| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/11/2000 | US6048650 Half tone phase shift mask comprising second pattern layer on backside of substrate |
| 04/11/2000 | US6048648 Mask including optical shield layer having variable light transmittance |
| 04/11/2000 | US6048647 Masking of attenuation type and semitransparent filns |
| 04/11/2000 | US6048588 Flow of inert gas over substrate surface while irradiating the undesired material with energetic photons. |
| 04/11/2000 | US6048576 Carboxylic group-containing acrylonitrile-butadiene copolymer, a mixed epoxy resin, a compound having at least two intramolecular maleimide groups, an aromatic diamine compound, an epoxy-containing liquid silicon resin, a filler and a |
| 04/11/2000 | US6048483 Resin sealing method for chip-size packages |
| 04/11/2000 | US6048475 Gapfill of semiconductor structure using doped silicate glasses |
| 04/11/2000 | US6048435 Plasma etch reactor and method for emerging films |
| 04/11/2000 | US6048434 Substrate holding system including an electrostatic chuck |
| 04/11/2000 | US6048424 Method for manufacturing ceramic laminated substrate |
| 04/11/2000 | US6048420 Method for surface mounting electrical components to a substrate |
| 04/11/2000 | US6048411 Silicon-on-silicon hybrid wafer assembly |
| 04/11/2000 | US6048409 Washing apparatus and washing method |
| 04/11/2000 | US6048406 Benign method for etching silicon dioxide |
| 04/11/2000 | US6048405 Megasonic cleaning methods and apparatus |
| 04/11/2000 | US6048403 Multi-ledge substrate support for a thermal processing chamber |
| 04/11/2000 | US6048400 Substrate processing apparatus |
| 04/11/2000 | US6048399 SOG coater nozzle pot |
| 04/11/2000 | US6048397 Formed by doping a constant composition layer with nitrogen |
| 04/11/2000 | US6048395 Method for producing a silicon single crystal having few crystal defects |
| 04/11/2000 | US6048259 Wafer loading and unloading mechanism for loading robot |
| 04/11/2000 | US6048256 Apparatus and method for continuous delivery and conditioning of a polishing slurry |
| 04/11/2000 | US6048162 Wafer handler for multi-station tool |
| 04/11/2000 | US6048154 High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock |
| 04/11/2000 | US6048011 Apparatus for contactless capturing and handling of spherical-shaped objects |
| 04/11/2000 | US6047877 Lead penetrating clamping system |
| 04/11/2000 | US6047717 Mandrel device and method for hard disks |
| 04/11/2000 | US6047480 Method of processing a semiconductor device |
| 04/11/2000 | US6047470 Singulation methods |
| 04/11/2000 | US6047468 Lead finger clamp assembly and method of stabilizing lead frame elements |
| 04/06/2000 | WO2000019775A1 Wafer level burn-in and test thermal chuck and method |
| 04/06/2000 | WO2000019592A1 Dechucking method and apparatus for workpieces in vacuum processors |
| 04/06/2000 | WO2000019573A1 Protective circuit on an integrated circuit |
| 04/06/2000 | WO2000019539A1 Cell based array having compute/drive ratios of n:1 |
| 04/06/2000 | WO2000019538A1 Self-aligned non-volatile contactless memory cell with reduced surface |
| 04/06/2000 | WO2000019536A1 Electronic switching device with at least two semiconductor components |
| 04/06/2000 | WO2000019535A1 Semiconductor structure for semiconductor components |
| 04/06/2000 | WO2000019534A1 Nitride etch stop for poisoned unlanded vias |
| 04/06/2000 | WO2000019533A1 Clad plate for lead frames, lead frame using the same, and method of manufacturing the lead frame |
| 04/06/2000 | WO2000019531A1 Backside electrical contact structure for a module having an exposed backside |
| 04/06/2000 | WO2000019530A1 Vertical field effect transistor with an interior gate and method for producing the same |
| 04/06/2000 | WO2000019529A1 Integrated circuit comprising vertical transistors, and a method for the production thereof |
| 04/06/2000 | WO2000019528A1 Dram cell system and method for producing same |
| 04/06/2000 | WO2000019527A1 Dram cell system and method for producing same |
| 04/06/2000 | WO2000019526A1 Semiconductor memory cell and method for producing the same |
| 04/06/2000 | WO2000019525A1 Substrate with an indentation for an integrated circuit device and method for the production thereof |
| 04/06/2000 | WO2000019524A2 Ic interconnect structures and methods for making same |
| 04/06/2000 | WO2000019523A1 High-performance dual-damascene interconnect structures |
| 04/06/2000 | WO2000019522A1 Improved methods for barrier layer formation |
| 04/06/2000 | WO2000019521A1 Chuck with integrated piezoelectric sensors for wafer detection |
| 04/06/2000 | WO2000019520A1 Methods and apparatus for determining an etch endpoint in a plasma processing system |
