Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2000
11/29/2000EP1055014A1 Free floating shield and semiconductor processing system
11/29/2000EP1055012A2 Plasma processes for depositing low dielectric constant films
11/29/2000EP1054829A1 Smif pod storage, delivery and retrieval system
11/29/2000EP1023582A4 Improved sample inspection system
11/29/2000EP0912259A4 Wet processing methods for the manufacture of electronic components using sequential chemical processing
11/29/2000EP0854759A4 Flip chip underfill system and method
11/29/2000CN2408571Y Luminous diode chip and epitaxy chip light intensity measurer
11/29/2000CN2408570Y High temperature annealing furnace for crystal
11/29/2000CN1275246A Semiconductor device, method of manufacture, circuit board and electronic device
11/29/2000CN1275174A Drive mechanism for vacuum device and vacuum device
11/29/2000CN1275170A Composite material and use thereof
11/29/2000CN1274974A Method for manufacture of semiconductor element, semiconductor element and gyro thereof
11/29/2000CN1274971A Manufacture process of automobile commutator
11/29/2000CN1274951A Lead sticking tape unit for semiconductor device and its assembling method
11/29/2000CN1274950A Mounting structure, method of manufacturing the same and electrically conductive adhesive
11/29/2000CN1274949A System for transfering polishing liquid when semiconductor wafer is chemimechanical polished
11/29/2000CN1274948A Batch-type supply system and method
11/29/2000CN1274908A Method for manufacture of head suspended assembly body with IC chip
11/29/2000CN1274870A Electronic beam exposure method
11/29/2000CN1274831A Heat radiator and its making-up method
11/29/2000CN1274823A Gas-conveying quantitative distributing pipe
11/29/2000CN1274768A Gas distributing system
11/29/2000CN1059054C 半导体器件 Semiconductor devices
11/29/2000CN1059053C Packaged semiconductor device having flange at its side surface and its manufacturing method
11/29/2000CN1058998C Integrated sputter target assembly and manufacture thereof
11/28/2000US6154873 Layout designing method and layout designing apparatus
11/28/2000US6154855 Efficient direct replacement cell fault tolerant architecture
11/28/2000US6154718 Method, apparatus and computer program product for simulating diffusion of impurities in a semiconductor
11/28/2000US6154717 Computer simulation method of impurity with pileup phenomenon
11/28/2000US6154712 Test procedure and test station for carrying out the test procedure
11/28/2000US6154711 Disposition tool for factory process control
11/28/2000US6154563 Method of correcting mask pattern and mask, method of exposure, apparatus thereof, and photomask and semiconductor device using the same
11/28/2000US6154415 Internal clock generation circuit of semiconductor device and method for generating internal clock
11/28/2000US6154395 Semiconductor memory device having a layout pattern adjusted input terminal capacitance
11/28/2000US6154391 Nonvolatile semiconductor memory device
11/28/2000US6154366 Structures and processes for fabricating moisture resistant chip-on-flex packages
11/28/2000US6154284 Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use
11/28/2000US6154281 Position detecting system and device manufacturing method using the same
11/28/2000US6154270 Scanning exposure method and apparatus
11/28/2000US6154269 Method of evaluating performance of a scan-type exposure apparatus
11/28/2000US6154074 Semiconductor device with test circuit for high accuracy chip testing
11/28/2000US6154038 Apparatus and method for testing circuit board
11/28/2000US6154018 High differential impedance load device
11/28/2000US6153941 Semiconductor registration measurement mark
11/28/2000US6153940 Core metal soldering knob flip-chip technology
11/28/2000US6153939 Flip-chip semiconductor device with enhanced reliability and manufacturing efficiency, and the method for under filling the same
11/28/2000US6153938 Flip-chip connecting method, flip-chip connected structure and electronic device using the same
11/28/2000US6153937 Semiconductor device and method of the same
11/28/2000US6153936 Method for forming via hole and semiconductor structure formed thereby
11/28/2000US6153935 Dual etch stop/diffusion barrier for damascene interconnects
