H05H 1 - Generating plasma; Handling plasma

Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
12/2002
12/27/2002	WO2002102519A1 Adjustable injector assembly for melted powder coating
12/27/2002	WO2002089612B1 Method and apparatus for non-thermal pasteurization
12/27/2002	WO2002003763A3 Vacuum plasma processor apparatus and method
12/26/2002	US20020197877 Plasma treating apparatus, plasma treating method and method of manufacturing semiconductor device
12/26/2002	US20020195950 Barrier coatings produced by atmospheric glow discharge
12/26/2002	US20020195330 Low frequency power feedback control system for controllably adjusting a power applied to a low frequency plasma within a vacuum chamber of the sterilization system to remove gas or vapor species from the article
12/26/2002	US20020195202 Electrode member for plasma treating apparatus, plasma treating apparatus and plasma treating method
12/25/2002	CN2528188Y Positioning and support device for filament array load
12/25/2002	CN2527570Y Microplasma metal surface intensified treatment device
12/24/2002	US6498317 Process for operating a plasma arc torch
12/24/2002	US6498316 Plasma torch and method for underwater cutting
12/24/2002	US6497802 Self ionized plasma sputtering
12/19/2002	WO2002102122A1 Star pinch x-ray and extreme ultraviolet photon source
12/19/2002	WO2002101784A1 Plasma processor
12/19/2002	WO2002086932B1 Magnetic mirror plasma source
12/19/2002	WO2002078407A3 Neutral particle beam processing apparatus
12/19/2002	WO2002078040A3 Neutral particle beam processing apparatus
12/19/2002	US20020192972 Plasma processing
12/19/2002	US20020192971 Plasma processing apparatus and processing method using the same, and manufacturing method of semiconductor device
12/19/2002	US20020192475 Placing tetraethoxysilane precursor and oxygen in plasma state, decomposing tetraethoxysilane gas into active species, reacting with oxygen ions or radicals in the plasma, depositing active species on substrate
12/19/2002	US20020192394 Thin polycrystalline silicon film forming method and thin film forming apparatus
12/19/2002	US20020190657 Wafer area pressure control for plasma confinement
12/19/2002	US20020189761 Use of pulsed grounding source in a plasma reactor
12/19/2002	US20020189544 Use of pulsed grounding source in a plasma reactor
12/18/2002	CN1385877A Cold-cathode fluorescent plant lamp
12/17/2002	US6495842 Implantation of the radioactive 32P atoms
12/17/2002	US6495769 Wiring board and production method thereof, and semiconductor apparatus
12/17/2002	US6495457 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds
12/12/2002	WO2002099841A1 High performance magnetron for dc sputtering systems
12/12/2002	WO2002099840A2 Inductively-coupled plasma processing system
12/12/2002	WO2002099836A1 Apparatus and method using capillary discharge plasma shower for sterilizing and disinfecting articles
12/12/2002	WO2002086937B1 Dipole ion source
12/12/2002	WO2002078041A3 Neutral particle beam processing apparatus
12/12/2002	US20020187066 Apparatus and method using capillary discharge plasma shower for sterilizing and disinfecting articles
12/12/2002	US20020186815 Star pinch plasma source of photons or neutrons
12/12/2002	US20020186018 Apparatus and method for measuring substrate biasing during plasma processing of a substrate
12/12/2002	US20020185477 Process for operating a plasma arc torch
12/12/2002	US20020185475 Tip gas distributor
12/12/2002	US20020185229 Inductively-coupled plasma processing system
12/12/2002	US20020185227 Plasma processor method and apparatus
12/11/2002	EP1264084A1 Method and device for carrying out the plasma-induced reduction of the soot emission of diesel engines
12/11/2002	EP1264005A1 Plasma polymerization system and method for plasma polymerization
12/11/2002	EP1263702A2 Treatment of fluorocarbon feedstocks
12/10/2002	US6492774 Wafer area pressure control for plasma confinement
12/10/2002	US6492613 System for precision control of the position of an atmospheric plasma
12/10/2002	US6491742 ESRF coolant degassing process
12/10/2002	US6490994 Plasma processing apparatus
12/05/2002	WO2002098191A1 Plasma-arc torch system with pilot re-attach circuit and method
12/05/2002	WO2002098190A1 Plasma torch
12/05/2002	WO2002097937A1 Inductively coupled high-density plasma source
