| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 02/07/2002 | US20020014845 Cylindrical geometry hall thruster |
| 02/07/2002 | US20020014599 Plasma focus light source with tandem ellipsoidal mirror units |
| 02/07/2002 | US20020014598 Plasma focus light source with active and buffer gas control |
| 02/07/2002 | US20020014475 Monitoring and controlling separate plasma jets to achieve desired properties in a combined stream |
| 02/07/2002 | DE10035177A1 Plasma treatment method for hollow body internal surface uses partial discharge within hollow space in electrical AC field |
| 02/06/2002 | EP1178134A1 Process and apparatus for the continuous plasma treatment of metallic substrates |
| 02/06/2002 | EP1177714A1 Method and apparatuses for plasma treatment |
| 02/06/2002 | EP1177112A1 Remote plasma generator |
| 02/06/2002 | CN1334885A Large area plasma source |
| 02/06/2002 | CN1334694A Plasma processing apparatus and method |
| 02/05/2002 | US6344105 Techniques for improving etch rate uniformity |
| 02/05/2002 | CA2256566C Plasma torch system |
| 01/31/2002 | WO2002009482A1 Dc plasma generator for generation of a non-local, non-equilibrium plasma at high pressure |
| 01/31/2002 | WO2002009259A1 Electrodynamic field generator |
| 01/31/2002 | WO2002009162A2 Heated substrate support assembly and method |
| 01/31/2002 | WO2002008787A2 Method and apparatus for the production of so called 'fractional hydrogen' and associated production of photon energy |
| 01/31/2002 | WO2001071765A3 Plasma reactor with overhead rf electrode tuned to the plasma |
| 01/31/2002 | WO2001045130A3 Plasma generator ignition circuit |
| 01/31/2002 | WO2000019481A9 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 01/31/2002 | US20020012756 Plasma coating; uniformity |
| 01/31/2002 | US20020011310 Downstream sapphire elbow joint for remote plasma generator |
| 01/31/2002 | US20020011214 Remote plasma mixer |
| 01/31/2002 | CA2416871A1 Electrodynamic field generator |
| 01/30/2002 | EP1176857A1 DC plasma generator for generation of a non-local, non-equilibrium plasma at high pressure |
| 01/30/2002 | CN1078742C Plasma processing apparatus for dry etching of semiconductor wafers |
| 01/29/2002 | US6341574 Plasma processing systems |
| 01/29/2002 | CA2085133C High performance induction plasma torch with a water-cooled ceramic confinement tube |
| 01/24/2002 | WO2002007484A2 Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
| 01/24/2002 | WO2001031682A8 Method and apparatus for low voltage plasma doping using dual pulses |
| 01/24/2002 | US20020008480 Plasma treatment apparatus and plasma treatment method |
| 01/24/2002 | US20020008455 Segmented electrode hall thruster with reduced plume |
| 01/24/2002 | US20020008451 Plasma Source |
| 01/24/2002 | US20020007915 Plasma processing apparatus |
| 01/24/2002 | US20020007914 Etching and cleaning apparatus |
| 01/24/2002 | US20020007912 Coolant for plasma generator |
| 01/24/2002 | US20020007795 Temperature control system for plasma processing apparatus |
| 01/24/2002 | DE10034028A1 High power microwave circulator has coaxial coupled cavities in single block |
| 01/24/2002 | DE10032955A1 Arrangement for generation of low temperature plasma at atmospheric pressure, has electrode system or parts of it provided with electrical networks for matching impedance to output data of high frequency generators |
| 01/24/2002 | DE10014034C2 Plasma-Beschleuniger-Anordnung Plasma accelerator configuration |
| 01/23/2002 | EP1174901A2 Integrated power oscillator RF source for plasma immersion ion implantation system |
| 01/23/2002 | EP1173874A1 Plasma gun and methods for the use thereof |
| 01/23/2002 | EP0775436B1 Plasma torch with axial injection of feedstock |
| 01/23/2002 | CN2473857Y Constant pressure low temperature plasma producing device |
| 01/23/2002 | CN1332950A Plasma vacuum pump |
| 01/22/2002 | US6340863 Microwave plasma generator and system for decomposing organic halide |
| 01/22/2002 | US6340639 Plasma process apparatus and plasma process method for substrate |
| 01/22/2002 | US6339997 Plasma processing apparatus |
| 01/22/2002 | CA2231888C Plasma accelerator with closed electron drift and conductive inserts |
| 01/17/2002 | WO2002005601A1 A method of improving the service life of a plasma torch electrode |
| 01/17/2002 | WO2002005597A1 Improved dielectric heating using inductive coupling |
| 01/17/2002 | WO2002005339A1 Plasma processing apparatus |
| 01/17/2002 | WO2002005308A2 A plasma reactor having a symmetric parallel conductor coil antenna |
