| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 07/24/2001 | US6265687 Helium, argon and hydrogen; energizing the gas to form a plasma; introducing the powder into the plasma |
| 07/24/2001 | US6265031 Method for plasma processing by shaping an induced electric field |
| 07/24/2001 | US6264852 Substrate process chamber and processing method |
| 07/24/2001 | US6264812 Method and apparatus for generating a plasma |
| 07/24/2001 | US6263831 Downstream plasma using oxygen gas mixtures |
| 07/24/2001 | US6263830 Microwave choke for remote plasma generator |
| 07/19/2001 | WO2001052303A1 Liner for semiconductor etching chamber |
| 07/19/2001 | US20010008805 Useful for continuously producing negative ions in high density and also negative ions can be made incident on the semiconductor substrate to be processed to conduct ashing, etching and cleaning of the substrate to remove impurities |
| 07/19/2001 | US20010008798 Plasma treatment system and method |
| 07/19/2001 | US20010008378 Quasi-hemispherical fabry-perot resonator and method of operating the same |
| 07/19/2001 | US20010008173 Plasma etching system |
| 07/19/2001 | US20010008171 Plasma processing apparatus for semiconductors |
| 07/19/2001 | US20010008122 Plasma processing apparatus |
| 07/19/2001 | CA2393283A1 Liner for semiconductor etching chamber |
| 07/18/2001 | EP1117280A2 Induction plasma torch liquid waste injector |
| 07/18/2001 | EP1117279A1 Plasma torch with head, electrode and nozzle identification means |
| 07/18/2001 | EP1117278A2 Method and apparatus for improving plasma arc consumable life |
| 07/18/2001 | EP1115523A1 Method and transferred arc plasma system for production of fine and ultrafine powders |
| 07/17/2001 | US6262538 High density plasma tool with adjustable uniformity and stochastic electron heating for reduced gas cracking |
| 07/17/2001 | US6262523 Large area atmospheric-pressure plasma jet |
| 07/17/2001 | US6262386 Plasma nozzle with angled mouth and internal swirl system |
| 07/16/2001 | WO2001054464A1 Three-phase plasma generator having adjustable electrodes |
| 07/16/2001 | CA2397756A1 Three-phase alternating current plasma generator having adjustable, extended life electrodes and multiple stream injector rings |
| 07/12/2001 | WO2001050498A1 Linear drive system for use in a plasma processing system |
| 07/12/2001 | WO2001050497A1 Electrode assembly |
| 07/12/2001 | WO2001050495A1 Method and device for treating a threadlike body surface |
| 07/12/2001 | WO2001050107A1 Damped paddle wheel for plasma chamber shock tube |
| 07/12/2001 | US20010007320 Plasma arc torch |
| 07/12/2001 | US20010007245 Hf-plasma coating chamber or pecvd coating chamber, its use and method of plating cds using the chamber |
| 07/12/2001 | DE19960401A1 Electrode for plasma source is helical winding on tubular bearer with distance between windings greater than that between adjacent dark spaces formed by gas discharges |
| 07/11/2001 | EP1115142A2 Plasma mass filter |
| 07/11/2001 | EP1115141A1 Method and device for the surface treatment of a filamentary body |
| 07/11/2001 | EP1115140A2 Plasma processing apparatus |
| 07/11/2001 | EP1114805A1 Plasma-resistant member and plasma treatment apparatus using the same |
| 07/11/2001 | EP1114434A1 Ac glow plasma discharge device having an electrode covered with apertured dielectric |
| 07/11/2001 | EP1113898A4 Permanent magnet ecr plasma source with magnetic field optimization |
| 07/11/2001 | EP1113898A1 Permanent magnet ecr plasma source with magnetic field optimization |
| 07/11/2001 | EP1113860A1 Method and apparatus for cleaning harmful gas by irradiation with gas laser and electron beams |
| 07/10/2001 | US6259209 Plasma processing apparatus with coils in dielectric windows |
| 07/10/2001 | US6259072 Zone controlled radiant heating system utilizing focused reflector |
| 07/06/2001 | CA2320597A1 Ion cyclotron power converter and radio and microwave generator |
| 07/05/2001 | WO2001049087A1 Method of generating euv radiation, method of manufacturing a device by means of said radiation, euv radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001049085A1 Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| 07/05/2001 | WO2001048791A1 Method of manufacturing an electrode for a plasma reactor and such an electrode |
| 07/05/2001 | WO2001006544A3 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
| 07/05/2001 | US20010006849 Methods and apparatus for producing semiconductor devices |
| 07/05/2001 | US20010006217 Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit |
| 07/05/2001 | DE19960403A1 Plasma treatment of flat fibrous material, e.g. fabrics, non-woven, involves discharge in a moderate vacuum according to gas being used |
| 07/04/2001 | EP1113711A2 Plasma torch and method for generating a plasma jet |
| 07/04/2001 | EP1113522A2 Coupling structure of waveguide and applicator, and its application to electrodeless lamp |
| 07/04/2001 | EP1112587A1 Device and method for etching a substrate by means of an inductively coupled plasma |
