Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
04/2003
04/08/2003US6543935 Method and system for instantaneously determining the temperature of a low density gas using ensemble ratioing of laser-induced fluorescence peaks
04/03/2003WO2003028081A2 Method for etching structures in an etching body by means of a plasma
04/03/2003WO2003028078A1 Plasma processing device
04/03/2003WO2002068144A3 Contact start plasma torch
04/03/2003US20030062344 Plasma reactor with overhead RF electrode tuned to the plasma
04/02/2003EP1298966A2 Electrode component thermal bonding
04/02/2003EP1298391A2 Method and apparatus for characterizing a combustion flame
04/02/2003EP1297891A1 Object processing apparatus and plasma facility comprising the same
04/02/2003EP1296772A1 Methods and apparatus for spray forming, atomization and heat transfer
04/01/2003US6541982 Plasma density measuring method and apparatus, and plasma processing system using the same
04/01/2003US6541917 Section of pipe for a gas treatment device and device incorporating such a section of pipe
04/01/2003US6541786 Plasma pinch high energy with debris collector
04/01/2003US6541764 For separating low-mass particles from high-mass particles in multi-species plasma
04/01/2003US6541729 Plasma apparatus separately measures multiple plasma jets upstream of where plasma jets converge into combined plasma stream
04/01/2003US6540966 Reactors for the total recycling of contaminated liquid waste such as crude oil, sea water, or sewage, which produce a clean burning combustible gas, usable heat, and solid precipitates using electric arcs
04/01/2003CA2212471C A method of forming an oxide ceramic anode in a transferred plasma arc reactor
03/2003
03/27/2003WO2003026365A1 Plasma burner with microwave stimulation
03/27/2003WO2003026364A2 Plasma processor coil
03/27/2003WO2003026363A1 Discharge source with gas curtain for protecting optics from particles
03/27/2003WO2003025971A2 Plasma processing apparatus with coil magnet system
03/27/2003WO2003010088A8 Production of hydrogen and carbon from natural gas or methane using barrier discharge non-thermal plasma
03/27/2003WO2002025696A9 Reducing deposition of process residues on a surface in a chamber
03/27/2003US20030059573 Plasma polymerization; pulsed discharges
03/27/2003US20030059340 Controlling the power applied to the plasma to remove gas or vapor species from an semiconductor article; comprising a current monitor, a voltage monitor, a power control module and a plasma generator
03/27/2003US20030057848 Plasma processing apparatus
03/27/2003US20030057846 Plasma accelarator arrangement
03/27/2003US20030057845 Plasma processing apparatus
03/27/2003US20030056901 Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
03/26/2003EP1295309A2 Switched uniformity control
03/26/2003EP1294523A1 High temperature tooling
03/26/2003EP1050064B1 Implantation of radioactive ?32 p atoms
03/26/2003EP0792519B1 Interconnection elements for microelectronic components
03/26/2003CN1406015A Deposition system of close wave-division multiplexer filter
03/26/2003CN1405857A Plasma etching device using plasma confining device
03/26/2003CN1404925A 等离子喷涂枪 Plasma spray gun
03/26/2003CN1103655C Apparatus and method for utilizing a plasma density gradient to produce a flow of particles
03/25/2003US6538388 Plasma processing apparatus suitable for power supply of higher frequency
03/25/2003US6538387 Substrate electrode plasma generator and substance/material processing method
03/25/2003US6538257 Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit
03/25/2003US6537419 Gas distribution plate assembly for providing laminar gas flow across the surface of a substrate
03/20/2003WO2003023507A1 Method for removing organic alignment layer coated on substrates and recovering the substrates using plasma
03/20/2003WO2003022498A2 Vacuum arc plasma gun deposition system
03/20/2003WO2002091521A3 Strain relief mechanism for a plasma arc torch
03/20/2003US20030054657 Semiconductor manufacturing apparatus
03/20/2003US20030053594 Discharge source with gas curtain for protecting optics from particles
03/20/2003US20030053593 Capillary discharge source
03/20/2003US20030052664 Structure and the method for measuring the spectral content of an electric field as a function of position inside a plasma
03/20/2003US20030052259 Method for monitoring plasma or flame-spray processes
03/20/2003US20030052097 Method for plasma jet welding
03/20/2003US20030052096 Novel electrode for use with atmospheric pressure plasma emitter apparatus and method for using the same
03/20/2003US20030052085 Control of power delivered to a multiple segment inject electrode
03/20/2003US20030052011 Plasma electroplating
03/20/2003US20030051993 Especially for partial oxidation of hydrocarbon feedstock to produce functionalized organic compounds.
