Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2000
12/28/2000WO2000079844A1 Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device
12/28/2000WO2000079843A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower
12/28/2000WO2000079603A1 Diamond semiconductor device and method of manufacture thereof
12/28/2000WO2000079602A1 Multi-channel mosfet and method for producing the same
12/28/2000WO2000079601A1 Semiconductor device and method of manufacture thereof
12/28/2000WO2000079600A1 SINGLE HETEROJUNCTION InP-COLLECTOR BJT DEVICE AND METHOD
12/28/2000WO2000079599A1 InGaAsN/GaAs QUANTUM WELL DEVICES
12/28/2000WO2000079597A1 Semiconductor memory device and method of manufacturing the same
12/28/2000WO2000079595A1 Method of modifying an integrated circuit
12/28/2000WO2000079591A1 Multi-chip module for leads-on-chip (loc) assembly and method for production of the same.
12/28/2000WO2000079590A1 Electronic device with flexible contacting points
12/28/2000WO2000079589A1 Electronic component with flexible contact structures and method for the production of said component
12/28/2000WO2000079588A1 Resin seal package and terminal forming board
12/28/2000WO2000079587A1 Semiconductor storage component with storage cells, logic areas and filling structures
12/28/2000WO2000079586A1 Production method for semiconductor integrated circuit device and semiconductor integrated circuit device
12/28/2000WO2000079584A1 Semiconductor and manufacturing method for semiconductor
12/28/2000WO2000079583A1 Method and apparatus for wet-etching semiconductor wafers
12/28/2000WO2000079582A1 Controllably degradable composition of heteroatom carbocyclic or epoxy resin and curing agent
12/28/2000WO2000079581A2 Improving mosfet performance by employing an improved method for forming halo implants
12/28/2000WO2000079580A1 Method of manufacturing semiconductor device
12/28/2000WO2000079579A2 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards
12/28/2000WO2000079578A1 Improvements relating to plasma etching
12/28/2000WO2000079577A1 Abrasive compound for cmp, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for cmp abrasive compound
12/28/2000WO2000079575A1 Plasma process device, electrode structure thereof, and stage structure
12/28/2000WO2000079573A1 Semiconductor arrangement having capacitive structure and manufacture thereof
12/28/2000WO2000079572A1 Post-plasma processing wafer cleaning method and system
12/28/2000WO2000079571A2 Vacuum compliant door hinge
12/28/2000WO2000079570A2 Silicon carbide epitaxial layers grown on substrates offcut towards <1100>
12/28/2000WO2000079568A2 Plasma reactor with multiple small internal inductive antennas
12/28/2000WO2000079567A1 Process and apparatus for implanting oxygen ions silicon wafers
12/28/2000WO2000079564A2 Plasma reactor with internal inductive antenna capable of generating helicon wave
12/28/2000WO2000079356A2 Robot pre-positioning in a wafer processing system
12/28/2000WO2000079355A1 Run-to-run controller for use in microelectronic fabrication
12/28/2000WO2000079343A1 Mask manufacturing methods comprising patterns to control corner rounding
12/28/2000WO2000079298A2 Magnetic systems with irreversible characteristics and a method of manufacturing and repairing and operating such systems
12/28/2000WO2000079297A1 Method for manufacturing a magnetic sensor device
12/28/2000WO2000079296A1 Integral bump technology sense resistor
12/28/2000WO2000079289A1 Wiring substrate for conductive contact unit
12/28/2000WO2000079257A1 Molecular and atomic scale evaluation of biopolymers
12/28/2000WO2000079245A1 Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool
12/28/2000WO2000079019A1 Apparatus for atomic layer chemical vapor deposition
12/28/2000WO2000078887A1 Adhesive, adhesive member, circuit substrate for semiconductor mounting having adhesive member, and semiconductor device containing the same
12/28/2000WO2000078668A1 Control of solid state dimensional features
12/28/2000WO2000078667A1 Precisely defined microelectromechanical structures and associated fabrication methods
12/28/2000WO2000078654A1 Improved wafer handling apparatus
12/28/2000WO2000078651A1 Frictionless transport apparatus and method
12/28/2000WO2000049202A3 Improved etching methods for anisotropic platinum profile
12/28/2000WO2000033373A3 Method of manufacturing a semiconductor device comprising a bipolar transistor
12/28/2000WO2000017937A3 Method for producing a semiconductor component
12/28/2000DE19929403A1 Objektiv, insbesondere Objektiv für eine Halbleiter-Lithographie-Projektionsbelichtungsanlage und Herstellungverfahren Lens, lens especially for semiconductor lithography projection exposure apparatus and manufacturing method
12/28/2000DE19929026A1 Manufacture of pressure sensor by injection molding over semiconductor mounting assembly and lead frame with clearance, employs plunger locally controlling temperature of duroplastic mass
12/28/2000DE19928297A1 Production of a sensor with a membrane comprises depositing a silicon nitride layer by a LPCVD or PECVD process on a surface of a silicon substrate, and etching a recess from the underside of the substrate
