Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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02/08/2000 | US6022779 Method of forming mask ROM |
02/08/2000 | US6022778 Process for the manufacturing of integrated circuits comprising low-voltage and high-voltage DMOS-technology power devices and non-volatile memory cells |
02/08/2000 | US6022777 Method of making semiconductor device |
02/08/2000 | US6022776 Method of using silicon oxynitride to improve fabricating of DRAM contacts and landing pads |
02/08/2000 | US6022775 High effective area capacitor for high density DRAM circuits using silicide agglomeration |
02/08/2000 | US6022774 Forming conductor pattern on semiconductor;oxidation resistant overcoat, dielectrics |
02/08/2000 | US6022773 Method of making a semiconductor device |
02/08/2000 | US6022772 Stacked capacitor having a corrugated electrode |
02/08/2000 | US6022771 Fabrication of semiconductor device having shallow junctions and sidewall spacers creating taper-shaped isolation where the source and drain regions meet the gate regions |
02/08/2000 | US6022770 NVRAM utilizing high voltage TFT device and method for making the same |
02/08/2000 | US6022769 Method of making self-aligned silicided MOS transistor with ESD protection improvement |
02/08/2000 | US6022768 Method and mask structure for self-aligning ion implanting to form various device structures |
02/08/2000 | US6022767 Semiconductor device with insulated gate electrode and method of fabricating the same |
02/08/2000 | US6022765 Semiconductor device having a SOI structure and a manufacturing method thereof |
02/08/2000 | US6022764 Exposure apparatus and method for forming thin film transistor |
02/08/2000 | US6022763 Substrate for semiconductor device, semiconductor device using the same, and method for manufacture thereof |
02/08/2000 | US6022762 Process for forming a morphological edge structure to seal integrated electronic devices |
02/08/2000 | US6022761 Method for coupling substrates and structure |
02/08/2000 | US6022758 Process for manufacturing solder leads on a semiconductor device package |
02/08/2000 | US6022757 Semiconductor device and manufacturing method |
02/08/2000 | US6022753 Manufacturing methods of liquid crystal displays |
02/08/2000 | US6022751 Production of electronic device |
02/08/2000 | US6022749 Using a superlattice to determine the temperature of a semiconductor fabrication process |
02/08/2000 | US6022672 Method of manufacturing semiconductors having improved temperature control |
02/08/2000 | US6022670 Hydrophobic photoimagable dielectric filmn in solvent;metallization |
02/08/2000 | US6022669 Method of fabricating an integrated circuit using self-patterned thin films |
02/08/2000 | US6022666 Blend of alkali-soluble hydroxy group containing polymer and cyano group-containing oximesulfonate |
02/08/2000 | US6022650 Substrate box; photoresist layer; rotation |
02/08/2000 | US6022645 Double-sided photomask |
02/08/2000 | US6022625 Method for producing thick crack-free coatings from hydrogen silsesquioxane resin |
02/08/2000 | US6022616 Adhesive composition with small particle size for microelectronic devices |
02/08/2000 | US6022587 Prewafer reaction layer is deposited onto a susceptor placed in reaction chamber to form prewafer reaction layer coated susceptor prior to film deposition, deposition gas is fed into reaction chamber to flow over the prewafer to form film |
02/08/2000 | US6022586 Supplying first film-forming gases into process chamber of vessel while heating the chamber so as to form a first pre-coating film on the inner surface of the process vessel, loading semiconductor wafer into chamber, coating |
02/08/2000 | US6022583 Dispensing series of discrete, single-point droplets and series of continuous beads within an area bounded by a dam, the encapsulant material spreading out from droplets and continuous beads to form encapsulating layer over the wire |
02/08/2000 | US6022485 Contacting surface of photoresist-free solid substrate with catalyst having patterns on support in presence of reactant to selectively remove material from those areas of said solid substrate threby transferring geometric pattern to substrate |
02/08/2000 | US6022484 Semiconductor processor with wafer face protection |
02/08/2000 | US6022465 For customizing electrode contact placement on a semiconductor wafer while depositing and/or removing a material on semiconductor wafer |
02/08/2000 | US6022461 Sputtering apparatus |
02/08/2000 | US6022460 Enhanced inductively coupled plasma reactor |
02/08/2000 | US6022458 Method of production of a semiconductor substrate |
02/08/2000 | US6022457 Forming titanium layer on silicon substrate, forming silicon layer and cobalt layer; performing thermal treatment to form cobalt silicide layer |
02/08/2000 | US6022446 Shallow magnetic fields for generating circulating electrons to enhance plasma processing |
02/08/2000 | US6022426 Controlled oxygen content copper clad laminate, |
