Patents
Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143)
03/1995
03/08/1995EP0642154A1 Process for producing group III-V compound semiconductor and group III-V compound semiconductor
03/08/1995EP0642004A2 Sound emission transducer
03/08/1995EP0641488A1 Electrostrictive sensors and actuators
03/08/1995EP0641485A1 Membrane dielectric isolation ic fabrication
03/07/1995US5396459 Single transistor flash electrically programmable memory cell in which a negative voltage is applied to the nonselected word line
03/07/1995US5396458 Semiconductor memory device and method of writing and reading out information for the same
03/07/1995US5396455 Magnetic non-volatile random access memory
03/07/1995US5396394 ISDN device line protection circuit
03/07/1995US5396304 Slide projector mountable light valve display
03/07/1995US5396119 MOS power transistor device with temperature compensation
03/07/1995US5396103 Graded composition ohmic contact for P-type II-VI semiconductors
03/07/1995US5396099 MOS type semiconductor device having a high ON current/OFF current ratio
03/07/1995US5396098 Structure and method of manufacturing a semiconductor memory device
03/07/1995US5396097 Transistor with common base region
03/07/1995US5396095 Method of manufacturing a semiconductor device comprising a capacitor with a ferroelectric dielectric, and semiconductor device comprising such a capacitor
03/07/1995US5396089 Method of generating active semiconductor structures by means of starting structures which have a 2D charge carrier layer parallel to the surface
03/07/1995US5396088 MOS component with a particular source and base structure
03/07/1995US5396087 Insulated gate bipolar transistor with reduced susceptibility to parasitic latch-up
03/07/1995US5396085 Silicon carbide switching device with rectifying-gate
03/07/1995US5396084 Thin film transistor device having driving circuit and matrix circuit
03/07/1995US5396083 Thin film transistor and method of making the same
03/07/1995US5396082 Semiconductor substrate and device with a surface layer structure
03/07/1995US5396066 Displacement element, cantilever probe and information processing apparatus using cantilever probe
03/07/1995US5395804 Method for fabricating a thin film transistor
03/07/1995US5395802 Process for making semiconductor acceleration sensor having anti-etching layer
03/07/1995US5395787 Method of manufacturing shallow junction field effect transistor
03/07/1995US5395780 Process for fabricating MOS transistor
03/07/1995US5395779 Process of manufacture of split gate EPROM device
03/07/1995US5395778 Method of manufacturing an integrated circuit having a memory element
03/07/1995US5395777 Method of producing VDMOS transistors
03/07/1995US5395776 Method of making a rugged DMOS device
03/07/1995US5395775 Method for manufacturing lateral bipolar transistors
03/07/1995US5395774 Methods for forming a transistor having an emitter with enhanced efficiency
03/07/1995US5395772 SOI type MOS transistor device
03/07/1995US5395739 Photoresists
03/07/1995US5394751 Method of producing semiconductor pressure sensor
03/02/1995WO1995006328A1 Self-aligned cmos process
03/02/1995WO1995006327A1 Bipolar transistor process
03/02/1995DE4424738A1 Semiconductor device of the type having high breakdown voltage
03/02/1995DE4409367A1 Method for producing a thin-film transistor
03/01/1995EP0641028A2 A thin film device and a method for fabricating the same
03/01/1995EP0641027A1 Semiconductor device
03/01/1995EP0641024A2 Semiconductor power device
03/01/1995EP0641018A1 Manufacturing method of semiconductor device and thin film transistor with a recrystallized thin semiconductor film
03/01/1995EP0640982A2 Non-volatile semiconductor memory device and data programming method
03/01/1995EP0640248A1 Epitaxial ohmic contact for integrated heterostructure of Group II-VI semiconductor materials and method of fabricating same
03/01/1995EP0235248B1 Detector and mixer diode operative at zero bias voltage and fabrication process therefor
02/1995
02/28/1995US5394372 Semiconductor memory device having charge-pump system with improved oscillation means
02/28/1995US5394360 Non-volatile large capacity high speed memory with electron injection from a source into a floating gate
02/28/1995US5394359 MOS integrated circuit with adjustable threshold voltage
02/28/1995US5394357 Non-volatile semiconductor memory device
02/28/1995US5394258 Active matrix display screen with storage capacitors formed of conductive blocks, semiconductive material, nonconductive material, and capacitive lines
