Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143) |
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11/24/1992 | CA1310763C Integrated circuit containing bi-polar and complementary mos transistors on a common substrate and method for the manufacture thereof |
11/19/1992 | EP0514297A2 Process for making a contact to a semiconductor device |
11/19/1992 | EP0514100A2 Fabrication of semiconductor devices in compound semiconductor layers |
11/19/1992 | EP0514079A2 High electron mobility transistor and method of manufacture |
11/19/1992 | EP0514060A2 DMOS transistor structure & method |
11/19/1992 | EP0513923A2 Protected programmable transistor with reduced parasitic capacitances and method of fabrication |
11/19/1992 | EP0513905A1 Semiconductor device and method of manufacturing such a device |
11/19/1992 | EP0513894A2 Method of manufacturing a semiconductor device comprising a capacitor with a ferroelectric dielectric, and semiconductor device comprising such a capacitor |
11/19/1992 | EP0513815A1 Semiconductor stress sensor |
11/19/1992 | EP0513764A2 Semiconductor device and method of increasing device breakdown voltage of semiconductor device |
11/19/1992 | EP0513684A2 Method of improving the manufaturing of SOI devices by forming position alignment marks |
11/19/1992 | EP0513666A1 CCD shift register |
11/19/1992 | EP0513644A2 Field effect thin film transistor and method of manufacturing the same |
11/19/1992 | EP0513639A2 Semiconductor field effect transistor device and fabrication thereof |
11/19/1992 | EP0513590A2 Thin-film transistor and method for manufacturing it |
11/19/1992 | EP0513261A1 Thin film transistor having an improved gate structure and gate coverage by the gate dielectric |
11/19/1992 | EP0513185A1 Mosfet structure having reduced gate capacitance and method of forming same. |
11/19/1992 | DE4212829A1 Mfg. metal-oxide semiconductor MOSFET - depositing insulating film on substrate of first conductivity type and etching both film part and substrate to preset thickness |
11/19/1992 | DE4208537A1 MOSFET structure with gate oxide film - has gate on substrate of first conductivity type and ion implantation layer under gate |
11/19/1992 | DE4143346A1 Integrated power semiconductor switch - has buried oxide layer insulating lateral MOSFET source from substrate and epitaxial layer |
11/19/1992 | DE4114660A1 Passivation layer semiconductor element mfr. - has channels of defined width and depth filled with glass paste to provide glass passivation layer |
11/17/1992 | US5165075 Electro-optic device having pairs of complementary transistors |
11/17/1992 | US5165066 Contact chain structure for troubleshooting eprom memory circuits |
11/17/1992 | US5164815 Integrated circuit device and method to prevent cracking during surface mount |
11/17/1992 | US5164813 New diode structure |
11/17/1992 | US5164807 Charge-coupled devices with locally widened electrodes |
11/17/1992 | US5164804 Semiconductor device having high breakdown voltage and low resistance and method of fabricating the same |
11/17/1992 | US5164803 Cmos semiconductor device with an element isolating field shield |
11/17/1992 | US5164802 Power vdmosfet with schottky on lightly doped drain of lateral driver fet |
11/17/1992 | US5164801 A p channel mis type semiconductor device |
11/17/1992 | US5164800 Semiconductor device |
11/17/1992 | US5164797 Lateral heterojunction bipolar transistor (LHBT) and suitability thereof as a hetero transverse junction (HTJ) laser |
11/17/1992 | US5164335 Semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
11/17/1992 | US5164333 Silicide diffusion barrier |
11/17/1992 | US5164327 Method of manufacturing a mis-type semiconductor |
11/17/1992 | US5164325 Method of making a vertical current flow field effect transistor |
11/17/1992 | US5164218 Semiconductor device and a method for producing the same |
11/17/1992 | CA1310433C Non-rectifying contacts to iii-v semiconductors |
11/17/1992 | CA1310296C P and n-type microcrystalline semiconductor alloy material including band gap widening elements devices utilizing same |
11/16/1992 | CA2234517A1 Blue-green lase diode |
11/12/1992 | WO1992020102A1 Oxides and nitrides of metastabile groupe iv alloys and nitrides of group iv elements and semiconductor devices formed thereof |
11/12/1992 | DE4215010A1 High density integrated MOS circuit with reduced narrow channel effect - uses vertical channel structure with epitaxial silicon or pattern etched into the substrate with circular or elliptical walls |
11/12/1992 | DE4212861A1 FET contg. potential barriers - has source-drain regions on substrate, gate electrode on insulation layer, channel region between substrate, source-drain and semiconductor layers |
11/11/1992 | EP0512878A1 Photosensitive device with read registers placed side by side |
11/11/1992 | EP0512840A2 An active matrix display device |
11/11/1992 | EP0512717A2 Threshold switching device with negative differential resistance |
11/11/1992 | EP0512605A1 Power device having reverse-voltage protection |
