Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
07/2003
07/10/2003US20030129916 AC driven plasma display panel for electrical commercial boards and method of fabricating the same
07/10/2003US20030127191 Plasma generation apparatus
07/09/2003EP1325509A1 Method and device for treating surfaces using a glow discharge plasma
07/09/2003CN1429398A Linear drive system for use in plasma processing system
07/09/2003CN1428753A AC plasma device for panel light source and its making method
07/09/2003CN1114102C Method and system for detecting nozzle and electrode wear
07/09/2003CN1113807C Method and device for preparing Fullerenes
07/08/2003US6590179 Plasma processing apparatus and method
07/08/2003US6589407 Aluminum deposition shield
07/08/2003CA2248250C Device for generating powerful microwave plasmas
07/03/2003WO2003055287A2 Plasma reactor with overhead rf electrode tuned to the plasma with arcing suppression
07/03/2003WO2003054941A1 Plasma treatment apparatus and control method thereof
07/03/2003WO2003054912A1 Method and apparatus comprising a magnetic filter for plasma processing a workpiece
07/03/2003WO2003054245A1 Device for producing pcvd coated glass tubes for the drawing of optical fibers
07/03/2003WO2003032434B1 Plasma production device and method and rf driver circuit
07/03/2003US20030124876 Apparatus and method for use in manufacturing a semiconductor device
07/03/2003US20030124250 Device for producing PCVD coated glass tubes for the drawing of optical fibers
07/03/2003US20030123992 Linear inductive plasma pump for process reactors
07/03/2003US20030121474 Apparatus for fixing an electrode in plasma polymerizing apparatus
07/02/2003EP1324644A2 Plasma arc cutting apparatus
07/02/2003EP1324371A1 Plasma processing apparatus
07/02/2003EP1323671A1 Process for the fabrication of at least one nanotube between two electrically conductive elements and device for carrying out this process
07/02/2003EP1323339A1 Plasma torch, especially a plasma positive pole torch
07/02/2003EP1323338A1 Electrode for glow-discharge atmospheric plasma treatment
07/02/2003EP1323180A2 System, apparatus, and method for processing wafer using single frequency rf power in plasma processing chamber
07/02/2003EP1323179A2 Wafer area pressure control for plasma confinement
07/02/2003EP1323178A2 Gas distribution apparatus for semiconductor processing
07/02/2003EP1322892A2 System and method for decongesting a waste converting apparatus
07/02/2003EP1322891A1 System and method for removing blockages in a waste converting apparatus
07/02/2003EP1322547A2 Method and apparatus for the production of so called "fractional hydrogen" and associated production of photon energy
07/02/2003EP1322403A1 The plasma assisted catalytic treatment of gases
07/02/2003EP1053563B1 Methods for reducing mask erosion during plasma etching
07/01/2003US6586757 Plasma focus light source with active and buffer gas control
07/01/2003US6586055 Method for depositing functionally gradient thin film
07/01/2003US6585907 Method for manufacturing a shield for an inductively-couple plasma apparatus
07/01/2003US6585891 Plasma mass separator using ponderomotive forces
06/2003
06/26/2003WO2003052807A1 Plasma processor
06/26/2003WO2003052806A1 Plasma treatment apparatus and plasma generation method
06/26/2003WO2003052432A2 Plasma analyser
06/26/2003US20030118745 Low pressure plasma treatment; stoppers for wine bottles, containers, for improving the printability
06/26/2003US20030118731 Bead blasting component to provide surface roughness, dipping component into solution of hydrofluoric acid, hydrochloric acid, and nitric acid, forming aluminum coating by thermal spraying
06/26/2003US20030117080 Applied plasma duct system
06/26/2003US20030116281 Atmospheric pressure plasma system
06/26/2003US20030116089 Plasma implantation system and method with target movement
06/26/2003DE20201801U1 Monitor, for electrical plasma unit, used for sterilizing gases and neutralizing odors, includes light emitting diode, to indicate adequate current flow
06/25/2003EP1322144A2 Method of forming an electrode
06/25/2003EP1321014A1 Device for producing a plasma, ionisation method, use of said method and production processes using said device
06/25/2003EP1320867A2 Reducing deposition of process residues on a surface in a chamber
06/25/2003CN1426671A High-frequency matching network
06/25/2003CN1426597A Method for improving uniformity and reducing etch rate variation of etching polysilicon
06/25/2003CN1426090A Inductive coupling type plasma device
06/24/2003US6583572 Inductive plasma processor including current sensor for plasma excitation coil
06/24/2003US6583378 Plasma machining electrode and plasma machining device
06/24/2003US6583064 Low contamination high density plasma etch chambers and methods for making the same
06/24/2003US6582778 Method of treatment with a microwave plasma
06/24/2003US6582618 Method of determining etch endpoint using principal components analysis of optical emission spectra
06/19/2003WO2003034463A3 Tunable multi-zone gas injection system
06/19/2003US20030114600 Treatment of fluorocarbon feedstocks
06/19/2003US20030113945 Disturbance-free, recipe-controlled plasma processing system and method
06/19/2003US20030113481 Directly forming individual anti-reflection, active, and electrode layers without going through the intermediate steps.
