Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2000
10/26/2000DE19916345A1 Verfahren und Vorrichtung zum Reinigen von Substraten Method and apparatus for cleaning substrates
10/26/2000DE19916177A1 Wire bonding connections for semiconductor chip contacts, connections are formed by mechanically deforming contact pieces before positioning in deformation area
10/26/2000DE19916071A1 Semiconductor components separating method, e.g. for components on lead-frame, carrier-tape or ceramic substrate
10/26/2000DE19913365A1 Vorrichtung und Verfahren zur Detektion eines Werkstückes in einer automatischen Bearbeitungsvorrichtung Apparatus and method for detecting a workpiece in an automatic processing apparatus
10/26/2000DE10019282A1 Production of fine structure in semiconductor substrates involves coating a target layer with a resist containing a crosslinker, forming a photoresist by lithography and then heating to crosslink and form narrower holes
10/26/2000DE10019224A1 Encapsulated module restoration method, involves opening encapsulated module with housing and substrate on which PCB is fastened and which is folded about housing
10/26/2000DE10018358A1 Semiconductor component manufacturing method, involves separating insulating layer on semiconductor substrate and producing connection strip conductor connected with strip conductor layer of semiconductor elements in layer.
10/26/2000DE10018138A1 Surface acoustic wave device production method, involves connecting surface acoustic wave device with base construction over bump in order to connect device with base
10/26/2000DE10017137A1 Novel silicon structure, used for solar cells or LCD TFTs, comprises a crystalline textured silicon thin film over a biaxially textured lattice-matched diffusion barrier buffer layer on a thermal expansion-matched inert substrate
10/26/2000DE10013013A1 Chemical synthesized components, intersects pair of crossing conductors which form crossing which has function for measurement in nanometer range
10/26/2000DE10008585A1 Hierarchical clock line tree design method for application specific integrated circuit, involves connecting clock line trees of same structure with clock signal input terminals of hierarchical structures
10/26/2000DE10002099A1 Probe tip arrangement in dense pad array, has aggressor conductor located in close proximity to the access transmission line, where redefined capacitance is created between conductor and transmission line
10/26/2000CA2396377A1 Cmos process
10/26/2000CA2306673A1 Mixture for the removal of light-sensitive resin in the manufacture of integrated circuits
10/25/2000EP1047289A2 RF plasma source for material processing
10/25/2000EP1047288A2 Plasma focus high energy photon source
10/25/2000EP1047220A2 Adjustable data delay using programmable clock shift
10/25/2000EP1047134A2 Interconnection scheme for semiconductor storage device
10/25/2000EP1047133A1 Method for producing devices for control circuits integrated in power devices
10/25/2000EP1047132A1 Integrated circuit device with inductance of high quality factor
10/25/2000EP1047131A1 Electrostatic discharge protection device
10/25/2000EP1047130A1 Radio frequency semiconductor apparatus
10/25/2000EP1047128A2 Warped semiconductor device and method of manufacturing the same
10/25/2000EP1047127A2 A method of forming a multi-layered dual-polysilicon structure
10/25/2000EP1047126A2 Method and apparatus for controlling chucking force in an electrostatic chuck
10/25/2000EP1047125A2 Method for rapidly dechucking a semiconductor wafer from an electrostatic chuck utilizing a hysteretic discharge cycle
10/25/2000EP1047124A2 Process for producing semiconductor device
10/25/2000EP1047123A2 Method for cleaning high aspect ratio openings by reactive plasma etching
10/25/2000EP1047122A2 Method of anisotropic etching of substrates
10/25/2000EP1047121A1 Cleaning solution for substrates of electronic devices
10/25/2000EP1047120A1 Method of manufacturing an electrode in a semiconductor device
10/25/2000EP1047119A2 Process of crystallizing semiconductor thin film and laser irradiation system
10/25/2000EP1047118A2 Improved top layer imaging lithography for semiconductor processing
10/25/2000EP1047117A2 Method for manufacturing a silicon nitride capacitor dielectric film
10/25/2000EP1047116A2 Backside gas delivery system for a semiconductor wafer processing system
10/25/2000EP1047115A2 Method and apparatus for aligning a cassette
10/25/2000EP1047114A2 A method of detecting the position of a wafer
10/25/2000EP1047113A2 Method and apparatus for generating controlled mixture of organic vapor and inert gas
10/25/2000EP1047112A2 Wafer container box
10/25/2000EP1047105A2 Ion implanter
10/25/2000EP1047104A1 Apparatus for particle beam induced modification of a specimen
10/25/2000EP1047103A2 ION implant dose control
10/25/2000EP1047102A2 Ion implanter with vacuum piston counterbalance
10/25/2000EP1047101A2 Ion implanter
10/25/2000EP1046994A2 Efficient direct cell replacement fault tolerant architecture supporting completely integrated systems with means for direct communication with system operator
10/25/2000EP1046992A2 Semiconductor RAM with two level bus system
10/25/2000EP1046975A1 Device and a method of supplying power to plurality of semiconductor integrated circuit devices
10/25/2000EP1046959A2 Coating device, particularly for coating silicon wafers
10/25/2000EP1046956A1 Radiation-sensitive resin composition
10/25/2000EP1046955A1 Radiation-sensitive resin composition
10/25/2000EP1046954A1 Method for forming micropattern of resist
10/25/2000EP1046921A2 Apparatus for carrying out Burn-in procedures of semiconductor devices on wafer planes
10/25/2000EP1046917A2 Method of manufacturing an external force detection sensor
10/25/2000EP1046881A1 Alignment and handover calibration with hole shadows and ion implanter with e-chuck and gripper
10/25/2000EP1046827A2 Apparatus for reducing distortion in fluid bearing surfaces
10/25/2000EP1046729A1 CVD processing chamber
10/25/2000EP1046728A2 Process chamber with inner support
10/25/2000EP1046690A1 Composition for mechanical chemical polishing of layers in an insulating material based on a polymer with a low dielectric constant
10/25/2000EP1046466A2 Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles
10/25/2000EP1046464A1 Substrate carrier
10/25/2000EP1046462A2 Wafer holding plate for wafer grinding apparatus and method for manufacturing the same.
