| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/01/2001 | WO2001014893A1 Test needle for a raster-matching adapter and a device for testing printed circuit boards |
| 03/01/2001 | WO2001014842A1 Semiconductor pressure sensor and pressure sensing device |
| 03/01/2001 | WO2001014811A1 Continuous-conduction wafer bump reflow system |
| 03/01/2001 | WO2001014619A1 Method and device for depositing materials with a large electronic energy gap and high binding energy |
| 03/01/2001 | WO2001014510A1 Stripping and cleaning compositions |
| 03/01/2001 | WO2001014496A1 Compositions for insulator and metal cmp and methods relating thereto |
| 03/01/2001 | WO2001014484A1 Adhesive agent, method for connecting wiring terminals and wiring structure |
| 03/01/2001 | WO2001014463A1 Etchant composition for polyimide resin and method of etching |
| 03/01/2001 | WO2001014227A1 Material delivery system for clean room environments |
| 03/01/2001 | WO2000079579A3 Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma output or adjusting the same upwards |
| 03/01/2001 | WO2000059009A3 Processing chamber with optical window cleaned using process gas |
| 03/01/2001 | WO2000058995B1 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 03/01/2001 | WO2000054933B1 Chemical mechanical polishing head having floating wafer retaining ring and wafer carrier with multi-zone polishing pressure control |
| 03/01/2001 | WO2000021139A8 Low stress polysilicon film and method for producing same |
| 03/01/2001 | DE19940120A1 Forming a bottle-like deep channel in a substrate comprises etching to form an upper region of the channel in the substrate using a plasma gas, etching to form a bottle-like base region of the channel and vertically etching |
| 03/01/2001 | DE19940035A1 Manufacture of integrated inductor which reduces energy loss through underlying silicon substrate |
| 03/01/2001 | DE19939955A1 Prüfnadel für einen Rasteranpassungsadapter einer Vorrichtung zum Testen von Leiterplatten Test needle for a pattern adapter of a device for testing printed circuit boards |
| 03/01/2001 | DE19939700A1 Process for characterizing and improving defect-adhered boundary surfaces in heterostructures on silicon comprises inserting foreign atoms into the heterostructure and detecting by a deep profiling process as boundary surface accumulation |
| 03/01/2001 | DE19939597A1 Microelectronic structure manufacturing method for integrated circuits |
| 03/01/2001 | DE19937995A1 Verfahren zur Strukturierung einer organischen Antireflexionsschicht Method for structuring an organic anti-reflective layer |
| 03/01/2001 | DE19937387C1 Vorrichtung zur Überwachung eines Auftrags eines flüssigen bis pastenförmigen Mediums auf ein Substrat Apparatus for monitoring the deposition of a liquid-to-pasty medium on a substrate |
| 03/01/2001 | DE19937262A1 Anordnung mit Transistor-Funktion Arrangement with transistor function |
| 03/01/2001 | DE19936569A1 Production of a porous silicon surface for making thin layer solar cells involves passing silicon strip through electrolyte bath |
| 03/01/2001 | DE19935441A1 Verfahren und Moldwerkzeug zum Umhüllen von elektronischen Bauelementen A method and molding tool for wrapping electronic components |
| 03/01/2001 | DE19935046A1 Plasma-CVD-Verfahren und Vorrichtung zur Herstellung einer mikrokristallinen Si:H-Schicht auf einem Substrat sowie deren Verwendung Plasma CVD method and apparatus for producing a microcrystalline Si: H layer on a substrate and the use thereof |
| 03/01/2001 | DE10041118A1 Verfahren und Vorrichtung zur Detektion von Mikrokratzern in einem Wafer Method and device for the detection of micro-scratches in a wafer |
