Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
07/2000
07/04/2000US6084199 Plasma arc torch with vented flow nozzle retainer
07/04/2000US6084198 Plasma gun and methods for the use thereof
07/04/2000US6084197 Powder-fan plasma torch
07/04/2000US6083568 Reducing organic material to form carbides for semiconductor wafers by injection of gas into reactors to form plasma :
07/04/2000US6083341 Method for making coatings of uniform thickness
07/04/2000US6082374 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher
07/04/2000US6082293 Plasma source
06/2000
06/29/2000WO2000038485A1 Wear part for arc welding torch produced in alloyed copper
06/29/2000WO1999056521A3 Method and apparatus for the production of neutrons and other particles
06/29/2000DE19962163A1 Centrifugal fusion tablet injector for nuclear fusion unit, comprises fuel supply system, vacuum tank with exhaust pipe, extruder, rotor and tablet splitting unit
06/29/2000DE19900128A1 Düse sowie Düsenanordnung für einen Brennerkopf eines Plasmaspritzgeräts Nozzle and nozzle assembly for a burner head of a plasma spray device
06/29/2000DE19849894C1 Gepulste Plasmaquelle für einen gasgefüllten Teilchenbeschleuniger Pulsed plasma source for a gas-filled particle accelerator
06/28/2000EP1014761A1 Duct piece for gas treatment device and device comprising such a duct piece
06/28/2000EP1013155A1 Plasma torch for plasma spraying equipment and pertaining anode
06/28/2000EP1012863A1 Glow plasma discharge device
06/28/2000EP1012113A1 Electrically assisted partial oxidation of light hydrocarbons by oxygen
06/28/2000CN1258131A Method and device for generating instantaneous high-energy current
06/27/2000US6080955 Plasma producer with a holder
06/27/2000US6080292 Monitoring apparatus for plasma process
06/27/2000US6080271 Plasma source for generating inductively coupled, plate-shaped plasma, having magnetically permeable core
06/27/2000US6080270 Compact microwave downstream plasma system
06/27/2000US6079426 Method and apparatus for determining the endpoint in a plasma cleaning process
06/27/2000US6079357 Plasma processing apparatus
06/27/2000US6079356 Reactor optimized for chemical vapor deposition of titanium
06/22/2000WO2000036638A1 Methods for running a high density plasma etcher to achieve reduced transistor device damage
06/21/2000EP1010184A1 Spherical inertial electrostatic confinement device as a tunable x-ray source
06/21/2000CN1053603C Plasma arc utilizing apparatus
06/20/2000US6077787 Method for radiofrequency wave etching
06/20/2000US6077759 Method of producing semiconductor device
06/20/2000US6077402 Method and apparatus for generating a plasma to sputter deposit a layer of material in the fabrication of semiconductor devices
06/20/2000US6077388 System and method for plasma etch on a spherical shaped device
06/20/2000US6077384 Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
06/20/2000US6076483 Plasma processing apparatus using a partition panel
06/15/2000WO2000035256A1 Device for producing a free cold plasma jet
06/15/2000WO2000034979A1 Hollow cathode array for plasma generation
06/15/2000DE19855655A1 Plasma treatment unit for wafers employs polyimide screws with raised heads avoiding sharp contours to reduce charge concentrations, minimize erosion and increase screw life
06/15/2000DE19855654A1 Wafer clamping ring used for plasma treatment chamber in IC manufacturing has erosion-resistant tips
06/15/2000CA2348653A1 Hollow cathode array for plasma generation
06/13/2000US6074519 Plasma etching apparatus having a sealing member coupling an upper electrode to an etching chamber
06/13/2000US6074516 High sputter, etch resistant window for plasma processing chambers
06/13/2000US6074514 High selectivity etch using an external plasma discharge
06/13/2000US6074512 Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners
06/13/2000US6073578 RF induction plasma source generating apparatus
06/13/2000US6073577 Electrode for plasma processes and method for manufacture and use thereof
06/08/2000WO2000032839A1 Enhanced plasma mode, method, and system for plasma immersion ion implantation
06/07/2000EP1006761A1 Plasma processor
06/07/2000EP1006760A2 Water-injection nozzle assembly with insulated front end
06/07/2000EP1006557A2 Apparatus for generating and utilizing magnetically neutral line discharge type plasma
06/07/2000CN1255554A Deposited film forming system and method thereof
06/07/2000CN1053230C Microwave enhanced CVD system and method under magnetic field
06/07/2000CN1053229C Microwave enhanced CVD system and method under magnetic field
06/06/2000US6072147 Plasma processing system
