Patents for H05H 1 - Generating plasma; Handling plasma (22,647)
06/2003
06/10/2003US6577113 Apparatus and method for measuring substrate biasing during plasma processing of a substrate
06/10/2003US6576860 Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
06/10/2003US6576202 Highly efficient compact capacitance coupled plasma reactor/generator and method
06/10/2003US6576127 Ponderomotive force plug for a plasma mass filter
06/10/2003US6576063 Apparatus and method for use in manufacturing a semiconductor device
06/05/2003WO2002062111A3 Apparatus and method for atmospheric pressure reactive atom plasma processing for surface modification
06/05/2003US20030102811 Plasma coil
06/05/2003US20030102208 Low pressure ionization; using magnet
06/05/2003US20030102087 Plasma processing apparatus and processing method
06/05/2003US20030102085 Chemical plasma cathode
06/05/2003US20030101936 Plasma reaction apparatus
06/05/2003US20030101935 Dose uniformity control for plasma doping systems
06/04/2003EP1316245A1 Electromagnetic radiation generation using a laser produced plasma
06/04/2003EP1316105A1 Plasma enhanced gas reactor
06/04/2003EP0895706B1 Method and apparatus for generating x-ray or euv radiation
06/04/2003EP0759215B1 Pulse power generating circuit with energy recovery
06/04/2003CN1422510A Twin plasma torch apparatus
06/04/2003CN1422195A Plasma arc reactor for the production of fine powders
06/03/2003CA2039516C Plasmagenic gas and its application to the plasma projection of metal oxide
05/2003
05/29/2003US20030100208 Plasma arc torch quick disconnect
05/29/2003US20030098367 Processes and systems for determining the identity of metal alloys
05/29/2003US20030098231 Vacuum treatment system and method of manufacturing same
05/29/2003US20030097984 Plasma processing apparatus, method for operating the same, designing system of matching circuit, and plasma processing method
05/29/2003US20030097903 Comprising two electrodes positioning a spaced apart, a plasma generator, an aluminum wire feeding through the channel of first electrode; plasma evaporation process to produce aluminum fine powder
05/28/2003EP1315201A1 Radial antenna and plasma processing apparatus comprising the same
05/28/2003EP1314183A1 Plasma processing
05/28/2003CN1421043A Plasma processing system and method therefor
05/28/2003CN1420713A Antenna electrode for induction coupling plasma transmitting device
05/27/2003US6570906 ARC furnace with DC arc and AC joule heating
05/27/2003US6570333 Method for generating surface plasma
05/27/2003US6568346 Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
05/22/2003WO2003043390A2 System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within the processing chamber
05/22/2003WO2003043134A2 Tamper resistant pin connection
05/22/2003WO2003043052A1 Magnet array in conjunction with rotating magnetron for plasma sputtering
05/22/2003WO2003041854A1 Electrode discharge, non thermal plasma device (reactor) for the pre-treatment of combustion air
05/22/2003WO2003017737A3 Cascade arc plasma and abrasion resistant coatings made therefrom
05/22/2003US20030095072 Antenna electrode for inductively coupled plasma generation apparatus
05/22/2003US20030094366 Plasma processing apparatus with real-time particle filter
05/22/2003US20030094238 Plasma processing apparatus for spatial control of dissociation and ionization
05/22/2003CA2456198A1 Electrode discharge, non thermal plasma device (reactor) for the pre-treatment of combustion air
05/21/2003EP1313132A1 Toroidal low-field reactive gas source
05/21/2003EP1313131A1 Toroidal low-field reactive gas source
05/21/2003EP1313130A1 Toroidal low-field reactive gas source
05/21/2003EP1313129A1 Toroidal low-field reactive gas source
05/21/2003EP1313128A1 Toroidal low-field reactive gas source
05/21/2003EP1312247A2 An electromagnetic radiation-initiated plasma reactor
05/21/2003EP1312152A1 Electrodynamic field generator
05/21/2003EP1105917A4 Elastomer bonded parts for plasma processes and method for manufacture and use thereof
