Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2000
11/02/2000DE10018126A1 Semiconductor device, especially a highly integrated device mounted on an insulating circuit board, has a bottom contact with an outer periphery not covered by a conductor connecting the circuit board to the device substrate
11/02/2000DE10011666A1 Charged particle beam exposure apparatus for integrated circuit manufacture shortens settling time to point at which beam has bean deflected to defined position
11/02/2000DE10004193A1 Carrier handling device for module IC handler, has drive motor with pulley at one side of vertical frame for moving module IC accommodation carrier connected to timing belt and fixed to carrier holder
11/02/2000CA2370852A1 A method in the fabrication of organic thin-film semiconducting devices
11/02/2000CA2367465A1 Flexible organic electronic device with improved resistance to oxygen and moisture degradation
11/01/2000CN1272226A Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other device
11/01/2000CN1272224A Improved gapfill of semiconductor structure using doped silicate glasses with multi-step deposition/anneal process
11/01/2000CN1272223A Reduction of gate-induced drain leakage in semiconductor devices
11/01/2000CN1272222A Method of processing semiconductor wafers
11/01/2000CN1272221A Polishing composition including inhibitor of tungsten etching
11/01/2000CN1272092A Wafer enclosure with door
11/01/2000CN1271999A Surface acoustic wave device having salient pole and its manufacturing method
11/01/2000CN1271963A Non volatile semi conductor memory device and its manufacturing method
11/01/2000CN1271962A Apparatus and method of maintaining cipher in interior of IC package
11/01/2000CN1271961A Method of forming storage capacitor
11/01/2000CN1271945A Non volatile semiconductor memory
11/01/2000CN1271871A Corrosion technique of anisotropic nitride by inlay corrosion method
11/01/2000CN1271870A Mask used in electron beam exposure and manufacturing method and manufacturing method of semi-conductor device
11/01/2000CN1271767A Cleaning liquid and manufacturing method of semi-conductor device using said cleaning liquid
11/01/2000CN1271720A Organic anti reflection paint and its preparation
11/01/2000CN1058108C MIS semiconductor device and method for fabricating same
10/2000
10/31/2000USRE36938 Method of forming a landing pad structure in an integrated circuit
10/31/2000USRE36932 Semiconductor memory device operating stably under low power supply voltage with low power consumption
10/31/2000USRE36925 Vacuum treatment apparatus and a method for manufacturing semiconductor device therein
10/31/2000US6141600 Retrying control method and apparatus for processing apparatus
10/31/2000US6141599 Method for setting conveying data for a lead frame
10/31/2000US6141291 Semiconductor memory device
10/31/2000US6141262 Boosting circuit with boosted voltage limited
10/31/2000US6141255 1 transistor cell for EEPROM application
10/31/2000US6141252 Voltage regulation for integrated circuit memory
10/31/2000US6141250 Non-volatile semiconductor memory device
10/31/2000US6141242 Low cost mixed memory integration with substantially coplanar gate surfaces
10/31/2000US6141239 Static memory cell
10/31/2000US6141237 Ferroelectric non-volatile latch circuits
10/31/2000US6141233 Rectifier circuit device and DC/Dc converter provided with the circuit device
10/31/2000US6141204 Capacitor constructions and semiconductor processing method of forming capacitor constructions
10/31/2000US6141203 Electrostatic chuck
10/31/2000US6141108 Position control method in exposure apparatus
10/31/2000US6141083 Exposure system and method of forming fluorescent surface using same
10/31/2000US6141081 Stepper or scanner having two energy monitors for a laser
10/31/2000US6140980 Head-mounted display system
10/31/2000US6140910 Stabilized polysilicon resistor and a method of manufacturing it
10/31/2000US6140840 Macro cell signal selector and semiconductor integrated circuit including these parts
10/31/2000US6140837 Charge pumps of antifuse programming circuitry powered from high voltage compatibility terminal
10/31/2000US6140834 Semiconductor integrated circuit
10/31/2000US6140833 In-situ measurement method and apparatus for semiconductor processing
10/31/2000US6140805 Source follower NMOS voltage regulator with PMOS switching element
10/31/2000US6140744 Wafer cleaning system
10/31/2000US6140711 Alignment marks of semiconductor substrate and manufacturing method thereof
10/31/2000US6140709 Bonding pad structure and method for manufacturing the bonding pad structure
10/31/2000US6140708 Chip scale package and method for manufacture thereof
