Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
08/2002
08/29/2002DE10028722A1 Einrichtung für die Formierung von Plasmaströmen mit erhöhten energetischen Parametern Means for the formation of plasma streams with elevated energetic parameters
08/28/2002EP1080138B1 Plasma surface treatment of silicone hydrogel contact lenses
08/27/2002US6441553 Electrode for glow-discharge atmospheric-pressure plasma treatment
08/27/2002US6441552 Apparatus and methods for generating persistent ionization plasmas
08/27/2002US6440260 Plasma monitoring method and semiconductor production apparatus
08/27/2002US6439155 Remote plasma generator with sliding short tuner
08/27/2002US6439154 Plasma processing apparatus for semiconductors
08/22/2002WO2002065820A1 Apparatus for generating low temperature plasma at atmospheric pressure
08/22/2002WO2002065533A1 Plasma apparatus and production method thereof
08/22/2002WO2002065532A1 Work treating method and treating device
08/22/2002WO2002065531A1 Focus ring for semiconductor treatment and plasma treatment device
08/22/2002WO2002064290A1 Plasma torch for heating molten steel
08/22/2002WO2001080281A3 Stand alone plasma vacuum pump
08/22/2002US20020114123 Plasma processing apparatus for processing semiconductor wafer using plasma
08/22/2002US20020113738 High frequency power source, plasma processing apparatus, inspection method for plasma processing apparatus, and plasma processing method
08/22/2002US20020113151 Methods and apparatus for spray forming, atomization and heat transfer
08/22/2002US20020112819 Remote plasma generator with sliding short tuner
08/22/2002US20020112794 Microwave plasma chemical synthesis of ultrafine powders
08/22/2002DE10104614A1 Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung Plasma system and method for generating a functional coating
08/22/2002DE10104613A1 Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung Plasma system and method for generating a functional coating
08/21/2002EP1233660A2 Powdered metal emissive elements
08/21/2002EP1232827A2 Improved gas flow for plasma arc torch
08/21/2002EP1232676A1 Method and apparatus to facilitate restriking in an arc-furnace
08/21/2002EP1232517A1 Plasma focus light source with improved pulse power system
08/21/2002EP1232513A1 Stabilized oscillator circuit for plasma density measurement
08/21/2002CN1365596A Apparatus for detecting plasma anomalous discharge and method of detecting the same
08/21/2002CN1365534A Radio frequency power source for genrating an inducively coupled plasma
08/20/2002US6436304 Plasma processing method
08/15/2002WO2002063667A1 Plasma treatment device and plasma treatment method
08/15/2002WO2002063650A1 Plasma fusion splicer electrode
08/15/2002WO2002063066A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
08/15/2002WO2002047445A3 Chemical plasma cathode
08/15/2002WO2002025696A3 Reducing deposition of process residues on a surface in a chamber
08/15/2002WO2001071185A3 Plasma accelerator arrangement
08/15/2002WO2001045135A9 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
08/15/2002WO2001038035A9 Plasma torch and method for underwater cutting
08/15/2002US20020110648 Diamond film depositing apparatus and method thereof
08/15/2002US20020109104 Method and apparatus to produce ions and nanodrops from Taylor cones at reduced pressure
08/15/2002US20020108933 Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
08/15/2002US20020108712 Apparatus for plasma processing
08/15/2002CA2437322A1 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
08/14/2002EP1231524A2 Adaptive plasma characterization system
08/14/2002EP1230668A2 Method and apparatus for producing uniform process rates
08/14/2002EP1230667A2 Method and apparatus for controlling the volume of a plasma
08/14/2002EP1230666A1 Plasma processing systems and method therefor
08/14/2002EP1230665A1 Plasma processing system with dynamic gas distribution control
08/14/2002EP1230663A1 Temperature control system for plasma processing apparatus
08/14/2002EP1230414A1 Method and device for plasma coating surfaces
08/14/2002DE10104615A1 Verfahren zur Erzeugung einer Funktionsbeschichtung mit einer HF-ICP-Plasmastrahlquelle A method for producing a functional coating with a RF ICP plasma beam source
