| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/02/2000 | US6056783 Method for designing cell array layout of non-volatile memory device |
| 05/02/2000 | US6056632 Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head |
| 05/02/2000 | US6056627 Probe cleaning tool, probe cleaning method and semiconductor wafer testing method |
| 05/02/2000 | US6056614 Method of manufacturing pixel electrode for reflection type display device |
| 05/02/2000 | US6056544 Apparatus for baking resists on semiconductor wafers |
| 05/02/2000 | US6056504 Adjustable frog-leg robot |
| 05/02/2000 | US6056433 Method and apparatus for infrared pyrometer calibration in a thermal processing system |
| 05/02/2000 | US6056191 Method and apparatus for forming solder bumps |
| 05/02/2000 | US6056190 Solder ball placement apparatus |
| 05/02/2000 | US6056188 Method of attaching a component to a plate-shaped support |
| 05/02/2000 | US6056184 Apparatus for shaping liquid portions of solder in soft soldering semiconductor chips |
| 05/02/2000 | US6056123 Semiconductor wafer carrier having the same composition as the wafers |
| 05/02/2000 | US6056026 Passively activated valve for carrier purging |
| 05/02/2000 | US6055995 Semiconductor manufacture apparatus |
| 05/02/2000 | US6055976 Method of preparing end faces on integrated circuits |
| 05/02/2000 | US6055927 Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology |
| 05/02/2000 | US6055743 Method and apparatus for drying semiconductor wafers without forming water markers thereon |
| 05/02/2000 | US6055742 Reticle cleaning apparatus for wafer exposure system |
| 05/02/2000 | US6055740 Vacuum processing apparatus and operating method therefor |
| 05/02/2000 | US6055724 Method and device for sealing IC chip |
| 05/02/2000 | US6055719 Method for manufacturing an electrostatic deflector |
| 05/02/2000 | US6055694 Wafer scrubbing machine |
| 05/02/2000 | CA2118649C Interconnection structure of electronic parts |
| 04/30/2000 | CA2287722A1 Semiconductor image position sensitive device |
| 04/28/2000 | CA2252017A1 Method of fineblanking a workpiece and the tool for carrying out the method and the resulting workpiece thereof |
| 04/27/2000 | WO2000024235A1 Method for measuring negative ions in plasma, and plasma treating method and apparatus |
| 04/27/2000 | WO2000024059A1 Method of producing soi wafer by hydrogen ion implanting separation method and soi wafer produced by the method |
| 04/27/2000 | WO2000024057A1 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with a grating and an at least partially recessed oxide pattern |
| 04/27/2000 | WO2000024055A1 A semiconductor topography employing a nitrogenated shallow trench isolation structure |
| 04/27/2000 | WO2000024054A1 Structure comprising a semiconductor layer and/or electronic elements on an insulating support and method for making same |
| 04/27/2000 | WO2000024053A1 Protective device for clean robot |
| 04/27/2000 | WO2000024052A1 Layer processing |
| 04/27/2000 | WO2000024050A1 Cvd nanoporous silica low dielectric constant films |
| 04/27/2000 | WO2000024049A1 Method of oxidizing a substrate in the presence of nitride and oxynitride films |
| 04/27/2000 | WO2000024048A1 Method of etching patterned layers useful as masking during subsequent etching or for damascene structures |
| 04/27/2000 | WO2000024047A1 Semiconductor manufacturing apparatus |
| 04/27/2000 | WO2000024046A1 Plasma etching method |
| 04/27/2000 | WO2000024045A1 Low haze wafer treatment process |
| 04/27/2000 | WO2000024044A1 Wafer support of semiconductor manufacturing system |
| 04/27/2000 | WO2000024043A1 Integrated polycrystalline silicon resistance with carbon or germanium |
| 04/27/2000 | WO2000024042A1 Arrangement with at least one integrated inductive element on a substrate |
| 04/27/2000 | WO2000024041A1 Carrier for cleaning silicon wafers |
| 04/27/2000 | WO2000024031A1 Device for producing excited/ionized particles in a plasma |
| 04/27/2000 | WO2000024017A1 Materials transport system having inductive power transfer |
| 04/27/2000 | WO2000024005A1 Particles |
| 04/27/2000 | WO2000023920A1 Approach for routing an integrated circuit |
| 04/27/2000 | WO2000023850A1 Radiation-sensitive resin composition |
| 04/27/2000 | WO2000023794A1 Method and apparatus for mapping surface topography of a substrate |
| 04/27/2000 | WO2000023636A1 Excess cvd reactant control |
| 04/27/2000 | WO2000023534A1 Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles |
| 04/27/2000 | WO2000023376A1 Method for processing silicon using etching processes |
| 04/27/2000 | WO2000023229A1 Wafer-polishing apparatus |
| 04/27/2000 | WO2000010200A8 Wafer plating method and apparatus |
| 04/27/2000 | WO2000007225A3 Method of and apparatus for sealing an hermetic lid to a microelectronic machine |
| 04/27/2000 | WO1999065070A3 Method of manufacturing a semiconductor device comprising a mos transistor |
| 04/27/2000 | WO1999064205A9 Method and apparatus for endpoint detection for chemical mechanical polishing |
| 04/27/2000 | DE4143592C2 Improved intermediate insulation layer between metallisation levels |
