| Patents for H05H 1 - Generating plasma; Handling plasma (22,647) |
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| 01/30/2003 | US20030021746 Thermal synthesis apparatus and process |
| 01/30/2003 | US20030021331 Method and system for instantaneously determining the temperature of a low density gas using ensemble ratioing of laser-induced fluorescence peaks |
| 01/30/2003 | US20030019947 Axial feedstock injector with single splitting arm |
| 01/30/2003 | US20030019850 Surface modification process on metal dentures, products produced thereby, and the incorporated system thereof |
| 01/30/2003 | US20030019839 Maintenance method and system for plasma processing apparatus etching and apparatus |
| 01/30/2003 | CA2454577A1 Microwave desorber for removing contaminants from resin |
| 01/29/2003 | EP1068778B1 Plasma torch with a microwave transmitter |
| 01/29/2003 | CN2533640Y Pulse power supply distribution control device for large discharge plasma reactor |
| 01/29/2003 | CN1394351A Liner for semiconductor etching chamber |
| 01/29/2003 | CN1099936C Plasma-arc application apparatus |
| 01/28/2003 | US6511577 Reduced impedance chamber |
| 01/25/2003 | CA2353752A1 Production of hydrogen and carbon from natural gas or methane using barrier discharge non-thermal plasma |
| 01/23/2003 | WO2003007358A1 Plasma reactor for manufacturing electronic components |
| 01/23/2003 | WO2003007326A2 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 01/23/2003 | WO2003007311A1 Description of methods to increase propellant throughput in a micro pulsed plasma thruster |
| 01/23/2003 | WO2002043438A3 Systems and methods for ignition and reignition of unstable electrical discharges |
| 01/23/2003 | US20030016035 Direct detection of dielectric etch system magnet driver and coil malfunctions |
| 01/23/2003 | US20030015505 Apparatus and method for sterilization of articles using capillary discharge atmospheric plasma |
| 01/23/2003 | US20030015415 Sterilization system employing low frequency plasma |
| 01/23/2003 | US20030015293 Apparatus for plasma treatment |
| 01/23/2003 | US20030015287 Inner wall protection member for chamber and plasma procressing apparatus |
| 01/22/2003 | EP1278229A2 Molten salt collector for plasma separations |
| 01/22/2003 | EP1277700A2 Device and method for producing sodium hydride |
| 01/22/2003 | EP1277377A1 Method and plasma torch for treating a surface in a cavity and related filling-closure installation |
| 01/22/2003 | EP1277223A2 Highly efficient compact capacitance coupled plasma reactor/generator and method |
| 01/21/2003 | US6509542 Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor |
| 01/21/2003 | US6508913 Gas distribution apparatus for semiconductor processing |
| 01/21/2003 | US6508911 Diamond coated parts in a plasma reactor |
| 01/21/2003 | US6508199 Plasma processing apparatus |
| 01/21/2003 | CA2115773C Electrodeless plasma torch apparatus and methods for the dissociation of hazardous waste |
| 01/16/2003 | WO2003005780A1 Plasma torch |
| 01/16/2003 | WO2003005397A2 A novel electrode for use with atmospheric pressure plasma emitter apparatus and method for using the same |
| 01/16/2003 | WO2002061797A3 Icp window heater integrated with faraday shield or floating electrode between the source power coil and the icp window |
| 01/16/2003 | US20030012890 Method for producing a plasma by microwave irradiation |
| 01/16/2003 | US20030012717 Device for recovering sodium hydride |
| 01/16/2003 | CA2452939A1 A novel electrode for use with atmospheric pressure plasma emitter apparatus and method for using the same |
| 01/15/2003 | EP1276223A1 Current detection device |
| 01/15/2003 | EP1275133A1 Device and method for the etching of a substrate by means of an inductively coupled plasma |
| 01/15/2003 | CN1099221C Method for increasing intensity of ion source beam flow |
| 01/15/2003 | CN1099220C Method for stimulating low-temp plasma heated by microwave |
| 01/14/2003 | US6507641 X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same |
| 01/14/2003 | US6507149 Plasma cell |
| 01/14/2003 | US6507142 Plume shield for ion accelerators |
| 01/14/2003 | US6506686 Plasma processing apparatus and plasma processing method |
| 01/14/2003 | US6506685 Perforated plasma confinement ring in plasma reactors |
| 01/14/2003 | US6506292 Film forming apparatus |
| 01/14/2003 | US6506287 Overlap design of one-turn coil |
| 01/09/2003 | WO2003003405A1 Apparatus and method for radio frequency de-coupling and bias voltage control in a plasma reactor |
| 01/09/2003 | WO2003003404A2 Process chamber components having textured internal surfaces and method of manufacture |
