Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2000
02/23/2000EP0980701A1 Gas recovery unit
02/23/2000EP0980590A2 Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices
02/23/2000EP0980589A1 A PN-DIODE OF SiC AND A METHOD FOR PRODUCTION THEREOF
02/23/2000EP0980588A1 Device based on quantic islands and method for making same
02/23/2000EP0980585A1 Multiple single-wafer loadlock wafer processing apparatus and loading and unloading method therefor
02/23/2000EP0980542A1 Method of patterning sub-0.25 lambda line features with high transmission, "attenuated" phase shift masks
02/23/2000EP0980541A1 Method and apparatus for direct writing of semiconductor die using microcolumn array
02/23/2000EP0980446A1 Silicon etching process for making microchannel plates
02/23/2000EP0980305A1 Method and apparatus for molding plastic packages
02/23/2000EP0980301A1 Coaxial drive loader arm
02/23/2000EP0944840A4 Probe card for high speed testing
02/23/2000EP0846325B1 Reduced area sense amplifier isolation layout in a dynamic ram architecture
02/23/2000EP0759893A4 Coating of substrates
02/23/2000CN1245629A Ceramic composite wiring structure for semiconductor devices and method of manufacture thereof
02/23/2000CN1245587A Film-like composite structure and method of manufacture thereof
02/23/2000CN1245586A Bumps in grooves for elastic positioning
02/23/2000CN1245520A Reducing void formation in curable adhesive formulations
02/23/2000CN1245351A Semiconductor chip with surface covering layer
02/23/2000CN1245350A Semiconductor device and method for manufacturing same
02/23/2000CN1245349A Method for manufacturing high-density semiconductor storage device
02/23/2000CN1245348A Method for producing material layer for composition of picture
02/23/2000CN1049765C Inter-connecting contact on integrated circuit and its making method
02/23/2000CN1049764C Method for making dielectric layer of integrated circuit
02/23/2000CN1049763C Method for forming metal interconnection of semiconductor device
02/23/2000CN1049762C Method of manufacturing semiconductor device
02/22/2000US6028994 Method for predicting performance of microelectronic device based on electrical parameter test data using computer model
02/22/2000US6028991 Layout parameter extraction device
02/22/2000US6028988 System for logic synthesis-for-testability capable of improving testability for an FSM having an asynchronous reset state
02/22/2000US6028986 Methods of designing and fabricating intergrated circuits which take into account capacitive loading by the intergrated circuit potting material
02/22/2000US6028953 Mask defect repair system and method which controls a dose of a particle beam
02/22/2000US6028813 NOR type semiconductor memory device and a method for reading data stored therein
02/22/2000US6028788 Flash memory device
02/22/2000US6028763 Capacitor and method for forming a capacitor
02/22/2000US6028762 Electrostatic chuck
02/22/2000US6028756 Using topological features to lower the blowing current needed for fuses
02/22/2000US6028660 Illumination unit for an optical apparatus
02/22/2000US6028659 Scanning projection-exposure apparatus and methods
02/22/2000US6028652 Array substrate for display device and manufacturing method thereof
02/22/2000US6028629 Solid-state imaging device and method of manufacturing the same
02/22/2000US6028474 Semiconductor integrated circuit
02/22/2000US6028447 FPGA having predictable open-drain drive mode
02/22/2000US6028443 Test circuit for semiconductor integrated logic circuit using tristate buffers allowing control circuit for tristate to be tested
02/22/2000US6028435 Semiconductor device evaluation system using optical fiber
02/22/2000US6028395 Vacuum plasma processor having coil with added conducting segments to its peripheral part
02/22/2000US6028394 Cold electron plasma reactive ion etching using a rotating electromagnetic filter
02/22/2000US6028376 Positioning apparatus and exposure apparatus using the same
02/22/2000US6028368 Semiconductor device with potting resin structures
02/22/2000US6028366 Ball grid array semiconductor device
02/22/2000US6028362 Damascene wiring with flat surface
02/22/2000US6028361 Method of manufacturing of semiconductor device having low leakage current
02/22/2000US6028360 Semiconductor integrated circuit device in which a conductive film is formed over a trap film which in turn is formed over a titanium film
02/22/2000US6028359 Integrated circuit having amorphous silicide layer in contacts and vias and method of manufacture therefor
02/22/2000US6028358 Package for a semiconductor device and a semiconductor device
02/22/2000US6028357 Semiconductor device with a solder bump over a pillar form
02/22/2000US6028356 Plastic-packaged semiconductor integrated circuit
