| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 01/09/2001 | US6171890 Method for manufacturing a semiconductor device |
| 01/09/2001 | US6171889 Semiconductor device and method of manufacturing the same |
| 01/09/2001 | US6171888 Multi-layer tab tape having distinct signal, power and ground planes, semiconductor device assembly employing same, apparatus for and method of assembling same |
| 01/09/2001 | US6171887 Semiconductor device for a face down bonding to a mounting substrate and a method of manufacturing the same |
| 01/09/2001 | US6171882 Method of manufacturing photo diode |
| 01/09/2001 | US6171874 Non-defect image and data transfer and storage methodology |
| 01/09/2001 | US6171873 Method and apparatus for preventing chip breakage during semiconductor manufacturing using wafer grinding striation information |
| 01/09/2001 | US6171872 Method of monitoring a process of manufacturing a semiconductor wafer including hemispherical grain polysilicon |
| 01/09/2001 | US6171871 Ferroelectric memory device and their manufacturing methods |
| 01/09/2001 | US6171764 Method for reducing intensity of reflected rays encountered during process of photolithography |
| 01/09/2001 | US6171763 Ultra-thin resist and oxide/nitride hard mask for metal etch |
| 01/09/2001 | US6171761 Resist pattern forming method utilizing multiple baking and partial development steps |
| 01/09/2001 | US6171760 Lithography method and system in which a photoresist film is irradiated with light while the charged particle beam is applied |
| 01/09/2001 | US6171759 Photocurable composition |
| 01/09/2001 | US6171757 Organometallic polymers and use thereof |
| 01/09/2001 | US6171755 Chemically amplified resist |
| 01/09/2001 | US6171754 Chemically amplified resist compositions |
| 01/09/2001 | US6171750 Coating novolak resin composition on substrate to form a coating film, prebaking the thus formed coating film to form a photoresist film, optionally post-baking the photoresist film, and exposing photoresist to radiation |
| 01/09/2001 | US6171740 Image-wise exposing photopolymeric layer to cause exposed areas to crosslink and exhibit increase in resistivity in comparison with unexposed areas, charging, applying catalyst metal containing toner, juxtaposing to semiconductor |
| 01/09/2001 | US6171737 For detecting defects in photolithography processes in a submicron integrated circuit manufacturing environment; combines use of a reusable test wafer with in-line processing to monitor defects using a pattern comparator system |
| 01/09/2001 | US6171717 Semiconductor substrate bearing a first titanium layer, a first titanium nitride layer and a plasma treated titanium nitride layer formed on the first titanium nitride layer; plasma enhanced chemical vapor deposition |
| 01/09/2001 | US6171703 Hermetic substrate coatings in an inert gas atmosphere |
| 01/09/2001 | US6171687 Infiltrated nanoporous materials and methods of producing same |
| 01/09/2001 | US6171672 Silicone pressure sensitive adhesive comprising a silicone resin and a silicon rubber that contains a phenyl group, and a crosslinking agent; avoids lifting/separtion of cover tape from carrier tape caused by a difference in thermal shrinkage |
| 01/09/2001 | US6171662 Method of surface processing |
| 01/09/2001 | US6171661 Deposition of copper with increased adhesion |
| 01/09/2001 | US6171645 Depositing a metal alcoholate as an aerogel precursor sol, a polyol as first solvent on a semiconductor substrate, allowing deposited sol to create gel, drying to form dry aerogel by removing pour fluid at controlled pressure/temp. |
| 01/09/2001 | US6171641 Vacuum processing apparatus, and a film deposition apparatus and a film deposition method both using the vacuum processing apparatus |
| 01/09/2001 | US6171514 Polishing method for planarizing a substrate |
| 01/09/2001 | US6171512 Selectively etching the non-oxidized porous silicon layer of a substrate having a non-oxidized porous silicon layer and a nonporous silicon layer with an etching liquid comprising hydrofluoric acid, free of nitric acid (hno3) |
| 01/09/2001 | US6171467 Silicon wafers in electrolytic baths, applying voltage and planarizing |
| 01/09/2001 | US6171456 Method for making improved long life bonding tools |
| 01/09/2001 | US6171455 Sampling and vapor deposition of films with direct current |
| 01/09/2001 | US6171453 Alignment mark shielding ring and method of using |
| 01/09/2001 | US6171438 Plasma processing apparatus and plasma processing method |
| 01/09/2001 | US6171437 Semiconductor manufacturing device |
| 01/09/2001 | US6171436 Apparatus for removing slurry particles |
| 01/09/2001 | US6171405 Methods of removing contaminants from integrated circuit substrates using cleaning solutions |
| 01/09/2001 | US6171403 Cleaning and drying apparatus, wafer processing system and wafer processing method |
| 01/09/2001 | US6171402 Thermal conditioning apparatus |
| 01/09/2001 | US6171401 Process liquid dispense apparatus |
| 01/09/2001 | US6171400 Vertical semiconductor wafer carrier |
| 01/09/2001 | US6171396 Growing system for uniformly growing thin film over semiconductor wafer through rotation |
| 01/09/2001 | US6171394 Method for manufacturing compound semiconductor epitaxial wafer |
