/03/2001 | CN1316096A Feedthrough overlap coil |
| 10/03/2001 | CN1316021A ESRF chamber cooling system and process |
| 10/03/2001 | CN1315821A Long-life anode of plasma generator |
| 10/03/2001 | CN1072105C Surface smoothing unit |
| 10/02/2001 | US6297595 Method and apparatus for generating a plasma |
| 10/02/2001 | US6297594 Plasma source ion implanting apparatus using the same |
| 10/02/2001 | US6297468 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 10/02/2001 | US6297165 Etching and cleaning methods |
| 10/02/2001 | US6297163 Etching semiconductor with fluorocarbon of octafluorobutene, difluoromethane and carbon monoxide plasma gas, masking and dielectric layer |
| 10/02/2001 | CA2234346C Plasma burner with a fluid-cooled anode |
| 09/27/2001 | WO2001072093A2 Plasma accelerator arrangement |
| 09/27/2001 | WO2001071765A2 Plasma reactor with overhead rf electrode tuned to the plasma |
| 09/27/2001 | WO2001071185A2 Plasma accelerator arrangement |
| 09/27/2001 | WO2000079564A3 Plasma reactor with internal inductive antenna capable of generating helicon wave |
| 09/27/2001 | WO2000058989A8 Plasma gun and methods for the use thereof |
| 09/27/2001 | US20010024114 Plasma density measuring method and apparatus, and plasma processing system using the same |
| 09/27/2001 | US20010023742 Plasma reactor for the treatment of large size substrates |
| 09/27/2001 | US20010023663 Mechanically softened tissues and towels; increased surface fuzziness |
| 09/27/2001 | DE10008483A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 09/26/2001 | CN1314775A Nanometer composite W-oxide electrode material and its preparing process |
| 09/26/2001 | CN1314774A Method for arresting lightening and lightning arrester for carrying out said method |
| 09/25/2001 | US6294227 Method of forming protective film on plastic part for vehicle-use and apparatus |
| 09/25/2001 | US6293090 More efficient RF plasma electric thruster |
| 09/25/2001 | CA2225942C Plasma pilot arc control |
| 09/20/2001 | US20010022295 Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the same |
| 09/20/2001 | US20010022293 Plasma processing equipment and plasma processing method using the same |
| 09/20/2001 | US20010022271 Electron trap formed by magnetron field of sputter source increases ratio of heavy to light metal deposition along surface of substrate, counteracting demixing |
| 09/20/2001 | US20010022215 Apparatus and method for improving uniformity in batch processing of semiconductor wafers |
| 09/20/2001 | US20010022158 Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
| 09/20/2001 | US20010022157 Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield |
| 09/20/2001 | DE10008484A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 09/19/2001 | EP1134774A2 Plasma processing apparatus |
| 09/19/2001 | EP1134073A1 Gas barrier film |
| 09/19/2001 | EP1133901A1 Plasma generator |
| 09/19/2001 | CN1314070A Plasma accelerator arrangement |
| 09/19/2001 | CN1313409A Method for forming electric conductive region by ion implanation |
| 09/18/2001 | US6291999 Plasma monitoring apparatus |
| 09/18/2001 | US6291939 Ion source device |
| 09/18/2001 | US6291937 High frequency coupler, and plasma processing apparatus and method |
| 09/18/2001 | US6291793 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal |
| 09/18/2001 | US6291362 Method of fabricating dielectric layer and fluorescent film for plasma display device |
| 09/18/2001 | US6290825 High-density plasma source for ionized metal deposition |
| 09/13/2001 | WO2001067830A1 Quartz antenna with hollow conductor |
| 09/13/2001 | WO2001066824A1 Plasma polymerization system and method for plasma polymerization |
| 09/13/2001 | US20010021550 Plasma processing method and apparatus |
| 09/13/2001 | US20010020582 For transformation, passivation and stabilization of polluting and toxic admixtures |
| 09/13/2001 | DE10011276A1 Process employing indirect atmospheric plasmatron, surface-treats or coats thin metallic foil or polymer sheet |
| 09/13/2001 | DE10011275A1 Verfahren zur Oberflächenaktivierung bahnförmiger Werkstoffe A process for surface activation of web-shaped materials |
| 09/13/2001 | DE10008482A1 High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
| 09/12/2001 | EP1133216A1 Plasma torch provided with a ceramic protective cap |
| 09/12/2001 | EP1132946A1 Ion beam processing apparatus |
| 09/12/2001 | EP1132195A2 Surface treatment or coating of strips using an atmospheric, non-transferred arc plasmatron |
| 09/12/2001 | EP1132148A2 Process for activating the surface of a web-like material |
| 09/12/2001 | CN1312954A Elastomer bonded parts for plasma processes and method for manufacture and use thereof |
| 09/12/2001 | CN1312145A Serial multistage-compression plasma arc generator |
| 09/12/2001 | CN1071060C Sheet material for electrical insulation |
| 09/11/2001 | US6288493 Antenna device for generating inductively coupled plasma |