| 04/06/2000 | WO2000019519A1 Electrostatic dechucking method and apparatus for dielectric workpieces in vacuum processors |
| 04/06/2000 | WO2000019518A1 Optical inspection equipment for semiconductor wafers with precleaning |
| 04/06/2000 | WO2000019517A1 Semiconductor chip and manufacture method thereof |
| 04/06/2000 | WO2000019516A1 Semiconductor device, connection method for semiconductor chip, circuit board and electronic apparatus |
| 04/06/2000 | WO2000019515A1 Semiconductor device and manufacturing method thereof, circuit board and electronic equipment |
| 04/06/2000 | WO2000019514A1 Semiconductor package and flip-chip bonding method therefor |
| 04/06/2000 | WO2000019512A1 Pseudomorphic high electron mobility transistors |
| 04/06/2000 | WO2000019511A1 Deposition of oxide layer on the gate |
| 04/06/2000 | WO2000019510A2 Elevated channel mosfet |
| 04/06/2000 | WO2000019509A2 Method of manufacturing a semiconductor device with a field effect transistor |
| 04/06/2000 | WO2000019508A1 Silicon carbide deposition method and use as a barrier layer and passivation layer |
| 04/06/2000 | WO2000019507A1 Method of plasma-assisted film deposition |
| 04/06/2000 | WO2000019506A1 Method of plasma etching dielectric materials |
| 04/06/2000 | WO2000019505A1 Method and apparatus for improving accuracy of plasma etching process |
| 04/06/2000 | WO2000019504A2 Methods for fabricating interpoly dielectrics in non-volatile stacked-gate memory structures |
| 04/06/2000 | WO2000019503A1 Method for producing transistors |
| 04/06/2000 | WO2000019502A1 Vertical furnace and wafer boat for vertical furnace |
| 04/06/2000 | WO2000019501A1 Method and apparatus for plasma processing |
| 04/06/2000 | WO2000019500A1 Semiconductor substrate and its production method, semiconductor device comprising the same and its production method |
| 04/06/2000 | WO2000019499A1 Method for the transfer of thin layers of monocrystalline material onto a desirable substrate |
| 04/06/2000 | WO2000019498A1 In situ deposition of low k si carbide barrier layer, etch stop, and anti-reflective coating for damascene applications |
| 04/06/2000 | WO2000019495A2 Chamber liner for semiconductor process chambers |
| 04/06/2000 | WO2000019493A2 Wafer load lock with internal wafer transport |
| 04/06/2000 | WO2000019492A2 Cathode assembly containing an electrostatic chuck for retaining a wafer in a semiconductor wafer processing system |
| 04/06/2000 | WO2000019491A1 Method for cleaning a process chamber |
| 04/06/2000 | WO2000019490A2 Dummy fill cell for reducing layer-to-layer interaction |
| 04/06/2000 | WO2000019483A1 Vacuum treatment chamber and method for treating surfaces |
| 04/06/2000 | WO2000019481A2 Low contamination high density plasma processing chamber and methods for processing a semiconductor substrate |
| 04/06/2000 | WO2000019441A2 Magnetoresistive memory having improved interference immunity |
| 04/06/2000 | WO2000019440A2 Magnetoresistive memory with low current density |
| 04/06/2000 | WO2000019343A2 Block based design methodology |
| 04/06/2000 | WO2000019276A1 Novel photosensitive resin compositions |
| 04/06/2000 | WO2000019275A1 Novel photosensitive resin compositions |
| 04/06/2000 | WO2000019274A1 Method for forming micropattern of resist |
| 04/06/2000 | WO2000019273A1 Novel photosensitive polybenzoxazole precursor compositions |
| 04/06/2000 | WO2000019272A1 Methods of reducing proximity effects in lithographic processes |
| 04/06/2000 | WO2000019224A1 Circuit configuration with a scan path that can be deactivated |
| 04/06/2000 | WO2000019215A1 Thermal isolation plate for probe card |
| 04/06/2000 | WO2000019187A2 Apparatus for x-ray analysis in grazing exit conditions |
| 04/06/2000 | WO2000018990A1 Method for removing defects of single crystal material and single crystal material from which defects are removed by the method |
| 04/06/2000 | WO2000018982A1 Method and apparatus for forming polycrystalline and amorphous silicon films |
| 04/06/2000 | WO2000018980A1 An in-line sputter deposition system |
| 04/06/2000 | WO2000018979A1 Sputter deposition apparatus |
| 04/06/2000 | WO2000018848A1 Pressure-sensitive adhesive sheet exfoliative with heat |
| 04/06/2000 | WO2000018847A1 Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film |
| 04/06/2000 | WO2000018547A1 Substrate transport apparatus |
| 04/06/2000 | WO2000018542A1 Chemical mechanical polishing conditioner |
| 04/06/2000 | WO2000018523A1 Method and apparatus for cleaning low k dielectric and metal wafer surfaces |
| 04/06/2000 | WO2000003418B1 Intelligent wafer handling system and method |