Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
03/2002
03/14/2002WO2001075932A3 An enhanced resist strip in a dielectric etcher using downstream plasma
03/14/2002WO2001045135A3 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
03/14/2002US20020031658 Nanosize particle coatings made by thermally spraying solution precursor feedstocks
03/14/2002US20020030038 System for precision control of the position of an atmospheric plasma
03/14/2002US20020029960 Sputtering apparatus and film manufacturing method
03/14/2002US20020029853 Methods for running a high density plasma etcher to achieve reduced transistor device damage
03/14/2002US20020029851 Plasma processing method and apparatus using dynamic sensing of a plasma environment
03/14/2002US20020029850 System for the plasma treatment of large area substrates
03/13/2002EP1187250A2 Microwave device
03/13/2002EP1187187A1 Plasma processing apparatus
03/13/2002EP1187172A2 Sputtering apparatus and film manufacturing method
03/13/2002EP1186353A2 Treatment of gas cylinders
03/13/2002EP1186211A1 Plasma torch comprising electrodes separated by an air gap and igniter incorporating same
03/13/2002EP1185833A1 Plasma torch incorporating a reactive priming fuse and igniter tube integrating such a torch
03/13/2002EP1185826A1 Emission control system
03/12/2002US6356097 Capacitive probe for in situ measurement of wafer DC bias voltage
03/12/2002US6356025 Shielded rf antenna
03/12/2002US6355908 Method and apparatus for focusing a laser
03/12/2002US6355573 Plasma processing method and apparatus
03/12/2002US6355312 Methods and apparatus for subjecting a rod-like or thread-like material to a plasma treatment
03/12/2002US6354903 Method of manufacture of a plasma reactor with curved shape for treating auto emissions
03/12/2002US6354733 System and method for determining combustion temperature using infrared emissions
03/12/2002US6354240 Plasma etch reactor having a plurality of magnets
03/07/2002WO2002019781A1 Electromagnetic radiation generation using a laser produced plasma
03/07/2002WO2002019380A1 Plasma processing
03/07/2002WO2000075393A3 Carbon plasma pulsed source
03/07/2002US20020028567 Film formation method and film formation apparatus
03/07/2002DE10129965A1 Verfahren und Einrichtung zum Schweißen Method and apparatus for welding
03/07/2002DE10041276A1 Joining process comprises forming an electric arc between a metal electrode to be melted and a workpiece to be joined, and surrounding the arc with a plasma arc and a protective gas
03/07/2002DE10041065A1 Device for exciting and generating ionized gas or plasma using high frequency resonance to trigger or excite ionization, comprises resonant circuit for generating trigger or excitation voltage in capacitor
03/07/2002DE10021071C1 Verfahren zur Entfernung von Stickoxiden aus einem Sauerstoff enthaltenden Rauchgasstrom A process for removing nitrogen oxides from a flue gas stream containing oxygen
03/06/2002EP1183709A1 Linearly extended device for large-surface microwave treatment and for large surface plasma production
03/06/2002EP1183447A1 Dielectric barrier gas reactors with non-axial flow
03/06/2002EP1101122B1 Quasi-hemispherical fabry-perot resonator and method for operating the same
03/06/2002EP0631711B1 System for characterizing ac properties of a processing plasma
03/05/2002US6353206 Plasma system with a balanced source
03/05/2002US6353201 Discharge electrode, RF plasma generation apparatus using the same, and power supply method
03/05/2002US6352627 Method and device for PVD coating
03/05/2002US6352050 Remote plasma mixer
03/05/2002US6352049 Plasma assisted processing chamber with separate control of species density
03/05/2002CA2270164C Apparatus and method for improved assembly concentricity in a plasma arc torch
02/2002
02/28/2002WO2001078188B1 Reconfigurable plasma electromagnetic waveguide
02/28/2002US20020025388 Apparatus includes a chamber, a wafer support, antennae, a control module for controlling the antennae and responsive to associated detectors, which are located in or adjacent the wafer
02/28/2002US20020025387 Process for the surface activation of materials
02/28/2002US20020023718 RF matching unit
02/28/2002US20020023589 Plasma generating apparatus
02/28/2002DE10037053A1 Verfahren und Vorrichtung zum Plasmaimpulsverfestigen eines metallischen Bauteils Method and apparatus for pulsed plasma solidifying a metallic component
02/27/2002EP1182912A1 Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
