Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2000
11/07/2000US6143581 Asymmetric transfer molding method and an asymmetric encapsulation made therefrom
11/07/2000US6143580 Methods of forming a mask pattern and methods of forming a field emitter tip mask
11/07/2000US6143579 Efficient method for monitoring gate oxide damage related to plasma etch chamber processing history
11/07/2000US6143478 Solution-coating with photoresist a circuit pattern having uneven topography, heating substrate from below while cooling from above to form a uniformly thick conformal layer of heat-modified photoresist, dissolving away nonmodified layer
11/07/2000US6143477 Degrading/stripping organic residues from wafer surface using oxygen radicals generated by exposing oxygen gas flow to xenon excimer light source to produce ozone which is subsequently treated with light of krypton halide lamp
11/07/2000US6143476 Method for high temperature etching of patterned layers using an organic mask stack
11/07/2000US6143474 Method of fabricating polysilicon structures with different resistance values for gate electrodes, resistors, and capacitor plates
11/07/2000US6143467 Photosensitive polybenzoxazole precursor compositions
11/07/2000US6143466 Chemically amplified photoresist composition
11/07/2000US6143463 Method and photoresist using a photoresist copolymer
11/07/2000US6143432 Ceramic composites with improved interfacial properties and methods to make such composites
11/07/2000US6143421 Electronic components incorporating ceramic-metal composites
11/07/2000US6143401 Electronic chip package
11/07/2000US6143399 Aromatic polyimide film
11/07/2000US6143396 System and method for reinforcing a bond pad
11/07/2000US6143377 Process of forming a refractory metal thin film
11/07/2000US6143374 Method for precise placement of an array of single particles on a surface
11/07/2000US6143366 Reducing the crystallization temperature
11/07/2000US6143362 Films on a substrate of an integrated circuit (ic) by forming a seed layer, then reducing a titanium precursor with the seed layer. in one embodiment, the seed layer comprises zinc.
11/07/2000US6143361 In exhaust conduit of cvd coating apparatus by introduction of gaseous chemical reactant in the exhaust stream to react with excess gaseous reactant constituents to form solid reaction products to reduce harmful deposition of liquid
11/07/2000US6143360 Method for making nanoporous silicone resins from alkylydridosiloxane resins
11/07/2000US6143357 Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same
11/07/2000US6143192 Contacting at least a region of a surface of the ruthenium metal structure or a layer of ruthenium oxide layer with a solution comprising ceric ammonium nitrate
11/07/2000US6143191 Contacting iridium-based material with xenon fluoride etching reagent for sufficient time to etch the deposited iridium-based material from the substrate
11/07/2000US6143190 Method of producing a through-hole, silicon substrate having a through-hole, device using such a substrate, method of producing an ink-jet print head, and ink-jet print head
11/07/2000US6143155 By providing relative motion between a bipolar electrode and a metallized surface of a semiconductor wafer without necessary physical contact with the wafer or direct electrical connection thereto
11/07/2000US6143149 Magnetron with plurality of targets in correspondence to shield members
11/07/2000US6143147 Wafer holding assembly and wafer processing apparatus having said assembly
11/07/2000US6143144 Method for etch rate enhancement by background oxygen control in a soft etch system
11/07/2000US6143140 Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field
11/07/2000US6143129 Inductive plasma reactor
11/07/2000US6143128 Apparatus for preparing and metallizing high aspect ratio silicon semiconductor device contacts to reduce the resistivity thereof
11/07/2000US6143127 Carrier head with a retaining ring for a chemical mechanical polishing system
11/07/2000US6143126 Process and manufacturing tool architecture for use in the manufacture of one or more metallization levels on an integrated circuit
11/07/2000US6143125 Apparatus and method for dry etching
11/07/2000US6143121 Hybrid module and method of manufacturing the same
11/07/2000US6143117 Process for transferring a thin-film structure to a temporary carrier
11/07/2000US6143089 Method of cleaning semiconductor wafers and other substrates
11/07/2000US6143086 Apparatus for full wafer deposition
11/07/2000US6143084 Apparatus and method for generating plasma
11/07/2000US6143083 Substrate transferring mechanism
11/07/2000US6143082 Isolation of incompatible processes in a multi-station processing chamber
11/07/2000US6143080 Wafer processing reactor having a gas flow control system and method
11/07/2000US6143079 Compact process chamber for improved process uniformity
11/07/2000US6143078 Gas distribution system for a CVD processing chamber
11/07/2000US6143077 Chemical vapor deposition apparatus
11/07/2000US6143072 Generic process for preparing a crystalline oxide upon a group IV semiconductor substrate