| 03/01/2001 | DE10040963A1 Vernetzermonomer, umfassend eine Doppelbindung, und ein dieses enthaltendes Photoresist-Copolymer Crosslinker comprising one double bond, and a photoresist containing this copolymer |
| 03/01/2001 | DE10037950A1 Non-volatile ferroelectric memory device arrangement, includes pairs of a control-line and a read-line formed in the direction intersecting the word-lines at fixed intervals |
| 03/01/2001 | DE10036217A1 Coordinate table mechanism for semiconductor lithography device has sliding shafts fitted with table surface within vacuum chamber supported by pressurized gas bearings |
| 03/01/2001 | DE10031881A1 Semiconductor device for e.g. high speed RAM, has titanium oxide film formed uniformly on lower strontium-ruthenium oxide film formed on semiconductor substrate |
| 03/01/2001 | DE10031056A1 Kondensator für eine Halbleiterspeichervorrichtung und Verfahren zu dessen Herstellung A capacitor for a semiconductor memory device and method for its production |
| 03/01/2001 | DE10030183A1 Semiconductor wafer cutting apparatus has chuck table to convey wafer from wafer mounting area to cutting area in X-axis direction |
| 03/01/2001 | DE10028062A1 Verfahren zum Durchschneiden einer Schutzfolie bei Halbleiterwafern Method for cutting a protective film semiconductor wafers |
| 03/01/2001 | DE10022425A1 Halbleiterbauelement und Verfahren zur Herstellung desselben A semiconductor device and method of manufacturing the same |
| 03/01/2001 | DE10017383A1 Halbleitervorrichtung Semiconductor device |
| 03/01/2001 | CA2316548A1 Surface stabilization of silicon rich silica glass using increased post deposition delay |
| 02/28/2001 | EP1079671A2 Antenna device for generating inductively coupled plasma |
| 02/28/2001 | EP1079480A2 Electro-optic systems |
| 02/28/2001 | EP1079444A2 Light-emitting semiconductor device using group III nitride compound |
| 02/28/2001 | EP1079439A1 Process for packaging a detector chip and a semiconductor device or package |
| 02/28/2001 | EP1079438A2 High frequency semiconductor device |
| 02/28/2001 | EP1079434A2 Power device packaging structure |
| 02/28/2001 | EP1079430A2 A method of manufacturing a semiconductor device |
| 02/28/2001 | EP1079429A1 Alignment processing mechanism and semiconductor processing device using it |
| 02/28/2001 | EP1079428A2 Method of monitoring a patterned transfer process using line width metrology |
| 02/28/2001 | EP1079427A2 Encapsulated electronic part and method of fabricating thereof |
| 02/28/2001 | EP1079426A1 Integration scheme using selfplanarized dielectric layer for shallow trench isolation (STI) |
| 02/28/2001 | EP1079425A1 Process and device for vacuum plasma treatment of substrate |
| 02/28/2001 | EP1079424A1 A method for forming a deep trench in a semiconductor substrate |
| 02/28/2001 | EP1079423A1 Apparatus for gas processing |
| 02/28/2001 | EP1079422A2 Method and apparatus for manufacturing semiconductor device |
| 02/28/2001 | EP1079421A1 Overhead transport system for open cassette transport |
| 02/28/2001 | EP1079420A2 Inspection apparatus |
| 02/28/2001 | EP1079419A2 Method and apparatus for reducing migration of conductive material on a component |
| 02/28/2001 | EP1079418A2 Vacuum processing apparatus and operating method therefor |
| 02/28/2001 | EP1079417A2 Non-contact detecting apparatus for detecting flat surface area, method thereof, apparatus for measuring tilt angle of tilted flat plane, laser marker provided with the same and mark reading apparatus |
| 02/28/2001 | EP1079416A1 Hot plate unit |
| 02/28/2001 | EP1079415A1 Substrate (plasma) processing taking account of optical instabilities |
| 02/28/2001 | EP1079394A1 Semiconductor memory |