05/21/2003EP0894332B1 Use of a connecting process and connecting process
05/21/2003EP0753241B1 Plasma gas mixture for sterilizer and method
05/20/2003US6566668 Plasma focus light source with tandem ellipsoidal mirror units
05/20/2003US6566667 Plasma focus light source with improved pulse power system
05/20/2003US6565988 Composite for high thermal stress
05/20/2003US6565930 High-efficiency plasma treatment of paper
05/20/2003US6565791 Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
05/20/2003US6565716 Dielectric barrier discharge system and method for decomposing hazardous compounds in fluids
05/20/2003US6564744 Plasma CVD method and apparatus
05/15/2003WO2003041460A1 Plasma process apparatus and its processor
05/15/2003WO2003041459A2 Plasma arc torch quick disconnect
05/15/2003WO2003041146A1 Apparatus and method for reactive atom plasma processing for material deposition
05/15/2003WO2003041112A2 Non-thermal plasma slit discharge apparatus
05/15/2003WO2003041111A1 Microwave plasma generator
05/15/2003US20030092318 Tamper resistant pin connection
05/15/2003US20030092278 Plasma baffle assembly
05/15/2003US20030091482 High frequency plasma source
05/15/2003US20030090209 Electrostatic fluid accelerator
05/15/2003US20030089850 Device and method for extracting a constituent from a chemical mixture
05/15/2003US20030089686 Inductively coupled plasma source
05/15/2003US20030089601 Magnet array in conjunction with rotating magnetron for plasma sputtering
05/15/2003DE19928053C2 Anordnung zur Erzeugung eines Niedertemperaturplasmas durch eine magnetfeldgestützte Kathodenentladung Arrangement for generating a low temperature plasma by a magnetic field-supported cathode discharge
05/15/2003CA2463554A1 Non-thermal plasma slit discharge apparatus
05/14/2003EP1310981A1 Toroidal low-field reactive gas source
05/14/2003EP1310980A1 Toroidal low-field reactive gas source
05/14/2003EP1310979A2 Plasma impedance controlling device
05/14/2003EP1155160B1 Non-magnetic stainless steel for use at very low temperature and resistant to neutrons and use
05/14/2003EP1115523B1 Method and transferred arc plasma system for production of fine and ultrafine powders
05/14/2003EP1044459B1 Plasma device including a powered non-magnetic metal member between a plasma ac excitation source and the plasma
05/14/2003EP0991590B1 Method and device for producing fullerenes
05/14/2003EP0928233A4 Fuel plasma vortex combustion system
05/14/2003CN1418453A Plasma accelerator arrangement
05/14/2003CN1418290A Plasma accelerator arrangement
05/13/2003US6563907 Radiation source with shaped emission
05/13/2003US6563076 Voltage control sensor and control interface for radio frequency power regulation in a plasma reactor
05/13/2003US6563075 Method of forming an electrode
05/13/2003US6562386 Gas plasma treatment
05/13/2003US6562190 System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber
05/13/2003US6562186 Apparatus for plasma processing
05/13/2003US6562079 Microwave discharge apparatus
05/08/2003WO2003039215A1 Plasma accelerator system
05/08/2003WO2003039214A1 Improved microwave stripline applicators
05/08/2003WO2003038850A2 Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator
05/08/2003WO2003038453A1 High-frequency detection method and high-frequency detection circuit
05/08/2003WO2003037503A1 Microwave plasma generating apparatus
05/08/2003WO2003037386A2 Sterilization of articles using capillary discharge plasma
05/08/2003WO2003003404A3 Process chamber components having textured internal surfaces and method of manufacture
05/08/2003US20030087530 Apparatus and method for reactive atom plasma processing for material deposition
05/08/2003US20030087472 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds
05/08/2003US20030087044 Device for the regulation of a plasma impedance
05/08/2003US20030086841 Compact plasma reactor
05/08/2003US20030086840 To apply plasma processing on a substrate such as a semiconductor