06/06/2000US6071372 RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls
06/06/2000US6071114 Method and apparatus for characterizing a combustion flame
06/02/2000WO2000032017A1 Plasma generator
05/2000
05/31/2000EP1004136A1 Plasma processing apparatus
05/30/2000US6069339 Dual flow nozzle shield for plasma-arc torch
05/30/2000US6069092 Etching silicon dioxide surface within heated chemical reactor using fluorohydrocarbon plasma generated by applying a radio frequency power to the lower electrode supporting the substrate
05/25/2000WO2000030148A1 Integrated power modules for plasma processing systems
05/25/2000DE19930925A1 Plasma generator has annular or tubular cathode mounted coaxially wrt. anode and open on both sides of its annular or tubular body; axial opening of cathode is adjustable
05/24/2000EP1002888A2 Method and apparatus for high frequency plasma treatment of a substrate
05/24/2000CN1254250A Plasma processing device and plasma processing method using said device
05/24/2000CN1052759C Fast quench reactor and method
05/23/2000US6066827 Electrode with emissive element having conductive portions
05/23/2000US6066826 Apparatus for plasma treatment of moving webs
05/23/2000US6066825 Methods and apparatus for low NOx emissions during the production of electricity from waste treatment systems
05/23/2000CA2034459C Low frequency radio frequency plasma spray deposition
05/18/2000WO2000028795A1 System and method for dual threshold sensing in a plasma arc torch
05/18/2000WO2000028794A1 Plasma arc torch tip providing a substantially columnar shield flow
05/17/2000EP1001449A1 Deposited film forming system and process
05/17/2000EP1001448A2 Thin film DC plasma processing system
05/17/2000EP1000528A1 Blow forward contact start plasma arc torch with distributed nozzle support
05/17/2000EP1000527A1 Method for generating energy by controlled plasma-induced nuclear fusion and device for the implementation of said method
05/16/2000US6063236 Vacuum processing system and method of removing film deposited on inner face of vacuum vessel in the vacuum processing system
05/16/2000US6063233 Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna
05/16/2000US6062163 Plasma initiating assembly
05/11/2000WO2000027170A1 Gas-filled particle accelerator with a pulsed plasma source
05/11/2000WO2000000992A3 Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber
05/11/2000DE19851628A1 Strip line arrangement for microwave-induced plasma sources for analytical atom spectrometry has gas lines integrated into dielectric substrate or basic metallization
05/11/2000DE19847848C1 Vorrichtung und Erzeugung angeregter/ionisierter Teilchen in einem Plasma Device and generating excited / ionized particles in a plasma
05/09/2000US6061006 Apparatus for sensing RF current delivered to a plasma with two inductive loops
05/09/2000US6060837 Method of and apparatus for minimizing plasma instability in an rf processor
05/09/2000US6060836 Plasma generating apparatus and ion source using the same
05/09/2000US6060680 Method of forming an oxide ceramic electrode in a transferred plasma arc reactor
05/09/2000US6059922 Plasma processing apparatus and a plasma processing method
05/04/2000WO2000025557A1 Microwave plasma generating apparatus, method for decomposing or ganic halide, and system for decomposing organic halide
05/04/2000WO2000025384A1 Oversized microwave load of high power direct current and use as calorimeter
05/04/2000WO2000025354A1 Polycrystalline silicon thin film forming method and thin film forming apparatus
05/04/2000WO2000025344A1 Method for monitoring alternating current discharge on a double electrode
05/04/2000DE19848636A1 Verfahren zur Überwachung einer Wechselspannungs-Entladung an einer Doppelelektrode A method for monitoring an AC voltage discharge on a double electrode
05/04/2000DE19847774A1 Verfahren zur Plasmabehandlung von stab- oder fadenförmigem Material A process for plasma treatment of rod- or thread-shaped material
05/03/2000EP0998174A1 Apparatus and method for supplying fluids to a plasma arc torch
05/03/2000EP0997926A2 Plasma treatment apparatus and method
05/02/2000US6057645 Plasma discharge device with dynamic tuning by a movable microwave trap
05/02/2000US6057524 Plasma arc utilizing apparatus
05/02/2000US6056848 Thin film electrostatic shield for inductive plasma processing
05/02/2000CA2029508C Plasma torch
04/2000
04/27/2000WO2000024235A1 Method for measuring negative ions in plasma, and plasma treating method and apparatus
04/27/2000WO2000024046A1 Plasma etching method
04/27/2000WO2000024031A1 Device for producing excited/ionized particles in a plasma