Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2000
12/13/2000EP1059295A1 Production of metal complexes by comproportionation
12/13/2000EP1059142A2 Carrier head to apply pressure to and retain a substrate
12/13/2000EP1059019A1 Components with releasable leads
12/13/2000EP1058949A1 Quasi-mesh gate structure including plugs connecting source regions with backside for lateral rf mos devices
12/13/2000EP1058946A1 Method for forming cavities in a semiconductor substrate by implanting atoms
12/13/2000EP1058945A1 Uniform heat trace and secondary containment for delivery lines for processing system
12/13/2000EP1058944A1 Cooling system with antifreeze for cooling magnetron for process chamber of processing system
12/13/2000EP1058602A1 Single drive, dual plane robot
12/13/2000EP0916186B1 Integrated circuit with resonant circuit using a capacitance adjustable by means of a programmable switch
12/13/2000EP0686303B1 Process and device for transporting flat objects, in particular substrates
12/13/2000CN1276905A Ferroelectric data processing device
12/13/2000CN1276741A Semiconductor mfg. system with getter safety device
12/13/2000CN1276648A Electronic component having circuit arrangement packed and mfg. method thereof
12/13/2000CN1276630A Semiconductor device and its mfg. method
12/13/2000CN1276629A Ferroelectric random storage unit with internal oxygen source and method for releasing oxygen
12/13/2000CN1276628A Semiconductor device and its mfg. method
12/13/2000CN1276626A Method for mfg. semiconductor device with element separating insulation film
12/13/2000CN1276625A Charging measuring device
12/13/2000CN1276624A Method for mfg. semiconductor device
12/13/2000CN1276623A Method for providing double work function doping and protection insulation cap
12/13/2000CN1276622A Method for mfg. optoelectronic device
12/13/2000CN1276577A Pattern defect testing method
12/13/2000CN1276541A Topcoating composition and method for forming fine pattern using said composition
12/13/2000CN1276534A Method and apparatus for producing test model of circuit block capable of reducing load and time
12/13/2000CN1276530A Probe unit for inspection of base board for assemblying semiconductor chip
12/13/2000CN1276271A Temp.-controlled degasification of deionized water in extremely ultrasonic cleaned semiconductor chip
12/13/2000CN1059518C Method for mfg. film transistor
12/13/2000CN1059517C Device isolation method of semiconductor device
12/13/2000CN1059516C Method of mfg. semiconductor device
12/13/2000CN1059515C Conductive ball carrying device
12/13/2000CN1059474C Collimator and mfg. method therefor
12/13/2000CN1059404C Device and method for detaching linerless labels
12/12/2000US6161215 Package routing of integrated circuit signals
12/12/2000US6161211 Method and apparatus for automated circuit design
12/12/2000US6161056 Placement method and apparatus
12/12/2000US6161054 Cell control method and apparatus
12/12/2000US6161053 In-situ binary PCM code indentifier to verify a ROM code id during processing
12/12/2000US6160906 Method and apparatus for visually inspecting an object
12/12/2000US6160865 X-ray exposure apparatus with synchrotron radiation intensity measurement
12/12/2000US6160827 Laser irradiating device and laser irradiating method
12/12/2000US6160753 Semiconductor integrated circuit device having main word lines and sub-word lines
12/12/2000US6160752 Semiconductor memory device
12/12/2000US6160714 Molded electronic package and method of preparation
12/12/2000US6160628 Interferometer system and method for lens column alignment
12/12/2000US6160623 Method for measuring an aberration of a projection optical system
12/12/2000US6160622 Alignment device and lithographic apparatus comprising such a device
12/12/2000US6160621 Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
12/12/2000US6160615 Surface measurement apparatus for detecting crystal defects of wafer
12/12/2000US6160611 Exposing apparatus and method
12/12/2000US6160598 Liquid crystal display and a method for fabricating thereof
12/12/2000US6160415 Apparatus and method for setting zero point of Z-axis in a wafer probe station
12/12/2000US6160407 Inspection method and wiring current observation method for semiconductor device and apparatus of the same
12/12/2000US6160338 Transport apparatus
12/12/2000US6160317 Method of spacer formation and source protection after self-aligned source formed and a device provided by such a method