10/25/2000EP1046433A1 Method and apparatus for chemical delivery through the brush
10/25/2000EP1046193A1 An integrated circuit provided with esd protection means
10/25/2000EP1046192A1 Method of manufacturing a semiconductor device in a silicon body, a surface of said silicon body being provided with an alignment grating and an at least partially recessed oxide pattern
10/25/2000EP1046191A1 Manufacture of electronic devices comprising thin-film circuit elements
10/25/2000EP1046190A1 Method and device for drying substrates
10/25/2000EP1046185A1 Projection lithography device utilizing charged particles
10/25/2000EP1046184A1 Quadrupole device for projection lithography by means of charged particles
10/25/2000EP1046183A1 Ion implantation device arranged to select neutral ions from the ion beam
10/25/2000EP1046049A1 Device comprising a first and a second ferromagnetic layer separated by a non-magnetic spacer layer
10/25/2000EP1046040A1 Electronic component
10/25/2000EP1045741A1 A carrier head with a removable retaining ring for a chemical mechanical polishing apparatus
10/25/2000EP1045740A1 A carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
10/25/2000EP1023681A4 System for logic extraction from a layout database
10/25/2000EP0861457B1 Method of monitoring a photolithographic process
10/25/2000CN2403124Y Improved chip binding device of micro-purifying room
10/25/2000CN1271509A Method for mounting semiconductor element to circuit board, and semiconductor device
10/25/2000CN1271474A Method and system for locally annealing a microstructure formed on a substrate and device formed thereby
10/25/2000CN1271464A Electrode means, with or without functional elements and an electrode device including polymer material and an electrode device formed of saidmeans
10/25/2000CN1271463A Process for preparation of silicon wafers having a controlled distribution of oxygen precipitate nucleation centers
10/25/2000CN1271306A Wafer processing apparatus
10/25/2000CN1271181A Semicondutor device
10/25/2000CN1271180A Semiconductor device capacitor and its preparing method
10/25/2000CN1271179A Process for oxide corroding of high selective neck ring
10/25/2000CN1271178A Probe card for testing semiconductor device and method for testing semiconductor device
10/25/2000CN1271177A Pulse width detection
10/25/2000CN1271176A Electronic beam photetching process and its device
10/25/2000CN1271175A Method for cleaning porous body and manufacture the same, non-porous film or keyed lining
10/25/2000CN1271167A IC storage with fuse detection circuit and its method
10/25/2000CN1271093A Non-destructive measuring method for minotiry carrier diffusion length and life of semiconductor device
10/25/2000CN1271000A Base board cleaning liquid of electronic material
10/25/2000CN1057870C Method for making fluorine-injected polysilicon buffering local oxidation semiconductor device
10/25/2000CN1057869C Method for forming through-hole of semiconductor device
10/25/2000CN1057868C Method for forming metal interconnects in semiconductor device
10/25/2000CN1057867C Method for making semiconductor device of channel area compensation formed by phosphorus injection
10/25/2000CN1057799C Method for preparing titanium nitride layer
10/24/2000US6138267 Reliability verification device for detecting portion of design that may cause malfunction of semiconductor integrated circuit and its verifying method
10/24/2000US6138058 Method for electronically tracking containers to avoid misprocessing of contents
10/24/2000US6138054 Control system employing fiber optic communication link for semiconductor processing apparatus
10/24/2000US6137901 Photomask pattern correcting method and photomask corrected by the same and photomask pattern correcting device