02/27/2002EP1182686A2 Method of hot switching a plasma tuner
02/27/2002EP0835518B1 Low inductance large area coil for an inductively coupled plasma source
02/26/2002US6351075 Plasma processing apparatus having rotating magnets
02/26/2002US6350961 Method and device for improving surfaces
02/26/2002US6350960 Parts-in-place safety reset circuit and method for contact start plasma-arc torch
02/26/2002US6350701 Etching system
02/26/2002US6350353 Apparatus comprising processing chamber, substrate support member disposed in the processing chamber having first power source coupled thereto, target disposed in the processing chamber, second power source, electromagnetic field source
02/26/2002US6350347 Plasma processing apparatus
02/26/2002US6350317 Linear drive system for use in a plasma processing system
02/21/2002WO2002015650A2 Externally excited torroidal plasma source
02/21/2002WO2002015649A2 Close coupled match structure for rf drive electrode
02/21/2002WO2002015222A2 Use of pulsed voltage in a plasma reactor
02/21/2002WO2001038035A3 Plasma torch and method for underwater cutting
02/21/2002US20020021952 Substrate processing apparatus
02/21/2002US20020021430 Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
02/21/2002US20020020691 Methods and apparatus for plasma processing
02/21/2002US20020020499 Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor
02/21/2002US20020020498 Plasma processing apparatus and plasma processing method
02/21/2002US20020020497 Plasma processing apparatus and plasma processing method
02/21/2002US20020020494 Plasma processing system and method
02/21/2002US20020020357 Apparatus and process for forming a deposited film
02/19/2002US6348158 Electron beam is injected into a plasma to a control an electron energy distribution; semiconductor etching
02/19/2002US6347602 Plasma processing apparatus
02/19/2002CA2246970C System and method for detecting nozzle and electrode wear
02/19/2002CA2088995C Plasma cycling sterilizing process
02/19/2002CA2023410C Device for generating x-radiation with a plasma source
02/14/2002WO2002013584A1 Monitoring and controlling separate plasma jets to achieve desired properties in a combined stream
02/14/2002WO2002013583A1 Apparatus and method of improved consumable alignment in material processing apparatus
02/14/2002WO2002013250A1 Radial antenna and plasma device using it
02/14/2002WO2002013249A1 Radial antenna and plasma processing apparatus comprising the same
02/14/2002WO2002013222A1 Improved apparatus and method for forming a high pressure plasma discharge column
02/14/2002WO2002012591A1 Method and device for plasma treatment of moving metal substrates
02/14/2002WO2001062053A3 Active control of electron temperature in an electrostatically shielded radio frequency plasma source
02/14/2002WO2001058840A3 Treatment of fluorocarbon feedstocks
02/14/2002US20020018025 Power supply antenna and power supply method
02/14/2002US20020017508 Monitoring and controlling separate plasma jets to achieve desired properties in a combined stream
02/14/2002DE10127035A1 Cleaning and odor neutralizing of air in rooms involves non-thermal, plasma-chemical conversion or passive boundary layer discharge using device made up of levels or cylindrical layers
02/14/2002CA2423138A1 Method and device for plasma treatment of moving metal substrates
02/13/2002EP1179854A1 Heterojunction compound semiconductor device
02/13/2002EP0868836A4 Fluorine assisted stripping and residue removal in sapphire downstream plasma asher
02/12/2002US6346915 Plasma processing method and apparatus
02/12/2002US6346685 Plasma arc torch
02/12/2002US6346428 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
02/12/2002CA2221624C Microwave-driven plasma spraying apparatus and method for spraying
02/07/2002WO2002010475A1 Ring-shaped high-density plasma source and method
02/07/2002WO2002009905A1 Method and device for hardening a metal component by plasma pulse technology
02/07/2002WO2001088220A8 System for precision control of the position of an atmospheric plasma jet
02/07/2002WO2001082329A3 Highly efficient compact capacitance coupled plasma reactor/generator and method
02/07/2002WO2001065895A3 Electrically controlled plasma uniformity in a high density plasma source
02/07/2002WO2001045134A3 Method and apparatus for producing uniform process rates
02/07/2002US20020015802 Method and apparatus for forming deposited film
02/07/2002US20020015797 Chemical vapor deposition and powder formation using thermal spray with near supercritical and supercritical fluid solutions