02/22/2000US6028348 Low thermal impedance integrated circuit
02/22/2000US6028346 Isolated trench semiconductor device
02/22/2000US6028345 Reduced resistance base contact for single polysilicon bipolar transistors using extrinsic base diffusion from a diffusion source dielectric layer
02/22/2000US6028344 Bipolar transistor on a semiconductor-on-insulator substrate
02/22/2000US6028340 Static random access memory cell having a field region
02/22/2000US6028339 Dual work function CMOS device
02/22/2000US6028338 Semiconductor integrated circuit device with electrostatic damage protection
02/22/2000US6028337 Lateral thin-film silicon-on-insulator (SOI) device having lateral depletion means for depleting a portion of drift region
02/22/2000US6028336 Triple polysilicon flash EEPROM arrays having a separate erase gate for each row of floating gates, and methods of manufacturing such arrays
02/22/2000US6028335 Semiconductor device
02/22/2000US6028334 Semiconductor device and method of manufacturing the same
02/22/2000US6028333 Electric device, matrix device, electro-optical display device, and semiconductor memory having thin-film transistors
02/22/2000US6028329 Bipolar junction transistor device and a method of fabricating the same
02/22/2000US6028326 Thin film transistor including a catalytic element for promoting crystallization of a semiconductor film
02/22/2000US6028325 Semiconductor device contact registration structure
02/22/2000US6028317 Charged particle beam optical element charged particle beam exposure apparatus and method of adjusting the same
02/22/2000US6028286 Method for igniting a plasma inside a plasma processing reactor
02/22/2000US6028022 Method for producing joined body of a1n substrates and joining agent used for the joining
02/22/2000US6028015 Process for treating damaged surfaces of low dielectric constant organo silicon oxide insulation material to inhibit moisture absorption
02/22/2000US6028014 Controlling selected parameter of the plasma to alter the ratio of molecular oxygen cations to atomic oxygen cations detected in the plasma, then supplying tetraethoxysilane into vapor deposition reactor to coat semiconductor with silica
02/22/2000US6028013 Moisture repellant integrated circuit dielectric material combination
02/22/2000US6028012 Process for forming a gate-quality insulating layer on a silicon carbide substrate
02/22/2000US6028010 Style gas ring with a guard extension
02/22/2000US6028009 Process for fabricating a device with a cavity formed at one end thereof
02/22/2000US6028005 Methods for reducing electric fields during the fabrication of integrated circuit devices
02/22/2000US6028004 Process for controlling the height of a stud intersecting an interconnect
02/22/2000US6028003 Method of forming an interconnect structure with a graded composition using a nitrided target
02/22/2000US6028002 Refractory metal roughness reduction using high temperature anneal in hydrides or organo-silane ambients
02/22/2000US6028001 Methods of fabricating contact holes for integrated circuit substrates by etching to define a sidewall and concurrently forming a polymer on the sidewall
02/22/2000US6028000 Method of forming contact plugs in semiconductor device having different sized contact holes
02/22/2000US6027999 Pad definition to achieve highly reflective plate without affecting bondability
02/22/2000US6027998 Method for fully planarized conductive line for a stack gate
02/22/2000US6027997 An electroconductive layer, e.g. tungsten, deposited in a plug opening is chemomechanical polished using slurry comprising abrasive and copper sulfate or copper perchlorate to form plug
02/22/2000US6027996 Method of planarizing a pre-metal dielectric layer using chemical-mechanical polishing
02/22/2000US6027995 Method for fabricating an interconnect structure with hard mask and low dielectric constant materials
02/22/2000US6027994 Method to fabricate a dual metal-damascene structure in a substrate
02/22/2000US6027993 Method of forming an opening in an insulation film over a semiconductor substrate
02/22/2000US6027992 Semiconductor device having a gallium and nitrogen containing barrier layer and method of manufacturing thereof
02/22/2000US6027991 Method of making a silicide semiconductor device with junction breakdown prevention
02/22/2000US6027990 Coating refractory metal film onto substrate, implanting silicon, annealing to form silicide
02/22/2000US6027989 Bandgap tuning of semiconductor well structure
02/22/2000US6027988 Method of separating films from bulk substrates by plasma immersion ion implantation
02/22/2000US6027987 Method of manufacturing a crystalline semiconductor
02/22/2000US6027985 Method for forming element isolating film of semiconductor device
02/22/2000US6027984 Method for growing oxide