| 01/17/2002 | WO2002004930A1 Plasma source for spectrometry |
| 01/17/2002 | US20020005395 Plasma reactor and gas modification method |
| 01/17/2002 | US20020005348 Sputtering method to generate ionized metal plasma using electron beams and magnetic field |
| 01/17/2002 | US20020005169 Thin film electrostatic shield for inductive plasma processing |
| 01/17/2002 | DE10027247A1 Plasma generator used for treatment of waste gases has electrical barrier formed by multi-component composite material consisting of high-temperature-resistant carrier material with glass-like, ceramic and/or mineral fillers |
| 01/17/2002 | CA2412529A1 Plasma source for spectrometry |
| 01/16/2002 | EP1172843A2 Material handling system and methods for a multichamber plasma treatment system |
| 01/16/2002 | EP1171900A1 Large area atmospheric-pressure plasma jet |
| 01/16/2002 | CN2472454Y Plano-RF induction coupling Antenna and vacuum coupling window |
| 01/16/2002 | CN1331836A Hollow cathode array for plasma generation |
| 01/15/2002 | US6339297 Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus |
| 01/15/2002 | US6339206 Apparatus and method for adjusting density distribution of a plasma |
| 01/15/2002 | US6338313 System for the plasma treatment of large area substrates |
| 01/15/2002 | CA2119561C Apparatus for rapid plasma treatments and method |
| 01/10/2002 | WO2002003763A2 Vacuum plasma processor apparatus and method |
| 01/10/2002 | WO2002003417A2 An electromagnetic radiation-initiated plasma reactor |
| 01/10/2002 | WO2002003415A2 Switched uniformity control |
| 01/10/2002 | US20020004104 Method for depositing a coating comprising pulsed plasma polymerization of a macrocycle |
| 01/10/2002 | US20020004022 Apparatus flows liquid over electric arc produced by nonconsumable tungsten and consumable carbon electrodes; atomic constituents of liquid and carbon electrode become magentically polarized clusters |
| 01/10/2002 | US20020003141 Dielectric heating using inductive coupling |
| 01/10/2002 | US20020002947 Inductive coupling plasma processing apparatus |
| 01/10/2002 | CA2415137A1 An electromagnetic radiation-initiated plasma reactor |
| 01/09/2002 | EP1170982A1 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 01/09/2002 | EP1169890A1 Plasma torch cartridge and plasma torch equipped therewith |
| 01/09/2002 | EP1169889A1 Cartridge for a plasma torch and plasma torch fitted therewith |
| 01/09/2002 | EP0699300B1 Plasma manipulator |
| 01/09/2002 | CN1330507A Radio frequency plasma generator |
| 01/08/2002 | US6337460 Plasma arc torch and method for cutting a workpiece |
| 01/08/2002 | US6337110 Heating substrate; creating plasma from ionized, gaseous mixture, for a magnetic field value corresponding to electron cyclotron resonance of organic molecules, creating a positive potential difference between plasma and substrate, diffusing |
| 01/03/2002 | WO2002001927A1 Plasma-chemical reactor |
| 01/03/2002 | WO2001075958A3 Method for improving uniformity and reducing etch rate variation of etching polysilicon |
| 01/03/2002 | US20020001540 Inductively coupled plasma (ICP) mass sprectrometry; spray chamber improves the efficiency of introducing a sample fluid into a plasma, improving sensitivity by suppressing proportion of a solvent that reaches a plasma torch |
| 01/03/2002 | US20020001333 System and method for determining combustion temperature using infrared emissions |
| 01/03/2002 | US20020000779 Constricted glow discharge plasma source |
| 01/03/2002 | US20020000368 Vacuum treatment chamber and method for treating surfaces |
| 01/03/2002 | DE10129758A1 Plasmabrenner Plasma torch |
| 01/02/2002 | EP1168896A2 Device, in particular plasma generating torch |
| 01/02/2002 | EP1168415A2 Power supply antenna and power supply method |
| 01/02/2002 | EP1166942A2 Plasma gun |
| 01/02/2002 | EP1166324A2 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 01/02/2002 | EP1166323A1 Method and apparatus for compensating non-uniform wafer processing in plasma processing |
| 01/02/2002 | EP1166322A1 Plasma processing method and apparatus with control of rf bias |
| 01/02/2002 | EP1166321A1 Plasma processor with coil having variable rf coupling |
| 01/02/2002 | EP1164915A2 Imaging system with remote controlled camera |
| 01/02/2002 | EP0860099A4 Three-phase alternating current plasma generator |
| 01/01/2002 | US6335595 Plasma generating apparatus |
| 01/01/2002 | US6335536 Method and apparatus for low voltage plasma doping using dual pulses |
| 01/01/2002 | US6335291 System and method for plasma etch on a spherical shaped device |