Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2000
03/23/2000DE19858759C1 Integrated circuit with nanoscale devices and CMOS device
03/23/2000DE19851866C1 Nonvolatile memory array has series-connected selection and storage transistors and a ferroelectric capacitor connected between a selection transistor connection and a storage transistor control electrode
03/23/2000DE19850838A1 Improving wet etching uniformity during spin-etching of a layer on a semiconductor wafer, by forming a water film on the wafer before acid etching of the layer
03/23/2000DE19845793A1 Bipolar transistor, especially a vertical bipolar transistor for high speed applications, produced using an initial low temperature deposition step to form a buffer layer on an insulation layer
03/23/2000DE19845792A1 Producing an amorphous or polycrystalline silicon layer on an insulation region, especially for a bipolar transistor for high speed applications, uses a nucleation layer to improve nucleation
03/23/2000DE19845790A1 Wet chemically thinning silicon layers in an active emitter region, especially of a high speed bipolar transistor, using an etch stop layer formed by atomic layer doping of a cover layer
03/23/2000DE19845789A1 Bipolar transistor, especially a vertical bipolar transistor for high speed applications, is produced using selective wet chemical treatment to provide the active emitter region with a surface relief
03/23/2000DE19845787A1 Bipolar transistor, especially a high speed vertical bipolar transistor, is produced by single-poly technology with differential epitaxial base production using a nucleation layer to improve nucleation on an insulation region
03/23/2000DE19843435A1 Burn-in test arrangement for semiconductor memory devices
03/23/2000DE19843411A1 Production of surface decorated substrates
03/23/2000DE19843350A1 Electronic magneto-resistive memory cell of Magnetic RAM type has magnetic sensor element in form of AMR or GMR (Giant-Magneto-resistance), enabling more compact data densities to be achieved
03/23/2000DE19843309A1 Kurzschlussfestes IGBT Modul Short-circuit-proof IGBT module
03/23/2000DE19843076A1 Verfahren zur Herstellung eines Hybridrahmens oder Hybridgehäuses sowie einen derartigen Hybridrahmen oder ein Hybridgehäuse A process for producing a hybrid frame or hybrid housing, as well as such a hybrid frame or hybrid housing
03/23/2000DE19842977A1 Heat sink device for semiconductor elements or electric motor has extruded lightweight metal base profile provided with projecting spaced cooling ribs
03/23/2000DE19842217A1 Metallized sloping step for a metal clad ridge waveguide semiconductor laser is produced by selectively etching a semiconductor substrate surface exposed by a partial metallization of finer grain structure than gold
03/23/2000DE19841964A1 Plasma etching of structure with trenched of different width or depth-width ratio, where etching speed is dependent upon temperature of silicon layer
03/23/2000DE19841492A1 Verfahren und Vorrichtung zum Abtrennen einer Vielzahl von Scheiben von einem sprödharten Werkstück Method and device for separating a plurality of discs of a hard brittle workpiece
03/23/2000DE19841473A1 Planar semiconductor wafer production comprises forming a semiconductor wafer with bowl-like thickness distribution and converting into a planar semiconductor wafer using a double-sided polishing step
03/23/2000CA2343416A1 Low temperature formation of backside ohmic contacts for vertical devices
03/22/2000EP0987929A2 Ionization system
03/22/2000EP0987765A2 DRAM trench capacitor
03/22/2000EP0987764A1 Electrically programmable non-volatile memory cell arrangement
03/22/2000EP0987760A2 Multimodule interconnect structure and process
03/22/2000EP0987759A2 Electrical fuses in semiconductors
03/22/2000EP0987758A2 Semiconducter device and method of producing the same
03/22/2000EP0987756A2 Stacked DRAM fin capacitor and method of making the same
03/22/2000EP0987755A2 Stacked DRAM fin capacitor and method of making the same
03/22/2000EP0987754A2 Method of producing a trench capacitor with insulation collar
03/22/2000EP0987753A2 Stacked DRAM fin capacitor and method of making the same
03/22/2000EP0987752A2 Improved-reliability damascene interconnects and process of manufacture
03/22/2000EP0987751A1 Isolation wall between power devices
03/22/2000EP0987750A1 Container
03/22/2000EP0987749A2 Semiconductor device, electrode structure therefore, and production thereof
03/22/2000EP0987748A2 Multilayered circuit board for semiconductor chip module, and method of manufacturing the same
03/22/2000EP0987747A1 Process for improving the adhesion between metal and plastic in containment structures for electronic semiconductor devices
03/22/2000EP0987746A1 Method of making an integrated circuit comprising an oxide layer on a GaAs-based semiconductor substrate
03/22/2000EP0987745A1 Metallization etching method using a hard mask layer
03/22/2000EP0987744A1 Method for optimizing the control of metal CMP processes
03/22/2000EP0987743A1 Semiconductor device and method of anodization for the semiconductor device
