Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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02/09/2000 | EP0978016A1 Antireflective coating compositions for photoresist compositions and use thereof |
02/09/2000 | EP0978015A1 Light absorbing polymers |
02/09/2000 | EP0977911A1 Preparation of copper-indium-gallium-diselenide precursor films by electrodeposition for fabricating high efficiency solar cells |
02/09/2000 | EP0977906A1 Metered gas control in a substrate processing apparatus |
02/09/2000 | EP0977797A1 Organohydridosiloxane resins with high organic content |
02/09/2000 | EP0977795A1 Synthesis of siloxane resins |
02/09/2000 | EP0977652A1 Abrasive material for the needle point of a probe card |
02/09/2000 | EP0791189B1 Positioning device with a vibration-free object table |
02/09/2000 | EP0775304B1 Method of producing cavity structures |
02/09/2000 | CN1244143A Processf or making a parylene coating |
02/09/2000 | CN1244070A Voltage adaptable interface circuit |
02/09/2000 | CN1244041A Semiconductor device and manufacture thereof |
02/09/2000 | CN1244040A Channel capacitor with epitaxial cover layer |
02/09/2000 | CN1244039A Semiconductor circuits and manufacture thereof |
02/09/2000 | CN1244037A Manufacture of semiconductor device |
02/09/2000 | CN1244036A Device and method for forming controllable isolating layer on top of deep channel |
02/09/2000 | CN1244035A High-temp dynamic ageing device for integrated circuits |
02/09/2000 | CN1244034A Semiconductor device and manufacture thereof, electric circuit board and electronic device therefor |
02/09/2000 | CN1244033A Method for polishing surface of copper boased material mechanically and chemically |
02/09/2000 | CN1244032A Method for forming dielectric layer |
02/09/2000 | CN1244031A Method and apparatus for manufacturing semiconductor layers, and manufacture of photovoltaic solar cell |
02/09/2000 | CN1244030A Phase-shift mask and manufacture thereof |
02/09/2000 | CN1244028A Semiconductor device and manufacture thereof, substrate, electric circuit board and electronic device for manufacturing same |
02/09/2000 | CN1244027A Method for transferring miniature machined block including integrated circuits |
02/09/2000 | CN1244017A Non-volatile magnetic memory unit and component |
02/09/2000 | CN1243948A Method for nondestructively measuring doped concentration and distribution of drift zone of semiconductor device |
02/09/2000 | CN1243856A Chemicomechanical grinding composition for manufacturing semiconductor |
02/09/2000 | CN1049300C Method for the fabrication of a semicodnuctor device |
02/09/2000 | CN1049299C Method for forming contact holes in semiconductor device |
02/08/2000 | US6023666 In-line method of monitoring die attach material adhesive weight |
02/08/2000 | US6023555 Radiant heating apparatus and method |
02/08/2000 | US6023424 Nonvolatile semiconductor memory device having verify function |
02/08/2000 | US6023423 Nonvolatile semiconductor memory device |
02/08/2000 | US6023407 Structure for a thin film multilayer capacitor |
02/08/2000 | US6023405 Electrostatic chuck with improved erosion resistance |
02/08/2000 | US6023338 Overlay alignment measurement of wafers |
02/08/2000 | US6023336 Technique for automated alignment of semiconductor chips |
02/08/2000 | US6023327 System and method for detecting defects in an interlayer dielectric of a semiconductor device |
02/08/2000 | US6023321 Projection exposure apparatus and method |
02/08/2000 | US6023320 Scanning exposure apparatus with surface position detecting system |
02/08/2000 | US6023103 Chip-scale carrier for semiconductor devices including mounted spring contacts |
02/08/2000 | US6023102 Low resistance contact between circuit metal levels |
02/08/2000 | US6023101 Semiconductor device and method for manufacturing the same |
02/08/2000 | US6023100 Metallization stack structure to improve electromigration resistance and keep low resistivity of ULSI interconnects |
02/08/2000 | US6023099 Semiconductor integrated circuit device with dummy pattern for equalizing thickness of inter-level insulating structure |
02/08/2000 | US6023096 Semiconductor device having metal foil integral with sealing resin |
02/08/2000 | US6023095 Semiconductor device and manufacture method thereof |
02/08/2000 | US6023094 Semiconductor wafer having a bottom surface protective coating |
02/08/2000 | US6023093 Deuterated direlectric and polysilicon film-based semiconductor devices and method of manufacture thereof |
02/08/2000 | US6023091 Semiconductor heater and method for making |
02/08/2000 | US6023089 Semiconductor memory device having a SOI structure |
02/08/2000 | US6023088 Semiconductor device formed on an insulator and having a damaged portion at the interface between the insulator and the active layer |
02/08/2000 | US6023087 Thin film transistor having an insulating membrane layer on a portion of its active layer |
