Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2000
01/11/2000US6014200 High throughput electron beam lithography system
01/11/2000US6014082 Temperature monitoring and calibration system for control of a heated CVD chuck
01/11/2000US6014064 Heterolithic voltage controlled oscillator
01/11/2000US6014053 Amplifier MOS biasing circuit for a avoiding latch-up
01/11/2000US6014050 Variable impedance delay elements
01/11/2000US6014020 Reference voltage source with compensated temperature dependency and method for operating the same
01/11/2000US6013984 Ion energy attenuation method by determining the required number of ion collisions
01/11/2000US6013958 Integrated circuit with variable capacitor
01/11/2000US6013954 Semiconductor wafer having distortion-free alignment regions
01/11/2000US6013951 Semiconductor device having an improved lead connection structure and manufacturing method thereof
01/11/2000US6013947 Substrate having gate recesses or slots and molding device and molding method thereof
01/11/2000US6013946 Wire bond packages for semiconductor chips and related methods and assemblies
01/11/2000US6013944 Semiconductor device in which chip electrodes are connected to terminals arranged along the periphery of an insulative board
01/11/2000US6013943 Etch stop for use in etching of silicon oxide
01/11/2000US6013942 Bipolar transistor structure
01/11/2000US6013941 Bipolar transistor with collector surge voltage protection
01/11/2000US6013940 Poly-crystalline silicon film ladder resistor
01/11/2000US6013939 Monolithic inductor with magnetic flux lines guided away from substrate
01/11/2000US6013938 Power control device
01/11/2000US6013937 Buffer layer for improving control of layer thickness
01/11/2000US6013936 Double silicon-on-insulator device and method therefor
01/11/2000US6013931 Semiconductor device and method for producing the same
01/11/2000US6013930 Semiconductor device having laminated source and drain regions and method for producing the same
01/11/2000US6013929 Thin film transistor, having a nitride film on the gate insulation layer and an organic resin interlayer film on the transistor
01/11/2000US6013928 Semiconductor device having interlayer insulating film and method for forming the same
01/11/2000US6013927 Semiconductor structures for suppressing gate oxide plasma charging damage and methods for making the same
01/11/2000US6013926 Semiconductor device with refractory metal element
01/11/2000US6013924 Semiconductor integrated circuit and method for making wiring layout of semiconductor integrated circuit
01/11/2000US6013922 Semiconductor storage element having a channel region formed of an aggregate of spherical grains and a method of manufacturing the same
01/11/2000US6013920 Wafer-mapping load post interface having an effector position sensing device
01/11/2000US6013899 Method and apparatus for mounting soldering balls onto electrodes of a substrate or a comparable electronic component
01/11/2000US6013877 Solder bonding printed circuit boards
01/11/2000US6013713 A paste for forming an electroconductive coatings on a c4 bump, comprising metallic particles selected from the group consisting of au, sn and au/sn alloy suspended in solvent solution; forming a coatings for testing integrated circuit
01/11/2000US6013633 Administering dipeptides and tripeptides
01/11/2000US6013584 Methods and apparatus for forming HDP-CVD PSG film used for advanced pre-metal dielectric layer applications
01/11/2000US6013583 Low temperature BPSG deposition process
01/11/2000US6013582 Plasma etching
01/11/2000US6013581 Method for preventing poisoned vias and trenches
01/11/2000US6013580 Preprocessing method of metal film forming process
01/11/2000US6013579 Self-aligned via process for prevention poisoning performed on semiconductors, hydrogen sesquioxane layer on substrates
01/11/2000US6013578 Method for forming a metal wiring structure of a semiconductor device
01/11/2000US6013577 Method of making an amorphous surface for a gate electrode during the fabrication of a semiconductor device
01/11/2000US6013576 Nitriding of titanium and treatment with hydrogen for multilayer film
01/11/2000US6013575 Method of selectively depositing a metal film
01/11/2000US6013574 Method of forming low resistance contact structures in vias arranged between two levels of interconnect lines
01/11/2000US6013573 Method of manufacturing an air bridge type structure for supporting a micro-structure
