| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/22/2000 | US6027983 Method of manufacturing trench isolate semiconductor integrated circuit device |
| 02/22/2000 | US6027982 Method to form shallow trench isolation structures with improved isolation fill and surface planarity |
| 02/22/2000 | US6027981 Method for forming a DRAM cell with a fork-shaped capacitor |
| 02/22/2000 | US6027979 Method of forming an integrated circuit device |
| 02/22/2000 | US6027978 Method of making an IGFET with a non-uniform lateral doping profile in the channel region |
| 02/22/2000 | US6027977 Method of fabricating semiconductor device with MIS structure |
| 02/22/2000 | US6027976 Process for making semiconductor device having nitride at silicon and polysilicon interfaces |
| 02/22/2000 | US6027975 Process for fabricating vertical transistors |
| 02/22/2000 | US6027974 Nonvolatile memory |
| 02/22/2000 | US6027973 Oxidation and etchback process for forming thick contact area on polysilicon layer in microelectronic structure |
| 02/22/2000 | US6027972 Method for producing very small structural widths on a semiconductor substrate |
| 02/22/2000 | US6027971 Methods of forming memory devices having protected gate electrodes |
| 02/22/2000 | US6027970 Method of increasing capacitance of memory cells incorporating hemispherical grained silicon |
| 02/22/2000 | US6027969 Capacitor structure for a dynamic random access memory cell |
| 02/22/2000 | US6027968 Forming high surface area node by selectively etching alternating layers of low doped and high doped concentration borophosphosilicate glass to form surface protrusions within via sidewalls |
| 02/22/2000 | US6027967 Method of making a fin-like stacked capacitor |
| 02/22/2000 | US6027966 Isolated sidewall capacitor |
| 02/22/2000 | US6027965 Method of manufacturing an integrated circuit with MOS transistors having high breakdown voltages, and with precision resistors |
| 02/22/2000 | US6027964 Method of making an IGFET with a selectively doped gate in combination with a protected resistor |
| 02/22/2000 | US6027963 Method and mask structure for self-aligning ion implanting to form various device structures |
| 02/22/2000 | US6027962 Method of manufacturing semiconductor device having bipolar transistor and field-effect transistor |
| 02/22/2000 | US6027961 CMOS semiconductor devices and method of formation |
| 02/22/2000 | US6027960 Cleaning a non-monocrystal silicon film formed on a substrate, then moving substrate during irradiation by linear laser beam to overlappingly scan surface and crystallize film within an oxygen-containing atmosphere |
| 02/22/2000 | US6027959 Methods for in-situ removal of an anti-reflective coating during a nitride resistor protect etching process |
| 02/22/2000 | US6027958 Transferred flexible integrated circuit |
| 02/22/2000 | US6027953 Lateral PN arrayed digital X-ray image sensor |
| 02/22/2000 | US6027951 Method of making high aspect ratio probes with self-aligned control electrodes |
| 02/22/2000 | US6027950 Method for achieving accurate SOG etchback selectivity |
| 02/22/2000 | US6027949 Method for evaluating a semiconductor device |
| 02/22/2000 | US6027948 Method to permit high temperature assembly processes for magnetically sensitive devices |
| 02/22/2000 | US6027947 Partially or completely encapsulated top electrode of a ferroelectric capacitor |
| 02/22/2000 | US6027861 VLSIC patterning process |
| 02/22/2000 | US6027856 Film forming mixture comprising alkali-soluble polymer, a photoacid generator and an allyl alcohol which becomes a protecting group for alkali-soluble polymer moieties when photoacid generator decomposes upon exposure to radiation |
| 02/22/2000 | US6027843 Charged-particle-beam microlithography methods including correction of imaging faults |
| 02/22/2000 | US6027842 Process for controlling etching parameters |
| 02/22/2000 | US6027841 Charged-particle-beam projection-exposure method exhibiting aberration reduction through multiple deflector use |
| 02/22/2000 | US6027839 Transferring pattern images through a mix-and-match exposure system, which achieves good overlay accuracy; wafer alignment is carried out at each group of narrow image fields corresponding to a wide image field; photolithography |
| 02/22/2000 | US6027790 Etching process which protects metal |
| 02/22/2000 | US6027761 Manufacturing process and structure of capacitor |
| 02/22/2000 | US6027760 Photoresist coating process control with solvent vapor sensor |
| 02/22/2000 | US6027669 Polishing composition |
| 02/22/2000 | US6027666 Fast luminescent silicon |
| 02/22/2000 | US6027662 Materials processing by separately generated process medium constituents |
| 02/22/2000 | US6027630 Method for electrochemical fabrication |
| 02/22/2000 | US6027618 Compact in-line film deposition system |
| 02/22/2000 | US6027606 Center gas feed apparatus for a high density plasma reactor |
| 02/22/2000 | US6027605 Plasma etching apparatus and method and apparatus for verifying a wafer |