| 04/27/2000 | DE19951317A1 Sealing mechanism for a vacuum chamber used in the production of semiconductors, comprises a rotating shaft support, fluid penetrations, an air suction unit and a filter |
| 04/27/2000 | DE19951053A1 Contacting mechanism gives focussing of image recognition camera for positioning chip and substrate precisely |
| 04/27/2000 | DE19950536A1 Circuit for test board of burn-in test system, judges quality of device for comparing output signal with test signal based on run time difference data which are stored corresponding to each type of test signal |
| 04/27/2000 | DE19949364A1 Semiconductor component with MOS gate control used for battery powered, portable electronic components, e.g. laptop computers |
| 04/27/2000 | DE19938907A1 Output buffer has MOS transistor with low potential node connected to control node of pull-up transistor and high potential nodes connected to low potential node of another transistor and high potential supply line |
| 04/27/2000 | DE19849471A1 Integrated high ohmic polycrystalline resistor, used in analog and digital circuits, comprises a polycrystalline resistive layer of silicon containing carbon and-or germanium |
| 04/27/2000 | DE19849097A1 Verfahren zur Schaltzustandsüberwachung eines IGBT und Vorrichtung zur Durchführung des Verfahrens A process for monitoring the switching state of an IGBT, and apparatus for carrying out the method |
| 04/27/2000 | DE19847659A1 Vorrichtung zum Lagern und Kommissionieren von Gegenständen, insbesondere von scheibenartigen Gegenständen wie Wafern oder dergleichen A device for storing and picking articles, in particular of disc-like objects such as wafers or the like |
| 04/27/2000 | DE19847455A1 Silicon multi-layer etching, especially for micromechanical sensor production, comprises etching trenches down to buried separation layer, etching exposed separation layer and etching underlying silicon layer |
| 04/27/2000 | DE19839606C1 Mikromechanisches Bauelement und Verfahren zu dessen Herstellung Micromechanical component and method for its production |
| 04/27/2000 | CA2347632A1 Slurries of abrasive inorganic oxide particles and method for adjusting the abrasiveness of the particles |
| 04/27/2000 | CA2342638A1 Layer processing |
| 04/26/2000 | EP0996325A2 Heater and method for heating a carrier with mounted electronic components |
| 04/26/2000 | EP0996321A2 Anisotropically electroconductive adhesive and adhesive film |
| 04/26/2000 | EP0996316A1 Tunable and matchable resonator coil assembly for ion implanter linear accelerator |
| 04/26/2000 | EP0996227A2 Method of controlling the switching state of a IGBT and device for carrying out the method |
| 04/26/2000 | EP0996176A1 Method of fabricating and structure of an active matrix light-emitting display device |
| 04/26/2000 | EP0996167A2 Bipolar transistor and field-effect transistor having a multiple quantum barrier structure |
| 04/26/2000 | EP0996163A2 Memory cell array and implantation mask for making the same |
| 04/26/2000 | EP0996162A1 Low resistance contact structure for a select transistor of EEPROM memory cells |
| 04/26/2000 | EP0996161A1 EEPROM with common control gate and common source for two cells |
| 04/26/2000 | EP0996160A1 Contact structure for a semiconductor device |
| 04/26/2000 | EP0996159A1 Integrated circuit structure comprising capacitor and corresponding manufacturing process |
| 04/26/2000 | EP0996158A1 High voltage resistive structure integrated on a semiconductor substrate |
| 04/26/2000 | EP0996157A1 Process for manufacturing integrated devices comprising microstructures and associated suspended electrical interconnections |
| 04/26/2000 | EP0996154A1 Semiconductor device and method for manufacturing the same, circuit substrate, and electronic device |
| 04/26/2000 | EP0996153A1 Memory cell |
| 04/26/2000 | EP0996152A1 Process for manufacturing electronic devices comprising non-salicidated nonvolatile memory cells, non-salicidated HV transistors, and salicidated-junction LV transistors |
| 04/26/2000 | EP0996151A2 Method for fabricating transistors |
| 04/26/2000 | EP0996150A1 Method of manufacturing passive and active devices on the same insulated substrate |
| 04/26/2000 | EP0996149A1 Manufacturing method for an oxide layer having high thickness |
| 04/26/2000 | EP0996148A1 Method for fabricating semiconductor devices comprising a heat treatment step |
| 04/26/2000 | EP0996147A1 Manufacturing method for semiconductor chips using anodic oxidation |
| 04/26/2000 | EP0996146A1 Process for forming an isolated well in a silicon wafer |
| 04/26/2000 | EP0996145A2 Process for producing semiconductor substrate |
| 04/26/2000 | EP0996144A1 Spin processing apparatus |
| 04/26/2000 | EP0996143A2 Technique for reducing pattern placement error in projection electron-beam lithography |
| 04/26/2000 | EP0996142A2 Electron-beam lithography method and electron-beam lithography system |
| 04/26/2000 | EP0996129A1 DRAM memory cell |
| 04/26/2000 | EP0995821A1 Method and apparatus for working semiconductor material |
| 04/26/2000 | EP0995784A1 Adhesive for semiconductor components |
| 04/26/2000 | EP0995542A2 Carrier unit for holding a workpiece by vacuum and vacuum holding head |
| 04/26/2000 | EP0995344A1 Plasma processing apparatus |