01/11/2000US6013572 Masking, plating silver on exposed layer, plating tin on silver and reflowing solder bumps
01/11/2000US6013571 Microelectronic assembly including columnar interconnections and method for forming same
01/11/2000US6013570 LDD transistor using novel gate trim technique
01/11/2000US6013569 One step salicide process without bridging
01/11/2000US6013567 Controlled cleavage process using pressurized fluid
01/11/2000US6013566 Method of forming a doped region in a semiconductor substrate
01/11/2000US6013565 High conductivity thin film material for semiconductor device
01/11/2000US6013564 Method of manufacturing semiconductor wafer without mirror polishing after formation of blocking film
01/11/2000US6013563 Controlled cleaning process
01/11/2000US6013562 Process for connecting electric contact points using anodic bonding
01/11/2000US6013561 Method for forming field oxide film of semiconductor device
01/11/2000US6013560 Semiconductor processing methods of forming field oxidation regions on a semiconductor substrate
01/11/2000US6013559 Method of forming trench isolation
01/11/2000US6013558 Silicon-enriched shallow trench oxide for reduced recess during LDD spacer etch
01/11/2000US6013557 Advanced CMOS isolation utilizing enhanced oxidation by light ion implantation
01/11/2000US6013556 Vapor deposition to form integrated circuit wafers, diffusion
01/11/2000US6013555 Process for rounding an intersection between an HSG-SI grain and a polysilicon layer
01/11/2000US6013554 Method for fabricating an LDD MOS transistor
01/11/2000US6013553 Zirconium and/or hafnium oxynitride gate dielectric
01/11/2000US6013552 Method of manufacturing a split-gate flash memory cell
01/11/2000US6013551 Method of manufacture of self-aligned floating gate, flash memory cell and device manufactured thereby
01/11/2000US6013550 Method to define a crown shaped storage node structure, and an underlying conductive plug structure, for a dynamic random access memory cell
01/11/2000US6013549 DRAM cell capacitor and method for manufacturing the same
01/11/2000US6013548 Self-aligned diffused source vertical transistors with deep trench capacitors in a 4F-square memory cell array
01/11/2000US6013547 Computers and semiconductors
01/11/2000US6013546 Semiconductor device having a PMOS device with a source/drain region formed using a heavy atom p-type implant and method of manufacture thereof
01/11/2000US6013545 Method of manufacturing high-voltage metal-oxide-semiconductor device
01/11/2000US6013544 Method for fabricating a semiconductor device
01/11/2000US6013543 Methods of forming thin film transistors
01/11/2000US6013542 Method of manufacturing a semiconductor device
01/11/2000US6013541 Method and apparatus for reducing warpage in semiconductor packages
01/11/2000US6013535 Method for applying adhesives to a lead frame
01/11/2000US6013534 Method of thinning integrated circuits received in die form
01/11/2000US6013412 Negative type image recording material
01/11/2000US6013411 Photosensitive composition with homo or copolycarbons, halogenium compounds and sulfonium compounds
01/11/2000US6013401 Method of controlling illumination field to reduce line width variation
01/11/2000US6013398 Semitransparent phase shifting masking
01/11/2000US6013395 Photomask for use in exposure and method for producing same
01/11/2000US6013381 Lead-tin alloy solder having fluorine deposited on exposed surface by dissociative adsorption
01/11/2000US6013355 Testing laminates with x-ray moire interferometry
01/11/2000US6013338 CVD apparatus
01/11/2000US6013334 Method for forming a thin film of a complex compound
01/11/2000US6013332 Ionizing decaborane, implanting ionized decaborane into silicon wafer
01/11/2000US6013317 Coating apparatus and method therefor
01/11/2000US6013310 Method for producing a thin film semiconductor device
01/11/2000US6013236 Comprising silicon carbide sintered body; heat resistance, acid resistance
01/11/2000US6013169 Method of reforming a tip portion of a probe
01/11/2000US6013156 Bubble monitor for semiconductor manufacturing
01/11/2000US6013155 Gas injection system for plasma processing
01/11/2000US6013136 Apparatus for plasma-supported back etching of a semiconductor wafer
01/11/2000US6013130 Process and device for the production of epitaxial layers
01/11/2000US6013129 Production of heavily-doped silicon
01/11/2000US6013112 Relay apparatus for relaying object to be treated
01/11/2000US6013109 Crack-resistance semiconductor package and fabrication method thereof and fabrication apparatus thereof