03/20/2003US20030051992 Synthetic combustible gas generation apparatus and method
03/20/2003US20030051990 Molecular dissociation of pollutants in exhaust gas streams of combustion systems.
03/20/2003US20030051811 Plasma resistant member
03/20/2003US20030051792 Use of a cleaning process, a cleaning process, a connection process and a workpiece pair
03/20/2003US20030051666 Impedance adapted microwave energy coupling device
03/20/2003US20030051665 High temperature ceramic heater assembly with rf capability
03/20/2003US20030051436 VIG evacuation with plasma excitation
03/19/2003EP1292717A1 Pulsed highly ionized magnetron sputtering
03/19/2003EP0797838B1 Method and apparatus for plasma processing
03/19/2003CN1404619A An atmospheric pressure plasma system
03/19/2003CN1404349A Low-temperature plasma generator
03/19/2003CN1403625A Combined microwave plasma exciter
03/19/2003CN1103382C Plasma chemical vapour phase deposition apparatus
03/18/2003US6534922 Plasma processing apparatus
03/18/2003US6534921 Method for removing residual metal-containing polymer material and ion implanted photoresist in atmospheric downstream plasma jet system
03/18/2003US6533894 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
03/18/2003US6533534 Manufacturing flat active display screens by increased rate of plasma enhanced chemical vapor deposition method and thereby lowering for coating treatment exposure to ion impact
03/13/2003WO2003022005A1 Arc furnace and method for converting waste
03/13/2003WO2003021644A1 Chamber shields for a plasma chamber
03/13/2003WO2002093987A3 Ion sorces
03/13/2003WO2002082499A3 Conductive collar surrounding semiconductor workpiece in plasma chamber
03/13/2003WO2002003763B1 Vacuum plasma processor apparatus and method
03/13/2003US20030049558 Vacuum processing method, vacuum processing apparatus, semiconductor device manufacturing method and semiconductor device
03/13/2003US20030049468 Gas impervious protective coatings; vapor vacuum deposition
03/13/2003US20030048828 Arc furnance with dc arc and ac joule heating
03/13/2003US20030048054 Artificial solar wind generator
03/13/2003US20030048053 Plasma accelerator arrangement
03/13/2003US20030047540 Arrangement for generating an active gas jet
03/13/2003US20030047444 Can be used to coat relatively large substrates and that can be operated with stability
03/13/2003US20030047137 Apparatus for evaluating plasma polymerized polymer layer using uv spectrometer
03/13/2003US20030046921 Air breathing electrically powered hall effect thruster
03/13/2003DE10144036C1 Brenner zum Schweißen und/oder Schneiden Torch for welding and / or cutting
03/12/2003EP1292176A2 Device for the production of an active gas beam
03/12/2003EP1291112A1 Torch for welding and/or cutting
03/12/2003EP1291077A2 Microwave reactor and method for controlling reactions of activated molecules
03/12/2003EP1291076A2 Pyrolysing apparatus and pyrolysing process
03/12/2003EP1290926A1 High frequency plasma source
03/12/2003EP1290925A2 Extreme ultraviolet source based on colliding neutral beams
03/12/2003EP0922122B1 Plasma cvd system with an array of microwave plasma electrodes and plasma cvd process
03/12/2003CN1103113C Electrode assembly and method for assembly and method for treating wafer using same
03/11/2003US6531031 Plasma etching installation
03/11/2003US6531029 Vacuum plasma processor apparatus and method
03/11/2003US6530342 Large area plasma source
03/06/2003WO2003018185A2 Method of producing powder with composite grains and the device for carrying out said method
03/06/2003WO2002078044A3 Method of processing a surface of a workpiece
03/06/2003WO2002078042A3 Neutral particle beam processing apparatus
03/06/2003WO2002071438A3 Capillary discharge plasma apparatus and method for surface treatment using the same