| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 03/15/2001 | WO2001018858A1 Magnetron plasma processing apparatus |
| 03/15/2001 | WO2001018845A1 Method of determining etch endpoint using principal components analysis of optical emission spectra |
| 03/15/2001 | WO2000075393A8 Carbon plasma pulsed source |
| 03/15/2001 | WO2000070928A3 Method for obtaining and accelerating plasma and plasma accelerator using a closed-circuit electron drift |
| 03/15/2001 | DE19937621A1 Pulse-shaped energy supply method for low pressure plasma by aperiodically setting on and/or off times of pulses using random principle |
| 03/15/2001 | CA2383883A1 Apparatus and method for propulsion |
| 03/14/2001 | EP1082727A2 Method and apparatus for the production of neutrons and other particles |
| 03/14/2001 | EP1082726A2 Method and apparatus for compressing a bose-einstein condensate of atoms |
| 03/14/2001 | EP0865715A4 Process depending on plasma discharges sustained by inductive coupling |
| 03/13/2001 | US6200539 Paraelectric gas flow accelerator |
| 03/13/2001 | US6200433 Depositing a barrier layer in a plasma chamber having an inductive coil and a target comprising the material to be sputtered, one or more plasma gases having high molar masses relative to target material such as xenon or krypton |
| 03/13/2001 | US6199506 Radio frequency supply circuit for in situ cleaning of plasma-enhanced chemical vapor deposition chamber using NF3 or NF3/He mixture |
| 03/13/2001 | US6199505 Plasma processing apparatus |
| 03/08/2001 | WO2001017007A1 Method of etching and method of plasma treatment |
| 03/08/2001 | DE19941542A1 Automatic tuning method and device for HF impedance matching network for plasma process uses cyclic measurement of electrical parameters and adjustment of tuning components in alternation |
| 03/07/2001 | EP1081749A1 Protective member for inner surface of chamber and plasma processing apparatus |
| 03/07/2001 | EP1081247A2 Arc type ion plating apparatus |
| 03/07/2001 | EP1080614A1 Apparatus for coupling power into a body of gas |
| 03/07/2001 | EP1080613A1 Device for generating a magnetic field inside a chamber |
| 03/07/2001 | EP1080612A1 Method for modulating a magnetic field configuration |
| 03/07/2001 | EP1080138A1 Plasma surface treatment of silicone hydrogel contact lenses |
| 03/07/2001 | EP1065502A4 Method for carrying out the electrical breakdown of a gaseous dielectric in a highly non-uniform field |
| 03/07/2001 | CN1286892A Substrate electrode plasma generator and substance/material processing method |
| 03/06/2001 | US6198224 Microwave plasma generator with the short cross-sectional side of the resonator parallel to the chamber axis |
| 03/06/2001 | US6198067 Plasma processing device for circuit supports |
| 03/02/2001 | CA2281394A1 Safety device for a plasma torch |
| 03/01/2001 | WO2001015212A1 Plasma processing apparatus and method of plasma processing |
| 03/01/2001 | WO2001015200A1 Implanting system and method |
| 03/01/2001 | WO2001015199A1 Electron beam plasma formation for surface chemistry |
| 03/01/2001 | WO2001014702A1 Low power compact plasma fuel converter |
| 03/01/2001 | WO2000079579A3 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards |
| 03/01/2001 | WO2000058995B1 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 03/01/2001 | CA2391851A1 Low power compact plasma fuel converter |
| 02/28/2001 | EP1079671A2 Antenna device for generating inductively coupled plasma |
| 02/28/2001 | EP1079425A1 Process and device for vacuum plasma treatment of substrate |
| 02/28/2001 | EP1079423A1 Apparatus for gas processing |
| 02/28/2001 | EP1079415A1 Substrate (plasma) processing taking account of optical instabilities |
| 02/28/2001 | EP1030788A4 Plasma processing methods and apparatus |
| 02/28/2001 | CN1285253A Electric arc type ion plating device |
| 02/27/2001 | US6194835 Device for producing plasma |
| 02/27/2001 | US6194680 Microwave plasma processing method |
| 02/27/2001 | US6194322 Electrode for plasma processes and method for a manufacture and use thereof |
| 02/27/2001 | US6194036 Deposition of coatings using an atmospheric pressure plasma jet |
| 02/27/2001 | US6193855 Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage |
| 02/27/2001 | US6193836 Center gas feed apparatus for a high density plasma reactor |
| 02/27/2001 | US6193832 Method of making dielectric catalyst structures |
| 02/27/2001 | US6193802 Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| 02/27/2001 | US6193369 Plasma surface treatment of silicone hydrogel contact lenses |
| 02/22/2001 | WO2001013419A1 Processing apparatus and processing method |
| 02/22/2001 | WO2001013404A1 Diamond coated parts in a plasma reactor |
| 02/22/2001 | WO2001013403A1 Inductively coupled plasma process chamber with shield electrode interposed between antenna and dielectric window |
