Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2000
08/29/2000US6110752 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
08/29/2000US6110650 Method of making a circuitized substrate
08/29/2000US6110649 Process for manufacture of integrated circuit device
08/29/2000US6110648 Method of enclosing copper conductor in a dual damascene process
08/29/2000US6110647 Method of manufacturing semiconductor device
08/29/2000US6110637 Photoresists which are suitable for producing sub-micron size structures
08/29/2000US6110627 Microlithography methods, especially such methods for projection-transferring, onto the surface of a semiconductor wafer.
08/29/2000US6110626 Microlithography using an energy beam such as a charged particle beam.
08/29/2000US6110598 Low resistive tantalum thin film structure and method for forming the same
08/29/2000US6110577 Composite material for heat sinks for semiconductor devices and method for producing the same
08/29/2000US6110556 Lid assembly for a process chamber employing asymmetric flow geometries
08/29/2000US6110544 Surface such as glass, metal or plastic to be coated is positioned in the path of the active species generated by the plasma as they pass into and through the deposition or coating chamber of the apparatus; protective coatings
08/29/2000US6110543 Process for making compound films
08/29/2000US6110541 Chemical vapor deposition method and apparatus for highly textured diamond film formation
08/29/2000US6110540 Plasma apparatus and method
08/29/2000US6110537 Coating integrated circuits using thermal spray
08/29/2000US6110531 Gasifying a generated mist to form a gasified precursor comprising a bismuth-containing organic compound, a metal polyalkoxide compound, a lead-containing organic compound, oxidizing with oxygen gas to form a superlattice thin film
08/29/2000US6110523 Method of manufacturing a semiconductor memory device
08/29/2000US6110399 Electroconductive solder particles dispersed in ferrofluid; magnetic field fixes pattern
08/29/2000US6110396 Applying slurry of rare earth hydroxide and abrasive; polishing aluminum, copper, tungsten and/or alloy; microelectronics
08/29/2000US6110393 Attaching circuit layer; semiconductors and microelectronics
08/29/2000US6110391 Method of manufacturing a bonding substrate
08/29/2000US6110322 Prevention of ground fault interrupts in a semiconductor processing system
08/29/2000US6110294 Apparatus and method for cleaning semiconductor wafer
08/29/2000US6110290 Method for epitaxial growth and apparatus for epitaxial growth
08/29/2000US6110289 Rapid thermal processing barrel reactor for processing substrates
08/29/2000US6110288 Temperature probe and measurement method for low pressure process
08/29/2000US6110287 Plasma processing method and plasma processing apparatus
08/29/2000US6110286 Vertical processing unit
08/29/2000US6110285 Vertical wafer boat
08/29/2000US6110284 Apparatus and a method for shielding light emanating from a light source heating a semicondutor processing chamber
08/29/2000US6110283 Chemical vapor deposition apparatus
08/29/2000US6110282 Coating apparatus for semiconductor process
08/29/2000US6110278 Methods for and products of growth of single-crystal on arrayed nucleation sites (SCANS) defined in nucleation unfriendly substrates
08/29/2000US6110277 Creating parcel-like structure on surface of substrate, growing nucleation layer on silicon surface in parcels, epitaxially growing nitride compound semiconductor exclusively in parcels on nucleation layer
08/29/2000US6110276 Doping diamond with both lithium and boron impurities simultaneously with deposition of diamond on substrate by chemical vapor deposition
08/29/2000US6110274 Process and apparatus for producing polycrystalline semiconductor
08/29/2000US6110272 Method for producing silicon single crystal
08/29/2000US6110232 Method for preventing corrosion in load-lock chambers
08/29/2000US6110223 Graphic editor for block diagram level design of circuits
08/29/2000US6110222 Layout design method and system for an improved place and route
08/29/2000US6110026 Carrier and polishing apparatus
08/29/2000US6110024 Polishing apparatus
08/29/2000US6110014 Method and apparatus polishing wafer for extended effective area of wafer
08/29/2000US6110012 Chemical-mechanical polishing apparatus and method
08/29/2000US6110011 Integrated electrodeposition and chemical-mechanical polishing tool
08/29/2000US6110008 Polishing system
08/29/2000US6109861 Apparatus and method for rotating semiconductor objects
08/29/2000US6109860 Two-armed transfer robot