| 01/09/2003 | WO2003003403A1 Configurable plasma volume etch chamber |
| 01/09/2003 | WO2003002250A1 Magnegas, a novel, highly efficient, nonpollutant, oxygen rich and cost competitive combustible gas and associated method |
| 01/09/2003 | WO2002003417A3 An electromagnetic radiation-initiated plasma reactor |
| 01/09/2003 | US20030008419 Induction magnet for use in producing high-density plasma and method of manufacturing the same, and semiconductor manufacturing equipment comprising the induction magnet |
| 01/09/2003 | US20030007907 Non-thermal plasma reactor substrate design-E-shape with low loss electrode pattern |
| 01/09/2003 | US20030007587 Controlled fusion in a field reversed configuration and direct energy conversion |
| 01/09/2003 | US20030006867 Dielectric heating using inductive coupling |
| 01/09/2003 | US20030006707 Controlled fusion in a field reversed configuration and direct energy conversion |
| 01/09/2003 | US20030006383 Plasma focus light source with improved pulse power system |
| 01/09/2003 | US20030006019 Electrically controlled plasma uniformity in a high density plasma source |
| 01/09/2003 | US20030006009 Process chamber having a voltage distribution electrode |
| 01/08/2003 | EP1097253B1 Ion energy attenuation |
| 01/08/2003 | EP0919066B1 Magnetron |
| 01/08/2003 | CN1390436A Method and apparatus to facilitate restriking in an arc-furnace |
| 01/08/2003 | CN1390360A Plasma focus light source with improved pulse power system |
| 01/07/2003 | US6504308 Electrostatic fluid accelerator |
| 01/07/2003 | US6504294 Method and apparatus for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source |
| 01/07/2003 | US6504126 Radio frequency |
| 01/07/2003 | US6503367 Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma |
| 01/07/2003 | US6503366 Chemical plasma cathode |
| 01/07/2003 | US6503364 Plasma processing apparatus |
| 01/07/2003 | US6503351 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair |
| 01/07/2003 | US6502530 Design of gas injection for the electrode in a capacitively coupled RF plasma reactor |
| 01/03/2003 | WO2003001558A1 Plasma treating apparatus |
| 01/03/2003 | WO2003001557A1 Electrode member for plasma treating apparatus, plasma treating apparatus and plasma treating method |
| 01/03/2003 | WO2003000550A1 Plasma-accelerator configuration |
| 01/03/2003 | WO2002082873A3 Controlled fusion in a field reversed configuration and direct energy conversion |
| 01/03/2003 | WO2002074023A3 Composite electrode for a plasma arc torch |
| 01/02/2003 | US20030003607 Disturbance-free, recipe-controlled plasma processing system and method |
| 01/02/2003 | US20030001510 Magneto-hydrodynamic power cell using atomic conversion of energy, plasma and field ionization |
| 01/02/2003 | US20030000823 Emission control for perfluorocompound gases by microwave plasma torch |
| 01/02/2003 | US20030000646 Plasma reactor |
| 01/02/2003 | EP1272015A1 Cyclotron resonance device for the generation of ions with variable positive charge |
| 01/02/2003 | EP1272013A2 Process of forming an electrode |
| 01/02/2003 | EP1269803A2 Plasma accelerator arrangement |
| 01/02/2003 | EP1269802A2 Plasma arc torch and method for longer life of plasma arc torch consumable parts |
| 01/02/2003 | EP1269529A2 Method for improving uniformity and reducing etch rate variation of etching polysilicon |
| 01/02/2003 | EP1269514A2 An enhanced resist strip in a dielectric etcher using downstream plasma |
| 01/02/2003 | EP1269511A2 Plasma reactor with overhead rf electrode tuned to the plasma |
| 01/02/2003 | EP1269020A2 Plasma accelerator arrangement |
| 01/02/2003 | EP1268113A1 Welding head, nozzle and method for powder plasma arc welding (ppaw) |
| 01/02/2003 | EP0954875B1 Modulator for plasma-immersion ion implantation |
| 01/01/2003 | CN1097491C Plasma processing method and method for cleaning plasma processing system |
| 12/31/2002 | US6500496 Increasing throughput and uniformity of ion implantations in target wafers using pulsed plasma processing system |
| 12/31/2002 | US6500314 Precise control and increased density range of the plasma |
| 12/31/2002 | US6499492 Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning |
| 12/27/2002 | WO2002104085A2 A closed-drift hall effect plasma vacuum pump for process reactors |
| 12/27/2002 | WO2002103770A1 Apparatus and method for cleaning the surface of a substrate |
| 12/27/2002 | WO2002103745A1 Ion momentum transfer plasma pump |
| 12/27/2002 | WO2002103079A1 Plasma cvd apparatus |
| 12/27/2002 | WO2002103078A1 Method and apparatus for plasma generation |