Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
05/2002
05/29/2002EP0988406B1 Method for making a non-sticking diamond like nanocomposite
05/28/2002US6396214 Device for producing a free cold plasma jet
05/28/2002US6396213 Apparatus for generating a compound plasma configuration with multiple helical conductor elements
05/28/2002US6396211 Microwave discharge type electrostatic accelerator having upstream and downstream acceleration electrodes
05/28/2002US6395238 Method and apparatus utilizing ethanol in non-thermal plasma treatment of effluent gas
05/28/2002US6395128 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
05/28/2002US6394026 Low contamination high density plasma etch chambers and methods for making the same
05/23/2002WO2002041672A1 Apparatus for fixing an electrode in plasma polymerizing apparatus
05/23/2002WO2002041355A2 Plasma processing comprising three rotational motions of an article being processed
05/23/2002WO2002040742A1 Method and device for atmospheric plasma processing
05/23/2002WO2002003415A3 Switched uniformity control
05/23/2002US20020061656 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
05/23/2002US20020060523 Plasma processing apparatus
05/23/2002US20020060207 Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator
05/23/2002US20020059981 Lower electrode design for higher uniformity
05/23/2002CA2435852A1 A method for plasma treatment under the atmospheric pressure and an equipment therefor
05/22/2002EP1207725A2 Edge-connected non-thermal plasma exhaust after-treatment device
05/22/2002EP1207550A1 Method of etching and method of plasma treatment
05/22/2002EP0807964A4 Device for treating planar elements with a plasma jet
05/22/2002CN1350284A System and method for controlling passive bipolar electric arc
05/21/2002US6393375 System and method for determining combustion temperature using infrared emissions
05/21/2002US6392189 Axial feedstock injector for thermal spray torches
05/21/2002US6392187 Apparatus and method for utilizing a plasma density gradient to produce a flow of particles
05/21/2002US6391789 Dry etching system for patterning target layer at high reproducibility and method of dry etching used therein
05/21/2002US6390020 Dual face shower head magnetron, plasma generating apparatus and method of coating substrate
05/21/2002US6390019 Chamber having improved process monitoring window
05/21/2002US6390018 Microwave plasma treatment apparatus
05/16/2002WO2002039791A1 Atmospheric plasma method for treating sheet electricity conducting materials and device therefor
05/16/2002WO2002039495A1 Plasma processing device and method of assembling the plasma processing device
05/16/2002WO2002039493A1 Plasma processing device and exhaust ring
05/16/2002WO2002038827A1 Plasma electroplating
05/16/2002WO2001084591A3 Pulsed rf power delivery for plasma processing
05/16/2002WO2001078191A9 A reconfigurable plasma antenna
05/16/2002US20020057754 Fuel pellets for thermonuclear reactions
05/16/2002US20020056416 With calcium carbonate; papermaking; continuous process
05/16/2002CA2424891A1 Atmospheric plasma method for treating sheet electricity conducting materials and device therefor
05/15/2002EP1205962A1 Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method
05/15/2002EP1204986A1 System and method for providing implant dose uniformity across the surface of a substrate
05/15/2002EP1204985A1 Implanting system and method
05/15/2002CN1349099A 输电系统 Transmission System
05/14/2002US6389106 Method and device for producing extreme ultraviolet and soft X-rays from a gaseous discharge
05/14/2002US6388632 Slot antenna used for plasma surface processing apparatus
05/14/2002US6388624 Parallel-planar plasma processing apparatus
05/14/2002US6388381 Constricted glow discharge plasma source
05/14/2002US6388225 Plasma torch with a microwave transmitter
05/14/2002US6387288 High selectivity etch using an external plasma discharge
05/14/2002US6387208 Inductive coupling plasma processing apparatus
05/14/2002US6386140 Plasma spraying apparatus
05/14/2002US6385977 ESRF chamber cooling system and process
05/10/2002WO2002037528A2 Magnetron with a rotating center magnet for a vault shaped sputtering target
05/10/2002WO2001006533A3 Pulsed magnetic opening of electron resonance ion sources for the generation of short, high-current pulses of highly charged ions or electrons
