Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/1999
08/03/1999US5933732 Nonvolatile devices with P-channel EEPROM devices as injector
08/03/1999US5933731 Semiconductor device having gate oxide films having different thicknesses and manufacturing method thereof
08/03/1999US5933730 Method for providing a semiconductor device
08/03/1999US5933729 Reduction of ONO fence during self-aligned etch to eliminate poly stringers
08/03/1999US5933728 Process for fabricating bottom electrode of capacitor
08/03/1999US5933727 Method for increasing capacitance of an HSG rugged capacitor using a phosphine rich oxidation and subsequent wet etch
08/03/1999US5933726 Method of forming a semiconductor device have a screen stacked cell capacitor
08/03/1999US5933724 Method of manufacturing a semiconductor integrated circuit device using a photomask in which transmitted light beam intensities are controlled
08/03/1999US5933723 Covering densified oxide dielectric with electroconductive inner capacitor plate, coating with a nitride capacitor dielectric layer having less edge thickness depletion because oxide was densified, forming outer capacitor plate
08/03/1999US5933722 Method for manufacturing well structure in integrated circuit
08/03/1999US5933721 Method for fabricating differential threshold voltage transistor pair
08/03/1999US5933720 Method for manufacturing BiMOS device with improvement of high frequency characteristics of bipolar transistor
08/03/1999US5933719 Method of manufacturing a semiconductor device
08/03/1999US5933717 Vertical transistor interconnect structure and fabrication method thereof
08/03/1999US5933716 Method of making semiconductor device using oblique ion implantation
08/03/1999US5933715 Process for manufacturing discrete electronic devices
08/03/1999US5933713 Simplification, accuracy
08/03/1999US5933711 Fabrication method for chip size semiconductor package
08/03/1999US5933708 Bonding semiconductor chip to inner leads of a lead frame by pressing one side of polyimide film to leads and the other side to a partially cured polyimide coating on the active surface of chip, then fully curing polyimide layers together
08/03/1999US5933707 Crystal substrate processing
08/03/1999US5933706 Method for surface treatment of a cadmium zinc telluride crystal
08/03/1999US5933704 Method for observing a section of a semiconductor wafer
08/03/1999US5933522 Specific part searching method and device for memory LSI
08/03/1999US5933521 Wafer reader including a mirror assembly for reading wafer scribes without displacing wafers
08/03/1999US5933383 Semiconductor integrated circuit device
08/03/1999US5933380 Semiconductor memory device having a multilayered bitline structure with respective wiring layers for reading and writing data
08/03/1999US5933373 Semiconductor memory device having constant potential generator for clamping digit lines at constant level allowing precharge transistor to slightly turn on
08/03/1999US5933364 Semiconductor device with a metal layer for supplying a predetermined potential to a memory cell section
08/03/1999US5933359 Method, apparatus and computer program product for simulating ion implantation
08/03/1999US5933350 Semiconductor device development information integrating system
08/03/1999US5933316 Method for forming a titanate thin film on silicon, and device formed thereby
08/03/1999US5933314 Method and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucks
08/03/1999US5933220 Apparatus and method for limiting double exposure in stepper
08/03/1999US5933219 Projection exposure apparatus and device manufacturing method capable of controlling polarization direction
08/03/1999US5933217 For transferring a recticle pattern image to a substrate
08/03/1999US5933215 Exposure apparatus and device manufacturing method using the same
08/03/1999US5933212 Delineating method employing electron ray beam
08/03/1999US5933211 Charged beam lithography apparatus and method thereof
08/03/1999US5933205 Electro-optical device and method for driving the same
08/03/1999US5933204 Display device and production method thereof with insulating members between pixel electrodes for smooth surface
08/03/1999US5933047 High voltage generating circuit for volatile semiconductor memories
08/03/1999US5933027 High-voltage-tolerant output buffers in low-voltage technology
08/03/1999US5933022 Input pad having an enable terminal employed in a low-current-consuming integrated circuit
08/03/1999US5933017 Prober interface card for shortening the settling time
08/03/1999US5933002 Controlled bending actuator system
08/03/1999US5932929 Semiconductors