12/28/2000DE19927749A1 Electronic arrangement used as a semiconductor chip has electrical contacts on a first surface with a flexible elevation made of an insulating material
12/28/2000DE19927527A1 Process for wet chemical treatment of a semiconductor wafer has a circuit to transport the treatment liquid between a storage tank and a container, and a circuit to transport the liquid enriched with gas back into the tank
12/28/2000DE19927287A1 Verfahren zur Herstellung einer nichtflüchtigen Halbleiter-Speicherzelle A method of manufacturing a nonvolatile semiconductor memory cell
12/28/2000DE19927046A1 Keramik-Metall-Substrat, insbesondere Mehrfachsubstrat A ceramic-metal substrate, in particular multiple substrate
12/28/2000DE10016060A1 Motherboard structure has linearly distributed through-holes which are mutually formed at predetermined interval such that through-holes on alternate linearity are linear
12/28/2000DE10012420A1 Wafer polishing head for polishing semiconductor wafers relying upon a chemical-mechanical polishing (CMP) method, has wafer carrier being moved relative to retainer ring and to body portion
12/28/2000DE10009656A1 Production of a semiconductor wafer sucking a test wafer with known topology with its reverse side against the film of the support and measuring a front side of the test wafer topologically
12/28/2000CA2376015A1 Apparatus for plasma treatment using capillary electrode discharge plasma shower
12/28/2000CA2374211A1 Method of modifying an integrated circuit
12/28/2000CA2374203A1 Semiconductor and manufacturing method for semiconductor
12/28/2000CA2374187A1 Controllably degradable composition of heteroatom carbocyclic or epoxy resin and curing agent
12/27/2000EP1063757A2 Power MOSFET having voltage-clamped gate
12/27/2000EP1063737A2 Method for joining wiring boards and manufacturing data carrier and device for mounting electronic component modules
12/27/2000EP1063709A2 Method of fabricating a surface coupled InGaAs photodetector
12/27/2000EP1063704A2 EL display device, driving method thereof, and electronic equipment provided with the EL display device
12/27/2000EP1063702A1 Double density fuse structure in a window
12/27/2000EP1063701A2 Backmetal drain terminal with low stress and thermal resistance
12/27/2000EP1063699A1 Base sheet for semiconductor module, method for manufacturing base sheet for semiconductor module, and semiconductor module
12/27/2000EP1063698A2 Method of forming a dram bit line contact
12/27/2000EP1063697A1 A cmos integrated circuit having vertical transistors and a process for fabricating same
12/27/2000EP1063696A1 A method for improving the quality of a metal-containing layer deposited from a plating bath
12/27/2000EP1063695A2 Method of passivating copper interconnects in a semiconductor device
12/27/2000EP1063694A1 Process for fabricating vertical transistors
12/27/2000EP1063693A1 Wiring, thin-film transistor substrate with the wiring, method of manufacture thereof, and liquid crystal display device
12/27/2000EP1063692A1 Process for depositing a low dielectric constant film
12/27/2000EP1063691A2 A dry-etching method and an equipment for dry-etching
12/27/2000EP1063690A1 Plasma processing apparatus and plasma processing method
12/27/2000EP1063689A1 Stripping agent against resist residues
12/27/2000EP1063688A1 Method of producing silicon device
12/27/2000EP1063687A2 Titanium-tantalum barrier layer film and method for forming the same
12/27/2000EP1063686A2 Method of silicide formation in a semiconductor device
12/27/2000EP1063685A1 Photoresist film removing method and device therefor
12/27/2000EP1063683A2 Robot blade for semiconductor processing equipment
12/27/2000EP1063670A2 Bonded article with improved work function uniformity and method for making the same
12/27/2000EP1063669A2 Cathode with improved work function and method for making the same
12/27/2000EP1063661A1 An integrated circuit having a micromagnetic device and method of manufacture therefor
12/27/2000EP1063599A2 System and method for integrated circuit design
12/27/2000EP1063578A1 Reference voltage generator with monitoring and start up means
12/27/2000EP1063570A2 In situ projection optic metrology method and apparatus
12/27/2000EP1063569A2 Method and apparatus for characterization of optical systems
12/27/2000EP1063568A1 Method of forming a fine pattern, and method of manufacturing a semiconductor device, and a semiconductor device having a fine pattern
12/27/2000EP1063551A1 Objective especially suited for semiconductor lithography projection imaging device and its production method
12/27/2000EP1063503A1 Wavelength monitoring apparatus for laser light for semiconductor exposure
12/27/2000EP1063203A1 Silica glass member
12/27/2000EP1063197A2 Charge separation type heterojunction structure and manufacturing method therefor
12/27/2000EP1063186A1 Substrate transferring device and method
12/27/2000EP1063056A2 Method and apparatus for measuring a pad profile and closed loop control of a pad conditioning process
12/27/2000EP1063055A2 Apparatus and method for chemical mechanical polishing
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