Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2000
08/15/2000US6103557 Semiconductor device or thin-film transistor manufacturing apparatus and manufacturing method
08/15/2000US6103556 Thin-film transistor and method of manufacturing the same
08/15/2000US6103554 Method for packaging integrated circuits with elastomer chip carriers
08/15/2000US6103553 Method of manufacturing a known good die utilizing a substrate
08/15/2000US6103552 Wafer scale packaging scheme
08/15/2000US6103551 Semiconductor unit and method for manufacturing the same
08/15/2000US6103550 Molded tape support for a molded circuit package prior to dicing
08/15/2000US6103549 No clean flux for flip chip assembly
08/15/2000US6103543 Forming a base layer of electrode made of vanadium, niobium amd/or zirconium on a portion of n-type gallium nitride (gan) layer; forming main electrode layer of another metal; heat treating to form an n electrode; improved connection
08/15/2000US6103542 Method of manufacturing an optoelectronic semiconductor device comprising a mesa
08/15/2000US6103539 Method and system for nondestructive layer defect detection
08/15/2000US6103457 Method for reducing faceting on a photoresist layer during an etch process
08/15/2000US6103456 Prevention of photoresist poisoning from dielectric antireflective coating in semiconductor fabrication
08/15/2000US6103455 Method to form a recess free deep contact
08/15/2000US6103450 Photosensitive copolymers of 5-norbornene-2-methanol having a c1 to c20 aliphatic hydrocarbon as side chain, and maleic anhydride; tricyclodecane- or sarsasapogenin-derivatives, each having an acid-labile group as dissolution inhibitor
08/15/2000US6103449 Negative working photoresist composition
08/15/2000US6103434 Data processing of converting drawing data on a semiconductor device pattern on a chip into a predetermined size and shape; dividing the converted drawing data into multiple fields
08/15/2000US6103433 Exposure method using reticle remount for temperature influence correction
08/15/2000US6103432 Method for forming black matrix
08/15/2000US6103428 Photomask utilizing auxiliary pattern that is not transferred with the resist pattern
08/15/2000US6103403 Clathrate structure for electronic and electro-optic applications
08/15/2000US6103399 Method for the manufacturing of micromachined structures and a micromachined structure manufactured using such method
08/15/2000US6103359 Process and apparatus for manufacturing an anisotropic conductor sheet and a magnetic mold piece for the same
08/15/2000US6103354 Ceramic circuit substrate and method of fabricating the same
08/15/2000US6103304 Flowing a purge gas into reactor holes in the walls which have an inside dimension greater than the outer diameter of the substrate holder; uniform down-flow of purge gas prevents the retention/circulation of reaction gas in the dead space
08/15/2000US6103137 Method for etching oxide film in plasma etching system
08/15/2000US6103134 Circuit board features with reduced parasitic capacitance and method therefor
08/15/2000US6103096 Apparatus and method for the electrochemical etching of a wafer
08/15/2000US6103095 Non-hazardous wet etching method
08/15/2000US6103085 Semiconductor wafers
08/15/2000US6103070 Insulative, inter-turn shield positioned at a channel defining coil windings; confining generated plasma
08/15/2000US6103069 Hermetic sealing, sputtering; semiconductors
08/15/2000US6103055 System for processing substrates
08/15/2000US6103025 Fine wire of gold alloy, method for manufacture thereof and use thereof
08/15/2000US6103020 Semiconductor substrates having electrically isolated transistor active areas to reduce field oxide encroachment and distortion by forming field oxide islands, for high density and high performance integrated circuit
08/15/2000US6103018 Alternate washing, rinsing and exposures to acid solutions, then to oxidizer solutions after more washing and rinsing
08/15/2000US6103014 Chemical vapor deposition chamber
08/15/2000US6103009 Fabrication process for a SOI substrate
08/15/2000US6103008 Silicon-integrated thin-film structure for electro-optic applications
08/15/2000US6103002 CVD method for forming oxide-system dielectric thin film
08/15/2000US6102993 Complexes
08/15/2000US6102964 Fitting for incremental compilation of electronic designs
08/15/2000US6102788 Semiconductor wafer carrier stage for chemical mechanical polishing apparatus
08/15/2000US6102786 Polishing apparatus including turntable with polishing surface of different heights
08/15/2000US6102784 Method and apparatus for improved gear cleaning assembly in polishing machines
