Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
06/2001
06/12/2001CA2040184C Plasma spray device with external powder feed
06/07/2001WO2001041182A1 Plasma processor, cluster tool, and method of controlling plasma
06/07/2001WO2001004927A3 Methodologies to reduce process sensitivity to the chamber wall condition
06/07/2001US20010002699 X-ray detector
06/07/2001DE19953928A1 Unit for generation of thermal arc plasmas comprises a first neutral segment dividing the arc burning space into anode and cathode spaces which are joined to one another by a connector channel
06/06/2001EP0874782B1 Thermal plasma reactor and wastewater treatment method
06/06/2001CN1298328A Container with material coating having barrier effect and method and apparatus for making same
06/06/2001CN1066851C 磁场阴极 Cathode magnetic field
06/05/2001US6242710 Method and apparatus for a contact start plasma cutting process
06/05/2001US6242053 Process for coating plastic containers or glass containers by means of a PCVD coating process
05/2001
05/31/2001WO2001039560A1 Device for hybrid plasma processing
05/31/2001WO2001039559A1 Method and apparatus for plasma treatment
05/31/2001WO2001039261A1 Method for plasma etching with pulsed substrate electrode power
05/31/2001WO2001038035A2 Plasma torch and method for underwater cutting
05/31/2001WO1999066533A9 Semiconductor process chamber electrode and method for making the same
05/31/2001US20010002336 Local etching the wafer while maintaining a distance between a plasma discharge location and the wafer surface at a predetermined value by using the halogen gas fed inside alumina discharge tube to produce activated etching gas
05/31/2001US20010002242 Method and apparatus for cleaning harmful gas by irradiation with gas laser and electron beams
05/31/2001DE19957429A1 Mesh, for reducing scattered X-rays, comprises numerous layers of wire elements made or coated with X-ray absorbing material
05/31/2001DE19955671A1 Device for generating plasma in treatment chamber has dividing plate between treatment chamber, antenna chamber in which plasma is not generated owing to higher pressure/gas filling
05/31/2001CA2389437A1 Plasma torch and method for underwater cutting
05/30/2001EP1104004A2 Collector cup
05/30/2001EP1103631A2 Apparatus and method for depositing material on a substrate
05/30/2001EP1102869A1 Esrf chamber cooling system and process
05/30/2001EP1102616A1 Esrf coolant degassing process
05/30/2001EP0988491A4 High capacity gas storage and dispensing system
05/30/2001CN1297491A Reduced impedance chamber
05/29/2001US6239553 RF plasma source for material processing
05/29/2001US6239543 Electron beam plasma formation for surface chemistry
05/29/2001US6239404 Plasma processing apparatus
05/29/2001US6239403 Power segmented electrode
05/29/2001US6239036 Apparatus and method for plasma etching
05/29/2001US6238811 Comprising a magnet and a semiconductor material consisting of a mixture of p-type and n-type semiconductor powders; concurrent generation of both an electrostatic field and a magnetostatic field; medical equipment
05/29/2001US6238629 Apparatus for plasma treatment of a gas
05/29/2001US6238588 High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process
05/29/2001US6238512 Plasma generation apparatus
05/29/2001US6237527 System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate
05/29/2001US6237526 Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
05/29/2001CA2243208C Improved arc retract circuit and method
05/25/2001WO2001037619A1 Method and apparatus to facilitate restriking in an arc-furnace
05/25/2001WO2001037317A1 Plasma processing system with dynamic gas distribution control
05/25/2001WO2001037316A1 Temperature control system for plasma processing apparatus
05/25/2001WO2001037315A1 Plasma processing systems and method therefor
05/25/2001WO2001037313A1 Plasma processing apparatus with an electrically conductive wall
05/25/2001WO2001037311A2 Method and apparatus for controlling the volume of a plasma
05/25/2001WO2001037310A2 Method and apparatus for ionized physical vapor deposition
05/25/2001WO2001037309A1 Plasma focus light source with improved pulse power system
05/25/2001WO2001037306A1 Stabilized oscillator circuit for plasma density measurement
