| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 07/13/1999 | US5923429 Apparatus for monitoring in-situ the thickness of a film during film deposition and a method thereof |
| 07/13/1999 | US5923408 Substrate holding system and exposure apparatus using the same |
| 07/13/1999 | US5923393 Liquid crystal display |
| 07/13/1999 | US5923181 Methods and apparatus for burn-in stressing and simultaneous testing of semiconductor device chips in a multichip module |
| 07/13/1999 | US5923180 Compliant wafer prober docking adapter |
| 07/13/1999 | US5923177 Portable wedge probe for perusing signals on the pins of an IC |
| 07/13/1999 | US5923157 Semiconductor device capable of decreasing an internal voltage in period of acceleration test |
| 07/13/1999 | US5923092 Wiring between semiconductor integrated circuit chip electrode pads and a surrounding lead frame |
| 07/13/1999 | US5923091 Bonded semiconductor integrated circuit device |
| 07/13/1999 | US5923087 Semiconductor device comprising bonding pad of barrier metal, silicide and aluminum |
| 07/13/1999 | US5923080 Semiconductor apparatus having a leadframe with coated leads |
| 07/13/1999 | US5923079 Single-chip system having electrostatic discharge (ESD) protective circuitry including a single bipolar transistor portion |
| 07/13/1999 | US5923078 Method of forming a resistor and integrated circuitry having a resistor construction |
| 07/13/1999 | US5923073 Method of manufacturing a semiconductor device and semiconductor device manufactured according to the method |
| 07/13/1999 | US5923072 Semiconductor device with metallic protective film |
| 07/13/1999 | US5923071 Semiconductor device having a semiconductor film of low oxygen concentration |
| 07/13/1999 | US5923070 Semiconductor device having an element inclusion region for reducing stress caused by lattice mismatch |
| 07/13/1999 | US5923068 Electrostatic discharge protection device |
| 07/13/1999 | US5923065 Power MOSFET device manufactured with simplified fabrication processes to achieve improved ruggedness and product cost savings |
| 07/13/1999 | US5923064 Semiconductor memory device with a concentrated impurities in channel transistors |
| 07/13/1999 | US5923063 Double density V nonvolatile memory cell |
| 07/13/1999 | US5923062 Semiconductor device incorporating capacitors |
| 07/13/1999 | US5923061 CCD charge splitter |
| 07/13/1999 | US5923057 Bipolar semiconductor device and method for fabricating the same |
| 07/13/1999 | US5923056 Flash memory device |
| 07/13/1999 | US5923053 Light-emitting diode having a curved side surface for coupling out light |
| 07/13/1999 | US5923051 Field controlled semiconductor device of SiC and a method for production thereof |
| 07/13/1999 | US5923050 Amorphous silicon TFT |
| 07/13/1999 | US5923048 Semiconductor integrated circuit device with test element |
| 07/13/1999 | US5923047 Semiconductor die having sacrificial bond pads for die test |
| 07/13/1999 | US5923046 Quantum dot memory cell |
| 07/13/1999 | US5923034 Pattern transfer mask, mask inspection method and a mask inspection apparatus |
| 07/13/1999 | US5922624 Method for semiconductor processing using mixtures of HF and carboxylic acid |
| 07/13/1999 | US5922623 Etching silicon oxide film abutting refractory metal silicide electrodes |
| 07/13/1999 | US5922622 Pattern formation of silicon nitride |
| 07/13/1999 | US5922620 Chemical-mechanical polishing (CMP) method for controlling polishing rate using ionized water, and CMP apparatus |
| 07/13/1999 | US5922619 Depositing polysilicon layer onto silicon wafer and raised field oxide isolation structures; depositing polysilicon etch masking layer onto polysilicon layer, planarizing polysilicon etch masking layer; etching |
| 07/13/1999 | US5922606 Accurately measuring fluorescent impurities in rinse solution; monitoring for increasing concentration, then determining chip is clean by constant concentration |
| 07/13/1999 | US5922515 Forming a polysilicon hard mask to prevent contaminants form entering the contact hole |
| 07/13/1999 | US5922513 Illumination method and apparatus for the formation of micro patterns |
| 07/13/1999 | US5922496 Apertures formed by differential etching are larger on the bottom of the mask contacting the substrate than constricted openings located near the top side of the mask, knife edges within upper sidewalls; compensation for thermal expansion |
| 07/13/1999 | US5922495 Used in lithography of semiconductor, provides a mask in which the line width of light blocking patterns at the overlapping region is widened to block the excessive light from passing through the mask due to repeated exposure |
| 07/13/1999 | US5922411 Composition for forming ceramic material and process for producing ceramic material |
| 07/13/1999 | US5922224 Laser separation of semiconductor elements formed in a wafer of semiconductor material |
| 07/13/1999 | US5922219 Pretreating substrate in chamber by exposing to ultraviolet illuminated halogen gas and subsequently uniform etching silicon oxide from substrate using gas-phase reactant system comprising hydrogen flouride and catalyst |