08/14/2002DE10041276C2 Plasma-MSG-Fügeverfahren und Brenner hierfür Plasma-MSG-joining method and burner for this
08/14/2002CN1363721A Processing method and apparatus for plasma
08/14/2002CN1363718A Processing apparatus for plasma
08/13/2002US6433494 Inductional undulative EH-accelerator
08/13/2002US6433480 Direct current high-pressure glow discharges
08/13/2002US6433300 Electrode interface bonding
08/13/2002US6433297 Plasma processing method and plasma processing apparatus
08/13/2002US6432831 Gas distribution apparatus for semiconductor processing
08/13/2002US6432730 Plasma processing method and apparatus
08/13/2002US6432492 HF-Plasma coating chamber or PECVD coating chamber, its use and method of plating CDs using the chamber
08/13/2002US6432261 Plasma etching system
08/13/2002US6432260 Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof
08/13/2002US6432259 Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates
08/13/2002US6432208 Plasma processing apparatus
08/13/2002US6431114 Method and apparatus for plasma processing
08/13/2002US6431113 Plasma vacuum substrate treatment process and system
08/13/2002CA2273382C Nozzle for use in a torch head of a plasma torch apparatus
08/08/2002WO2002062115A1 Plasma installation and method for producing a functional coating
08/08/2002WO2002062114A1 Plasma unit and method for generation of a functional coating
08/08/2002WO2002062113A1 Impulsive source of carbon plasma
08/08/2002WO2002062112A2 Magnetic and electrostatic confinement of plasma in a field reversed configuration
08/08/2002WO2002062111A2 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
08/08/2002WO2002061797A2 Icp window heater integrated with faraday shield or floating electrode between the source power coil and the icp window
08/08/2002WO2002061171A1 Method for the production of a functional coating by means of a high-frequency icp plasma beam source
08/08/2002WO2002060828A2 Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
08/08/2002WO2002027755A3 Chamber configuration for confining a plasma
08/08/2002US20020104832 Plasma processing apparatus and method
08/08/2002US20020104753 Electric supply unit and method for reducing arcing during sputtering
08/08/2002US20020104751 Method and apparatus for ionized physical vapor deposition
08/08/2002US20020104482 Plasma-assisted processing apparatus
08/08/2002CA2437360A1 Magnetic and electrostatic confinement of plasma in a field reversed configuration
08/07/2002EP1228522A1 Vacuum circuit for a device for treating a receptacle with low pressure plasma
08/07/2002CN1363111A Apparatus for evaluating plasma polymerized polymer layer using UV spectrometer
08/07/2002CN1088765C Plasma treatment apparatus
08/06/2002US6429400 Plasma processing apparatus and method
08/06/2002US6429399 Discharge tube for a local etching apparatus and a local etching apparatus using the discharge tube
08/06/2002CA2268084C Integral spring consumables for plasma arc torch using contact starting system
08/01/2002WO2002059934A2 Plasma generation apparatus and method
08/01/2002WO2002058452A2 Device for plasma chemical treatment of water in a medium of electric non-self-maintained glow discharge
08/01/2002WO2002058449A2 Activated water apparatus and methods
08/01/2002US20020102858 Low contamination high density plasma etch chambers and methods for making the same
08/01/2002US20020101162 Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide
08/01/2002US20020100751 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
08/01/2002US20020100557 ICP window heater integrated with faraday shield or floating electrode between the source power coil and the ICP window
08/01/2002US20020100555 Linear drive system for use in a plasma processing system
08/01/2002CA2433142A1 Activated water apparatus and methods
07/2002
07/31/2002EP1226343A1 Low power compact plasma fuel converter
07/31/2002EP1102616A4 Esrf coolant degassing process
07/31/2002CN2503687Y Massenfilter for manufacturing superhard film ionization source device
07/31/2002CN1362003A Apparatus for plasma treatment using capillary electrode discharge plasma shower
07/31/2002CN1361919A Stabilized oscillator circuit for plasma density measurement