| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 02/27/2001 | US6194317 Method of planarizing the upper surface of a semiconductor wafer |
| 02/27/2001 | US6194316 Method for forming CU-thin film |
| 02/27/2001 | US6194315 Electrochemical cobalt silicide liner for metal contact fills and damascene processes |
| 02/27/2001 | US6194314 Process for chemical vapor deposition layer production on a semiconductor surface with absorbing protective gasses |
| 02/27/2001 | US6194313 Method for reducing recess for the formation of local interconnect and or plug trench fill for etchback process |
| 02/27/2001 | US6194312 Semiconductor device and method of manufacturing the same |
| 02/27/2001 | US6194311 Method for manufacturing semiconductor device capable of effectively carrying out hydrogen passivation |
| 02/27/2001 | US6194310 Method of forming amorphous conducting diffusion barriers |
| 02/27/2001 | US6194309 Method for forming contact |
| 02/27/2001 | US6194308 Method of forming wire line |
| 02/27/2001 | US6194307 Elimination of copper line damages for damascene process |
| 02/27/2001 | US6194306 Mask and method for forming dynamic random access memory (DRAM) contacts |
| 02/27/2001 | US6194305 Planarization using plasma oxidized amorphous silicon |
| 02/27/2001 | US6194304 Semiconductor device and method of fabricating the same |
| 02/27/2001 | US6194302 Integrated process flow to improve the electrical isolation within self aligned contact structure |
| 02/27/2001 | US6194301 Method of fabricating an integrated circuit of logic and memory using damascene gate structure |
| 02/27/2001 | US6194300 Method of manufacturing the floating gate of split-gate flash memory |
| 02/27/2001 | US6194299 Method for fabrication of a low resistivity MOSFET gate with thick metal on polysilicon |
| 02/27/2001 | US6194298 Method of fabricating semiconductor device |
| 02/27/2001 | US6194297 Method for forming salicide layers |
| 02/27/2001 | US6194296 Method for making planarized polycide |
| 02/27/2001 | US6194295 Production of a refractory metal by chemical vapor deposition of a bilayer-stacked tungsten metal |
| 02/27/2001 | US6194294 Method of forming gate electrode in semiconductor device |
| 02/27/2001 | US6194293 Channel formation after source and drain regions are formed |
| 02/27/2001 | US6194292 Method of fabricating in-situ doped rough polycrystalline silicon using a single wafer reactor |
| 02/27/2001 | US6194291 Microelectronic assemblies with multiple leads |
| 02/27/2001 | US6194290 Methods for making semiconductor devices by low temperature direct bonding |
| 02/27/2001 | US6194289 SOI device and method of isolation thereof |
| 02/27/2001 | US6194288 Implant N2 into a pad oxide film to mask the active region and grow field oxide without Si3N4 film |
| 02/27/2001 | US6194287 Shallow trench isolation (STI) method with reproducible alignment registration |
| 02/27/2001 | US6194286 Method of etching thermally grown oxide substantially selectively relative to deposited oxide |
| 02/27/2001 | US6194285 Formation of shallow trench isolation (STI) |
| 02/27/2001 | US6194284 Method for forming residue free etched silicon layer |
| 02/27/2001 | US6194283 High density trench fill due to new spacer fill method including isotropically etching silicon nitride spacers |
| 02/27/2001 | US6194282 Method for stabilizing SOI semiconductor device and SOI semiconductor device |
| 02/27/2001 | US6194281 Methods of forming three-dimensional capacitor structures including ozone tetraethylorthosilicate undoped silicate |
| 02/27/2001 | US6194280 Method for forming a self-aligned BJT emitter contact |
| 02/27/2001 | US6194279 Fabrication method for gate spacer |
| 02/27/2001 | US6194278 Device performance by employing an improved method for forming halo implants |
| 02/27/2001 | US6194276 Radiation hardened semiconductor memory |
| 02/27/2001 | US6194275 Method to form a mask ROM device with coding after source and drain implantation |
| 02/27/2001 | US6194274 Method of fabricating a mask ROM |
| 02/27/2001 | US6194273 Method of manufacturing an insulated gate type semiconductor device having a U-shaped groove |
| 02/27/2001 | US6194272 Split gate flash cell with extremely small cell size |
| 02/27/2001 | US6194271 Method for fabricating flash memory |
| 02/27/2001 | US6194270 Process for the manufacturing of an electrically programmable non-volatile memory device |
| 02/27/2001 | US6194269 Method to improve cell performance in split gate flash EEPROM |
| 02/27/2001 | US6194268 Printing sublithographic images using a shadow mandrel and off-axis exposure |
| 02/27/2001 | US6194267 Integrated circuit having independently formed array and peripheral isolation dielectrics |
| 02/27/2001 | US6194266 Method for forming a capacitor having selective hemispherical grained polysilicon |
| 02/27/2001 | US6194265 Process for integrating hemispherical grain silicon and a nitride-oxide capacitor dielectric layer for a dynamic random access memory capacitor structure |