11/10/1992 | US5163178 Semiconductor device having enhanced impurity concentration profile |
11/10/1992 | US5162966 Semiconductor device having a surge protecting element |
11/10/1992 | US5162892 Semiconductor device with polycrystalline silicon active region and hydrogenated passivation layer |
11/10/1992 | US5162890 Stacked capacitor with sidewall insulation |
11/10/1992 | US5162888 High DC breakdown voltage field effect transistor and integrated circuit |
11/10/1992 | US5162884 Insulated gate field-effect transistor with gate-drain overlap and method of making the same |
11/10/1992 | US5162883 Increased voltage MOS semiconductor device |
11/10/1992 | US5162882 Semiconductor over insulator mesa |
11/10/1992 | US5162880 Nonvolatile memory cell having gate insulation film with carrier traps therein |
11/10/1992 | US5162879 Diffusionless conductor/oxide semiconductor field effect transistor and methods for making and using the same |
11/10/1992 | US5162876 Semiconductor device having high breakdown voltage |
11/10/1992 | US5162875 Protective layer for electroactive passivation layers |
11/10/1992 | US5162263 Metal silicide layer |
11/10/1992 | US5162262 Multilayer, silicides, nitrides |
11/10/1992 | US5162255 Chemical vapor deposition of silicon carbide layer on silicon dioxide, protective coating |
11/10/1992 | US5162254 Semiconductor device having a SOI substrate and fabrication method thereof |
11/10/1992 | US5162251 Method for making thinned charge-coupled devices |
11/10/1992 | US5162247 Process for trench-isolated self-aligned split-gate EEPROM transistor and memory array |
11/10/1992 | US5162245 Self-aligned bipolar transistor using selective polysilicon growth |
11/10/1992 | US5162244 Bipolar transistor and manufacturing method thereof |
11/10/1992 | US5162243 Method of producing high reliability heterojunction bipolar transistors |
11/10/1992 | US5162239 Laser crystallized cladding layers for improved amorphous silicon light-emitting diodes and radiation sensors |
11/10/1992 | CA1310078C Voltage controlled variable capacitor |
11/10/1992 | CA1310060C Electrostatic discharge protection network for large area transducer arrays |
11/09/1992 | CA2068020A1 Method of manufacturing a semiconductor device comprising a capacitor with a ferroelectric dielectric, and semiconductor device comprising such a capacitor |
11/04/1992 | EP0511864A2 Epitaxially grown compound semiconductor crystals with buffer layers |
11/04/1992 | EP0511837A2 Method of producing stepped wall interconnects and gates |
11/04/1992 | EP0511628A2 Insulator for integrated circuits formed by high-pressure oxidation |
11/04/1992 | EP0511627A2 P-N junction diffusion barrier employing mixed dopants |
11/04/1992 | EP0511370A1 Method of making an MOS EEPROM floating gate transistor cell |
11/03/1992 | US5161235 Field-effect compound semiconductive transistor with GaAs gate to increase barrier height and reduce turn-on threshold |
11/03/1992 | US5161113 CCD output signal processing method and apparatus |
11/03/1992 | US5160994 Heterojunction bipolar transistor with improved base layer |
11/03/1992 | US5160990 MIS-FET with small chip area and high strength against static electricity |
11/03/1992 | US5160989 Extended body contact for semiconductor over insulator transistor |
11/03/1992 | US5160986 Matrix of EPROM memory cells with a tablecloth structure having an improved capacitative ratio and a process for its manufacture |
11/03/1992 | US5160985 Insulated gate bipolar transistor |
11/03/1992 | US5160982 Enhanced mobility semiconductor |
11/03/1992 | US5160856 Reference voltage regulator semiconductor integrated circuit |
11/03/1992 | US5160793 Shallow ohmic contacts to n-Alx Ga1-x As |
11/03/1992 | US5160491 Metal oxide semiconductor, miniaturization |
11/03/1992 | CA2067413A1 Threshold switching device |
11/03/1992 | CA1309781C Compact cmos analog crosspoint switch matrix |
10/30/1992 | CA2061120A1 Mask within a concave semiconductor structure |
10/29/1992 | WO1992018895A1 Data line defect remedying structure |
10/29/1992 | DE4213606A1 Transistor with current detection property - has main transistor region on substrate also carrying separately arranged measurement regions with common base and collector connections and separate emitter regions |
10/29/1992 | DE4211970A1 Hetero-epitaxial structure including buffer layer - for adjusting or eliminating residual stress in epitaxial layer |
10/29/1992 | DE4113756A1 Field effect-controllable semiconductor device - has insulation layer to prevent switch-on of bipolar structure |
10/28/1992 | EP0511096A1 Process for local passivation of a substrate, by an hydrogenated amorphous carbon layer, and method for fabricating thin film transistors on this passivated substrate |
10/28/1992 | EP0510966A2 MOS semiconductor device and fabrication method of the same |
10/28/1992 | EP0510858A1 Method of selectively forming a TiNx layer by MOCVD, on a semi-conductor device |
10/28/1992 | EP0510755A1 Display device |
10/28/1992 | EP0510710A1 Oscillating circuit device and its manufacturing method. |