11/28/2000US6153934 Buried butted contact and method for fabricating
11/28/2000US6153933 Elimination of residual materials in a multiple-layer interconnect structure
11/28/2000US6153930 Electronic circuit device and method
11/28/2000US6153926 Semiconductor device
11/28/2000US6153925 Film circuit
11/28/2000US6153923 Semiconductor device
11/28/2000US6153922 Semiconductor device
11/28/2000US6153921 Diode device
11/28/2000US6153920 Process for controlling dopant diffusion in a semiconductor layer and semiconductor device formed thereby
11/28/2000US6153919 Bipolar transistor with polysilicon dummy emitter
11/28/2000US6153918 Semiconductor device with improved planarity and reduced parasitic capacitance
11/28/2000US6153916 MOS transistor with high output voltage endurance
11/28/2000US6153915 CMOS semiconductor device
11/28/2000US6153914 Output circuit for integrated circuits
11/28/2000US6153913 Electrostatic discharge protection circuit
11/28/2000US6153912 SOI with conductive metal substrate used as VSS connection
11/28/2000US6153911 Metal oxide semiconductor device and method manufacturing the same
11/28/2000US6153910 Semiconductor device with nitrogen implanted channel region
11/28/2000US6153909 Semiconductor device and method for fabricating the same
11/28/2000US6153908 Buried-gate semiconductor device with improved level of integration
11/28/2000US6153907 IC layout structure for MOSFET having narrow and short channel
11/28/2000US6153906 Flash memory
11/28/2000US6153905 Semiconductor component including MOSFET with asymmetric gate electrode where the drain electrode over portions of the lightly doped diffusion region without a gate dielectric
11/28/2000US6153904 Fabrication method for increasing the coupling efficiency of ETOX flash memory devices
11/28/2000US6153903 Cell capacitors, memory cells, memory arrays, and method of fabrication
11/28/2000US6153902 Vertical DRAM cell with wordline self-aligned to storage trench
11/28/2000US6153901 Integrated circuit capacitor including anchored plug
11/28/2000US6153900 Method and structure for manufacturing contact windows in semiconductor process
11/28/2000US6153899 Capacitor array structure for semiconductor devices
11/28/2000US6153898 Ferroelectric capacitor, method of manufacturing same and memory cell using same
11/28/2000US6153897 Heterojunction compound semiconductor device and method of manufacturing the same
11/28/2000US6153896 Semiconductor device and control method thereof
11/28/2000US6153893 Thin film semiconductor device for display
11/28/2000US6153892 Semiconductor device and method for manufacture thereof
11/28/2000US6153891 Method and apparatus providing a circuit edit structure through the back side of an integrated circuit die
11/28/2000US6153890 Memory cell incorporating a chalcogenide element
11/28/2000US6153887 Sucked material detector, sucked material detecting method using the same detector, shift detecting method using the same detector, and cleaning method using the same detector
11/28/2000US6153885 Toroidal charged particle deflector with high mechanical stability and accuracy
11/28/2000US6153877 Projection exposure apparatus
11/28/2000US6153849 Method and apparatus for preventing etch rate drop after machine idle in plasma etch chamber
11/28/2000US6153833 Integrated circuit having interconnect lines separated by a dielectric having a capping layer
11/28/2000US6153724 A polylactam as flocculants in water purification, as polymers useful on non-fouling surfaces for biofilm suppression, thin conductive films for microchips and other electronic devices
11/28/2000US6153543 High density plasma passivation layer and method of application
11/28/2000US6153542 Reacting silane and hydrogen peroxide; depressurization
11/28/2000US6153541 Method for fabricating an oxynitride layer having anti-reflective properties and low leakage current
11/28/2000US6153540 From tetraethoxy silane and triethyl phosphate in vapor phase
11/28/2000US6153539 Using hexafluorotitanic acid
11/28/2000US6153538 Method of making MOSFET with ultra-thin gate oxide
11/28/2000US6153537 Process for the production of a semiconductor device having better interface adhesion between dielectric layers
11/28/2000US6153536 Method for mounting wafer frame at back side grinding (BSG) tool