03/22/2000EP0987742A2 Process for forming a doped region through diffusion
03/22/2000EP0987741A1 Method for relieving stress in GaN devices
03/22/2000EP0987740A1 Epitaxial layer for dissolved wafer micromachining process
03/22/2000EP0987739A2 Arrangement configured to support substrate during dicing process, and apparatus and method for cutting tapeless subtrate using the arrangement
03/22/2000EP0987653A2 Self assembled nano-devices using DNA
03/22/2000EP0987601A2 An exposure apparatus and exposure method using same
03/22/2000EP0987600A1 Antireflective coating compositions
03/22/2000EP0987556A2 Device for measuring the diffusion length in semiconductor bodies
03/22/2000EP0987538A1 Light-transmitting optical element for optical lithography apparatus
03/22/2000EP0987346A1 Copper deposition method using a precursor with (alkyloxy) (alkyl)silylolefin ligands
03/22/2000EP0987336A2 Synthesis of chemical tags
03/22/2000EP0987307A2 Composition and method for reducing dishing in patterned metal during CMP process
03/22/2000EP0987218A1 Process for the formation of oxide ceramic thin film
03/22/2000EP0987217A1 Reactor for generation of moisture
03/22/2000EP0987084A1 Polishing apparatus
03/22/2000EP0986826A1 Heat treatment method for semiconductor substrates
03/22/2000EP0986825A1 Carousel wafer transfer system
03/22/2000EP0986777A1 Lithography system
03/22/2000EP0885380A4 Real time/off line applications testing system
03/22/2000EP0754248A4 An improved module in an integrated delivery system for chemical vapors from liquid sources
03/22/2000EP0723677B1 Top anti-reflective coating films
03/22/2000EP0625285B1 Method for anisotropically etching silicon
03/22/2000CN2370564Y Three-in-one wire combined formed mold structure
03/22/2000CN1248346A Semiconductor device and process for producing the same
03/22/2000CN1248145A Method for manufacturing sealed electronic component using reproduceable packaging sealant
03/22/2000CN1248101A Semiconductor integrated circuit and its testing method
03/22/2000CN1248098A Film semiconductor integrated circuit
03/22/2000CN1248069A Semiconductor device and process for producing the same
03/22/2000CN1248068A Condenser installed on carriage in semiconductor device and its manufacture
03/22/2000CN1248067A Semiconductor device with laminated electrode formed by hemispherical crystal bring-up
03/22/2000CN1248066A Channel condenser with epitaxial buried layer
03/22/2000CN1248065A Vertical device and method for semiconductor chip
03/22/2000CN1248064A Method of forming shielding wire adjacement to signal wire
03/22/2000CN1248063A Device for connection of test head and probe board in substrate-testing system
03/22/2000CN1248062A Semiconductor device and process for producing the same
03/22/2000CN1248061A Ion dosing device and method for ion-beam injector
03/22/2000CN1248060A Improved oxidation process for semiconductor substrate using chlorine plasma
03/22/2000CN1248059A Manufacture of flat intermetallic dielectric layer or inner dielectric layer
03/22/2000CN1248058A Method for coating corrosion inhibitor film and coater for corrosion inhibitor
03/22/2000CN1248038A Semiconductor device and its formaing method
03/22/2000CN1248037A Active matrix display
03/22/2000CN1050701C Transistor in semiconductor device and method of making the same
03/22/2000CN1050700C Transistor in semiconductor device and method of making the same
03/22/2000CN1050699C Flash EEPROM cell and manufacturing method thereof
03/22/2000CN1050696C Method and apparatus for directly joining chip to heat sink
03/22/2000CN1050695C Method for manufacturing highly integrated semiconductor device
03/22/2000CN1050694C Semiconductor device and method for manufacturing the same
03/22/2000CN1050693C Method of planarizing film of semiconductor device
03/22/2000CN1050692C Method for forming junction in high speed EEPROM unit
03/22/2000CN1050691C Method for making transistor of semiconductor device
03/22/2000CN1050681C Non-contact tpype IC card and method and apparatus for manufacturing the same
03/21/2000USRE36623 Performing single and in-situ multiple integrated circuit processing steps, including thermal vapor deposition, plasma-enhanced chemical vapor deposition, reactor self-cleaning, film etchback
03/21/2000US6041371 Asynchronous input/output for integrated circuits that latches external asynchronous signal in feedback path of state machine
03/21/2000US6041270 Automatic recipe adjust and download based on process control window
03/21/2000US6041174 Method of simulating oxidation enhanced diffusion by solving partial differential equation
03/21/2000US6041014 Nonvolatile semiconductor memory device having row decoder
03/21/2000US6041013 Semiconductor memory device, method of laying out semiconductor memory device, method of driving semiconductor pattern of semiconductor device
03/21/2000US6041009 Apparatus for stabilizing an antifuse used for a memory device
03/21/2000US6041002 Semiconductor memory device and method of testing the same
03/21/2000US6040995 Method of operating a storage cell arrangement
03/21/2000US6040991 SRAM memory cell having reduced surface area