| 07/13/1999 | US5922217 Method for correcting defects in a phase shift mask |
| 07/13/1999 | US5922180 Targets, shielding plate, emitters |
| 07/13/1999 | US5922168 Apparatus for making laminated electrical and electronic devices |
| 07/13/1999 | US5922167 Bending integrated circuit chips |
| 07/13/1999 | US5922138 Liquid treatment method and apparatus |
| 07/13/1999 | US5922137 Method of producing a semiconductor wafer and a cleaning apparatus for the same |
| 07/13/1999 | US5922136 Quick dump rinse (qdr) water bath receives a cassette of semiconductor substrates from a previous chemical mechanical polishing station, keeping the substrates submerged before transfer to the next station; high throughput, less chemicals |
| 07/13/1999 | US5922134 Simultaneous discharge device |
| 07/13/1999 | US5922133 Multiple edge deposition exclusion rings |
| 07/13/1999 | US5922125 Semiconductor device and method of manufacturing the same |
| 07/13/1999 | US5921855 Polishing pad having a grooved pattern for use in a chemical mechanical polishing system |
| 07/13/1999 | US5921773 Wafer boat for a vertical furnace |
| 07/13/1999 | US5921744 Wafer carrying device and wafer carrying method |
| 07/13/1999 | US5921559 Sealing structure for an airtight chamber |
| 07/13/1999 | US5921460 Method of soldering materials supported on low-melting substrates |
| 07/13/1999 | US5921458 Integrated circuit solder ball implant machine |
| 07/13/1999 | US5921257 Device for treating substrates in a fluid container |
| 07/13/1999 | CA2147318C Tape carrier for increasing the number of terminals between the tape carrier and a substrate |
| 07/13/1999 | CA2063508C Manufacture of a micromechanical element with two degrees of freedom |
| 07/12/1999 | CA2241440A1 Low voltage device operable with a high voltage supply |
| 07/10/1999 | WO1999050651A1 Pattern inspection device |
| 07/08/1999 | WO1999034656A1 Molded electronic package, method of preparation and method of shielding |
| 07/08/1999 | WO1999034644A1 Power and control system for a workpiece chuck |
| 07/08/1999 | WO1999034584A1 Bidding for telecommunications traffic over route segments |
| 07/08/1999 | WO1999034512A1 Semiconductor integrated circuit device, recording medium stored with cell library, and method for designing semiconductor integrated circuit |
| 07/08/1999 | WO1999034449A2 A high voltage thin film transistor with improved on-state characteristics and method for making same |
| 07/08/1999 | WO1999034445A1 Semiconductor integrated circuit |
| 07/08/1999 | WO1999034442A1 A novel passivation structure and its method of fabrication |
| 07/08/1999 | WO1999034437A1 Wafer transferring robot |
| 07/08/1999 | WO1999034436A1 Semiconductor device |
| 07/08/1999 | WO1999034435A1 Circuit board, manufacture thereof, and electronic device using circuit board |
| 07/08/1999 | WO1999034434A1 Epoxy bleeding inhibitor and method of preventing epoxy bleeding |
| 07/08/1999 | WO1999034433A1 A method of making a self-aligned disposable gate electrode for advanced cmos design |
| 07/08/1999 | WO1999034432A1 Method of providing a gettering scheme in the manufacture of silicon-on-insulator (soi) integrated circuits |
| 07/08/1999 | WO1999034431A1 Method of producing silicon oxide film, method of manufacturing semiconductor device, semiconductor device, display, and infrared irradiating device |
| 07/08/1999 | WO1999034430A1 Fluorocarbon film and method for forming the same |
| 07/08/1999 | WO1999034429A1 Method of etching and cleaning using fluorinated carbonyl compounds |
| 07/08/1999 | WO1999034428A1 Method of etching and cleaning using interhalogen compounds |
| 07/08/1999 | WO1999034427A1 Hydrofluorocarbon etching compounds with reduced global warming impact |
| 07/08/1999 | WO1999034426A1 Self-aligned contacts for semiconductor device |
| 07/08/1999 | WO1999034425A1 Etching process for organic anti-reflective coating |
| 07/08/1999 | WO1999034424A1 Precleaning step prior to metallization for sub-quarter micron application |
| 07/08/1999 | WO1999034423A1 Wafer passivation structure and method of fabrication |
| 07/08/1999 | WO1999034422A1 Aerosol substrate cleaner |
| 07/08/1999 | WO1999034421A1 Process for producing a porous layer by an electrochemical etching process |
| 07/08/1999 | WO1999034420A1 Wafer cleaning equipment and tray for use in wafer cleaning equipment |
| 07/08/1999 | WO1999034419A1 Etching process |
| 07/08/1999 | WO1999034415A1 A single step electroplating process for interconnect via fill and metal line patterning |
| 07/08/1999 | WO1999034414A1 Holding device |
| 07/08/1999 | WO1999034412A2 Workpiece chuck |
| 07/08/1999 | WO1999034310A1 Timing closure methodology |
| 07/08/1999 | WO1999034258A1 Alignment device and lithographic apparatus comprising such a device |
| 07/08/1999 | WO1999034257A1 Positioning device having three coil systems mutually enclosing angles of 120°, and lithographic device comprising such a positioning device |
| 07/08/1999 | WO1999034256A1 Method for continuous and maskless patterning of structured substrates |
| 07/08/1999 | WO1999034159A1 Temperature control system for a workpiece chuck |