02/08/2000 | US6022418 Vacuum processing method |
02/08/2000 | US6022417 Support for wafer-shaped objects, in particular silicon wafers |
02/08/2000 | US6022415 Spherical article conveying atmosphere replacing device |
02/08/2000 | US6022414 Single body injector and method for delivering gases to a surface |
02/08/2000 | US6022412 Epitaxial reactor, susceptor and gas-flow system |
02/08/2000 | US6022410 Molecular beam epitaxy chamber |
02/08/2000 | US6022225 Electrical assembly |
02/08/2000 | US6022185 Substrate transferring device |
02/08/2000 | US6022142 Monitor of process temperature and formation of alloy |
02/08/2000 | US6022095 Curable compositions |
02/08/2000 | US6022052 Quartz tank for wet semiconductor wafer processing |
02/08/2000 | US6021991 Active anti-vibration apparatus |
02/08/2000 | US6021904 Chip carrier processing and shipping array and method of manufacture thereof |
02/08/2000 | US6021806 Slurry distribution system for a CMP process in semiconductor device fabrication |
02/08/2000 | US6021791 Method and apparatus for immersion cleaning of semiconductor devices |
02/08/2000 | US6021790 Substrate treating apparatus and method for treating substrate |
02/08/2000 | US6021789 Wafer cleaning system with progressive megasonic wave |
02/08/2000 | US6021786 Rinsing a wafer; rotating drying |
02/08/2000 | US6021785 Procedure and device for cleaning disk-shaped objects in particular wafers by sonification with water as rinsing medium |
02/08/2000 | US6021772 Bandsaw and process for cutting off slices from a workpiece |
02/08/2000 | US6021696 Slicing method for adjusting a force applied to an object |
02/08/2000 | US6021564 Method for reducing via inductance in an electronic assembly and article |
02/08/2000 | CA2153774C Particle detection system with reflective line-to-spot collector |
02/03/2000 | WO2000005816A1 High-speed current switch with complementary stages |
02/03/2000 | WO2000005773A1 Integrated circuit interconnect lines having sidewall layers |
02/03/2000 | WO2000005772A1 Method and device for processing a flat workpiece, especially a semiconductor wafer |
02/03/2000 | WO2000005770A1 Method for double-sided patterning of high temperature superconducting circuits |
02/03/2000 | WO2000005768A1 J-fet semiconductor device |
02/03/2000 | WO2000005767A1 Semiconductor device and method for fabricating the same |
02/03/2000 | WO2000005765A1 Method for producing rewiring substrates for semiconductor chip packages |
02/03/2000 | WO2000005763A1 Method of producing an interconnect structure for an integrated circuit |
02/03/2000 | WO2000005762A1 Transfer arm |
02/03/2000 | WO2000005761A1 Wafer holding hand |
02/03/2000 | WO2000005760A1 Detection of nontransient processing anomalies in vacuum manufacturing process |
02/03/2000 | WO2000005759A1 Method for measuring number of yield loss chips and number of poor chips by type due to defect of semiconductor chips |
02/03/2000 | WO2000005758A1 Electronic component and method for the production thereof |
02/03/2000 | WO2000005757A1 Low temperature process for fabricating layered superlattice materials and making electronic devices including same |
02/03/2000 | WO2000005756A1 Method of etching doped silicon dioxide with selectivity to undoped silicon dioxide with a high density plasma etcher |
02/03/2000 | WO2000005755A1 Method of forming a laterally-varying charge profile in a silicon carbide substrate |
02/03/2000 | WO2000005754A1 Semiconductor thin film and thin film device |
02/03/2000 | WO2000005753A1 Infra-red transparent thermal reactor cover member |
02/03/2000 | WO2000005752A1 Method and apparatus for processing wafers |
02/03/2000 | WO2000005751A1 Method and apparatus for reducing contamination of a substrate in a substrate processing system |
02/03/2000 | WO2000005750A1 Improved substrate support member |
02/03/2000 | WO2000005749A2 Method and apparatus for anisotropic etching |
02/03/2000 | WO2000005748A2 Blind pin placement on circuit boards |
02/03/2000 | WO2000005747A2 Metallization structures for microelectronic applications and process for forming the structures |
02/03/2000 | WO2000005745A1 Physical vapor processing of a surface with non-uniformity compensation |
02/03/2000 | WO2000005722A1 Resistive ferroelectric storage cell |
02/03/2000 | WO2000005721A1 Storage assembly consisting of resistive ferroelectric storage cells |
02/03/2000 | WO2000005720A1 Ferroelectric storage assembly |
02/03/2000 | WO2000005719A1 Storage assembly comprised of a plurality of resistive ferroelectric storage cells |
02/03/2000 | WO2000005431A1 Cvd apparatus |
02/03/2000 | WO2000005430A1 Chemical vapor deposition vaporizer |
02/03/2000 | WO2000005297A1 Method of producing porous calcined polyimide |
02/03/2000 | WO2000005282A1 Water soluble positive-working photoresist composition |
02/03/2000 | WO1999065081A3 Semiconductor arrangement with ohmic contact and a method for contacting a semiconductor arrangement |