02/28/1995US5394002 Erasable programmable memory
02/28/1995US5394001 Nonvolatile semiconductor memory device having reduced resistance value for the common source wiring region
02/28/1995US5393999 SiC power MOSFET device structure
02/28/1995US5393998 Semiconductor memory device containing junction field effect transistor
02/28/1995US5393997 Solid state imaging device
02/28/1995US5393995 Semiconductor thyristor device with recess
02/28/1995US5393992 Semiconductor thin film transistor with gate controlled offset portion
02/28/1995US5393990 HEMT structure
02/28/1995US5393684 Method of making thin oxide portions particularly in electrically erasable and programmable read-only memory cells
02/28/1995US5393683 Forming first oxide layer on substrate in oxygen atmosphere, then forming second oxide layer in nitrous oxide atmosphere
02/28/1995US5393682 Method of making tapered poly profile for TFT device manufacturing
02/28/1995US5393681 Method for forming a compact transistor structure
02/28/1995US5393678 Method for making collector arrangement for magnetotransistor
02/28/1995US5393676 Implanting argon into polysilicon, patterning, implanting boron fluoride at shallower depth to reduce fluorine diffusion to gate oxide
02/28/1995US5393352 Pb/Bi-containing high-dielectric constant oxides using a non-P/Bi-containing perovskite as a buffer layer
02/28/1995US5392651 Capacitance type accelerometer
02/23/1995WO1995005706A1 High off-gate gain gto thyristor
02/23/1995WO1995005679A1 Bipolar transistors and method of making the same
02/23/1995WO1995005626A2 A method for simulating distributed effects within a device such as a power semiconductor device
02/23/1995DE4425360A1 Charge-coupled device and method for producing thereof
02/22/1995EP0639860A1 Non-volatile semiconductor memory
02/22/1995EP0639778A2 Fault based diagnosis of HBT-based circuits using electroluminescence
02/22/1995EP0639294A1 Semiconductor device with integrated rc network and schottky diode
02/22/1995EP0639266A1 A method of manufacturing a measuring device.
02/21/1995US5392306 Multiple quantum well structure and semiconductor device using the same
02/21/1995US5392238 Nonvolatile semiconductor memory device
02/21/1995US5392237 Semiconductor memory device with EEPROM in trench with polysilicon/metal contacting to source and drain in virtual ground type array
02/21/1995US5392187 Integrated circuit power device with transient responsive current limiting means
02/21/1995US5391951 Integrated circuit having an adjusting component and an adjustable thyristor
02/21/1995US5391908 Lateral insulated gate field effect semiconductor
02/21/1995US5391907 Semiconductor device with buried inverse T-type field region
02/21/1995US5391902 Semiconductor device and production method thereof
02/21/1995US5391899 Compound semiconductor device with a particular gate structure
02/21/1995US5391898 Insulated gate bipolar transistor having high short-circuit and latch-up withstandability
02/21/1995US5391897 Status induction semiconductor device
02/21/1995US5391895 Double diamond mesa vertical field effect transistor
02/21/1995US5391515 Capped anneal
02/21/1995US5391510 A diamond-like-carbon layer is used as masking structure to protect gate dielectric layer from contamination during high temperature annealing, removal by plasma etching, forming metal gate electrode in space vacated by masking layer
02/21/1995US5391509 Method of manufacturing a semiconductor device forming a high concentration impurity region through a CVD insulating film
02/21/1995US5391508 Method of forming semiconductor transistor devices
02/21/1995US5391507 Lift-off fabrication method for self-aligned thin film transistors
02/21/1995US5391506 Manufacturing method for semiconductor devices with source/drain formed in substrate projection.
02/21/1995US5391505 Active device constructed in opening formed in insulation layer and process for making same
02/21/1995US5391504 Method for producing integrated quasi-complementary bipolar transistors and field effect transistors
02/21/1995US5391503 Method of forming a stacked semiconductor device wherein semiconductor layers and insulating films are sequentially stacked and forming openings through such films and etchings using one of the insulating films as a mask
02/16/1995WO1995005006A1 Silicon carbide thyristor
02/16/1995WO1994028577A3 Method of producing a structure with narrow line width and devices obtained
02/16/1995DE4333661C1 Semiconductor component with high breakdown voltage