Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2000
04/06/2000WO1999067158A9 Integrated roller transport pod and asynchronous conveyor
04/06/2000WO1999059190A3 Process and manufacturing tool architecture for use in the manufacture of one or more metallization levels on a workpiece
04/06/2000WO1999057940A3 Smif pod including independently supported wafer cassette
04/06/2000WO1999057751A3 Method and apparatus for controlling the radial temperature gradient of a wafer while ramping the wafer temperature
04/06/2000WO1999054920A3 Electro-chemical deposition cell for face-up processing of single semiconductor substrates
04/06/2000WO1999035505A3 Method for removing accumulated solder from probe card probing features
04/06/2000DE19946999A1 Ferroelectric memory device manufacture includes forming titanium and platinum layers on an insulation layer covered substrate and thermally treating under an oxygen atmosphere
04/06/2000DE19945170A1 Pattern mask, for ion beam, electron beam, x-ray or scanning angular limited electron beam lithography, is produced using a subdivided silicon nitride film as mask for mask substrate structuring
04/06/2000DE19929859A1 Trench capacitor, especially for use with DRAMs, has dielectric material on trench side walls with conducting material, further dielectric material and further conducting material
04/06/2000DE19844531A1 Verfahren zur Herstellung von Transistoren A process for the production of transistors
04/06/2000DE19844418A1 Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer
04/06/2000DE19844102A1 Herstellverfahren für eine Halbleiterstruktur Manufacturing method of a semiconductor structure
04/06/2000DE19843959A1 Verfahren zum Herstellen eines Halbleiterbauelements A method of manufacturing a semiconductor device
04/06/2000DE19842954A1 Chemical mechanical polishing (CMP) system for semiconductor wafer
04/06/2000DE19842704A1 Kondensator mit einem Hoch-e-Dielektrikum oder einem Ferroelektrikum nach dem Fin-Stack-Prinzip und Herstellverfahren unter Einsatz einer Negativform Capacitor having a high-e-dielectric or a ferroelectric after the fin stack principle and preparation process using a female mold
04/06/2000DE19842682A1 Kondensator mit einem Hoch-e-Dielektrikum oder einem Ferro-elektrikum nach dem Fin-Stack-Prinzip und Herstellverfahren Capacitor having a high dielectric-e or a ferro-elektrikum after the fin stack principle and preparation process
04/06/2000DE19842665A1 Herstellungsverfahren für einen Grabenkondensator mit einem Isolationskragen Manufacturing method for a capacitor with an insulation collar grave
04/06/2000CA2345648A1 Block based design methodology
04/06/2000CA2345122A1 Semiconductor substrate and production method thereof, semiconductor device using the same and production method thereof
04/06/2000CA2311967A1 Method of manufacturing a semiconductor device with a field effect transistor
04/05/2000EP0991185A2 Surface elastic wave device having bumps in a definite area on the device and method for manufacturing the same
04/05/2000EP0991127A1 Hybrid device and method of assembling electrically active components
04/05/2000EP0991126A1 Method of manufacturing semiconductor device and semiconductor device, method of manufacturing electrooptic device and electrooptic device, and electronic apparatus employing it
04/05/2000EP0991125A1 Modifiable semiconductor circuit element
04/05/2000EP0991124A2 DRAM memory array with four cells per bit line contact
04/05/2000EP0991122A2 Connecting legs for electronic device
04/05/2000EP0991118A1 Method for realizing a multilevel ROM memory in a dual gate CMOS process and corresponding ROM memory cell
04/05/2000EP0991117A2 A memory cell with a stacked capacitor
04/05/2000EP0991116A2 Stacked capacitor memory cell and method of fabrication
04/05/2000EP0991115A1 Process for the definition of openings in a dielectric layer
04/05/2000EP0991114A2 Ultra-low sheet resistance metal/poly-SI gate for deep sub-micron CMOS application
04/05/2000EP0991113A2 A process for fabricating a self-aligned T-shaped gate electrode with reduced resistivity
04/05/2000EP0991112A2 Transport vehicle
04/05/2000EP0991111A1 Holder for carriers
04/05/2000EP0991110A1 Mounting assembly for semiconductors with a chip gripper
04/05/2000EP0991080A2 Non-volatile semiconductor memory device
04/05/2000EP0991078A2 Quantum random address memory with magnetic readout and/or nano-memory elements
04/05/2000EP0991077A2 Semiconductor memory device
04/05/2000EP0990933A2 Projection optical system for projection exposure apparatus
04/05/2000EP0990918A2 Device and method for nondestructive inspection on semiconductor device
04/05/2000EP0990717A1 GaAs single crystal substrate and epitaxial wafer using the same
04/05/2000EP0990686A2 Adhesive film for semiconductor package