08/15/2000US6102780 Substrate polishing apparatus and method for polishing semiconductor substrate
08/15/2000US6102778 Wafer lapping method capable of achieving a stable abrasion rate
08/15/2000US6102710 Controlled impedance interposer substrate and method of making
08/15/2000US6102649 Two-armed transfer robot
08/15/2000US6102629 Apparatus for conveying spherical articles between atmospheres
08/15/2000US6102273 Die bonding apparatus
08/15/2000US6102267 Method and apparatus for non-contact pulsating jet cleaving of a semiconductor material
08/15/2000US6102164 Multiple independent robot assembly and apparatus for processing and transferring semiconductor wafers
08/15/2000US6102057 Lifting and rinsing a wafer
08/15/2000US6102023 Precision cutting apparatus and cutting method using the same
08/15/2000US6101971 Ion implantation control using charge collection, optical emission spectroscopy and mass analysis
08/15/2000US6101970 Plasma processing apparatus
08/15/2000US6101872 Sensor having a thin film element
08/15/2000US6101868 Tool for inspecting broken wafer edges
08/15/2000US6101844 Double wall reaction chamber glassware
08/15/2000US6101816 Fluid storage and dispensing system
08/15/2000US6101737 Apparatus and method for drying a semiconductor member
08/15/2000US6101710 Method for facilitating engineering changes in a multiple level circuit package
08/15/2000US6101656 Wafer cleaning device
08/15/2000CA2236993C Hybrid circuit construction of push-pull power amplifier
08/15/2000CA2148654C Method and device for lacquering or coating of a substrate
08/15/2000CA2072393C Variable delay device
08/11/2000CA2296819A1 Process for fabricating article exhibiting substantial three-dimensional micron-scale order and resultant article
08/10/2000WO2000047023A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source
08/10/2000WO2000046859A1 High-voltage transistor with multi-layer conduction region
08/10/2000WO2000046858A1 Mos transistor with dynamic threshold voltage equipped with a current limiting device and method for making same
08/10/2000WO2000046857A1 Two transistor eeprom cell
08/10/2000WO2000046856A1 Capacitor and method of its manufacture
08/10/2000WO2000046854A1 Apparatuses and methods for forming assemblies
08/10/2000WO2000046851A1 Method of making a high-voltage transistor with multiple lateral conduction layers
08/10/2000WO2000046850A1 A LATERAL FIELD EFFECT TRANSISTOR OF SiC, A METHOD FOR PRODUCTION THEREOF AND A USE OF SUCH A TRANSISTOR
08/10/2000WO2000046849A1 Improvement of liquid deposition by selection of liquid viscosity and other precursor properties
08/10/2000WO2000046848A1 A method of forming a high voltage semiconductor device and a high voltage semiconductor device
08/10/2000WO2000046847A1 Process for lift off and transfer of semiconductor devices onto an alien substrate
08/10/2000WO2000046846A1 Charged particle beam exposure apparatus and exposure method
08/10/2000WO2000046845A1 Method for detecting alignment mark in charged particle beam exposure apparatus
08/10/2000WO2000046844A1 Thin-film capacitors and methods for forming the same
08/10/2000WO2000046843A1 Microelectronic structure
08/10/2000WO2000046842A2 Work piece cleaning apparatus and associated method
08/10/2000WO2000046841A1 Method and device for cleaning substrates
08/10/2000WO2000046840A1 Cooled showerhead for rapid thermal processing (rtp) system
08/10/2000WO2000046838A2 Hf vapor phase wafer cleaning and oxide etching
08/10/2000WO2000046809A1 Semiconductor integrated circuit and nonvolatile memory element
08/10/2000WO2000046648A1 Four-phase charge pump with lower peak current
08/10/2000WO2000046642A1 Aligning device for assembling microsystems
08/10/2000WO2000046640A1 Positive resist composition of chemical amplification type
08/10/2000WO2000046431A1 Method for producing nitride monocrystals
08/10/2000WO2000046315A1 Adhesive, electrode-connecting structure, and method of connecting electrodes
08/10/2000WO2000045993A1 Wafer holder and polishing device
08/10/2000WO2000036636A3 Capacitor electrode
08/10/2000WO2000028579A3 Method and apparatus for cleaning the edge of a thin disc
08/10/2000WO2000017918A9 Metal-contact induced crystallization in semiconductor devices
08/10/2000WO2000014791A9 Method of fabricating a high power rf field effect transistor with reduced hot electron injection and resulting structure
08/10/2000WO2000000998A3 Electrode for plasma processes and method for manufacture and use thereof
08/10/2000WO1999056057A9 Fluid storage and dispensing system
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