08/03/1999US5932928 Semiconductor circuit interconnections and methods of making such interconnections
08/03/1999US5932927 High-frequency device package
08/03/1999US5932923 Semiconductor device packages having dummy block leads and tie bars with extended portions to prevent formation of air traps in the encapsulate
08/03/1999US5932921 Semiconductor device
08/03/1999US5932920 Nonvolatile memory device and manufacturing method thereof
08/03/1999US5932919 MOSFETs with improved short channel effects
08/03/1999US5932914 Semiconductor protection device formed inside a well having contact with a buried layer
08/03/1999US5932913 MOS transistor with controlled shallow source/drain junction, source/drain strap portions, and source/drain electrodes on field insulation layers
08/03/1999US5932912 Semiconductor device having LDD structure with a recess in the source/drain region which is formed during the removal of a damaged layer
08/03/1999US5932911 Bar field effect transistor
08/03/1999US5932910 Flash memory cell structure having electrically isolated stacked gate
08/03/1999US5932909 Nonvolatile semiconductor memory device
08/03/1999US5932908 Trench EPROM
08/03/1999US5932907 Method, materials, and structures for noble metal electrode contacts to silicon
08/03/1999US5932905 Article comprising a capacitor with non-perovskite Sr-Ba-Ti oxide dielectric thin film
08/03/1999US5932904 Two transistor ferroelectric memory cell
08/03/1999US5932903 Ferroelectric semiconductor memory cell, a memory and a method for accessing the same
08/03/1999US5932896 Nitride system semiconductor device with oxygen
08/03/1999US5932893 Semiconductor device having doped polycrystalline layer
08/03/1999US5932891 Semiconductor device with test terminal and IC socket
08/03/1999US5932884 Charged-beam exposure system and charged-beam exposure method
08/03/1999US5932883 Ion implanter for implanting ion on wafer with low contamination
08/03/1999US5932881 Computer-implemented simulation for ion implantation into a semiconductor
08/03/1999US5932493 Method to minimize watermarks on silicon substrates
08/03/1999US5932492 Methods for forming alumina masking
08/03/1999US5932491 Forming side wall-aligned contact structure without hardmask layer; simplification
08/03/1999US5932490 Integrated circuitry having a pair of adjacent conductive lines and method of forming
08/03/1999US5932488 Method of dry etching
08/03/1999US5932487 Method for forming a planar intermetal dielectric layer
08/03/1999US5932485 Method of laser ablation of semiconductor structures
08/03/1999US5932484 Thin film semiconductor device for active matrix panel
08/03/1999US5932380 Setting threshold value for concentration of alkaline component which causes defective resolution, controlling and changing procesing atmosphere
08/03/1999US5932379 Repairing fractured wafers in semiconductor manufacturing
08/03/1999US5932378 Forming recesses in transparent substrate; then opacity layer; patterning
08/03/1999US5932333 Method for manufacturing charge storage electrode
08/03/1999US5932323 Method and apparatus for mounting, inspecting and adjusting probe card needles
08/03/1999US5932295 Method and apparatus for misted liquid source deposition of thin films with increased yield
08/03/1999US5932294 This invention relates, generally, to apparatus used in the manufacture of components in the compound semiconductor and related industries.
08/03/1999US5932289 Semiconductor wafers
08/03/1999US5932286 Deposition of silicon nitride thin films
08/03/1999US5932281 Method of manufacturing bi-layered ferroelectric thin film
08/03/1999US5932254 System for encapsulating microelectronic devices
08/03/1999US5932160 Process and mold for encapsulating semiconductor chips having radial runners
08/03/1999US5932118 Photoprocessing method
08/03/1999US5932115 Method of manufacturing a crown shape capacitor
08/03/1999US5932061 Board Level Decapsulator
08/03/1999US5932048 Method of fabricating direct-bonded semiconductor wafers
08/03/1999US5932043 Method for flat firing aluminum nitride/tungsten electronic modules
08/03/1999US5932027 Cleaning and drying photoresist coated wafers
08/03/1999US5932022 Hydrogen peroxide, hydrochloric acid
08/03/1999US5932014 Apparatus for producing semiconductor device
08/03/1999US5932013 Apparatus for cleaning a semiconductor processing tool
08/03/1999US5932009 Wafer spinner having a heat controller for fabricating a semiconductor device
08/03/1999US5932008 Apparatus for manufacturing a single-crystal and method of manufacturing a single-crystal using the same
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