10/31/2000US6140707 Laminated integrated circuit package
10/31/2000US6140706 Semiconductor device and method of manufacturing without damaging HSQ layer and metal pattern utilizing multiple dielectric layers
10/31/2000US6140705 Self-aligned contact through a conducting layer
10/31/2000US6140704 Integrated circuit memory devices with improved twisted bit-line structures
10/31/2000US6140703 A surface multilayer comprising a first layer of titanium and a second layer of nickel and vanadium alloy
10/31/2000US6140702 Plastic encapsulation for integrated circuits having plated copper top surface level interconnect
10/31/2000US6140701 Suppression of hillock formation in thin aluminum films
10/31/2000US6140700 Semiconductor chip package and method for fabricating the same
10/31/2000US6140697 Semiconductor device
10/31/2000US6140694 Field isolated integrated injection logic gate
10/31/2000US6140693 Method for making metal capacitors for deep submicrometer processes for semiconductor integrated circuits
10/31/2000US6140691 Trench isolation structure having a low K dielectric material isolated from a silicon-based substrate
10/31/2000US6140690 Semiconductor device
10/31/2000US6140688 Semiconductor device with self-aligned metal-containing gate
10/31/2000US6140685 Static memory cell and method of manufacturing a static memory cell
10/31/2000US6140684 SRAM cell structure with dielectric sidewall spacers and drain and channel regions defined along sidewall spacers
10/31/2000US6140680 Integrated power semiconductor transistor with current sensing
10/31/2000US6140679 Zero thermal budget manufacturing process for MOS-technology power devices
10/31/2000US6140678 Trench-gated power MOSFET with protective diode
10/31/2000US6140677 Semiconductor topography for a high speed MOSFET having an ultra narrow gate
10/31/2000US6140675 Semiconductor device and manufacturing method thereof
10/31/2000US6140674 Buried trench capacitor
10/31/2000US6140673 Semiconductor memory device and fabricating method
10/31/2000US6140672 Ferroelectric field effect transistor having a gate electrode being electrically connected to the bottom electrode of a ferroelectric capacitor
10/31/2000US6140671 Semiconductor memory device having capacitive storage therefor
10/31/2000US6140668 Silicon structures having an absorption layer
10/31/2000US6140667 Semiconductor thin film in semiconductor device having grain boundaries
10/31/2000US6140659 Method and apparatus for removing residual dirt adhered on dies
10/31/2000US6140656 Ion implantation apparatus, ion implantation method and semiconductor device
10/31/2000US6140655 Method for water vapor enhanced charged-particle-beam machining
10/31/2000US6140654 Charged beam lithography apparatus and method thereof
10/31/2000US6140616 Wafer level burn-in and test thermal chuck and method
10/31/2000US6140612 Controlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuck
10/31/2000US6140603 Micro-cleavage method for specimen preparation
10/31/2000US6140583 An electronic parts coated with a metallic or alloy coatings, excellent heat resistance, oxidation resistance and corrosion resistance and especially excellent solderability
10/31/2000US6140402 Comprising organic polymer resin, inorganic filler and fugitive liquid which can be used for die attach applications
10/31/2000US6140287 Cleaning compositions for removing etching residue and method of using
10/31/2000US6140255 Method for depositing silicon nitride using low temperatures
10/31/2000US6140254 Edge bead removal for nanoporous dielectric silica coatings
10/31/2000US6140253 Reducing the flow of a coating material dispensed on a top surface of a rotating wafer onto a bottom surface of the wafer,
10/31/2000US6140252 Reducing capacitive coupling on a semiconductor device using electrical insulators made of porous dielectric materials.
10/31/2000US6140251 Method of processing a substrate
10/31/2000US6140250 Method for forming oxide film of semiconductor device, and oxide film forming apparatus capable of shortening pre-processing time for concentration measurement
10/31/2000US6140249 Low dielectric constant dielectric films and process for making the same
10/31/2000US6140247 Supplying anhydrous hydrofluoric acid gas to the silicon oxide film, thereby removing the silicon oxide film.
10/31/2000US6140246 In-situ P doped amorphous silicon by NH3 to form oxidation resistant and finer grain floating gates
10/31/2000US6140245 Semiconductor processing methods, and methods of forming capacitor constructions
10/31/2000US6140244 Method for forming a spacer
10/31/2000US6140243 By exposure to an nh3, o2 plasma.
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