| 02/28/2001 | EP1079277A1 Hybrid illumination system for use in photolithography |
| 02/28/2001 | EP1079273A2 Mask repair |
| 02/28/2001 | EP1079260A2 Electro-optical device |
| 02/28/2001 | EP1079203A1 Capacitive monitoring of the application of an adhesive on a substrate with complex permittivity |
| 02/28/2001 | EP1079007A2 Single crystal SiC composite material for producing a semiconductor device and a method of producing the same |
| 02/28/2001 | EP1079004A2 Aluminium-neodymium etch process with hydrogen iodide |
| 02/28/2001 | EP1079001A1 Dual fritted bubbler |
| 02/28/2001 | EP1079000A1 Method for removing residue from an exhaust line |
| 02/28/2001 | EP1078998A2 Dielectric film with a perovskite structure and method of fabricating the same |
| 02/28/2001 | EP1078945A2 Polymer for use in a photoresist composition |
| 02/28/2001 | EP1078717A2 Fixed abrasive polishing tool |
| 02/28/2001 | EP1078506A1 Laser pattern generator |
| 02/28/2001 | EP1078454A1 Planar resist structure, especially an encapsulation for electric components and a thermomechanical method for the production thereof |
| 02/28/2001 | EP1078404A4 Annealing of a crystalline perovskite ferroelectric cell and cells exhibiting improved barrier properties |
| 02/28/2001 | EP1078404A1 Annealing of a crystalline perovskite ferroelectric cell and cells exhibiting improved barrier properties |
| 02/28/2001 | EP1078402A1 Semiconductor system with trenches for separating doped areas |
| 02/28/2001 | EP1078401A1 Power mos transistor with overtemperature protection circuit |
| 02/28/2001 | EP1078399A1 Method of manufacturing a leadframe assembly |
| 02/28/2001 | EP1078396A1 A two-step borophosphosilicate glass deposition process and related devices and apparatus |
| 02/28/2001 | EP1078395A1 Method for etching silicon dioxide using fluorocarbon gas chemistry |
| 02/28/2001 | EP1078394A1 Wet processing methods for the manufacture of electronic components |
| 02/28/2001 | EP1078392A1 An automated substrate processing system |
| 02/28/2001 | EP1078391A1 Method and device for changing a semiconductor wafer position |
| 02/28/2001 | EP1078389A1 Reduction of metal oxide in dual frequency plasma etch chamber |
| 02/28/2001 | EP1078388A1 Method and installation for correcting integrated circuit faults with an ion beam |
| 02/28/2001 | EP1078372A1 High-efficiency miniature magnetic integrated circuit structures |
| 02/28/2001 | EP1078371A1 Circuit with a sensor and non-volatile memory |
| 02/28/2001 | EP1078217A1 Non-destructive analysis of a semiconductor using reflectance spectrometry |
| 02/28/2001 | EP1078113A1 Energy transfer system and method for thermal processing applications |
| 02/28/2001 | EP1078112A1 A sub-atmospheric chemical vapor deposition system with dopant bypass |
| 02/28/2001 | EP1077790A1 A carrier head with a retaining ring for a chemical mechanical polishing system |
| 02/28/2001 | EP1077789A1 Substrate retainer |
| 02/28/2001 | EP1030788A4 Plasma processing methods and apparatus |
| 02/28/2001 | EP0998592A4 Method of using hydrogen and oxygen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom |
| 02/28/2001 | EP0909311A4 Post clean treatment |
| 02/28/2001 | EP0831978B1 On-site ammonia purification for semiconductor manufacture |
| 02/28/2001 | CN1285955A Semiconductor substrate and method for making same |
| 02/28/2001 | CN1285954A In situ wafer cleaning process |
| 02/28/2001 | CN1285932A Method of molecular-scale pattern imprinting at surface |
| 02/28/2001 | CN1285837A Alcohol-based processors for producing manoporous silica thin films |
| 02/28/2001 | CN1285656A Conductive cap, electronic assembly and method for forming insulation film of conductive cap |