12/05/2002	WO2002097855A1 Plasma processing apparatus and method
12/05/2002	WO2002097854A2 Plasma reactor
12/05/2002	WO2002097158A1 Application of dense plasmas generated at atmospheric pressure for treating gas effluents
12/05/2002	WO2002096956A1 Continuous processing apparatus by plasma polymerization with vertical chamber
12/05/2002	WO2002096800A1 Method for producing fullerene-containing carbon and device for carrying out said method
12/05/2002	WO2002096591A1 Postcombustion removal of n2o in a pulsed corona reactor
12/05/2002	WO2002080219B1 Stacked rf excitation coil for inductive plasma processor
12/05/2002	WO2001050498A9 Linear drive system for use in a plasma processing system
12/05/2002	WO2001020953A9 Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis
12/05/2002	US20020181655 Laser accelerator produced colliding ion beams fusion device
12/05/2002	US20020179603 Container with a coating of barrier effect material, and method and apparatus for manufacturing the same
12/05/2002	US20020179578 Method of coating an emissive element
12/05/2002	US20020179577 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
12/05/2002	US20020179575 Plasma nozzle
12/05/2002	US20020179250 Inductive plasma processor including current sensor for plasma excitation coil
12/05/2002	US20020179249 Apparatus for and method of processing an object to be processed
12/05/2002	US20020179248 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow
12/05/2002	US20020179246 Removable shield arrangement for ICP-RIE reactors
12/05/2002	DE10151080C1 Device for producing extreme ultraviolet radiation used in the semiconductor industry comprises a discharge chamber surrounded by electrode housings through which an operating gas flows under a predetermined pressure
12/04/2002	EP1263268A2 Electrode interface bonding
12/04/2002	EP1263025A1 Removable shield arrangement for plasma reactors
12/04/2002	EP1262273A2 Method of coating an emissive element
12/04/2002	EP1262093A1 Apparatus for fixing an electrode in plasma polymerizing apparatus
12/04/2002	EP1012863B1 Glow plasma discharge device
12/04/2002	CN1383182A Ion beam radiator and method for triggering plasma by using such radiator
12/03/2002	US6489585 Comprising an electrode substrate and a protection layer formed by heat-fusion coating a glass-based material on at least an outer surface exposed to plasma of said electrode substrate, wherein said protection layer
12/03/2002	US6489245 Methods for reducing mask erosion during plasma etching
12/03/2002	US6488889 Two successive, but separate, evacuation stages, low pressure plasma; entire amount of gas does not need to be transported through one single pump
11/2002
11/28/2002	WO2002094455A1 Process for plasma treatment and apparatus
11/28/2002	WO2001022478A9 Semiconductor processing equipment having radiant heated ceramic liner
11/28/2002	US20020176947 Heterogeneous structure from amorphous carbon material with a polymer tendency applied as a coating on a substrate of polymer material
11/28/2002	US20020175869 Method and apparatus for producing uniform process rates
11/28/2002	US20020175068 Decontamination of fluids or objects contaminated with chemical or biological agents using a distributed plasma reactor
11/28/2002	US20020174951 Surface isolation device
11/27/2002	EP1259975A1 An atmospheric pressure plasma system
11/27/2002	EP1212692A4 Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
11/27/2002	EP0842307B1 System for the plasma treatment of large area substrates
11/27/2002	CN1382303A Vacuum circuit for device for treating receptacle with low pressure plasma
11/27/2002	CN1095314C Low temp. plasma generator
11/26/2002	US6486593 Plasma accelerator
11/26/2002	US6486431 Toroidal low-field reactive gas source
11/26/2002	US6486430 Method and apparatus for a contact start plasma cutting process
11/26/2002	US6485604 Substrate processing apparatus
11/26/2002	US6485602 Plasma processing apparatus
11/26/2002	US6485572 Use of pulsed grounding source in a plasma reactor
11/21/2002	WO2002093987A2 Ion sorces
11/21/2002	WO2002093632A1 Plasma processing device, and method of cleaning the same
11/21/2002	WO2002093631A1 Plasma processor
11/21/2002	WO2002076583A3 Device and method for purifying exhaust gas
11/21/2002	WO2002059934A3 Plasma generation apparatus and method

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