| 07/04/2001 | EP0921849B1 Process and apparatus for purification of nitrogen oxides containing exhaust gases |
| 07/03/2001 | US6255221 Methods for running a high density plasma etcher to achieve reduced transistor device damage |
| 07/03/2001 | US6254940 Forming nanoparticles; heating, flaming, applying perpendicular electric field; carbiding, alloying |
| 07/03/2001 | US6254746 Recessed coil for generating a plasma |
| 07/03/2001 | US6254738 Use of variable impedance having rotating core to control coil sputter distribution |
| 06/28/2001 | WO2001045794A1 Pulsed plasma radiation device for significant spectral bands |
| 06/28/2001 | US20010005119 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly |
| 06/28/2001 | US20010004920 Provides shields for shielding the interior surface of the reactor pumping annulus from the plasma by preventing plasma from flowing through gap between wafer pedestal and the chamber sidewall without obstructing free flow of natural gas |
| 06/28/2001 | CA2364376A1 Pulsed plasma radiation device for significant spectral bands |
| 06/27/2001 | EP1110237A2 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards |
| 06/26/2001 | US6252354 RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control |
| 06/26/2001 | US6252194 Assembly of electrode body and electrode carrier for a plasma torch |
| 06/26/2001 | US6251793 Particle controlling method for a plasma processing chamber |
| 06/26/2001 | US6251241 Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield |
| 06/26/2001 | US6250070 Ion thruster with ion-extraction grids having compound contour shapes |
| 06/21/2001 | WO2001045135A2 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates |
| 06/21/2001 | WO2001045134A2 Method and apparatus for producing uniform process rates |
| 06/21/2001 | WO2001045130A2 Plasma generator ignition circuit |
| 06/21/2001 | WO2001044790A1 Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions |
| 06/21/2001 | WO2001024220A3 Uniform gas distribution in large area plasma treatment device |
| 06/21/2001 | US20010004473 Delivering solution of liquid precursor to thermal spray device, forming nanaostructured particles from liquid precursor solution within thermal spray device and delivering formed nanostructured particles to substrate |
| 06/21/2001 | US20010004000 Plasma reactor with coil antenna of interleaved conductors |
| 06/21/2001 | CA2395180A1 Segmented electrode capillary discharge, non-thermal plasma apparatus and process for promoting chemical reactions |
| 06/20/2001 | EP1108264A1 Method and device for surface processing with plasma at atmospheric pressure |
| 06/20/2001 | CN1300524A processing system with dual ion sources |
| 06/19/2001 | US6248250 RF plasma reactor with hybrid conductor and multi-radius dome ceiling |
| 06/19/2001 | US6248240 Separation of charged particles within plasma chamber in response to crossed electric and magnetic fields for rotating particles in respective orbits about the longitudinal axis according to their mass and creating respective cyclotron |
| 06/19/2001 | US6248206 Apparatus for sidewall profile control during an etch process |
| 06/19/2001 | US6247425 Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor |
| 06/14/2001 | WO2001043512A1 Plasma nozzle |
| 06/14/2001 | WO2001043511A1 Transfer-type plasma heating anode |
| 06/14/2001 | WO2001041964A2 Plasma arc torch |
| 06/14/2001 | US20010003607 Alternate steps of imp and sputtering process to improve sidewall coverage |
| 06/14/2001 | US20010003272 Method for improving the rate of a plasma enhanced vacuum treatment |
| 06/14/2001 | US20010003270 Rf powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition |
| 06/13/2001 | EP1107653A1 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device |
| 06/13/2001 | EP1107260A2 X-ray absorbing grid |
| 06/13/2001 | EP1107022A2 X-ray detector with a sensor matrix and a scintillator device |
| 06/13/2001 | EP1105917A1 Elastomer bonded parts for plasma processes and method for manufacture and use thereof |
| 06/13/2001 | EP1105703A1 Method and apparatus for monitoring plasma processing operations |
| 06/13/2001 | DE19957169A1 Plasmaätzverfahren mit gepulster Substratelektrodenleistung Plasma etching with pulsed substrate electrode performance |
| 06/13/2001 | DE10027409C1 Apparatus for purifying IC engine exhaust gas comprises a first and a second component electrically insulated from each other having a sleeve and a core through which the gas flows |
| 06/13/2001 | CN2434626Y 等离子体电冰箱 Plasma Refrigerator |
| 06/13/2001 | CN1299387A Plasma surface treatment of silicone hydrogel contact lenses |
| 06/12/2001 | US6246175 Large area microwave plasma generator |
| 06/12/2001 | US6245309 Method and devices for producing hydrogen by plasma reformer |
| 06/12/2001 | US6245202 Plasma treatment device |
| 06/12/2001 | US6245192 Gas distribution apparatus for semiconductor processing |
| 06/12/2001 | US6245190 Plasma processing system and plasma processing method |