04/05/2000EP0990630A1 Structural body comprising aluminum nitride and method of producing the same
04/05/2000EP0990498A1 Method and device for cutting wafers from a hard brittle ingot
04/05/2000EP0990485A2 Method for enhancing semiconductor wafer release
04/05/2000EP0990270A1 Dry-etching of indium and tin oxydes
04/05/2000EP0990269A1 Metal contact scheme using selective silicon growth
04/05/2000EP0990268A1 Latch-up free power mos-bipolar transistor
04/05/2000EP0990267A2 Etching method
04/05/2000EP0990266A1 Hyperfrequency transistor with quasi-aligned structure and method for making same
04/05/2000EP0990265A1 Methods and compositions for post-etch layer stack treatment in semiconductor fabrication
04/05/2000EP0990264A1 Treating substrates by producing and controlling a cryogenic aerosol
04/05/2000EP0990263A2 A substrate for high frequency integrated circuits
04/05/2000EP0990253A2 Liquid etch endpoint detection and process metrology
04/05/2000EP0990252A1 Detecting registration marks with a low energy electron beam
04/05/2000EP0990251A2 Central coil design for ionized metal plasma deposition
04/05/2000EP0990163A4 Reusable die carrier for burn-in and burn-in process
04/05/2000EP0990163A1 Reusable die carrier for burn-in and burn-in process
04/05/2000EP0990059A1 Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices
04/05/2000EP0989962A1 Methods for treating semiconductor wafers
04/05/2000EP0946988A4 Memory redundancy circuit using single polysilicon floating gate transistors as redundancy elements
04/05/2000CN1249853A Nitride semiconductor device
04/05/2000CN1249852A Subscriber interface protection circuit
04/05/2000CN1249851A Fabrication of semiconductor device with gaps for ultra-low capacitance interconnections
04/05/2000CN1249850A Method for mfg. semiconductor integrated circuit device
04/05/2000CN1249849A Strontium bismuth niobate tantalate ferroelectric thin film
04/05/2000CN1249848A Semiconductor and method relating to semiconductor
04/05/2000CN1249847A Method of checking for presence of connection balls
04/05/2000CN1249824A Positive photoresists contg. novel photoactive compounds
04/05/2000CN1249725A IC tray with self aligning pocket
04/05/2000CN1249539A Method for solving door interference of insulator base silicon transmission
04/05/2000CN1249538A Modifiable semiconductor circuit element
04/05/2000CN1249537A Miltilayer wiring structure and producing method thereof
04/05/2000CN1249535A Device and method for nondestructive inspection of semiconductor device
04/05/2000CN1249534A Method and system for testing IC in wafer stage
04/05/2000CN1249533A Epitaxial wafer, its mfg method and method for surficial cleaning of compound semiconductor substrate
04/05/2000CN1249532A Cleaner for large crystal wafer
04/05/2000CN1249531A Process for mfg. semiconductor substrate
04/05/2000CN1249518A Non-volatile semiconductor memory device
04/05/2000CN1249368A Single crystal substrate of gallium arsenide, and epitaxial wafer using same
04/05/2000CN1249302A Allylated amide compound and plastic main panel adhesive prepared therefrom
04/05/2000CN1249214A Method and system for preventing incontinent drop
04/05/2000CN1051197C Method for mfg. circuit board, and made circuit board
04/05/2000CN1051172C Double grid substrate plate DRAM cell array
04/05/2000CN1051170C Lead-wire frame for resin sealed semiconductor device and method for production of said device
04/05/2000CN1051169C Method for enhancement of polyimide adhesion to reactive metal
04/05/2000CN1051164C Spacer flash cell process
04/05/2000CN1051111C Method and composition for determination of potassium ions in fluids
04/04/2000US6047246 Computer-controlled ultrasonic cleaning system
04/04/2000US6047116 Method for generating exposure data for lithographic apparatus
04/04/2000US6047107 Furnace for rapid thermal processing with optical switching film disposed between heater and reflector
04/04/2000US6047083 Method of and apparatus for pattern inspection
04/04/2000US6046932 Circuit implementation to quench bit line leakage current in programming and over-erase correction modes in flash EEPROM
04/04/2000US6046929 Memory device with two ferroelectric capacitors per one cell
04/04/2000US6046927 Nonvolatile semiconductor memory device, a method of fabricating the same, and read, erase write methods of the same
04/04/2000US6046926 Ferroelectric memory and screening method therefor
04/04/2000US6046924 Semiconductor memory device having a sense amplifier region formed in a triple-well structure
04/04/2000US6046910 Microelectronic assembly having slidable contacts and method for manufacturing the assembly
04/04/2000US6046796 Methodology for improved semiconductor process monitoring using optical emission spectroscopy
04/04/2000US6046793 Proximity printing device with variable irradiation angle
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