12/12/2000US6160316 Integrated circuit utilizing an air gap to reduce capacitance between adjacent metal linewidths
12/12/2000US6160315 The alloying metal oxide having a thickness of about 6 nm on the oxide sidewalls encapsulates the copper layer to provide a barrier against copper migration, to form an adhesion layer over silicon dioxide
12/12/2000US6160314 Polishing stop structure
12/12/2000US6160313 Semiconductor device having an insulating substrate
12/12/2000US6160308 Semiconductor device
12/12/2000US6160306 Diode of semiconductor device and method for manufacturing the same
12/12/2000US6160304 Semiconductor device comprising a half-bridge circuit
12/12/2000US6160301 Gate structure
12/12/2000US6160300 Multi-layer gate conductor having a diffusion barrier in the bottom layer
12/12/2000US6160299 Shallow-implant elevated source/drain doping from a sidewall dopant source
12/12/2000US6160298 Full CMOS SRAM cell comprising Vcc and Vss buses on both sides of each of complementary data lines on a single level
12/12/2000US6160297 Semiconductor memory device having a first source line arranged between a memory cell string and bit lines in the direction crossing the bit lines and a second source line arranged in parallel to the bit lines
12/12/2000US6160296 Titanium nitride interconnects
12/12/2000US6160295 CMOS device
12/12/2000US6160294 Semiconductor device having an interconnection pattern for connecting among conductive portions of elements
12/12/2000US6160291 SOI-MOS field effect transistor with improved source/drain structure
12/12/2000US6160289 RESURF EDMOS transistor and high-voltage analog multiplexer circuit using the same
12/12/2000US6160288 Vertical type misfet having improved pressure resistance
12/12/2000US6160287 Flash memory
12/12/2000US6160285 Polysilicon electrode with increased surface area and method for making same
12/12/2000US6160284 Semiconductor device with sidewall insulating layers in the capacitor contact hole
12/12/2000US6160283 Methods of forming integrated circuitry and integrated circuitry structures
12/12/2000US6160279 Method for producing a semiconductor device including doping with a catalyst that is a group IV element
12/12/2000US6160277 Field effect transistor assemblies and transistor gate block stacks
12/12/2000US6160276 Double-sided programmable interconnect structure
12/12/2000US6160272 Self-light-emitting apparatus and semiconductor device used in the apparatus
12/12/2000US6160271 Semiconductor thin film and semiconductor device
12/12/2000US6160270 Improved multilayer matrix line including inverted gate thin film matrix transistors to reduce defects in and enhance performance of matrix incorporating the transistors, including active matrix displays
12/12/2000US6160269 Thin film semiconductor integrated circuit
12/12/2000US6160268 Semiconductor device and manufacturing method thereof
12/12/2000US6160265 SMIF box cover hold down latch and box door latch actuating mechanism
12/12/2000US6160262 Method and apparatus for deflecting charged particles
12/12/2000US6160244 Susceptors
12/12/2000US6160242 Apparatus and process for measuring the temperature of semiconductor wafers in the presence of radiation absorbing gases
12/12/2000US6159884 Method of annealing silicon carbide for activation of ion-implanted dopants
12/12/2000US6159874 Method of forming a hemispherical grained capacitor
12/12/2000US6159872 F ion implantation into oxide films to form low-K intermetal dielectric
12/12/2000US6159871 Method for producing hydrogenated silicon oxycarbide films having low dielectric constant
12/12/2000US6159870 Borophosphosilicate glass incorporated with fluorine for low thermal budget gap fill
12/12/2000US6159868 Method of forming a high quality layer of BST
12/12/2000US6159867 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
12/12/2000US6159866 Method for insitu vapor generation for forming an oxide on a substrate
12/12/2000US6159865 Wafer treating solution and method for preparing the same
12/12/2000US6159864 Method of preventing damages of gate oxides of a semiconductor wafer in a plasma-related process
12/12/2000US6159863 Insitu hardmask and metal etch in a single etcher
12/12/2000US6159862 Semiconductor processing method and system using C5 F8
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