Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
06/2002
06/27/2002US20020079294 Plasma processing apparatus
06/27/2002US20020078895 Plasma treatment apparatus
06/27/2002CA2431017A1 Injector and method for prolonged introduction of reagents into plasma
06/26/2002EP1217683A2 Microwave window
06/26/2002EP1216605A1 Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis
06/26/2002EP1216493A1 Power splitter for plasma device
06/26/2002EP1216106A1 Improved apparatus and method for growth of a thin film
06/26/2002EP1171900A4 Large area atmospheric-pressure plasma jet
06/25/2002US6411490 Integrated power modules for plasma processing systems
06/25/2002US6410880 Induction plasma torch liquid waste injector
06/25/2002US6410879 Device with a plasma torch
06/25/2002US6410448 Etching a wafer in a gas apparatus having upper, lower and peripheral electrodes attached to high and low frequency power sources and magnets to control plasma gases; high density semiconductors
06/25/2002US6409891 Low energy plasma cleaning method for cryofilms
06/25/2002US6409851 Microwave plasma chemical synthesis of ultrafine powders
06/25/2002US6408786 Semiconductor processing equipment having tiled ceramic liner
06/25/2002CA2366175A1 Method of treatment with a microwave plasma
06/20/2002WO2002049088A1 Sheet type plasma processing device, method of assembling and disassembling electrode for plasma processing device, and exclusive jig for the method
06/20/2002WO2002048515A1 Plasma reactor gas processing
06/20/2002WO2002047850A1 Treating molten metals by moving electric arc
06/20/2002WO2002015650A3 Externally excited torroidal plasma source
06/20/2002WO2002005308A3 A plasma reactor having a symmetric parallel conductor coil antenna
06/20/2002US20020076368 Individually energizable electrode segments are progressively smaller in size in the exhaust flow direction
06/20/2002US20020076367 Plasma processing apparatus
06/20/2002US20020076366 Conductor-single structural dielectric barrier- exhaust channel-conductor repeating arrangement
06/20/2002US20020076363 Scaleable inter-digitized tine non-thermal plasma reactor
06/20/2002US20020074946 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide
06/20/2002US20020074226 Film forming apparatus
06/20/2002US20020074221 Reacting the methane containing gas stream with a plasma discharge generated between two electrodes for conversion to acetylene, methanol or ethane
06/20/2002US20020073925 Apparatus and method for exposing a substrate to plasma radicals
06/20/2002DE10035177C2 Verfahren zur plasmagestützten Behandlung der Innenfläche eines Hohlkörpers und Verwendung desselben Of the same method for the plasma assisted treatment of the inner surface of a hollow body and using
06/19/2002EP1215947A2 Scaleable inter-digitized tine non-thermal plasma reactor
06/19/2002EP1215717A1 Magnetron plasma processing apparatus
06/19/2002EP1215710A2 Method and apparatus for vacuum processing, semiconductor device manufacturing method and semiconductor device
06/19/2002EP1214732A1 Semiconductor processing equipment having radiant heated ceramic liner
06/19/2002CN1354275A Electric arc evaporimeter, method for driving electric arc evaporimeter and ion electro plating equipment
06/18/2002US6407359 Method of producing individual plasmas in order to create a uniform plasma for a work surface, and apparatus for producing such a plasma
06/18/2002US6407358 Process and unit for plasma-arc working with a gas having controlled O2 and N2 contents
06/18/2002US6406925 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing
06/18/2002US6406759 Remote exposure of workpieces using a recirculated plasma
06/18/2002US6406599 Magnetron with a rotating center magnet for a vault shaped sputtering target
06/13/2002WO2002047445A2 Chemical plasma cathode
06/13/2002WO2002046839A2 Laser plasma from metals and nano-size particles
06/13/2002WO2002046739A1 A novel method for chromatographic finger printing and standardization of single medicines and formulations
06/13/2002WO2002029849A3 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber
06/13/2002WO2002015222A3 Use of pulsed voltage in a plasma reactor
06/13/2002WO2002009162A3 Heated substrate support assembly and method
06/13/2002US20020071117 Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method
06/13/2002US20020070670 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide
06/13/2002US20020070669 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide
06/13/2002US20020070647 Nanostructure plasma source
06/13/2002US20020070353 EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
06/13/2002US20020069968 Suspended gas distribution manifold for plasma chamber