| 02/22/2000 | US6027604 Dry etching apparatus having upper and lower electrodes with grooved insulating rings or grooved chamber sidewalls |
| 02/22/2000 | US6027602 Wet processing apparatus |
| 02/22/2000 | US6027574 Method of drying a substrate by lowering a fluid surface level |
| 02/22/2000 | US6027573 Industrial cleaning sponge apparatus and method for extracting residue from a sponge material |
| 02/22/2000 | US6027571 Specific weight percents of hydrogen fluoride and ammonium fluoride, prepared by dissolving ammonium gas into a solution of hydrogen fluoride; smaller difference in etching speeds of oxide films obtained by different methods |
| 02/22/2000 | US6027563 Method and apparatus for the oriented solidification of molten silicon to form an ingot in a bottomless crystallization chamber |
| 02/22/2000 | US6027301 Semiconductor wafer testing apparatus with a combined wafer alignment/wafer recognition station |
| 02/22/2000 | US6027262 Resist process method and system |
| 02/22/2000 | US6027244 Apparatus for determining the temperature of a semi-transparent radiating body |
| 02/22/2000 | US6026986 Chemical spray system and waste liquid tank used in same |
| 02/22/2000 | US6026963 Moisture barrier bag having window |
| 02/22/2000 | US6026896 Temperature control system for semiconductor processing facilities |
| 02/22/2000 | US6026832 Ultrasonic cleaning apparatus |
| 02/22/2000 | US6026830 Post-CMP cleaner apparatus and method |
| 02/22/2000 | US6026764 Apparatus for low pressure chemical vapor deposition |
| 02/22/2000 | US6026763 Thin-film deposition apparatus using cathodic arc discharge |
| 02/22/2000 | US6026762 Apparatus for improved remote microwave plasma source for use with substrate processing systems |
| 02/22/2000 | US6026589 Wafer carrier and semiconductor apparatus for processing a semiconductor substrate |
| 02/22/2000 | US6026588 Superheated vapor dryer system |
| 02/22/2000 | US6026561 Automatic assembler/disassembler apparatus adapted to pressurized sealable transportable containers |
| 02/22/2000 | CA2086367C Bonding tool and its fabrication |
| 02/18/2000 | CA2280365A1 Sulfonyloximes for i-line photoresists of high sensitivity and high resist thickness |
| 02/17/2000 | WO2000008691A1 Zinc oxide films containing p-type dopant and process for preparing same |
| 02/17/2000 | WO2000008688A1 An integrated circuit provided with esd protection means |
| 02/17/2000 | WO2000008687A1 Integrated circuit comprising fuse links which can be separated by the action of energy |
| 02/17/2000 | WO2000008682A1 Method for producing a storage cell |
| 02/17/2000 | WO2000008681A1 Misted precursor deposition apparatus and method with improved mist and mist flow |
| 02/17/2000 | WO2000008680A1 Vapor growth method for metal oxide dielectric film and vapor growth device for metal oxide dielectric material |
| 02/17/2000 | WO2000008679A1 Deposition of nanoporous silica films using a closed cup coater |
| 02/17/2000 | WO2000008678A1 Abrasive composition for polishing lsi device |
| 02/17/2000 | WO2000008677A1 Non-uniform minority carrier lifetime distributions in high performance silicon power devices |
| 02/17/2000 | WO2000008676A1 Workpiece vibration damper |
| 02/17/2000 | WO2000008674A2 Mosfet having self-aligned gate and buried shield and method of making same |
| 02/17/2000 | WO2000008671A2 Device for coating panel-shaped substrates |
| 02/17/2000 | WO2000008670A2 Dose monitor for plasma-monitor ion implantation doping system |
| 02/17/2000 | WO2000008650A1 Mram array having a plurality of memory banks |
| 02/17/2000 | WO2000008526A1 Diffractive element in extreme-uv lithography condenser |
| 02/17/2000 | WO2000008429A1 A sensor for measuring a substrate temperature |
| 02/17/2000 | WO2000008401A1 Furnace for processing semiconductor wafers |
| 02/17/2000 | WO2000008389A1 Compact external torch assembly for semiconductor processing |
| 02/17/2000 | WO2000008230A1 Copper precursor composition and process for manufacture of microelectronic device structures |
| 02/17/2000 | WO2000008229A1 Esrf chamber cooling system and process |
| 02/17/2000 | WO2000008225A2 Organocopper precursors for chemical vapor deposition |
| 02/17/2000 | WO2000007915A1 Port door retention and evacuation system |
| 02/17/2000 | WO2000007780A1 Robot having multiple degrees of freedom |
| 02/17/2000 | WO2000007771A1 Polishing method and polishing device |
| 02/17/2000 | WO2000007688A1 Esrf coolant degassing process |
| 02/17/2000 | WO1999064197A8 Feed unit for moving parts |
| 02/17/2000 | WO1999063582A3 Method for producing semiconductor elements |
| 02/17/2000 | WO1999063527A3 Data storage and processing apparatus, and method for fabricating the same |
| 02/17/2000 | WO1999060615A3 Process for the preparation of epitaxial wafers for resistivity measurements |
| 02/17/2000 | WO1999041424A3 Reflow chamber and process |
| 02/17/2000 | DE19937912A1 Floating gate, for a semiconductor device such as a flash-EPROM, is produced by applying a conformal dielectric layer and a conductive layer onto an asymmetrical V-shaped trench |