| 02/22/2001 | WO2000073247A9 Thermal device and method for production of carbon monoxide and hydrogen by thermal dissociation of hydrocarbon gases |
| 02/21/2001 | EP1077021A1 The method of making a physically and chemically active environment by means of a plasma jet and the related plasma jet |
| 02/21/2001 | EP1077020A1 Method and device for high frequency treatment of products, related materials and uses |
| 02/21/2001 | EP0809659A4 Plasma deposited film networks |
| 02/20/2001 | US6191532 Arrangement for producing plasma |
| 02/20/2001 | US6191386 Method and apparatus for initiating, directing and constricting electrical discharge arcs |
| 02/20/2001 | US6191381 Tapered electrode for plasma arc cutting torches |
| 02/20/2001 | US6191380 Plasma arc torch head |
| 02/20/2001 | US6191045 Method of treating surface of sample |
| 02/20/2001 | US6191043 Flowing an etchant gas comprising helium, oxygen, and argon into inductively coupled plasma etching reactor in which a semiconductor substrate is positioned and striking the plasma, then supplying sulfur hexafluoride to gas mixture |
| 02/20/2001 | US6190927 Method and apparatus for detecting optimal endpoints in plasma etch processes |
| 02/20/2001 | US6190512 Soft plasma ignition in plasma processing chambers |
| 02/20/2001 | US6190496 Plasma etch reactor and method for emerging films |
| 02/20/2001 | US6190495 Magnetron plasma processing apparatus |
| 02/20/2001 | US6189484 Plasma reactor having a helicon wave high density plasma source |
| 02/20/2001 | CA2198684C Plasma torch |
| 02/15/2001 | WO2001011659A1 System and method for providing implant dose uniformity across the surface of a substrate |
| 02/15/2001 | WO2001011658A1 Plasma reactor for treating substrates having large surfaces |
| 02/15/2001 | WO2001011650A1 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof |
| 02/15/2001 | WO2001010546A1 Magnegas, a novel, highly efficient, nonpollutant, oxygen rich and cost competitive combustible gas and associated method |
| 02/15/2001 | WO2000065631A3 Apparatus and method for exposing a substrate to plasma radicals |
| 02/15/2001 | DE19935468A1 Plasmaspritzvorrichtung Plasma spraying device |
| 02/15/2001 | DE19925555A1 Releasing energy using controlled nuclear fusion involves use of plasma chamber having plasma which operates with specific energy |
| 02/15/2001 | DE10008255A1 Plasma burner used in plasma arc welding comprises a vapor outlet opening arranged between a vaporizer for producing water vapor and an ionization chamber |
| 02/14/2001 | EP1076352A2 High-density plasma source for ionized metal deposition |
| 02/13/2001 | US6188746 Spherical inertial electrostatic confinement device as a tunable x-ray source |
| 02/13/2001 | US6188564 Method and apparatus for compensating non-uniform wafer processing in plasma processing chamber |
| 02/13/2001 | US6187226 A thermodynamically stable high temperature process; heating the reactant stream and expanding through the outlet end of the reaction chamber to cool the gaseous stream, converting thermal energy to kinetic energy |
| 02/13/2001 | US6187206 Thermal plasma reactor and wastewater treatment method |
| 02/13/2001 | US6187072 Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
| 02/13/2001 | US6185839 Semiconductor process chamber having improved gas distributor |
| 02/08/2001 | WO2001009031A1 Plasma transformer for the transformation of fossil fuels into hydrogen-rich gas |
| 02/08/2001 | WO2001001443B1 Plasma processor with coil responsive to variable amplitude rf envelope |
| 02/08/2001 | CA2379892A1 Plasma converter of fossil fuels into hydrogen-rich gas |
| 02/07/2001 | EP1075168A1 Method for generating an elementary plasma in order to produce a uniform plasma for a target surface and device for generating such a plasma |
| 02/07/2001 | EP1075167A2 Plasma spray device |
| 02/07/2001 | EP1073779A1 Reduced impedance chamber |
| 02/07/2001 | CN1283076A Electrode used for producing plasme body, plasma body processing equipment using said dectrode and plasma body processing using said equipment |
| 02/06/2001 | US6184982 Sample introduction system |
| 02/06/2001 | US6184625 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 02/06/2001 | US6184624 Ion source |
| 02/06/2001 | US6184623 Method for controlling plasma-generating high frequency power, and plasma generating apparatus |
| 02/06/2001 | US6184488 Low inductance large area coil for an inductively coupled plasma source |
| 02/06/2001 | US6183614 Rotating sputter magnetron assembly |
| 02/06/2001 | US6183605 Sputtering dielectrics |
| 02/06/2001 | US6182604 Hollow cathode for plasma doping system |
| 02/06/2001 | CA2231634C Plasma system and method of operating same |
| 02/01/2001 | WO2001008455A1 Method of promoting uniform process conditions in pecvd reactor for batch production of glazing panels |
| 02/01/2001 | WO2001008208A1 Semiconductor device, method for forming silicon oxide film, and apparatus for forming silicon oxide film |