11/07/2000US6143071 Method for heat treatment of silicon substrate, substrate treated by the method, and epitaxial wafer utilizing the substrate
11/07/2000US6143063 Misted precursor deposition apparatus and method with improved mist and mist flow
11/07/2000US6143040 Comprises a semiconductor wafer processing chamber, a wafer transfer device, a wafer cassette holding unit, a wafer cassette transfer device and a wafer cassette bringing in/out section disposed in this order and a housing
11/07/2000US6142773 Enveloping device and vertical heat-treating apparatus for semiconductor process system
11/07/2000US6142726 Automated chamfering method
11/07/2000US6142723 Transfer apparatus
11/07/2000US6142722 Automated opening and closing of ultra clean storage containers
11/07/2000US6142663 Temperature measuring method for semiconductor wafers and processing apparatus
11/07/2000US6142660 Semiconductor manufacturing apparatus and command setting method
11/07/2000US6142539 Gas panel
11/07/2000US6142361 Chip C4 assembly improvement using magnetic force and adhesive
11/07/2000US6142358 Wafer-to-wafer transfer of microstructures using break-away tethers
11/07/2000US6142356 Die bonding apparatus
11/07/2000US6142138 High speed method of aligning cutting lines of a workpiece using patterns
11/07/2000US6142096 Electronic device manufacturing apparatus and method for manufacturing electronic device
11/07/2000US6141869 Apparatus for and method of manufacturing a semiconductor die carrier
11/07/2000US6141866 Universal tool for uniformly applying a force to a plurality of components on a circuit board
11/07/2000US6141812 Cleaning apparatus and cleaning member rinsing apparatus
11/07/2000CA2204394C Silicon-germanium-carbon compositions and processes thereof
11/03/2000CA2270807A1 Closed chamber method and apparatus for the coating of liquid films
11/02/2000WO2000065670A1 Flexible organic electronic device with improved resistance to oxygen and moisture degradation
11/02/2000WO2000065662A1 High voltage integrated switching devices on a bonded and trenched silicon substrate
11/02/2000WO2000065658A2 Method of structuring a metal or metal-silicide layer and a capacitor produced according to said method
11/02/2000WO2000065655A1 A semiconductor device with an operating frequency larger than 50mhz comprising a body composed of a soft ferrite material
11/02/2000WO2000065654A1 Method and apparatus using silicide layer for protecting integrated circuits from reverse engineering
11/02/2000WO2000065653A1 A method in the fabrication of organic thin-film semiconducting devices
11/02/2000WO2000065649A1 CVD TiN PLUG FORMATION FROM TITANIUM HALIDE PRECURSORS
11/02/2000WO2000065648A1 Circuit suitable for vertical integration and method of producing same
11/02/2000WO2000065647A1 Chip scale package
11/02/2000WO2000065646A1 A super-self-aligned trench-gate dmos with reduced on-resistance
11/02/2000WO2000065644A1 Method of mending interconnection and focused ion beam device
11/02/2000WO2000065643A1 Improvements in or relating to sol gel processing of lead zirconate titanate thin films
11/02/2000WO2000065642A1 Production methods of compound semiconductor single crystal and compound semiconductor element
11/02/2000WO2000065640A1 PECVD OF Ta FILMS FROM TANTALUM HALIDE PRECURSORS
11/02/2000WO2000065639A1 Anti-reflective coatings and methods regarding same
11/02/2000WO2000065638A1 Method for predicting yield on semiconductor product and apparatus therefor
11/02/2000WO2000065637A2 Device for treating silicon wafers
11/02/2000WO2000065636A2 A bipolar transistor
11/02/2000WO2000065631A2 Apparatus and method for exposing a substrate to plasma radicals
11/02/2000WO2000065616A1 Electronic device and manufacture thereof
11/02/2000WO2000065611A1 Method of forming conducting transparent film, method of repairing wiring connection, and apparatus for forming conducting transparent film
11/02/2000WO2000065492A1 Method for storing multiple levels of design data in a common database
11/02/2000WO2000065408A1 Method for forming a micro-pattern on a substrate
11/02/2000WO2000065302A1 Interferometric apparatus and method that compensate refractive index fluctuations
11/02/2000WO2000065301A1 Helium-neon laser light source generating two harmonically related, single-frequency wavelengths for use in displacement and dispersion measuring interferometry
11/02/2000WO2000065126A1 Cvd tantalum nitride plug formation from tantalum halide precursors
11/02/2000WO2000065125A1 PECVD OF TaN FILMS FROM TANTALUM HALIDE PRECURSORS
11/02/2000WO2000065124A1 Plasma treatment of thermal cvd tan films from tantalum halide precursors
11/02/2000WO2000065123A1 THERMAL CVD OF TaN FILMS FROM TANTALUM HALIDE PRECURSORS
11/02/2000WO2000065122A1 CVD OF INTEGRATED Ta AND TaNx FILMS FROM TANTALUM HALIDE PRECURSORS
11/02/2000WO2000064980A1 Filler for crosslinkable elastomer and crosslinkable elastomer composition containing the same
11/02/2000WO2000064785A1 Disk holder and disk storage device
11/02/2000WO2000064752A1 System and method for transferring components between packing media
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