| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 04/23/2002 | US6377149 Magnetic field generator for magnetron plasma generation |
| 04/23/2002 | US6376978 Quartz antenna with hollow conductor |
| 04/23/2002 | US6376977 Silicon electrode plate |
| 04/23/2002 | US6376796 Plasma processing system |
| 04/23/2002 | US6376385 Method of manufacturing assembly for plasma reaction chamber and use thereof |
| 04/23/2002 | US6376028 Device and method for treating the inside surface of a plastic container with a narrow opening in a plasma enhanced process |
| 04/18/2002 | WO2002031858A2 Gas distribution apparatus for semiconductor processing |
| 04/18/2002 | WO2002030308A1 Plasma arc sur surgical device and method |
| 04/18/2002 | US20020043985 Method of measuring electron energy distribution in plasma region and apparatus for measuring the same |
| 04/18/2002 | US20020043937 Magnetron having a lowered oscillation frequency and processing equipment employing the same |
| 04/18/2002 | US20020043341 Plasma process apparatus |
| 04/18/2002 | CA2425257A1 Plasma arc surgical device and method |
| 04/17/2002 | EP1196938A2 Apparatus and method for exposing a substrate to plasma radicals |
| 04/16/2002 | US6373023 ARC discharge initiation for a pulsed plasma thruster |
| 04/16/2002 | US6373022 Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry |
| 04/16/2002 | US6372084 Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate |
| 04/11/2002 | WO2002029849A2 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber |
| 04/11/2002 | WO2002029848A2 Wafer area pressure control for plasma confinement |
| 04/11/2002 | WO2002029322A2 System and method for decongesting a waste converting apparatus |
| 04/11/2002 | WO2002029321A1 System and method for removing blockages in a waste converting apparatus |
| 04/11/2002 | WO2002028548A2 Method and apparatus for forming a coating |
| 04/11/2002 | WO2001037310A3 Method and apparatus for ionized physical vapor deposition |
| 04/11/2002 | US20020042205 Gas distribution apparatus for semiconductor processing |
| 04/11/2002 | US20020042204 Plasma processing apparatus with reduced parasitic capacity and loss in RF power |
| 04/11/2002 | US20020040889 Plasma furnace disposal of hazardous wastes |
| 04/11/2002 | US20020040766 Etching silicon oxide with fluorohydrocarbon or fluorine; controlling temperature |
| 04/11/2002 | US20020040765 Apparatus and methods for processing surface of semiconductor substrate |
| 04/10/2002 | EP1195793A2 Passive bipolar arc control system and method |
| 04/10/2002 | EP1195792A2 Film forming apparatus |
| 04/10/2002 | EP1195077A1 Anode electrode for plasmatron structure |
| 04/09/2002 | US6370486 System and method for determining combustion temperature using infrared emissions |
| 04/09/2002 | US6369763 Reconfigurable plasma antenna |
| 04/09/2002 | US6369350 Plasma-arc torch system with pilot re-attach circuit and method |
| 04/09/2002 | US6369349 Plasma reactor with coil antenna of interleaved conductors |
| 04/09/2002 | US6369348 Plasma reactor with coil antenna of plural helical conductors with equally spaced ends |
| 04/09/2002 | US6368678 Plasma processing system and method |
| 04/04/2002 | WO2002027755A2 Chamber configuration for confining a plasma |
| 04/04/2002 | WO2002003763A8 Vacuum plasma processor apparatus and method |
| 04/04/2002 | WO2001080290A3 A method of operating a dual chamber reactor with neutral density decoupled from ion density |
| 04/04/2002 | WO2001072093A3 Plasma accelerator arrangement |
| 04/04/2002 | US20020039626 Formation of said plasma is performed by applying an RF power and a DC power, and said DC power is applied to an electrode carrying the deposition target object. |
| 04/04/2002 | US20020038692 Plasma Processing apparatus |
| 04/04/2002 | US20020038691 Plasma processing system |
| 04/04/2002 | US20020038632 Plasma treatment method and plasma treatment apparatus |
| 04/04/2002 | DE10044764A1 Arrangement for plasma welding and/or plasma cutting has nozzle opening with high temperature resistant surface with electrical conducting properties at least near plasma jet outlet |
| 04/04/2002 | DE10042629A1 Igniter for vapor deposition arc, includes source supplying ions between cathode and anode |
| 04/03/2002 | EP1194018A2 Inter-torch plasma transfer device |
| 04/03/2002 | EP1192953A2 Power system for sterilization systems employing low frequency plasma |
| 04/03/2002 | EP1192637A1 Method and device for electronic cyclotronic resonance plasma deposit of carbon nanofibre layers in fabric form and resulting fabric layers |