06/19/2003US20030113477 Non-fouling, wettable coated devices
06/19/2003US20030111963 Inductively coupled plasma system
06/19/2003US20030111445 Plasma source for spectrometry
06/18/2003EP1320118A2 Reactor for simultaneously coating both sides of spectacle glasses
06/18/2003CN1425187A Method and apparatus for ionized physical vapor deposition
06/18/2003CN1424867A Ion beam radiation device and method for choking basis charge accumulation
06/17/2003US6580051 Direct and efficient conversion of ceramic material
06/17/2003US6579805 In situ chemical generator and method
06/17/2003US6579573 Dispersing ceramics, cermets or metals in liquids using sound waves to form solutions having narrow particle size distributions, then injecting into flame sprayers to form uniform coatings
06/17/2003US6579428 Arc evaporator, method for driving arc evaporator, and ion plating apparatus
06/17/2003US6579426 Use of variable impedance to control coil sputter distribution
06/17/2003US6579424 Method for the production of substrates, magnetron source and sputter-coating chamber
06/17/2003US6578515 Film formation apparatus comprising movable gas introduction members
06/17/2003CA2365955A1 Plasma analyser
06/13/2003CA2414390A1 Volume-optimized reactor for simultaneously coating eyeglasses on both sides
06/12/2003WO2003049499A2 Ultraviolet radiation generation with flame and electrical discharge
06/12/2003WO2003049171A1 Exhaust ring mechanism, and plasma treatment device using the exhaust ring mechanism
06/12/2003WO2003049142A1 Uniformity control for plasma doping systems
06/12/2003WO2003049141A2 Device for applying an electromagnetic microwave to a plasma container
06/12/2003WO2003049139A1 Electron source
06/12/2003WO2002099840A3 Inductively-coupled plasma processing system
06/12/2003WO2002079815B1 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
06/12/2003US20030108683 Comprises ionized arc nozzle including consumable electrode (provides vaporizable precursor), nonconsumable electrode, and working/impingement gas which exothermically reacts to produce metal compound or ceramic clusters, then heating
06/12/2003US20030108155 X-ray micro-target source
06/12/2003US20030106788 Dielectric with slit; segmented electrode
06/12/2003US20030106645 Vacuum plasma processor apparatus and method
06/12/2003DE20201270U1 Device for sterilizing and deodorizing air in rooms tubes and channels uses non thermal plasma-chemical conversion
06/12/2003DE10207835C1 Channel spark source for a stable electron beam e.g. an electron gun, has a conical sleeve in the hollow cathode with a gas feed and an adjusted pressure drop to give a large number of shots without loss of beam quality
06/12/2003CA2468760A1 Electron source
06/12/2003CA2457337A1 Ultraviolet radiation generation with flame and electrical discharge
06/11/2003EP1318703A2 Plasma reaction apparatus
06/11/2003EP1123567B1 Oversized microwave load for continuous high power and its use as calorimeter
06/11/2003EP0965253B1 Method and device for producing plasma
06/11/2003EP0962048B1 System for high power RF plasma processing
06/11/2003EP0938395B1 Plasma torch
06/11/2003CN1423916A High frequency plasma source
06/11/2003CN1423828A Method and apparatus for controlling the volume of a plasma
06/11/2003CN1423827A Method and apparatus for producing uniform process rates
06/11/2003CN1423826A Temperature control system for plasma processing apparatus
06/11/2003CN1423825A Plasma processing system with dynamic gas distribution control