08/29/2000US6109775 Method for adjusting the density of lines and contact openings across a substrate region for improving the chemical-mechanical polishing of a thin-film later disposed thereon
08/29/2000US6109677 Apparatus for handling and transporting plate like substrates
08/29/2000US6109509 Method of securely mounting conductive balls
08/29/2000US6109507 Method of forming solder bumps and method of forming preformed solder bumps
08/29/2000US6109501 Radial wire bonder and selectable side view inspection system
08/29/2000US6109444 Multi-function packing insert
08/29/2000US6109323 Device to withdraw, superimpose and anchor foils for green-tape circuits
08/29/2000US6109278 Liquid treatment method and apparatus
08/29/2000US6109208 Plasma generating apparatus with multiple microwave introducing means
08/29/2000US6109207 Process for fabricating semiconductor device with shallow p-type regions using dopant compounds containing elements of high solid solubility
08/29/2000US6109206 Remote plasma source for chamber cleaning
08/29/2000US6109175 Intaglio printing method, intaglio printer, method of formation of bumps or wiring pattern, apparatus therefor, bump electrode and printed circuit board
08/29/2000US6109106 Process for manufacturing high-sensitivity accelerometric and gyroscopic integrated sensors, and sensor thus produced
08/29/2000US6109011 Method and apparatus for cultivation and harvesting of mushrooms and other plant material
08/29/2000US6108937 Method of cooling wafers
08/29/2000US6108932 Method and apparatus for thermocapillary drying
08/29/2000US6108929 Vacuum processing apparatus
08/29/2000US6108928 Vacuum dryer of drying semiconductor device using the same
08/29/2000CA2192631C Fabrication process of soi substrate
08/29/2000CA2157259C Electronic device assembly and a manufacturing method of the same
08/27/2000WO2000024058A1 Integrated circuit chip made secure against the action of electromagnetic radiation
08/26/2000CA2298318A1 Inductive component, integrated transformer, intended to be incorporated into a radio frequency circuit, and integrated circuit associated with the said inductive component or integrated transformer
08/24/2000WO2000049662A1 Igbt with pn insulation
08/24/2000WO2000049660A1 Iridium oxide diffusion barrier between local interconnect layer and thin film of layered superlattice material
08/24/2000WO2000049656A1 Semiconductor device and method of manufacture thereof
08/24/2000WO2000049655A1 Semiconductor device, circuit board, method of manufacturing circuit board, and electronic device
08/24/2000WO2000049654A1 Method for producing a dram cell with a trench capacitor
08/24/2000WO2000049651A1 Improved masking methods and etching sequences for patterning electrodes of high density ram capacitors
08/24/2000WO2000049650A1 Iridium etching methods for anisotrophic profile
08/24/2000WO2000049649A2 Method for preventing corrosion of a dielectric material
08/24/2000WO2000049648A1 Ceramic multilayered thin-layer capacitor
08/24/2000WO2000049647A1 Method for cmp of low dielectric constant polymer layers
08/24/2000WO2000049646A1 Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
08/24/2000WO2000049645A1 Electrode for semiconductor device and its manufacturing method
08/24/2000WO2000049644A1 Method and device for treating substrates
08/24/2000WO2000049643A2 Gate insulator comprising high and low dielectric constant parts
08/24/2000WO2000049642A2 Semiconductor structure with a programmable strip conductor
08/24/2000WO2000049464A2 Photolithography method and apparatus configuration for performing photolithography
08/24/2000WO2000049366A1 Wafer sensor utilizing hydrodynamic pressure differential
08/24/2000WO2000049202A2 Improved etching methods for anisotropic platinum profile
08/24/2000WO2000049198A1 Method and apparatus for controlling polymerized teos build-up in vacuum pump lines
08/24/2000WO2000049197A1 Wafer processing reactor having a gas flow control system and method
08/24/2000WO2000049196A1 Plasma deposition method and apparatus with magnetic bucket and concentric plasma and material source
08/24/2000WO2000049087A1 Epoxy resin composition
08/24/2000WO2000048936A1 Robotic gripping device
08/24/2000WO2000048788A1 Polishing pad and process for forming same
08/24/2000WO2000048787A1 Improved arrangements for wafer polishing
08/24/2000WO2000048779A1 Method for producing building components, use thereof, airbearing workpiece and vacuum treatment chamber
08/24/2000WO2000048744A1 Method and device for treating substrates
08/24/2000WO2000024017A9 Materials transport system having inductive power transfer
08/24/2000WO2000019187A3 Apparatus for x-ray analysis in grazing exit conditions
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