| 01/09/2001 | US6171389 Methods of producing doped semiconductors |
| 01/09/2001 | US6171385 Colophonium resin modified with ester and amine for adhesives for semiconductor wafers |
| 01/09/2001 | US6171353 Apparatus for treating waste gases |
| 01/09/2001 | US6171352 Comprising 70-95% by weight aqueous medium, 1-25% by weight abrasive, 0.1-20% by weight abrasion accelerator, wherein abrasion accelerator comprises monocarboxy group- or an amido group-containing compound |
| 01/09/2001 | US6171180 Planarizing a trench dielectric having an upper surface within a trench spaced below an adjacent polish stop surface |
| 01/09/2001 | US6171176 Method of effecting a precision saw-toothed grinding on the surface of a given workpiece |
| 01/09/2001 | US6171174 System and method for controlling a multi-arm polishing tool |
| 01/09/2001 | US6171163 Process for production of field-emission cold cathode |
| 01/09/2001 | US6171104 Oxidation treatment method and apparatus |
| 01/09/2001 | US6171049 Method and device for receiving, orientating and assembling of components |
| 01/09/2001 | US6170815 Method of fabricating a thin film transistor including forming a trench and forming a gate electrode on one side of the interior of the trench |
| 01/09/2001 | US6170737 Solder ball placement method |
| 01/09/2001 | US6170690 Air-tightly sealable container with bell jar covering |
| 01/09/2001 | US6170640 Carrying system and carrying method |
| 01/09/2001 | US6170496 Apparatus and method for servicing a wafer platform |
| 01/09/2001 | US6170495 Apparatus for treating substrates using the marangoni effect |
| 01/09/2001 | US6170492 Monitoring a position of a valve regulating a gas outlet of the chamber; in the process of making integrated circuit and flat panel display fabrication |
| 01/09/2001 | US6170433 Method and apparatus for processing a wafer |
| 01/09/2001 | US6170431 Plasma reactor with a deposition shield |
| 01/09/2001 | US6170430 Gas feedthrough with electrostatic discharge characteristic |
| 01/09/2001 | US6170429 Chamber liner for semiconductor process chambers |
| 01/09/2001 | US6170428 Symmetric tunable inductively coupled HDP-CVD reactor |
| 01/09/2001 | US6170235 Wafer packaging method |
| 01/09/2001 | US6170171 Vacuum drying of semiconductor fragments |
| 01/09/2001 | US6170165 Method and apparatus for measuring a gap |
| 01/09/2001 | US6170155 System of components to be hybridized and hybridization process allowing for thermal expansions |
| 01/09/2001 | US6170151 Universal unit strip/carrier frame assembly and methods |
| 01/09/2001 | US6170116 Abrasive member and cleaning device for probe needle for probe card |
| 01/09/2001 | US6170110 Apparatus for HF-HF cleaning |
| 01/05/2001 | CA2313346A1 Method for the testing of electronic components |
| 01/04/2001 | WO2001001736A1 Device for producing an extreme ultraviolet and soft x radiation from a gaseous discharge |
| 01/04/2001 | WO2001001496A1 Method for making a semiconductor device comprising a stack alternately consisting of silicon layers and dielectric material layers |
| 01/04/2001 | WO2001001493A1 Memory cell array and corresponding production method |
| 01/04/2001 | WO2001001491A1 Multi-bit trench capacitor |
| 01/04/2001 | WO2001001490A1 Soi dram without floating body effect |
| 01/04/2001 | WO2001001489A1 Dram cell arrangement and method for the production thereof |
| 01/04/2001 | WO2001001486A1 Interposer and method of making same |
| 01/04/2001 | WO2001001485A2 A semiconductor device |
| 01/04/2001 | WO2001001483A1 Method for producing a ferroelectric memory array |
| 01/04/2001 | WO2001001482A1 Method for producing read-only memory (rom) cells |
| 01/04/2001 | WO2001001481A1 Mos transistor and dram cell arrangement and method for the production thereof |
| 01/04/2001 | WO2001001480A1 Method of protecting an underlying wiring layer during dual damascene processing |
| 01/04/2001 | WO2001001479A1 Mounting/demounting device for wafer carrier lid |
| 01/04/2001 | WO2001001478A1 Component and method for the production thereof |
| 01/04/2001 | WO2001001477A1 Method for lateral etching with holes for making semiconductor devices |
| 01/04/2001 | WO2001001476A1 Method of producing a non-volatile semiconductor memory cell with a separate tunnel window |
| 01/04/2001 | WO2001001475A1 Electrofluidic assembly of devices and components for micro- and nano-scale integration |
| 01/04/2001 | WO2001001474A1 Acid blend for removing etch residue on semiconductor substrates |
| 01/04/2001 | WO2001001473A1 A method and apparatus for etching a gold metal layer using a titanium hardmask |
| 01/04/2001 | WO2001001472A1 Method and apparatus for forming a film on a substrate |
| 01/04/2001 | WO2001001471A1 A method and apparatus for side wall passivation for organic etch |
| 01/04/2001 | WO2001001470A1 A method and apparatus for etching carbon-doped organic silicate glass |
| 01/04/2001 | WO2001001469A2 Process for designing a mask |
| 01/04/2001 | WO2001001468A1 Method of achieving top rounding and uniform etch depths while etching shallow trench isolation features |
| 01/04/2001 | WO2001001466A1 Oxidation of silicon on germanium |
| 01/04/2001 | WO2001001465A1 Cyclic thermal anneal for dislocation reduction |