06/13/2002US20020069828 Chemical plasma cathode
06/13/2002US20020069827 Allows the quality of milk supplied by each animal to be accurately monitored and also allows the health of the udders of the milked animals to be monitored
06/13/2002DE10061828A1 Introducing material into plasma beam involves feeding material in liquid state via capillaries into plasma beam or into stimulation zone for generating plasma
06/13/2002CA2424363A1 A novel method for chromatographic finger printing and standardization of single medicines and formulations
06/12/2002EP1213950A2 Improved and modified plasma torch for enhanced enthalpy delivery
06/12/2002EP1213749A1 Plasma processing apparatus and method of plasma processing
06/12/2002EP1212777A1 Ion beam vacuum sputtering apparatus and method
06/12/2002EP1212775A1 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof
06/12/2002EP1212692A1 Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
06/12/2002EP1212611A2 Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
06/12/2002CN1353859A Apparatus for improving plasmia distribution and performance in inductively coupled plasma
06/11/2002US6404134 Plasma processing system
06/11/2002US6404089 Electrodynamic field generator
06/11/2002US6403915 Electrode for a plasma arc torch having an enhanced cooling configuration
06/11/2002US6403490 Method of producing a plasma by capacitive-type discharges with a multipole barrier, and apparatus for implementing such a method
06/11/2002US6403167 Method for surface modification of 3-dimensional bulk polymers
06/11/2002US6402902 Apparatus and method for a reliable return current path for sputtering processes
06/11/2002US6402885 Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma
06/11/2002US6401652 Plasma reactor inductive coil antenna with flat surface facing the plasma
06/06/2002WO2002045126A1 Ion source
06/06/2002WO2002044674A1 Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy
06/06/2002WO2002043781A1 Method and device for treating the surfaces of items
06/06/2002US20020068012 Sterilization system employing a switching module adapted to pulsate the low frequency power applied to a plasma
06/06/2002US20020067229 Microwave window
06/06/2002US20020067133 Method for lighting an inductively coupled plasma at low pressure
06/06/2002US20020066668 Sputter depositing a thin film of nitinol metal material onto the substrate comprising silicon dioxide over silicon
06/06/2002US20020066537 Plasma reactor
06/06/2002US20020066536 Plasma processing apparatus
06/06/2002US20020066535 Exhaust system for treating process gas effluent
06/06/2002US20020066323 Plasma probe and method for making same
06/06/2002DE10121188A1 Verfahren zum Entfernen eines restlichen Metall enthaltenden Polymermaterials und von ionenimplantiertem Photoresistmaterial in einem stromabwärtigen atmosphärischen Plasmabearbeitungssystem A method of removing a residual polymeric material containing metal and ion-implanted photoresist material in a downstream atmospheric plasma processing system
06/05/2002EP1210724A1 Method of determining etch endpoint using principal components analysis of optical emission spectra
06/05/2002EP1147692B1 Wear part for arc welding torch produced in alloyed copper
06/04/2002US6399927 Method and device for high frequency treatment of products, related materials and uses
06/04/2002US6399507 Stable plasma process for etching of films
06/04/2002US6399159 High-efficiency plasma treatment of polyolefins
06/04/2002US6399151 For depositing a diamond thick film on a large substrate such as a silicon wafer; direct current plasma assisted chemical vapor deposition; includes holder for fixing the cathode to the chamber and has a cooling line for the cathode
06/04/2002US6397776 Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators
06/04/2002US6397775 Deposited film forming system and process
05/2002
05/30/2002WO2002043454A1 Plasma powder welding torch
05/30/2002WO2002043453A1 Configurable nozzle baffle apparatus and method
05/30/2002WO2002043452A1 Plasma generating apparatus using microwave
05/30/2002WO2002043438A2 Systems and methods for ignition and reignition of unstable electrical discharges
05/30/2002WO2001095352A3 Apparatus and method for accelerating electrons in a plasma reactor
05/30/2002WO2001059804A3 Device and method for coupling two circuit components which have different impedances
05/30/2002US20020063530 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide
05/29/2002EP1209721A2 Inductive type plasma processing chamber
05/29/2002EP1208583A1 Plasma reactor for treating substrates having large surfaces