02/08/2000 | US6023085 Core cell structure and corresponding process for NAND-type high performance flash memory device |
02/08/2000 | US6023084 Semiconductor integrated circuit device including a memory device having memory cells with increased information storage capacitance and method of manufacturing same |
02/08/2000 | US6023083 Semiconductor device having a conductor pattern side face provided with a separate conductive sidewall |
02/08/2000 | US6023082 Strain-based control of crystal anisotropy for perovskite oxides on semiconductor-based material |
02/08/2000 | US6023081 Semiconductor image sensor |
02/08/2000 | US6023080 Input/output connection structure of a semiconductor device |
02/08/2000 | US6023079 Multilayer |
02/08/2000 | US6023075 Electro-optical device and method for manufacturing the same |
02/08/2000 | US6023067 Blanking system for electron beam projection system |
02/08/2000 | US6023041 Method for using photoabsorptive coatings and consumable copper to control exit via redeposit as well as diameter variance |
02/08/2000 | US6023039 Method of cleaving a brittle material using a point heat source for providing a thermal stress |
02/08/2000 | US6023038 Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system |
02/08/2000 | US6022815 Method of fabricating next-to-minimum-size transistor gate using mask-edge gate definition technique |
02/08/2000 | US6022814 Coating a polysiloxane/silsesquioxane on the substrate; heating to a temperature ranging from 250.degree. c. to the glass transition point of the polymer; dielectric film of low density and a large free volume; heat resistance |
02/08/2000 | US6022813 Method and apparatus for manufacturing semiconductor devices |
02/08/2000 | US6022812 Dielectric polysilicate films by vapor deposition of tetra-alkoxysilane(s) on a substrate; exposing to water and acid or base catalyst to gel; drying; high porosity; low dielectric constant; semiconductors; integrated circuits |
02/08/2000 | US6022811 Method of uniform CVD |
02/08/2000 | US6022810 Method of manufacturing semiconductor device |
02/08/2000 | US6022809 Silicon dioxide |
02/08/2000 | US6022808 Filling hole with copper containing dope; annealing to diffuse dope |
02/08/2000 | US6022807 Method for fabricating an integrated circuit |
02/08/2000 | US6022806 Supplying process gases; vapor deposition; rotating wafer |
02/08/2000 | US6022805 Method of fabricating semiconductor device with a multi-layered interconnection structure having a low contact resistance |
02/08/2000 | US6022804 Semiconductor device and its manufacturing method |
02/08/2000 | US6022803 Forming metal film; second film containing platinum in determined pattern by lift-off method; forming photoresis;forming gold plate film; etching; u-shaped gold lines |
02/08/2000 | US6022802 Low dielectric constant intermetal dielectric (IMD) by formation of air gap between metal lines |
02/08/2000 | US6022801 Method for forming an atomically flat interface for a highly disordered metal-silicon barrier film |
02/08/2000 | US6022800 Method of forming barrier layer for tungsten plugs in interlayer dielectrics |
02/08/2000 | US6022799 Low pressure vapor deposition of silicon oxynitride |
02/08/2000 | US6022798 Method of forming an interconnect using thin films of Ti and TiN |
02/08/2000 | US6022797 Method of manufacturing through holes in a semiconductor device |
02/08/2000 | US6022796 Geometrical control of device corner threshold |
02/08/2000 | US6022795 Sputtering titanium nitride; annealing; forming silicide |
02/08/2000 | US6022794 Method of manufacturing a buried contact in a static random access memory |
02/08/2000 | US6022793 Thermal annealing; forming nucleation defects; overcoating with epitaxial layer |
02/08/2000 | US6022792 Semiconductor dicing and assembling method |
02/08/2000 | US6022791 Chip crack stop |
02/08/2000 | US6022790 Semiconductor process integration of a guard ring structure |
02/08/2000 | US6022789 Method of selective oxidation |
02/08/2000 | US6022788 Method of forming an integrated circuit having spacer after shallow trench fill and integrated circuit formed thereby |
02/08/2000 | US6022786 Method for manufacturing a capacitor for a semiconductor arrangement |
02/08/2000 | US6022785 Method of fabricating a metal-oxide-semiconductor transistor |
02/08/2000 | US6022784 Method for manufacturing a semiconductor device |
02/08/2000 | US6022783 NMOS field effect transistors and methods of forming NMOS field effect transistors |
02/08/2000 | US6022782 Method for forming integrated circuit transistors using sacrificial spacer |
02/08/2000 | US6022781 Method for fabricating a MOSFET with raised STI isolation self-aligned to the gate stack |
02/08/2000 | US6022780 Semiconductor device having source and drain regions different in depth from each other and process of fabrication thereof |