| 04/02/2002 | US6365867 Plasma arc torch with coaxial wire feed |
| 04/02/2002 | US6365063 Plasma reactor having a dual mode RF power application |
| 04/02/2002 | US6364958 Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges |
| 04/02/2002 | US6363882 Lower electrode design for higher uniformity |
| 03/28/2002 | WO2002026005A1 Plasma torch, especially a plasma positive pole torch |
| 03/28/2002 | WO2002026004A1 Device for producing a plasma, ionisation method, use of said method and production processes using said device |
| 03/28/2002 | WO2002025696A2 Reducing deposition of process residues on a surface in a chamber |
| 03/28/2002 | WO2002025693A1 Method and device for treating surfaces using a glow discharge plasma |
| 03/28/2002 | WO2002024819A1 Device and method for converting carbon containing feedstock into carbon containing materials, having a defined nanostructure |
| 03/28/2002 | WO2001091523A3 Extreme ultraviolet source based on colliding neutral beams |
| 03/28/2002 | US20020037374 Applying a supply voltage to the two electrodes, characterized in that supply voltage is an alternating current voltage whose amplitude and frequency are adapted in order to maintain portion of the components of the gas in the excited state |
| 03/28/2002 | US20020036187 Plasma processing device |
| 03/28/2002 | US20020036133 Magnetron sputtering source |
| 03/28/2002 | US20020035918 Explosive-triggered RF beam source |
| 03/27/2002 | EP1191569A2 Method for reducing plasma-induced damage |
| 03/27/2002 | EP1191121A1 Radioactive medical implant and method of manufacturing |
| 03/27/2002 | EP1190605A1 Microwave plasma burner |
| 03/27/2002 | EP1190604A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower |
| 03/27/2002 | EP1190436A1 Plasma processor with coil responsive to variable amplitude rf envelope |
| 03/27/2002 | EP1190435A1 A plasma reaction chamber component having improved temperature uniformity |
| 03/27/2002 | EP1036488B1 Method and device for producing extreme ultraviolet and soft x-rays from a gaseous discharge |
| 03/26/2002 | USRE37608 Plasma torch electronic pulsing circuit |
| 03/26/2002 | US6362450 Gas flow for plasma arc torch |
| 03/26/2002 | US6362449 Very high power microwave-induced plasma |
| 03/26/2002 | US6362110 Enhanced resist strip in a dielectric etcher using downstream plasma |
| 03/26/2002 | US6361707 Apparatus and methods for upgraded substrate processing system with microwave plasma source |
| 03/26/2002 | US6361668 Sputtering installation with two longitudinally placed magnetrons |
| 03/26/2002 | US6360686 Plasma reactor with a deposition shield |
| 03/25/2002 | CA2320557A1 Radioactive medical implant and method of manufacturing |
| 03/21/2002 | WO2002023960A1 Electrode for glow-discharge atmospheric plasma treatment |
| 03/21/2002 | WO2002022240A1 The plasma assisted catalytic treatment of gases |
| 03/21/2002 | WO2002009259B1 Electrodynamic field generator |
| 03/21/2002 | WO2001093315A3 Methods and apparatus for plasma processing |
| 03/21/2002 | WO2001063980A3 Direct current plasma arc torch with increasing volt-ampere characteristic |
| 03/21/2002 | US20020034590 Average current density of the plasma generated is set to satisfy a given formula; dielectric between electrodes, and an electrical power source for alternating current or pulsed current; monitoring current or voltage waveform |
| 03/21/2002 | US20020033386 Device with a plasma torch |
| 03/21/2002 | DE10044867A1 Explosivstoffgetriebene RF-Strahlenquelle Explosive-Driven RF beam source |
| 03/20/2002 | EP1189492A1 Explosive activated RF source |
| 03/20/2002 | EP1189491A1 Apparatus for detecting plasma anomalous discharge and method of detecting the same |
| 03/20/2002 | EP1189258A2 Vacuum arc evaporation apparatus |
| 03/20/2002 | EP1188847A2 Plasma processing method and apparatus |
| 03/20/2002 | EP1188801A1 Device and method for converting carbon containing feedstock into carbon containing materials, having a defined structure |
| 03/20/2002 | EP1188180A1 Improvements relating to plasma etching |
| 03/20/2002 | CN1340990A Plasma producing device |
| 03/20/2002 | CN1340913A Method for heat conversion plasma tuner |
| 03/19/2002 | US6359250 RF matching network with distributed outputs |
| 03/19/2002 | US6358573 Mixed frequency CVD process |
| 03/19/2002 | US6358375 Method and device for producing fullerenes |
| 03/19/2002 | US6358361 Plasma processor |
| 03/19/2002 | US6357308 Plasma probe and method for making same |
| 03/14/2002 | WO2002021567A1 Plasma enhanced gas reactor |