05/09/2002US20020053557 Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis
05/08/2002EP1204134A2 RF plasma processor
05/08/2002EP1204002A2 EUV lithography system with thin-film coating for protection from laser-produced plasma
05/08/2002EP1203441A1 Radio frequency power source for generating an inductively coupled plasma
05/08/2002EP1203396A1 Device and method for etching a substrate using an inductively coupled plasma
05/07/2002US6384540 System for high power RF plasma processing
05/07/2002US6383953 Apparatus for fabricating semiconductor device and method for fabricating semiconductor using the same
05/07/2002US6383333 Protective member for inner surface of chamber and plasma processing apparatus
05/02/2002WO2002035895A2 A method and an apparatus for excitation of a plasma
05/02/2002WO2002035576A1 An atmospheric pressure plasma assembly
05/02/2002WO2002035575A1 Device for treating gas with plasma
05/02/2002WO2002035092A1 Method for controlling a thrust vector of an electric propulsion engine and device for carrying out said method
05/02/2002WO2002034669A1 Method and device for electronic cyclotron resonance plasma deposit of single-wall carbon nanotubes and resulting nanotubes
05/02/2002WO2002015649A3 Close coupled match structure for rf drive electrode
05/02/2002WO2001082328A3 Magnetic barrier for plasma in chamber exhaust
05/02/2002WO2001003159A9 Gas distribution apparatus for semiconductor processing
05/02/2002US20020052114 Enhanced resist strip in a dielectric etcher using downstream plasma
05/02/2002US20020050575 Ultraviolet lamp system and methods
05/02/2002US20020050323 Device for the plasma treatment of gases
05/02/2002EP1202614A2 Electrode with brazed separator and method of making same
05/02/2002EP1202117A1 Exposure method and exposure apparatus
05/02/2002EP1201254A2 Sterilization power system employing low frequency plasma
05/02/2002EP1200981A1 Gas distribution apparatus for semiconductor processing
05/02/2002DE10057676C1 Plasma-powder welder with supply tube and powder channels surrounding nozzle is designed for most uniform possible powder introduction irrespective of attitude
05/02/2002CA2426545A1 A method and an apparatus for excitation of a plasma
04/2002
04/30/2002US6380684 Plasma generating apparatus and semiconductor manufacturing method
04/30/2002US6380507 Apparatus for feeding waste matter into a plasma arc furnace to produce reusable materials
04/30/2002US6379491 Plasma chamber with erosion resistive securement screws
04/30/2002US6379419 Forming fines with plasma arc systems, forming an arc injection of gas, transformation of vapors
04/30/2002US6378290 High-frequency ion source
04/25/2002WO2002033728A1 Device and method for the etching of a substrate by means of an inductively coupled plasma
04/25/2002WO2001087021A3 Plasma processing method and apparatus
04/25/2002US20020049127 Glass, plasma resisting component, component for electromagnetic wave-transparent window and plasma processing apparatus
04/25/2002US20020047673 Propulsion device and method of generating shock waves
04/25/2002US20020047544 Plasma generating apparatus
04/25/2002US20020047543 Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus
04/25/2002US20020047539 Process and switching arrangement for pulsing energy introduction into magnetron discharges
04/25/2002US20020047536 Plasma processing apparatus
04/25/2002US20020046993 Electrothermal gun for direct electrothermal-physical conversion of precursor into nanopowder
04/25/2002US20020046989 RF matching network with distributed outputs
04/25/2002US20020046987 Device and method for etching a substrate by using an inductively coupled plasma
04/25/2002US20020046945 High performance magnetron for DC sputtering systems
04/25/2002US20020046941 Anode, evaporation source, electrode as a cathode and a current control unit
04/25/2002US20020046808 Plasma processing apparatus
04/25/2002US20020046807 Plasma processing apparatus
04/25/2002DE10141844A1 Hochfrequenz-Anpassungseinheit RF matching unit
04/25/2002DE10060069C1 Stress-free microwave window mounting, comprises outer clamped flange, into which window is adhered or welded by its thermoplastic dielectric coating
04/24/2002EP1198822A2 New methodologies to reduce process sensitivity to the chamber condition
04/24/2002EP1198821A1 Techniques for improving etch rate uniformity