05/24/2001US20010001743 Inductively coupled plasma etching in a reactor by flowing oxygen, helium and argon gas into the reactor, striking a plasma, then adding sulfur fluoride (SF6) gas in given flow ratios
05/23/2001EP1102521A2 Plasma injector
05/23/2001EP1102305A1 Plasma processing apparatus with an electrically conductive wall
05/23/2001EP1101122A1 Quasi-hemispherical fabry-perot resonator and method for operating the same
05/23/2001CN2431541Y Refrigerator with freshness-keeping function
05/22/2001US6236014 Method and apparatus for providing welding/plasma power
05/22/2001US6236013 Combined process and automatic installation for plasma-jet marking and cutting or welding, in particular of metals
05/22/2001US6236012 Plasma torch with an adjustable injector and gas analyzer using such a torch
05/22/2001US6235655 Semiconductor manufacturing system and semiconductor manufacturing method
05/22/2001US6235646 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
05/22/2001US6235202 Separation low mass particles from high mass particles
05/22/2001US6235067 Liquid hydrocarbon fuel and water supercritical mixture emitter nozzles
05/22/2001US6234013 Solar-plasma meter
05/22/2001CA2290146A1 Nozzle/nozzle holder set for plasma torch
05/22/2001CA2290144A1 Electrode body/electrode holder set for plasma torch
05/17/2001WO2000070928A8 Method for obtaining and accelerating plasma and plasma accelerator using a closed-circuit electron drift
05/17/2001US20010001201 Plasma reactor with coil antenna of plural helical conductors with equally spaced ends
05/17/2001US20010001184 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair
05/17/2001DE10007130C1 Plasma induced reduction of soot emission from diesel engine
05/16/2001EP1100115A1 Device and method for plasma processing
05/16/2001EP1100114A2 Zone controlled radiant heating system utilizing focused reflector
05/16/2001EP1099360A1 Electrode for a plasma arc torch having an improved insert configuration
05/16/2001EP0873561A4 Fusion reactor that produces net power from the p-b11 reaction
05/16/2001CN1295628A Method and apparatus for deposition of biaxially textured coatings
05/15/2001US6232575 Apparatus and method for supplying fluids to a plasma arc torch
05/15/2001US6232574 Method and apparatus for improving plasma ARC consumable life
05/15/2001US6231776 Multi-temperature processing
05/15/2001US6231726 Plasma processing apparatus
05/15/2001US6230652 Apparatus and methods for upgraded substrate processing system with microwave plasma source
05/15/2001US6230651 Gas injection system for plasma processing
05/15/2001CA2230427C Arc transfer circuit
05/10/2001WO2001033056A1 Low power compact plasma fuel converter
05/10/2001WO2001032949A1 Method and device for plasma coating surfaces
05/10/2001WO2001032297A2 Modular chemical treatment system
05/10/2001US20010000898 Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions
05/10/2001CA2389009A1 Low power compact plasma fuel converter
05/10/2001CA2325305A1 Sequential feedstock injector for thermal spray torches
05/09/2001EP1097253A1 Ion energy attenuation
05/09/2001CN2429989Y Ionic Bernstein wave antenne
05/09/2001CN1294480A Plasma processor and method for generating plasma using such plasma processor
05/08/2001US6229264 Plasma processor with coil having variable rf coupling
05/08/2001US6228438 Plasma reactor for the treatment of large size substrates
05/08/2001US6228266 Water treatment apparatus using plasma reactor and method thereof
05/08/2001US6228229 Method and apparatus for generating a plasma
05/08/2001US6228210 Surface wave coupled plasma etching apparatus
05/08/2001US6227141 RF powered plasma enhanced chemical vapor deposition reactor and methods
05/08/2001US6227140 Semiconductor processing equipment having radiant heated ceramic liner
05/08/2001CA2231109C Plasma arc torch
05/03/2001WO2001031683A1 Plasma doping system comprising a hollow cathode
05/03/2001WO2001031682A1 Method and apparatus for low voltage plasma doping using dual pulses
05/03/2001WO2001031680A1 Vacuum circuit for a device for treating a receptacle with low pressure plasma
05/03/2001US20010000604 Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry
05/03/2001DE19951017A1 Verfahren und Vorrichtung zur Plasmabehandlung von Oberflächen Method and apparatus for plasma treatment of surfaces