| 02/27/2001 | US6194264 Semiconductor processing method of making a hemispherical grain (HSG) polysilicon layer |
| 02/27/2001 | US6194263 Methods for forming capacitor structures including etching pits |
| 02/27/2001 | US6194262 Method for coupling to semiconductor device in an integrated circuit having edge-defined, sub-lithographic conductors |
| 02/27/2001 | US6194261 High yield semiconductor device and method of fabricating the same |
| 02/27/2001 | US6194260 Method of forming a CMOS sensor |
| 02/27/2001 | US6194259 Forming retrograde channel profile and shallow LLDD/S-D extensions using nitrogen implants |
| 02/27/2001 | US6194258 Method of forming an image sensor cell and a CMOS logic circuit device |
| 02/27/2001 | US6194257 Fabrication method of gate electrode having dual gate insulating film |
| 02/27/2001 | US6194256 Method for fabricating CMOS device |
| 02/27/2001 | US6194255 Method for manufacturing thin-film transistors |
| 02/27/2001 | US6194254 Semiconductor device and method for manufacturing the same |
| 02/27/2001 | US6194253 Method for fabrication of silicon on insulator substrates |
| 02/27/2001 | US6194252 Semiconductor device and manufacturing method for the same, basic cell library and manufacturing method for the same, and mask |
| 02/27/2001 | US6194251 Die positioning in integrated circuit packaging |
| 02/27/2001 | US6194250 Low-profile microelectronic package |
| 02/27/2001 | US6194245 Method for making thin film semiconductor |
| 02/27/2001 | US6194244 Method of manufacturing a photodiode in a solid-state device |
| 02/27/2001 | US6194243 Method of production an underfill of a bumped or raised die using a barrier adjacent to the sidewall of a semiconductor device |
| 02/27/2001 | US6194241 Semiconductor light emitting device and method of manufacturing the same |
| 02/27/2001 | US6194239 Method for making thin film semiconductor |
| 02/27/2001 | US6194237 Method for forming quantum dot in semiconductor device and a semiconductor device resulting therefrom |
| 02/27/2001 | US6194234 Method to evaluate hemisperical grain (HSG) polysilicon surface |
| 02/27/2001 | US6194233 Integrated circuit and method of manufacture for avoiding damage by electrostatic charge |
| 02/27/2001 | US6194232 Multi-track wafer processing method |
| 02/27/2001 | US6194231 Method for monitoring polishing pad used in chemical-mechanical planarization process |
| 02/27/2001 | US6194230 Endpoint detection by chemical reaction and light scattering |
| 02/27/2001 | US6194229 Method for improving the sidewall stoichiometry of thin film capacitors |
| 02/27/2001 | US6194228 Electronic device having perovskite-type oxide film, production thereof, and ferroelectric capacitor |
| 02/27/2001 | US6194227 Method of producing a bismuth layer structured ferroelectric thin film |
| 02/27/2001 | US6194128 Method of dual damascene etching |
| 02/27/2001 | US6194126 Pattern-forming process using photosensitive resin composition |
| 02/27/2001 | US6194119 Thermal transfer donor element with light to heat conversion layer, interlayer, and thermal transfer layer including release layer, cathode layer, light emitting polymer layer, small molecule hole transport layer and anode layer |
| 02/27/2001 | US6194102 Mask for transferring a pattern to a substrate, comprising sub-fields including pattern lines and interconnection patterns which include transmitting pattern segments with widths that change monotonically in a longitudinal direction |
| 02/27/2001 | US6194101 Photomask, and process and apparatus for determining condition of photomask |
| 02/27/2001 | US6194085 Optical color tracer identifier in metal paste that bleed to greensheet |
| 02/27/2001 | US6194053 Apparatus and method fabricating buried and flat metal features |
| 02/27/2001 | US6194038 Variations in gas flow concentration |
| 02/27/2001 | US6194029 Coating with acid solution; gelation; sublimination |
| 02/27/2001 | US6194023 Method of manufacturing a poly-crystalline silicon film |
| 02/27/2001 | US6193911 Combustion chemical vapor deposition (ccvd) solution in which is dissolved an additive which forms an electroconductivity adjusting metal oxide in the resulting thin film resistor |
| 02/27/2001 | US6193908 Electroluminescent phosphor powders, methods for making phosphor powders and devices incorporating same |
| 02/27/2001 | US6193900 Method for sensing etch of distributed bragg reflector in real time |
| 02/27/2001 | US6193870 Use of a hard mask for formation of gate and dielectric via nanofilament field emission devices |
| 02/27/2001 | US6193855 Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage |
| 02/27/2001 | US6193836 Center gas feed apparatus for a high density plasma reactor |
| 02/27/2001 | US6193813 Tungsten silicide wafer film that exhibits hysteresis when stress of film is determined |
| 02/27/2001 | US6193811 Baking a semiconductor and isolation |
| 02/27/2001 | US6193807 Conveyors, suction pads and switches |
| 02/27/2001 | US6193804 Apparatus and method for sealing a vacuum chamber |